ASML NETERLANDS B.V.
ASML NETERLANDS B.V. Patent applications | ||
Patent application number | Title | Published |
---|---|---|
20120008116 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 01-12-2012 |