Patent application number | Description | Published |
20080305994 | Pharmaceutical Compositions and Method for Treating, Reducing, Ameliorating, Alleviating, or Preventing Dry Eye - A composition for treating, reducing, ameliorating, alleviating, or preventing a dry eye condition or an opthalmologic disorder that has an etiology in inflammation comprises an inhibitor of activity of poly(ADP-ribose) polymerase (“PARP”). The composition can also include a modulator of pro-inflammatory gene expression. | 12-11-2008 |
20080306038 | Compositions and Methods for Modulating Inflammation Using Fluoroquinolones - Compositions for modulating an inflammation comprise a fluoroquinolone having one of Formulae I-VIII. Methods for modulating an inflammation comprise administering such compositions to a subject in need thereof. The compositions and methods are suitable for modulating an ocular or ophthalmic inflammation, including uveitis, vernal keratoconjunctivitis, or inflammation associated with contact lens-associated corneal infiltrates. | 12-11-2008 |
20090054406 | Compositions and Methods for Modulating Endophthalmitis Using Fluoroquinolones - Compositions for modulating endophthalmitis comprise a fluoroquinolone having one of Formulae I-VIII. Methods for modulating endophthalmitis comprise administering such compositions to a subject in need thereof. The compositions and methods are suitable for modulating post-operative endophthalmitis, post-traumatic endophthalmitis, non-infectious endophthalmitis, panophthalmitis, hematogenous endophthalmitis, or combinations thereof. | 02-26-2009 |
20110046033 | Multipurpose Lens Care Solution with Benefits to Corneal Epithelial Barrier Function - A multipurpose lens care solution comprising 0.005 wt. % to 1 wt. % of an anionic biopolymer, and an antimicrobial agent selected from 0.5 ppm to 2 ppm of poly(hexamethylene biguanide), 0.5 ppm to 2 ppm polyquaternium-1, or 1 ppm to 4 ppm alexidine. The lens care solution exhibits a ZO-1 immunostaining of HCEpiC similar to phosphate buffered saline for after thirty minutes of contact time with the solution. The lens care solution will also have a transepithelial electrical resistance (TEER) of HCEpiC within a 25% difference or less than phosphate buffered saline in Ohm/cm | 02-24-2011 |
20110166126 | Compositions and Methods for Modulating Endophthalmitis Using Fluoroquinolones - Compositions for modulating endophthalmitis comprise a fluoroquinolone having one of Formulae I-VIII. Methods for modulating endophthalmitis comprise administering such compositions to a subject in need thereof. The compositions and methods are suitable for modulating post-operative endophthalmitis, post-traumatic endophthalmitis, non-infectious endophthalmitis, panophthalmitis, hematogenous endophthalmitis, or combinations thereof. | 07-07-2011 |
20110269796 | Use of Levocabastine for Modulating Generation of Pro-Inflammatory Cytokines - A composition for modulating generation of pro-inflammatory cytokines comprises levocabastine or a pharmaceutically acceptable salt or ester thereof. Such composition is useful for treating or controlling diseases having an inflammatory component, such as ocular diseases that are caused by inflammation or have inflammatory sequelae. | 11-03-2011 |
20110281882 | Compositions and Methods for Treating, Controlling, Reducing, or Ameliorating Inflammatory Pain - A composition for treating, controlling, reducing, or ameliorating inflammatory pain comprises a dissociated glucocorticoid receptor agonist (“DIGRA”), a prodrug thereof, a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable ester thereof. The composition can comprise an additional anti-inflammatory agent and can be formulated for topical application, injection, or implantation. It may be used in a method of managing post-surgical ocular pain such that it has lower risk of eliciting adverse side effects seen with other therapeutic agents. | 11-17-2011 |
20120065228 | COMPOSITIONS AND METHODS FOR TREATING, CONTROLLING, REDUCING, OR AMELIORATING OCULAR INFLAMMATORY WITH LOWER RISK OF INCREASED INTRAOCULAR PRESSURE - A composition for treating, controlling, reducing, or ameliorating inflammatory pain comprises a dissociated glucocorticoid receptor agonist (“DIGRA”), a prodrug thereof, a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable ester thereof. The composition can comprise an additional anti-inflammatory agent and can be formulated for topical application, injection, or implantation. It may be used in a method of managing ocular inflammation and/or pain such that it has lower risk of eliciting increased intraocular pressure seen with glucocorticoids. | 03-15-2012 |
20120070401 | Composition and Method for Promoting Wound Healing - A composition for promoting wound healing comprises a bioadhesive polymer and a pharmaceutically acceptable liquid medium. Such a composition is applied to a wound to promote healing of the wound. The bioadhesive polymer can be selected from the group consisting of natural or synthetic hydrophilic polymers and hydrogels. | 03-22-2012 |
20120252756 | Pharmaceutical Compositions and Methods for Treating, Controlling, Ameliorating, or Reversing Conditions of the Eye - A pharmaceutical composition comprises a polyethylene glycol having a molecular weight in the range from about 1,000 to about 10,000, and a water-soluble cellulose derivative having a molecular weight in the range from about 50,000 to 120,000. The composition can further comprise boric acid and/or phosphate, a non-ionic surfactant, and/or an ophthalmic therapeutic agent. The composition is effective in treating, controlling, ameliorating, or reversing one or more conditions or symptoms of dry eye. | 10-04-2012 |
20120316199 | COMPOSITIONS AND METHODS FOR TREATING, CONTROLLING, REDUCING, OR AMELIORATING INFLAMMATORY PAIN - A composition for treating, controlling, reducing, or ameliorating inflammatory pain comprises a dissociated glucocorticoid receptor agonist (“DIGRA”), a prodrug thereof, a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable ester thereof. The composition can comprise an additional anti-inflammatory agent and can be formulated for topical application, injection, or implantation. It may be used in a method of managing post-surgical ocular pain such that it has lower risk of eliciting adverse side effects seen with other therapeutic agents. | 12-13-2012 |
20130289070 | Use of Levocabastine for Modulating Generation of Pro-Inflammatory Cytokines - A composition for modulating generation of pro-inflammatory cytokines comprises levocabastine or a pharmaceutically acceptable salt or ester thereof. Such composition is useful for treating or controlling diseases having an inflammatory component, such as ocular diseases that are caused by inflammation or have inflammatory sequelae. | 10-31-2013 |
20130345259 | Use of Levocabastine for Modulating Generation of Pro-Inflammatory Cytokines - A composition for modulating generation of pro-inflammatory cytokines comprises levocabastine or a pharmaceutically acceptable salt or ester thereof. Such composition is useful for treating or controlling diseases having an inflammatory component, such as ocular diseases that are caused by inflammation or have inflammatory sequelae. | 12-26-2013 |
Patent application number | Description | Published |
20100167629 | METHOD OF DETERMINING PRESSURE TO APPLY TO WAFERS DURING A CMP - A method for uniformly planarizing a wafer that includes determining a first wafer warped value at a first zone on the wafer, determining a second wafer warped value at a second zone on the wafer, and calculating a pressure difference based on the first and second wafer warped values at the first and second zones is provided. The method also includes performing a chemical mechanical polishing of the wafer, applying a first pressure based on the first wafer warped value to the wafer at the first zone during the chemical mechanical polishing, and applying a second pressure based on the second wafer warped value to the wafer at the second zone during the chemical mechanical polishing, a difference between the first pressure and the second pressure based on the pressure difference. | 07-01-2010 |
20110156032 | METHOD OF REPAIRING PROBE PADS - A method that includes forming a first level of active circuitry on a substrate, forming a first probe pad electrically connected to the first level of active circuitry where the first probe pad having a first surface, contacting the first probe pad with a probe tip that displaces a portion of the first probe pad above the first surface, and performing a chemical mechanical polish on the first probe pad to planarize the portion of the first probe pad above the first surface. The method also includes forming a second level of active circuitry overlying the first probe pad, forming a second probe pad electrically connected to the second level of active circuitry, contacting the second probe pad with a probe tip that displaces a portion of the probe pad, and chemically mechanically polishing the second probe pad to remove the portion displaced. | 06-30-2011 |
20110156152 | CMP TECHNIQUES FOR OVERLAPPING LAYER REMOVAL - Chemical-Mechanical Polishing can be used to planarize a semiconductor wafer having a patterned overlapping layer. Isotropic etching can remove a portion of the patterned overlapping layer to produce tapered sidewalls of reduced height. A portion of the overlapping layer can be removed using CMP. The overlapping layer can have a higher polishing rate than the underlying layer so that the underlying layer remains substantially intact after removing the overlying layer. | 06-30-2011 |
20110156284 | DEVICE AND METHOD FOR ALIGNMENT OF VERTICALLY STACKED WAFERS AND DIE - A device is provided that includes a first die having a first alignment structure that includes a plurality of first transmission columns arranged in a pattern and a second die positioned on the first die, the second die having a second alignment structure that includes a plurality of second transmission columns arranged in the same pattern as the first transmission columns. The first and second transmission columns are each coplanar with a first surface and a second surface of the first and second die, respectively. | 06-30-2011 |
20120009693 | System and method for cleaning a charging wafer surface - A system and method for processing a wafer includes a charge neutralization system. The wafer processing system includes a wafer measuring device that can measure characteristics of a surface of the semiconductor wafer. One or more wafer processing stations perform a chemical mechanical polish (CMP) process on the wafer surface. A desica cleaning station can clean and dry the semiconductor wafer. The wafer processing system further includes a charge neutralizing device that can alter a surface charge of the wafer surface. | 01-12-2012 |
20120122373 | PRECISE REAL TIME AND POSITION LOW PRESSURE CONTROL OF CHEMICAL MECHANICAL POLISH (CMP) HEAD - A method and system for detecting and controller wafer surface pressure distribution. Detecting and controlling wafer surface pressure distribution comprises measuring in situ wafer uniformity of a wafer at a plurality of locations of the wafer; and in response to the measured wafer uniformity controlling through a feedback loop in situ CMP head pressure applied at the plurality of locations of the wafer in real time to polish the wafer. | 05-17-2012 |
20120168958 | METHOD AND SYSTEM FOR FORMING DUMMY STRUCTURES IN ACCORDANCE WITH THE GOLDEN RATIO - The present disclosure is directed to method of forming dummy structures in accordance with the golden ratio to reduce dishing and erosion during a chemical mechanical polish. The method includes determining at least one unfilled portion of a die prior to a chemical mechanical planarization and filling the at least one unfilled portion with a plurality of dummy structures, a ratio of the dummy structures to a total area of the unfilled portion being in the range of 36 percent and 39 percent. A die formed in accordance with the method may include a plurality of metal levels and a plurality of regions at each metal level, each region having a plurality of dummy structures formed as golden rectangles. | 07-05-2012 |
20120187530 | USING BACKSIDE PASSIVE ELEMENTS FOR MULTILEVEL 3D WAFERS ALIGNMENT APPLICATIONS - Passive circuit elements are formed at surfaces of two integrated circuit wafers. The passive circuit elements are utilized to align the two integrated circuit wafers to form an integrated circuit wafer stack. | 07-26-2012 |
20120313144 | RECESSED GATE FIELD EFFECT TRANSISTOR - A semiconductor device having a gate positioned in a recess between the source region and a drain region that are adjacent either side of the gate electrode. A channel region is below a majority of the source region as well as a majority of the drain region and the entire gate electrode. | 12-13-2012 |
20120313153 | SYSTEM AND METHOD OF PLATING CONDUCTIVE GATE CONTACTS ON METAL GATES FOR SELF-ALIGNED CONTACT INTERCONNECTIONS - According to one embodiment of the invention, the gate contact is formed by a selective deposition on the gate electrode. One acceptable technique for the selective deposition is by plating. Plating is one process by which a metal structure, such as a gate contact, may be formed directly on the gate electrode. The plating is carried out by immersing the semiconductor die in a plating solution with the gate electrode exposed. The gate contact is plated onto the gate electrode and thus is ensured of being fully aligned exactly to the gate electrode. After this, the appropriate dielectric layers are formed adjacent the gate contact and over the source and drain to ensure that the gate electrode is electrically isolated from other components of the transistor. | 12-13-2012 |
20130063173 | METHOD OF REPAIRING PROBE PADS - A method that includes forming a first level of active circuitry on a substrate, forming a first probe pad electrically connected to the first level of active circuitry where the first probe pad having a first surface, contacting the first probe pad with a probe tip that displaces a portion of the first probe pad above the first surface, and performing a chemical mechanical polish on the first probe pad to planarize the portion of the first probe pad above the first surface. The method also includes forming a second level of active circuitry overlying the first probe pad, forming a second probe pad electrically connected to the second level of active circuitry, contacting the second probe pad with a probe tip that displaces a portion of the probe pad, and chemically mechanically polishing the second probe pad to remove the portion displaced. | 03-14-2013 |
20130072011 | METHOD OF REPAIRING PROBE PADS - A method that includes forming a first level of active circuitry on a substrate, forming a first probe pad electrically connected to the first level of active circuitry where the first probe pad having a first surface, contacting the first probe pad with a probe tip that displaces a portion of the first probe pad above the first surface, and performing a chemical mechanical polish on the first probe pad to planarize the portion of the first probe pad above the first surface. The method also includes forming a second level of active circuitry overlying the first probe pad, forming a second probe pad electrically connected to the second level of active circuitry, contacting the second probe pad with a probe tip that displaces a portion of the probe pad, and chemically mechanically polishing the second probe pad to remove the portion displaced. | 03-21-2013 |
20130093289 | SIZE-CONTROLLABLE OPENING AND METHOD OF MAKING SAME - A support structure includes an internal cavity. An elastic membrane extends to divide the internal cavity into a first chamber and a second chamber. The elastic membrane includes a nanometric-sized pin hole extending there through to interconnect the first chamber to the second chamber. The elastic membrane is formed of a first electrode film and a second electrode film separated by a piezo insulating film. Electrical connection leads are provided to support application of a bias current to the first and second electrode films of the elastic membrane. In response to an applied bias current, the elastic membrane deforms by bending in a direction towards one of the first and second chambers so as to produce an increase in a diameter of the pin hole. | 04-18-2013 |
20130199563 | ADJUSTABLE BRUSH CLEANING APPARATUS FOR SEMICONDUCTOR WAFERS AND ASSOCIATED METHODS - A cleaning apparatus for cleaning a semiconductor wafer includes a rotary brush to be positioned to clean the semiconductor wafer, and an optical sensing device associated with the rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer. An actuator is coupled to the optical sensing device to position the rotary brush based upon the sensed separation distance. | 08-08-2013 |
20130199580 | DRYING APPARATUS WITH EXHAUST CONTROL CAP FOR SEMICONDUCTOR WAFERS AND ASSOCIATED METHODS - A drying apparatus for drying a semiconductor wafer includes a processing chamber including a rinsing section and a drying section adjacent thereto. The rinsing section has a chamber loading slot associated therewith for receiving the semiconductor wafer. The drying section has a chamber unloading slot associated therewith for outputting the semiconductor wafer. An exhaust control cap is carried by the processing chamber and includes a bottom wall, a top wall, at least one intermediate wall between the bottom and top walls, and a side wall coupled to the top, bottom and the at least one intermediate wall to define stacked exhaust sections. The exhaust control cap has a cap loading slot aligned with the chamber loading slot, a cap unloading slot aligned with the chamber unloading slot, and at least one exhaust port configured to be coupled to a vacuum source. | 08-08-2013 |
20130218316 | ENDPOINT DETECTOR FOR A SEMICONDUCTOR PROCESSING STATION AND ASSOCIATED METHODS - A semiconductor processing apparatus includes a semiconductor processing station for a semiconductor wafer, and an endpoint detector associated with the semiconductor processing station. The endpoint detector includes a non-contact probe configured to probe the semiconductor wafer, an optical transmitter configured to transmit an optical signal to the non-contact probe, and an optical receiver configured to receive a reflected optical signal from the non-contact probe. The controller controls the semiconductor processing station based on the reflected optical signal. | 08-22-2013 |
20130312791 | DUAL MEDIUM FILTER FOR ION AND PARTICLE FILTERING DURING SEMICONDUCTOR PROCESSING - The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool. | 11-28-2013 |
20140078495 | INLINE METROLOGY FOR ATTAINING FULL WAFER MAP OF UNIFORMITY AND SURFACE CHARGE - An apparatus for performing metrology of a wafer. The apparatus may include a substrate with a plurality of microprobes. A plurality of light sources may direct light onto each of the microprobes. Light reflected from the microprobes may be detected by a plurality of photodetectors thereby generating a detection signal associated with each of the microprobes. A controller may send a driving signal to each of the plurality of microprobes and determine a height profile and a surface charge profile of the wafer based on each of the detection signals. | 03-20-2014 |
20140080229 | ADAPTIVE SEMICONDUCTOR PROCESSING USING FEEDBACK FROM MEASUREMENT DEVICES - A semiconductor processing device and a method of operating the same. The method may include measuring at least one property of a semiconductor wafer and determining a recipe for processing the semiconductor wafer based on the at least one property. The semiconductor wafer may be processed with a plurality of chemical mechanical polishing (CMP) modules based on the determined recipe, wherein the recipe comprises a value of at least one parameter for use by each of the plurality of CMP modules. The measurements may be made in situ or by an inline metrology device. The recipe and various parameters associated with the recipe may be determined by a controller of the semiconductor processing device. | 03-20-2014 |
20140080304 | INTEGRATED TOOL FOR SEMICONDUCTOR MANUFACTURING - An integrated tool to reduce defects in manufacturing a semiconductor device by reducing queue times during a manufacturing process. The integrated tool may include at least one a polishing tool comprising at least one polishing module and at least one deposition tool comprising at least one deposition chamber. At least one pump-down chamber may connect the polishing tool to the deposition tool. The at least one pump-down chamber includes a passage through which the semiconductor device is passed. Defects in the semiconductor device are reduced by reducing the queue time at various stages of the fabrication process. | 03-20-2014 |
20140084245 | QUANTUM DOT ARRAY DEVICES WITH METAL SOURCE AND DRAIN - Metal quantum dots are incorporated into doped source and drain regions of a MOSFET array to assist in controlling transistor performance by altering the energy gap of the semiconductor crystal. In a first example, the quantum dots are incorporated into ion-doped source and drain regions. In a second example, the quantum dots are incorporated into epitaxially doped source and drain regions. | 03-27-2014 |
20140084247 | THRESHOLD ADJUSTMENT FOR QUANTUM DOT ARRAY DEVICES WITH METAL SOURCE AND DRAIN - Incorporation of metallic quantum dots (e.g., silver bromide (AgBr) films) into the source and drain regions of a MOSFET can assist in controlling the transistor performance by tuning the threshold voltage. If the silver bromide film is rich in bromine atoms, anion quantum dots are deposited, and the AgBr energy gap is altered so as to increase V | 03-27-2014 |
20140084465 | SYSTEM AND METHOD OF NOVEL MX TO MX-2 - A plurality of metal tracks are formed in an integrated circuit die in three metal layers stacked within the die. A protective dielectric layer is formed around metal tracks of an intermediate metal layer. The protective dielectric layer acts as a hard mask to define contact vias between metal tracks in the metal layers above and below the intermediate metal layer. | 03-27-2014 |
20140084481 | SYSTEM AND METHOD OF NOVEL ENCAPSULATED MULTI METAL BRANCH FOOT STRUCTURES FOR ADVANCED BACK END OF LINE - A plurality of metal tracks are formed in a plurality of intermetal dielectric layers stacked in an integrated circuit die. Thin protective dielectric layers are formed around the metal tracks. The protective dielectric layers act as a hard mask to define contact vias between metal tracks in the intermetal dielectric layers. | 03-27-2014 |
20140097539 | TECHNIQUE FOR UNIFORM CMP - Pitch-dependent dishing and erosion following CMP treatment of copper features is quantitatively assessed by atomic force microscopy (AFM) and transmission electron microscopy (TEM). A new sequence of processing steps presented herein is used to prevent dishing and to reduce significantly the local pitch- and pattern density-induced CMP non-uniformity for copper metal lines having widths and spacing in the range of about 32-128 nm. The new process includes a partial copper deposition step followed by deposition of a silicon carbide/nitride (SiC | 04-10-2014 |
20140124865 | SEMICONDUCTOR DEVICE INCLUDING LOW-K DIELECTRIC CAP LAYER FOR GATE ELECTRODES AND RELATED METHODS - A semiconductor device may include a substrate, source and drain regions in the substrate, a recessed epitaxial channel layer in the substrate between the source and drain regions, and a high-K gate dielectric layer overlying the recessed epitaxial channel layer. The semiconductor device may further include a gate electrode overlying the high-K gate dielectric layer, a dielectric cap layer in contact with top and sidewall portions of the gate electrode, the dielectric cap layer having a lower dielectric constant than the high-K gate dielectric layer, and source and drain contacts coupled to the source and drain regions. | 05-08-2014 |
20140175610 | ELECTROSTATIC DISCHARGE DEVICES FOR INTEGRATED CIRCUITS - A junction diode array for use in protecting integrated circuits from electrostatic discharge can be fabricated to include symmetric and/or asymmetric junction diodes of various sizes. The diodes can be configured to provide low voltage and current discharge via unencapsulated contacts, or high voltage and current discharge via encapsulated contacts. Use of tilted implants in fabricating the junction diode array allows a single hard mask to be used to implant multiple ion species. Furthermore, a different implant tilt angle can be chosen for each species, along with other parameters, (e.g., implant energy, implant mask thickness, and dimensions of the mask openings) so as to craft the shape of the implanted regions. Isolation regions can be inserted between already formed diodes, using the same implant hard mask if desired. A buried oxide layer can be used to prevent diffusion of dopants into the substrate beyond a selected depth. | 06-26-2014 |
20140183735 | SYSTEM AND METHOD OF COMBINING DAMASCENES AND SUBTRACT METAL ETCH FOR ADVANCED BACK END OF LINE INTERCONNECTIONS - Metal interconnections are formed in an integrated by combining damascene processes and subtractive metal etching. A wide trench is formed in a dielectric layer. A conductive material is deposited in the wide trench. Trenches are etched in the conductive material to delineate a plurality of metal plugs each contacting a respective metal track exposed by the wide trench. | 07-03-2014 |
20140293687 | SEMICONDUCTOR DEVICE WITH PCM MEMORY CELLS AND NANOTUBES AND RELATED METHODS - A semiconductor device may include a substrate, and an array of PCM memory cells above the substrate. Each PCM memory cell may include first and second vertically aligned electrodes, a first dielectric layer between the first and second electrodes, a carbon nanotube extending vertically through the first dielectric layer from the second electrode and toward the first electrode, and a PCM body between the first electrode and the at least one carbon nanotube. | 10-02-2014 |
20140299936 | INTEGRATED CIRCUIT DEVICES AND FABRICATION TECHNIQUES - Integrated circuit devices and fabrication techniques. A semiconductor device fabrication method may include doping, in a same processing step, first and second portions of a substrate of an integrated circuit. The first portion corresponds to a doped region of a semiconductor device. The second portion corresponds to a via contact. The method may further include, after the doping, forming the gate of the semiconductor device. | 10-09-2014 |
20140299938 | METHODS AND DEVICES FOR ENHANCING MOBILITY OF CHARGE CARRIERS - Methods and devices for enhancing mobility of charge carriers. An integrated circuit may include semiconductor devices of two types. The first type of device may include a metallic gate and a channel strained in a first manner. The second type of device may include a metallic gate and a channel strained in a second manner. The gates may include, collectively, three or fewer metallic materials. The gates may share a same metallic material. A method of forming the semiconductor devices on an integrated circuit may include depositing first and second metallic layers in first and second regions of the integrated circuit corresponding to the first and second gates, respectively. | 10-09-2014 |
20140353722 | GRAPHENE CAPPED HEMT DEVICE - A graphene capped HEMT device and a method of fabricating same are disclosed. The graphene capped HEMT device includes one or more graphene caps that enhance device performance and/or reliability of an exemplary AlGaN/GaN heterostructure transistor used in high-frequency, high-energy applications, e.g., wireless telecommunications. The HEMT device disclosed makes use of the extraordinary material properties of graphene. One of the graphene caps acts as a heat sink underneath the transistor, while the other graphene cap stabilizes the source, drain, and gate regions of the transistor to prevent cracking during high-power operation. A process flow is disclosed for replacing a three-layer film stack, previously used to prevent cracking, with a one-atom thick layer of graphene, without otherwise degrading device performance. In addition, the HEMT device disclosed includes a hexagonal boron nitride adhesion layer to facilitate deposition of the compound nitride semiconductors onto the graphene. | 12-04-2014 |
Patent application number | Description | Published |
20090145772 | METHOD OF TREATING NANOPARTICLES USING AN INTERMITTENTLY PROCESSING ELECTROCHEMICAL CELL - A method of treating electrically conductive nanoparticles using a dynamic processing electrochemical cell. | 06-11-2009 |
20090145781 | METHOD OF TREATING NANOPARTICLES USING A PROTON EXCHANGE MEMBRANE AND LIQUID ELECTROLYTE CELL - One embodiment of the invention includes an electrochemical cell including a proton exchange membrane and a method of treating nanoparticles using the same. | 06-11-2009 |
20100105548 | METHOD FOR GENERATING A SHELL OF NOBLE METAL OVERLAID ON A CORE OF NON-NOBLE METAL, AND CATALYSTS MADE THEREBY - An electrocatalyst is described. The electrocatalyst includes a core of a non-noble metal or non-noble metal alloy; and a continuous shell of a noble metal or noble metal alloy on the core, the continuous shell being at least two monolayers of the noble metal or noble metal alloy. Methods for making the electrocatalyst are also described. | 04-29-2010 |
20100197490 | Platinum-Coated Non-Noble Metal-Noble Metal Core-Shell Electrocatalysts - Core-shell particles encapsulated by a thin film of a catalytically active metal are described. The particles are preferably nanoparticles comprising a non-noble core with a noble metal shell which preferably do not include Pt. The non-noble metal-noble metal core-shell nanoparticles are encapsulated by a catalytically active metal which is preferably Pt. The core-shell nanoparticles are preferably formed by prolonged elevated-temperature annealing of nanoparticle alloys in an inert environment. This causes the noble metal component to surface segregate and form an atomically thin shell. The Pt overlayer is formed by a process involving the underpotential deposition of a monolayer of a non-noble metal followed by immersion in a solution comprising a Pt salt. A thin Pt layer forms via the galvanic displacement of non-noble surface atoms by more noble Pt atoms in the salt. The overall process is a robust and cost-efficient method for forming Pt-coated non-noble metal-noble metal core-shell nanoparticles. | 08-05-2010 |
20110151356 | Electrocatalyst for Oxygen Reduction with Reduced Platinum Oxidation and Dissolution Rates - The invention relates to platinum-metal oxide composite particles and their use as electrocatalysts in oxygen-reducing cathodes and fuel cells. The invention particularly relates to methods for preventing the oxidation of the platinum electrocatalyst in the cathodes of fuel cells by use of these platinum-metal oxide composite particles. The invention additionally relates to methods for producing electrical energy by supplying such a fuel cell with an oxidant, such as oxygen, and a fuel source, such as hydrogen. | 06-23-2011 |
20110236788 | METHOD FOR MEMBRANE ELECTRODE ASSEMBLY FABRICATION AND MEMBRANE ELECTRODE ASSEMBLY - A method of coating carbon based electrodes and thick electrodes without mud-cracking is described. The electrode ink is deposited on a decal substrate, and transferred to a hot press before the electrode ink is completely dried. The partially dried electrode ink is hot pressed to the membrane to form a membrane electrode assembly. A membrane electrode assembly including a polymer membrane; and a pair of crack-free electrode layers on opposite sides of the polymer membrane, each of the pair of electrode layers having a thickness of at least about 50 μm is also described. | 09-29-2011 |
20110256467 | Cobalt(II) Tetramethoxyphenylporphyrin (CoTMPP) Ionomer Stabilization to Prevent Electrode Degradation - A membrane/electrode assembly for fuel cell applications includes an ion conducting polymer and a porphyrin-containing compound at least partially dispersed within the ion conducting polymer, a first electrode and a second electrode. At least one of the first and second electrodes also includes the porphyrin-containing compound. The membrane/electrode assembly exhibits improved performance over membrane/electrode assembly not incorporating such porphyrin-containing compounds. | 10-20-2011 |
20120122016 | Fuel Cell Durability Through Oxide Supported Precious Metals in Membrane - A fuel cell includes an anode, a cathode, and an ion conducting membrane interposed between the anode and cathode. The ion conducting membrane includes a base layer that has an ion conducting polymer and additive layer that has a metal supported on an oxide support, the oxide support scavenging hydroxyl radicals formed during fuel cell operation. | 05-17-2012 |
20120208108 | Graphite Particle-Supported Pt-Shell/Ni-Core Nanoparticle Electrocatalyst for Oxygen Reduction Reaction - A method for forming an electrocatalyst for fuel cell applications comprises electrolessly depositing a first plurality of nickel particles onto carbon-support particles. The nickel particles are formed from a nickel ion-containing aqueous solution. At least a portion of the nickel particles are replaced with platinum via a galvanic displacement reaction to form a second plurality of nickel particles coated with a platinum layer. During this displacement reaction step, the nickel particles are heated to a temperature sufficient to form the platinum layer. Finally, the second plurality of nickel particles is optionally incorporated into a cathode layer of a fuel cell. | 08-16-2012 |
20120208693 | Graphite Particle-Supported Pt and Pt Alloy Electrocatalyst with Controlled Exposure of Defined Crystal Faces for Oxygen Reduction Reaction (ORR) - A method for forming an electrocatalyst for fuel cell applications comprises electrolessly depositing a first plurality of nickel particles onto carbon-support particles. The nickel particles are formed from a nickel ion-containing aqueous solution. At least a portion of the nickel particles are replaced with platinum via a galvanic displacement reaction to form a second plurality of nickel particles coated with a platinum layer. During this displacement reaction step, the nickel particles are heated to a temperature sufficient to form the platinum layer. Finally, the second plurality of nickel particles is optionally incorporated into a cathode layer of a fuel cell. | 08-16-2012 |
Patent application number | Description | Published |
20100078407 | LIQUID DROP EJECTOR HAVING SELF-ALIGNED HOLE - A method for forming a self-aligned hole through a substrate to form a fluid feed passage is provided by initially forming an insulating layer on a first side of a substrate having two opposing sides; and forming a feature on the insulating layer. Next, etch an opening through the insulating layer, such that the opening is physically aligned with the feature on the insulating layer; and coat the feature with a layer of protective material. Patterning the layer of protective material will expose the opening through the insulating layer. Dry etching from the first side of the substrate forms a blind feed hole in the substrate corresponding to the location of the opening in the insulating layer, the blind feed hole including a bottom. Subsequently, grind a second side of the substrate and blanket etch it to form a hole through the entire substrate. | 04-01-2010 |
20120188309 | LIQUID DROP EJECTOR HAVING SELF-ALIGNED HOLE - A method for forming a self-aligned hole through a substrate to form a fluid feed passage is provided by initially forming an insulating layer on a first side of a substrate having two opposing sides; and forming a feature on the insulating layer. Next, etch an opening through the insulating layer, such that the opening is physically aligned with the feature on the insulating layer; and coat the feature with a layer of protective material. Patterning the layer of protective material will expose the opening through the insulating layer. Dry etching from the first side of the substrate forms a blind feed hole in the substrate corresponding to the location of the opening in the insulating layer, the blind feed hole including a bottom. Subsequently, grind a second side of the substrate and blanket etch it to form a hole through the entire substrate. | 07-26-2012 |
20130002753 | MICROFLUIDIC DEVICE HAVING IMPROVED EPOXY LAYER ADHESION - A microfluidic device includes a substrate; at least one inorganic layer provided on the substrate; a patterned epoxy layer formed over the at least one inorganic layer, the patterned epoxy layer including a wall that defines a location for a fluid in the microfluidic device; and an alkoxysilane material containing a primary or secondary amine for promoting adhesion between the at least one inorganic layer and the patterned epoxy layer. | 01-03-2013 |
20130004898 | MAKING A MICROFLUIDIC DEVICE WITH IMPROVED ADHESION - A method for making a microfluidic device, the method includes providing at least one inorganic layer on a substrate; applying an alkoxysilane material containing a primary or secondary amine on the at least one inorganic layer; baking the applied alkoxysilane material at a temperature greater than 130 degrees C.; applying an epoxy material to form an epoxy layer, wherein the applied alkoxysilane material is disposed at an interface between the epoxy layer and the at least one inorganic layer; and patterning the epoxy layer to provide a wall for defining a location for a fluid in the microfluidic device. | 01-03-2013 |
20130082028 | FORMING A PLANAR FILM OVER MICROFLUIDIC DEVICE OPENINGS - A method of fabricating a microfluidic device, the method includes etching a plurality of frame-shaped grooves into a first side of a substrate, each frame-shaped groove surrounding a non-etched portion of the substrate; dispensing a sacrificial photoresist on the first side of the substrate; spinning the wafer to obtain a substantially planar surface of the sacrificial photoresist; patterning the sacrificial photoresist to form openings defining walls for a plurality of chambers and fluid passageways; laminating a polymer film over the patterned sacrificial photoresist; etching a portion of the substrate from a second side of the substrate until the etched portion meets the frame-shaped grooves; removing the sacrificial resist to provide a plurality of chambers, each chamber being adjacent to at least one of the plurality of walls; and removing the non-etched portions of the substrate surrounded by the frame-shaped grooves to form a plurality of feed holes. | 04-04-2013 |
20130083126 | LIQUID EJECTION DEVICE WITH PLANARIZED NOZZLE PLATE - A liquid ejection device includes: a plurality of feed holes, each feed hole including a feed opening on the device side of the substrate; a plurality of fluid passageways controlling the flow of liquid from the feed openings to the chamber; and a polymer forming the nozzle plate and the walls of the fluid passageways and chambers, the nozzle plate including a first side that forms the top of the chambers and fluid passageways and a second side opposite the first side that forms the top of the nozzle plate, wherein the first side of the nozzle plate defines a nominally planar surface in a region proximate the plurality of feed openings, and wherein the first side of the nozzle plate does not deviate from the nominally planar surface by more than three microns in a region proximate the plurality of feed openings. | 04-04-2013 |
20140024147 | CORRUGATED MEMBRANE MEMS ACTUATOR FABRICATION METHOD - A MEMS device fabrication method includes providing a substrate and a chamber wall material layer on a first surface of the substrate, the chamber wall material layer including a chamber cavity having a sacrificial material located therein. A mask material is deposited on the chamber wall material layer and the sacrificial material and patterned to form a mask pattern including a plurality of discrete portions. The mask material and some of the sacrificial material are removed to transfer the mask pattern including the plurality of discrete portions to the sacrificial material. A membrane material layer is deposited on the chamber wall material layer and the sacrificial material that includes the transferred mask pattern including the plurality of discrete portions. Some of the substrate and the sacrificial material are removed to release the membrane material layer using at least one process initiated from a second surface of the substrate. | 01-23-2014 |
Patent application number | Description | Published |
20100282721 | SYSTEM AND METHOD FOR IMPROVED FILM COOLING - A system for producing at least one trench to improve film cooling in a sample is provided. The system includes at least one laser source outputting at least one pulsed laser beam. The pulsed laser beam includes a pulse duration including a range less than about 50 μs, an energy per pulse having a range less than about 0.1 Joule, and a repetition rate with a range greater than about 1000 Hz. The system also includes a control subsystem coupled to the laser source, the control subsystem configured to synchronize a position of the sample with the pulse duration and energy level in order to selectively remove at least one of a thermal barrier coating, a bondcoat and a substrate metal in the sample to form the at least one trench. | 11-11-2010 |
20110185572 | PROCESS AND SYSTEM FOR FORMING SHAPED AIR HOLES - A process and system are provided for forming shaped air holes, such as for use in turbine blades. Aspects of the disclosure relate to forming shaped portions of air holes using a short pulse laser, forming a metered hole corresponding to each shaped portion, and separately finishing the shaped portion using a short-pulse laser. In other embodiments, the order of these operations may be varied, such as to form the shaped portions and to finish the shaped portions using the short-pulse laser prior to forming the corresponding metered holes. | 08-04-2011 |
20120074109 | METHOD AND SYSTEM FOR SCRIBING A MULTILAYER PANEL - The present invention provides method of scribing a multilayer panel. The method comprises (a) providing a multilayer panel comprising a substrate layer, a transparent conductive layer disposed thereupon, a first semiconducting layer disposed upon the transparent conductive layer; (b) configuring the multilayer panel relative to a laser machining device, the machining device comprising a laser head and an optical sensor; (c) inducing a motion of the laser head relative to the multilayer panel such that a laser beam contacts the panel along a transverse line across the panel, the laser beam incident upon the panel having sufficient energy to ablate one or more layers of the multilayer panel within a zone irradiated by the laser beam irradiated to provide a scribed panel; (d) simultaneously irradiating the scribed panel with a first light source; and (e) detecting the light emerging from the scribed panel at the optical sensor in real time. Also provided is a system for scribing a multilayer panel. | 03-29-2012 |
20120080414 | METHOD AND SYSTEM FOR LASER PATTERNING A SEMICONDUCTOR SUBSTRATE - A method for laser patterning a sample is presented. The method includes coating at least one side of a substrate to form a sample, where coating the at least one side of the substrate forms an interface between the coating and the at least one side of the substrate. Further, the method includes configuring a scanning pattern for patterning the sample. In addition, the method includes determining settings for one or more laser beams of a laser based on the configured scanning pattern. Moreover, the method includes focusing the one or more laser beams of the laser at or near a surface of the substrate by selecting a focal point of the one or more laser beams near the surface of the substrate and setting a scribe depth near the surface of the substrate. The method also includes patterning the sample based on the configured scanning pattern using the one or more laser beams to generate one or more pixelated devices from the sample. | 04-05-2012 |
20130026380 | RADIATION DETECTOR WITH ANGLED SURFACES AND METHOD OF FABRICATION - Radiations detectors with angled walls and methods of fabrication are provided. One radiation detector module includes a plurality of sensor tiles configured to detect radiation. The plurality of sensor tiles have (i) top and bottom edges defining top and bottom surfaces of the plurality of sensor tiles, (ii) sidewall edges defining sides of the plurality of sensor tiles, and (iii) corners defined by the top and bottom edges and the sidewall edges. The radiation detector module also has at least one beveled surface having an oblique angle, wherein the beveled surface includes beveling of at least one of top or bottom edges, the side wall edges, or the corners. | 01-31-2013 |
20130168050 | HEAT EXCHANGE ASSEMBLY AND METHODS OF ASSEMBLING SAME - A heat exchange assembly for use in cooling an electrical component is described herein. The heat assembly includes a casing that includes an evaporator section, a condenser section, and a transport section extending between the evaporator section and the condenser section along a longitudinal axis. The casing is configured to bend along a bending axis oriented with respect to the transport section. The casing also includes at least one sidewall that includes at least one fluid chamber extending between the evaporator section and the condenser section to channel a working fluid between the evaporator section and the condenser section. A plurality of fluid channels are defined within the inner surface to channel liquid fluid from the condenser section to the evaporator section. At least one vapor channel is defined within the inner surface to channel gaseous fluid from the evaporator section to the condenser section. | 07-04-2013 |
Patent application number | Description | Published |
20080203306 | METHOD AND SYSTEM FOR PLASMA-INDUCED TERAHERTZ SPECTROSCOPY - A method of analyzing a remotely-located object includes the step of illuminating at least a portion of a targeted object with electromagnetic radiation to induce a phase transformation in the targeted object, wherein the phase transformation produces an emitter plasma, which emits terahertz radiation. The method also includes the step of ionizing a volume of an ambient gas to produce a sensor plasma by focusing an optical probe beam in the volume and the step of detecting an optical component of resultant radiation produced from an interaction of the focused optical probe beam and the terahertz radiation in the sensor plasma. Detecting an optical component of the resultant radiation emitted by the sensor plasma facilitates detection of a characteristic fingerprint of the targeted object imposed onto the terahertz radiation produced as a result of the induced phase transformation. | 08-28-2008 |
20090066948 | Compact Terahertz Spectrometer Using Optical Beam Recycling and Heterodyne Detection - Compact terahertz spectrometer. The spectrometer includes an optical beam both for generating terahertz radiation for interaction with the sample and for use in a detector. A DC heterodyne detector uses a DC field-induced second harmonic wave at a sensor plasma to serve as a local oscillator. The spectrometer has a bandwidth orders of magnitude larger than conventional THz spectrometers. | 03-12-2009 |
20100277718 | METHOD AND SYSTEM FOR PLASMA-INDUCED TERAHERTZ SPECTROSCOPY - A method of analyzing a remotely-located object includes the step of illuminating at least a portion of a targeted object with electromagnetic radiation to induce a phase transformation in the targeted object, wherein the phase transformation produces an emitter plasma, which emits terahertz radiation. The method also includes the step of ionizing a volume of an ambient gas to produce a sensor plasma by focusing an optical probe beam in the volume and the step of detecting an optical component of resultant radiation produced from an interaction of the focused optical probe beam and the terahertz radiation in the sensor plasma. Detecting an optical component of the resultant radiation emitted by the sensor plasma facilitates detection of a characteristic fingerprint of the targeted object imposed onto the terahertz radiation produced as a result of the induced phase transformation. | 11-04-2010 |
20110036984 | TUNABLE BROADBAND ANTI-RELFECTION APPARATUS - A broadband anti-reflection apparatus for use with terahertz radiation includes a layer having an outer surface comprising a plurality of pyramid structures having about a 30 μm to about a 110 μm period, and wherein reflectance of the terahertz radiation is reduced compared to a layer comprising a planar outer surface. Also disclosed is a method for modifying terahertz radiation which includes receiving terahertz radiation on a device having an anti-reflection layer having an outer surface comprising a plurality of pyramid structures having about a 30 μm to a 110 μm period, and modifying the terahertz radiation passing through the device or processing the terahertz radiation in the device. | 02-17-2011 |
20110272584 | METHODS AND SYSTEMS FOR DETECTING TERAHERTZ RADIATION BY RADIATION ENHANCED EMISSION OF FLUORESCENCE - Methods and systems for detecting radiation, particularly, terahertz (THz) radiation, are disclosed. The methods and systems disclosed include directing an optical beam in a volume of gas; ionizing at least a portion of the volume of gas with the optical beam to produce a plasma; and detecting a fluorescence produced from an interaction of a radiation wave with the plasma. The information contained in the characteristics of the detected fluorescence, for example, the amplitude and/or phase are used to characterize the radiation wave. Aspects of the invention may be used for homeland security, medicine, and astronomy, among other fields. | 11-10-2011 |
20120193535 | PLASMA DIAGNOSTIC METHOD USING TERAHERTZ-WAVE-ENHANCED FLUORESCENCE - Methods and systems for characterizing a plasma with radiation, particularly, terahertz (THz) radiation, are disclosed. The disclosed method of characterizing a plasma includes directing THz radiation into the plasma; and detecting an emission due to interaction of the THz radiation with the plasma to characterize the plasma. A disclosed plasma characterizing device includes a means for directing THz radiation into a plasma; and a detector adapted to detect an emission emitted by the plasma due to interaction of the THz radiation with the plasma to characterize the plasma. A plasma characterizing system is also disclosed. The emission detected may be a fluorescence, a variation in fluorescence and/or an acoustic emission. | 08-02-2012 |
20130153790 | ACOUSTIC METHODS AND SYSTEMS FOR DETECTING TERAHERTZ RADIATION - Methods and systems for detecting radiation for example, terahertz radiation, with the aid of acoustic signal generation and detection include: directing an optical beam into a volume of gas; ionizing at least a portion of the volume of gas with the optical beam to produce a plasma; and detecting an acoustic signal produced from an interaction of a radiation wave with the plasma. The methods and systems are particularly adapted for remote detection of chemicals, biological substances, and explosives, among others. The capability of the methods and systems can be enhanced by employing multi-color laser excitation to produce the plasma and varying the time delay between the multi-color pulses. | 06-20-2013 |
Patent application number | Description | Published |
20090040261 | System and method for calibrating a printing system to compensate for sensor artifact using non-complementary illuminations of test patterns on an image substrate - A system removes a light sensor artifact from a light sensor in a printer that is used to obtain reflectance measurements from test patterns printed on an image substrate. The system includes a print head for ejecting a plurality of pixels having a first single color in a test pattern onto an image substrate, a light source for illuminating the test pattern on the image substrate with a light, a light sensor for measuring reflectance of the first portion of the test pattern with reference to a light having a color that is non-complementary to the first single color of the test pattern, measuring reflectance of the first portion of the test pattern with reference to a light that is complementary to the first single color of the test pattern, and measuring reflectance of the second portion of the test pattern with reference to the complementary light, the second portion including an area that overlaps the first portion of the test pattern, and a sensor controller configured to scale the reflectance of the first portion measured with reference to the non-complementary light to minimize a difference between the reflectance of the first portion measured with reference to the complementary light and the reflectance of the second portion measured with reference to the complementary light in the overlapped area. | 02-12-2009 |
20090284762 | REDUCING PRINTHEAD PROCESS COLOR NON-UNIFORMITIES IN A DIRECT MARKING DEVICE - What is disclosed is a novel system and method for reducing process color banding due to printhead non-uniformities in a direct marking device. In one example, a first measurement of a printhead spatial non-uniformity is obtained along a first line in a color space which produces a spatial uniformity when a target primary color is printed alone. A first spatial tone reproduction curve is generated. A second measurement of the printhead spatial non-uniformity is obtained along a second line in color space in a coverage area of a process color which maximally changes a halftone structure of the target primary color. A second spatial TRC is generated. The first and second spatial TRCs are combined using a weighted average which balances the primary and process colors. A modified spatial TRC is generated. The printhead is adjusted at a location of the target primary color according to the modified spatial TRC. | 11-19-2009 |
20100232652 | System And Method For Adjusting Operation Of Printheads In An Ink Printing Device - A method evaluates image quality in an ink printing system and generates data values for altering the operation of the ink printing system. The method includes generating an ink image on an ink image receiving member that corresponds to a digital image stored in the ink printing system, generating a scanned image signal corresponding to the ink image, generating firing signal waveform adjustments and image data adjustments with reference to the scanned image signal corresponding to the ink image, and operating a printhead in an ink imaging system with reference to the firing signal waveform adjustments and the image data adjustments. | 09-16-2010 |
20110102852 | SUSAN-BASED CORNER SHARPENING - This closure provides image processing methods and apparatus for corner enhancing a digital image for rendering on an image output device. According to an exemplary method, the method determines whether or not image pixels are associated with a corner as a function of the USAN values generated for the image pixels. Subsequently, one or more pixels associated with a corner are modified to render a corner enhanced image. | 05-05-2011 |
20110116123 | System And Method For Attenuating Rotating Member Contamination Affecting Uniformity Measurements In An Inkjet Imaging Device - A method enables an inkjet printing system to attenuate image noise in an image of a test strip obtained as print media bearing the test strip travels over a roller in the printing system. The method includes illuminating blank media as the media travels over a rotating member, generating electrical signals corresponding to light reflected by the blank media as the blank media travels over the rotating member, converting the electrical signals to image data of the blank media, printing a test strip on media, illuminating the media as the media on which the test strip is printed travels over the rotating member, generating electrical signals corresponding to light reflected by the media as the media on which the test strip is printed travels over the rotating member, converting the electrical signals to image data of the media on which the test strip is printed, modifying the image data of the media on which the test strip is printed with the image data of the blank media, and storing the modified image data in memory. | 05-19-2011 |
20110242186 | Test Pattern Effective For Coarse Registration Of Inkjet Printheads And Method Of Analysis Of Image Data Corresponding To The Test Pattern In An Inkjet Printer - A test pattern printed by printheads in an inkjet printer enables image analysis of the test pattern that identifies positions of the printheads and the inkjets operating in the printheads. The test pattern includes a plurality of arrangements of dashes, each arrangement of dashes having a predetermined number of rows and a predetermined number of columns, each dash in a row of dashes in the arrangement of dashes being separated by a first predetermined distance and each dash in a column of dashes in the arrangement of dashes being separated by a second predetermined distance, each dash in a column of an arrangement of dashes being ejected by a single inkjet ejector in a printhead of the inkjet printer, and a plurality of unprinted areas interspersed between the plurality of arrangements of dashes. | 10-06-2011 |
20110279503 | Method And System For Measuring And Compensating For Process Direction Artifacts In An Optical Imaging System In An Inkjet Printer - A printer operating method enables a controller to identify process direction errors in an optical imaging system. The method includes identifying a printhead roll error for each printhead in a plurality of printheads in a printer, moving each printhead by an amount that corrects the printhead roll error for the corresponding printhead, generating a plurality of dashes on media with the plurality of printheads as the media moves past the plurality of printheads, identifying a position for each dash in the process direction from image data of the plurality of dashes on the media, identifying a displacement in the process direction for each optical detector in a linear array of optical detectors used to generated the image data of the plurality of dashes, the displacement being identified with reference to the identified positions for the dashes, and operating the printer to compensate for the identified displacements of the optical detectors. | 11-17-2011 |
20130038657 | In Situ Calibration Of Multiple Printheads To Reference Ink Targets - A method for calibrating in situ a plurality of printheads in an imaging device has been developed. Firing signals operate a plurality of printheads to form ink test patterns on an image receiving member. Reflectance measurements of light reflected from the test patterns and optical density measurements for a portion of the patterns formed by only one printhead in the plurality of printheads are used to adjust the firing signals and enable the printheads to print within a predetermined range about an average reflectance value and a predetermined optical density. | 02-14-2013 |
20130070957 | SYSTEMS AND METHODS FOR DETECTING CELL PHONE USAGE BY A VEHICLE OPERATOR - An embodiment generally relates to systems and methods for determining cell phone usage automatically by individuals operating vehicles. A processing module can process multi-spectral images or videos of individuals and detect different regions in the image such as face regions, hand regions, and cell phone regions. Further, the processing module can analyze the regions based on locations and numbers of skin pixels and cell phone pixels to determine if the individual is holding his or her cell phone near his or her face. Based on the analysis, it can be determined whether the individual is operating the cell phone. Further, the analysis can yield a confidence level associated with the cell phone usage. | 03-21-2013 |
20130113855 | Method and System for Adjusting Printhead Voltage Parameters in an Inkjet Printer - A method of operating a printer enables the mass of the ink drops ejected by the printheads in the printer to maintained in an optimal range without measuring the drop mass being ejected by the inkjets in the printheads. After calibration of the printheads, the printheads are operated with electrical signals having different peak-to-peak voltages. The number of inoperable inkjets for each printhead is determined from image data of the ejected ink on the image receiving member and the number of inoperable inkjets for each printhead is compared to a predetermined threshold. The peak-to-peak voltage for the electrical signals used to operate a printhead is adjusted with reference to the number of inoperable inkjets and the predetermined threshold. | 05-09-2013 |
20130187972 | In Situ Calibration Of Multiple Printheads To Reference Ink Targets - A method for calibrating in situ a plurality of printheads in an imaging device has been developed. Firing signals operate a plurality of printheads to form ink test patterns on an image receiving member. Reflectance measurements of light reflected from the test patterns and optical density measurements for a portion of the patterns formed by only one printhead in the plurality of printheads are used to adjust the firing signals and enable the printheads to print within a predetermined range about an average reflectance value and a predetermined optical density. | 07-25-2013 |
20130201233 | System And Method For Compensating For Drift In Multiple Printheads In An Inkjet Printer - A method for calibrating in situ a plurality of printheads in an imaging device has been developed. Firing signals operate a plurality of printheads to form ink test patterns on an image receiving member. Reflectance measurements of light reflected from the test patterns and optical density measurements for a portion of the patterns formed by only one printhead in the plurality of printheads are used to adjust the firing signals and enable the printheads to print within a predetermined range about an average reflectance value and a predetermined optical density. | 08-08-2013 |
20130265419 | SYSTEM AND METHOD FOR AVAILABLE PARKING SPACE ESTIMATION FOR MULTISPACE ON-STREET PARKING - A method for determining parking availability includes receiving video data from a sequence of frames taken from an image capture device that is monitoring a parking area. The method includes determining background and foreground images in an initial frame of the sequence of frames. The method further includes updating the background and foreground images in each of the sequence of frames following the initial frame. The method also includes determining a length of a parking space using the determined background and foreground images. The determining includes computing a pixel distance between a foreground image and one of an adjacent foreground image and an end of the parking area. The determining further includes mapping the pixel distance to an actual distance for estimating the length of the parking space. | 10-10-2013 |
20140198146 | System And Method For Process Direction Registration Of Inkjets In A Printer Operating With A High Speed Image Receiving Surface - A method for process direction registration in an inkjet printer includes ejecting ink drops from a first inkjet at less than a maximum operating rate onto an image receiving surface moving in a process direction. The method includes generating image data samples of the image receiving surface including the ink drops. The method further includes identifying a center of the ink drops in the process direction with reference to the image data samples and storing a time offset value in a memory to correct an identified process direction offset between the identified center of the ink drops and another identified center of ink drops that are ejected by another inkjet. | 07-17-2014 |
Patent application number | Description | Published |
20090318677 | Modulators of body weight, corresponding nucleic acids and proteins, and diagnostic and therapeutic uses thereof - The present invention relates generally to the control of body weight of animals including mammals and humans, and more particularly to materials identified herein as modulators of weight, and to the diagnostic and therapeutic uses to which such modulators may be put. In its broadest aspect, the present invention relates to the elucidation and discovery of nucleotide sequences, and proteins putatively expressed by such nucleotides or degenerate variations thereof, that demonstrate the ability to participate in the control of mammalian body weight. The nucleotide sequences in object represent the genes corresponding to the murine and human ob gene, that have been postulated to play a critical role in the regulation of body weight and adiposity. Preliminary data, presented herein, suggests that the polypeptide product of the gene in question functions as a hormone. The present invention further provides nucleic acid molecules for use as molecular probes, or as primers for polymerase chain reaction (PCR) amplification, i.e., synthetic or natural oligonucleotides. In further aspects, the present invention provides a cloning vector, which comprises the nucleic acids of the invention; and a bacterial, insect, or a mammalian expression vector, which comprises the nucleic acid molecules of the invention, operatively associated with an expression control sequence. Accordingly, the invention further relates to a bacterial cell or a mammalian transfected or transformed with an appropriate expression vector, and correspondingly, to the use of the above mentioned constructs in the preparation of the modulators of the invention. Also provided are antibodies to the ob polypeptide. Moreover, a method for modulating body weight of a mammal is provided. In specific examples, genes encoding two isoforms of both the murine and human ob polypeptides are provided. | 12-24-2009 |
20110218332 | Modulators of body weight, corresponding nucleic acids and proteins, and diagnostic and therapeutic uses thereof - The present invention relates generally to the control of body weight of animals including mammals and humans, and more particularly to materials identified herein as modulators of weight, and to the diagnostic and therapeutic uses to which such modulators may be put. In its broadest aspect, the present invention relates to the elucidation and discovery of nucleotide sequences, and proteins putatively expressed by such nucleotides or degenerate variations thereof, that demonstrate the ability to participate in the control of mammalian body weight. The nucleotide sequences in object represent the genes corresponding to the murine and human ob gene, that have been postulated to play a critical role in the regulation of body weight and adiposity. Preliminary data, presented herein, suggests that the polypeptide product of the gene in question function as a hormone. The present invention further provides nucleic acid molecules for use as molecular probes, or as primers for polymerase chain reaction (PCR) amplification, i.e., synthetic or natural oligonucleotides. In further aspects, the present invention provides a cloning vector, which comprises the nucleic acids of the invention; and a bacterial, insect, or a mammalian expression vector, which comprises the nucleic acid molecules of the invention, operatively associated with an expression control sequence. Accordingly, the invention further relates to a bacterial or a mammalian cell transfected or transformed with an appropriate expression vector, and correspondingly, to the use of the above mentioned constructs in the preparation of the modulators of the invention. Also provided are antibodies to the ob polypeptide. Moreover, a method for modulating body weight of a mammal is provided. In specific examples, genes encoding two isoforms of both the murine and human ob polypeptides are provided. | 09-08-2011 |