Patent application number | Description | Published |
20090252975 | PROTECTIVE FILM AND ENCAPSULATION MATERIAL COMPRISING THE SAME - Disclosed herein is a protective film. The protective film is produced by alternate coating of a polysilazane-based polymer and a flexible polysiloxane-based polymer. The polysilazane-based polymer is cured at low temperature to form silica, thereby achieving high hardness and high light transmittance. The protective film has improved interfacial adhesion between the respective coating films, which prevents permeation of moisture and oxygen. In addition, the protective film can be easily produced by low-temperature wet processes. Also disclosed herein is an encapsulation material comprising the protective film. | 10-08-2009 |
20090258237 | GRADED COMPOSITION ENCAPSULATION THIN FILM COMPRISING ANCHORING LAYER AND METHOD OF FABRICATING THE SAME - Disclosed herein is a graded composition encapsulation thin film and a fabrication method thereof. The encapsulation thin film comprises a substrate, a graded composition layer and an anchoring layer interposed therebetween. The anchoring layer serves to improve the adhesion between the graded composition layer and the substrate and creates advantageous conditions for the formation of the graded composition layer. Due to the presence of the anchoring layer, the encapsulation thin film has excellent barrier properties against the permeation of moisture and oxygen and is highly resistant to diffusion of other chemical species. | 10-15-2009 |
20090305062 | METHOD FOR FABRICATING MULTILAYERED ENCAPSULATION THIN FILM HAVING OPTICAL FUNCTIONALITY AND MUTILAYERED ENCAPSULATION THIN FILM FABRICATED BY THE SAME - A method for fabrication of a multilayered encapsulation thin film having optical functionality and a multilayered encapsulation thin film fabricated thereof includes a reactive or a non-reactive PVD process using a physical vapor deposition device containing multiple targets in a vacuum chamber is conducted or the above processes are alternately conducted such that the multilayered encapsulation thin film consisting of multiple layers with different densities and refractive indexes may be easily fabricated. In addition, the multilayered encapsulation thin film fabricated by the same has superior ability for inhibiting moisture and/or oxygen penetration sufficient to be used as an encapsulation material, controls a refractive index distribution for multiple layers in fabrication of a multilayered thin film so as to function as an anti-reflection film, and improves light output of a device. | 12-10-2009 |
20100021691 | THIN LAYER HAVING COMPOSITION GRADIENT AND PRODUCTION METHOD THEREOF - Disclosed herein are a thin layer having a composition gradient and a method for the production of the thin layer. According to the method, the thin layer is produced by subjecting a mixture of one or more organic materials and one or more inorganic materials to a sol-gel process. The composition gradient and the surface energy of the thin layer are controlled during production, leaving no interfacial failure defects. | 01-28-2010 |
20100112270 | MULTILAYER FILM, METHOD FOR MANUFACTURE THEREOF AND ARTICLES INCLUDING THE SAME - A multilayer film is provided. The multilayer film includes a barrier layer and an adhesive layer underlying the barrier layer. The adhesive layer contains a block copolymer that can phase separate into two or more different domains. The multilayer film has good gas and moisture barrier properties and is highly flexible. Therefore, the multilayer film can be effectively used in manufacturing encapsulation structures for electronic devices. In addition, the multilayer film is suitable for use as a substrate for a device. Further provided are a method for producing the multilayer film and an encapsulation structure including the multilayer film. | 05-06-2010 |
20100117110 | Photosensitive Quantum Dot, Composition Comprising the Same and Method of Forming Quantum Dot-Containing Pattern Using the Composition - A photosensitive quantum dot including a quantum dot, and a plurality of photosensitive moieties that are bound to a surface of the quantum dot, wherein each of the photosensitive moieties includes silicon (Si) and a photosensitive functional group. Also disclosed are a composition for forming a quantum dot-containing pattern, where the composition includes the photosensitive quantum dot, and a method of forming a quantum dot-containing pattern using the composition. | 05-13-2010 |
20100117522 | ORGANIC MATERIAL, FILM COMPRISING THE SAME AND ELECTRIC DEVICE COMPRISING THE FILM - An organic material including a hydrophilic polymer and an organic moiety having a hydroxyl substituted C | 05-13-2010 |
20100119976 | COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed. | 05-13-2010 |
20100279066 | NANOSTRUCTURED THIN FILM AND METHOD FOR CONTROLLING SURFACE PROPERTIES THEREOF - Disclosed herein is a nanostructured thin film. The nanostructured thin film comprises a nanoparticle layer and a number of micro-undulated surfaces formed on the nanoparticle layer. The two micro-undulated structures of the nanostructured thin film are uniformly introduced over a large area. This configuration makes it easy to control the surface properties of the nanostructured thin film. Therefore, the nanostructured thin film can be widely applied to a variety of devices. Also disclosed herein is a method for controlling the surface properties of the nanostructured thin film. | 11-04-2010 |
20110163310 | Thin-film transistor having etch stop multi-layer and method of manufacturing the same - A thin-film transistor (TFT) may include a channel layer, an etch stop multi-layer, a source, a drain, a gate, and a gate insulation layer. The etch stop multi-layer may include a first etch stop layer and a second etch stop layer. The second etch stop layer may prevent or reduce an etchant from contacting the channel layer. | 07-07-2011 |
20120104330 | METAL INK COMPOSITION, METHOD OF FORMING A CONDUCTIVE METAL FILM USING THE SAME, AND CONDUCTIVE METAL FILM USING THE SAME - Provided herein is a metal ink composition, including an organism-derived adhesive material. Such a metal ink composition is eco-friendly and is adhered to an adherent with excellent adhesion even when added in a small content. Further, the metal ink composition is not condensed by thermal sintering, and thus exhibits excellent patternability. | 05-03-2012 |
20120177895 | METHOD OF PATTERNING METAL AND ASSEMBLY FOR FORMING A PATTERNED METAL FILM - A method of patterning a metal to form a patterned metal film. The method includes patterning a surface-treating composition including a polymer and a reductant on a surface of a substrate; and applying a metal source onto the substrate to form a patterned metal film. | 07-12-2012 |
20130004716 | PASTE, METHOD OF PREPARING SAME, AND ELECTRONIC DEVICE - A paste may include a functional water-soluble material, a surfactant surrounding the functional water-soluble material to form a reverse micelle structure, a binder, and a liposoluble organic solvent, and an electronic device including at least one of a pattern and an electrode may be formed using the paste. | 01-03-2013 |
20130104973 | CONDUCTIVE PASTE, AND ELECTRONIC DEVICE AND SOLAR CELL INCLUDING ELECTRODE FORMED USING THE CONDUCTIVE PASTE | 05-02-2013 |