EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION Patent applications |
Patent application number | Title | Published |
20150118617 | NEGATIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM AND USE THEREOF - The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. | 04-30-2015 |
20130067664 | POLYURETHANE DERIVATIVES, COMPOSITION THEREOF AND DYE ADDITIVES COMPRISING THE POLYURETHANE DERIVATIVES - A polyurethane derivative and a composition thereof are disclosed. The polyurethane derivative of the present invention has a structure of formula (I). The polyurethane derivative and the composition thereof can be used for increasing light fastness. | 03-21-2013 |
20120301830 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHOD FOR FORMING PATTERN - The present invention is related to a photosensitive resin composition containing: a vinyl-based copolymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group and a carboxyl group-containing vinyl monomer (b); a quinonediazide compound (II) and a compound (III) represented by the following formula (5), and to a photosensitive dry film and a method for forming a patter by using the photosensitive resin composition. | 11-29-2012 |