Yusuke Iida
Yusuke Iida, Ayabe-Shi JP
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20100232650 | MEASUREMENT APPARATUS - In a measurement apparatus, higher-quality measurement is realized in measurement of measurement object displacement or imaging of a two-dimensional image. In a controller, a light receiving signal of a photodiode is supplied to a displacement measuring unit of a sensor head in order to measure a height of a measurement object, and the height of a surface of the measurement object is measured based on the light receiving signal. Then, in the controller, image obtaining timing is determined based on the height of the measurement object. Specifically, a focus adjustment value corresponding to the computed height of the measurement object is obtained from the table, and an image obtaining signal is transmitted to an imaging device at the timing the focus adjustment value is realized. Therefore, a length between two points on the measurement object is computed from the thus obtained image based on the height of the measurement object. | 09-16-2010 |
20130201490 | DISPLACEMENT SENSOR - A signal processing unit (C | 08-08-2013 |
Yusuke Iida, Yokkaichi-Shi JP
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20120242985 | PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD - In accordance with an embodiment, a pattern inspection apparatus includes a stage supporting a substrate with a pattern, a light source irradiating the substrate with light, a detection unit, an optical system, a focus position change unit, a control unit, and a determination unit. The detection unit detects reflected light from the substrate. The optical system leads the light from the light source to the substrate and leads the reflected light to the detection unit. The focus position change unit changes a focus position of the light to the substrate in a direction vertical to the surface of the substrate. The control unit associates the movement of the stage with the light irradiation and controls the stage drive unit and the focus position change unit, thereby changing the focus position. The determination unit determines presence/absence of a defect of the pattern based on the signal from the determination unit. | 09-27-2012 |
20120242995 | PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD - In accordance with an embodiment, a pattern inspection apparatus includes a beam splitter, a polarization controller, a phase controller, a wave front distribution controller, and a detector. The beam splitter generates signal light and reference light from light emitted from a light source. The signal light is reflected light from a pattern on a subject to be inspected. The polarization controller is configured to control the polarization angle and polarization phase of the reference light. The phase controller is configured to control the phase of the reference light. The wave front distribution controller is configured to control a wave front distribution of the reference light. The detector is configured to detect light resulting from interference caused by superposing the signal light and the reference light on each other. | 09-27-2012 |
20120243770 | PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD - In accordance with an embodiment, a pattern inspection method includes: applying a light generated from a light source to the same region of a substrate in which an inspection target pattern is formed; guiding, imaging and then detecting a reflected light from the substrate, and acquiring a detection signal for each of a plurality of different wavelengths; and adding the detection signals of the different wavelengths in association with an incident position of an imaging surface to generate added image data including information on a wavelength and signal intensity, judging, by the added image data, whether the inspection target pattern has any defect, and when judging that the inspection target pattern has a defect, detecting the position of the defect in a direction perpendicular to the substrate. | 09-27-2012 |
20130063721 | PATTERN INSPECTION APPARATUS AND METHOD - In one embodiment, a pattern inspection apparatus includes a light source configured to generate light, and a condenser configured to shape the light into a line beam to illuminate a wafer with the line beam. The apparatus further includes a spectrometer configured to disperse the line beam reflected from the wafer. The apparatus further includes a two-dimensional detector configured to detect the line beam dispersed by the spectrometer, and output a signal including spectrum information of the line beam. The apparatus further includes a comparison unit configured to compare the spectrum information obtained from corresponding places of a repetitive pattern on the wafer with each other, and a determination unit configured to determine whether the wafer includes a defect, based on a comparison result of the spectrum information. | 03-14-2013 |
20140212023 | PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS - In accordance with an embodiment, a pattern inspection method includes applying a light to a substrate including an inspection target pattern in a plurality of optical conditions, detecting a reflected light from the substrate to acquire a pattern image for each of the optical conditions, outputting a gray value difference between the pattern image and a reference image for each of the optical conditions, and specifying a position of the defect in a stacking direction of the stacked film from a relation of the obtained gray value difference between the optical conditions. The pattern is formed by a stacked film, the optical conditions includes at least a first optical condition for detection of a defect on a surface of the stacked film. | 07-31-2014 |
Yusuke Iida, Ayabe-City JP
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20120303317 | DISPLACEMENT SENSOR - Teaching processing using a model of a workpiece is performed by accepting at least one input of a target value for a response time and a tolerance value for a detection error as a parameter representing a condition for a displacement sensor to operate. A CPU during teaching processing determines a maximum exposure time while it causes repeated detection processing by a light projecting unit and a light receiving unit, calculates variation in measurement data of an amount of displacement, and derives the number of pieces of data of moving average calculation suitable for a value for the input parameter as a result of operation processing using the maximum exposure time and variation in measurement data. This number of pieces of data is registered in a memory and used for moving average calculation in a normal operation mode. | 11-29-2012 |
Yusuke Iida, Kyoto JP
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20140111814 | PHOTOELECTRIC SENSOR - The disclosure provides a photoelectric sensor that provides useful information to set measurement conditions. The photoelectric sensor includes a light emitting unit having a light emitting element configured to emit detection light toward a detection area, a light receiving unit having a light receiving element configured to receive the detection light from the detection area and to obtain a detection value corresponding to the amount of light received, and a display unit configured to display information about the detection value in the light receiving unit. When the detection value varies across a predetermined threshold, the display unit displays a transit time that is the time from when the detection value crosses the predetermined threshold until when it crosses the predetermined threshold again, and a variation amount of the detection value in the variation. | 04-24-2014 |
20140131555 | SENSOR SYSTEM - In a sensor system including a plurality of photoelectric sensor units, a light projecting period arbitrarily determined in each type is provided and mutual interference is prevented between identical types. The sensor system includes the plurality of sensor units coupled by a connector unit while a signal can be transmitted. Each of the sensor units retains type information thereof, and sets a unique identification number by transmitting the signal to each other. Each sensor unit operates after a delay time determined according to the identification number thereof elapses with a synchronous signal as a starting point. The synchronous signal is transmitted with a predetermined period from the sensor unit having a specific identification number in the plurality of sensor units. The delay time of each sensor unit is determined such that an operating period is matched with a predetermined period determined in each piece of the type information. | 05-15-2014 |
Yusuke Iida, Osaka JP
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20130335227 | MOBILE TERMINAL WITH LOCATION INFORMATION ACQUIRING PORTION - A mobile terminal includes a detecting portion that detects a state of a user, a location information acquiring portion that acquires location information of a current location of the user, and a controlling portion configured to determine whether the user is in a drowsing state or a wakeful state, based on the state of the user detected by the detecting portion. If the controlling portion determines that the user is in a drowsing state, the controlling portion drives the location information acquiring portion so as to acquire the location information for the current location, and if the controlling portion determines that the user is in a wakeful state, the controlling portion stops the location information acquiring portion. | 12-19-2013 |
Yusuke Iida, Yokkaichi JP
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20150268177 | DEFECT DETECTION METHOD - According to an embodiment, a defect detection method includes inspecting an inspection target, classifying the inspection target by a characteristic quantity of a signal in the inspection of the inspection target, producing an in-plane map of the inspection target based on the characteristic quantities of the signals in the inspection of the inspection target, calculating a characteristic quantity of an in-plane map of the inspection target, and classifying defects of the inspection target in accordance with an agreement rate between the in-plane map characteristic quantity of the inspection target and an in-plane map characteristic quantity of a reference target. | 09-24-2015 |