Patent application number | Description | Published |
20080199794 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member having excellent electrophotographic properties while being prevented from the generation of blade turn-up, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member contains a polymer having a specific repeating structural unit. | 08-21-2008 |
20090180800 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS - An electrophotographic photosensitive member having excellent electrophotographic properties while being prevented from the generation of blade turn-up, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member contains a polymer having a specific repeating structural unit. | 07-16-2009 |
20100159122 | DEPOSITION FILM FORMING APPARATUS, DEPOSITION FILM FORMING METHOD AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER MANUFACTURING METHOD - The present invention provides a deposition film forming apparatus including a reaction container, an exhaust device and an exhaust gas flow path for causing a material gas to flow from the reaction container to the exhaust device, wherein the exhaust gas flow path includes a portion whose cross section expands with a step with respect to a direction in which the material gas flows and the deposition film forming apparatus further includes a cleaning gas flow device for causing the cleaning gas to directly flow into a region closer to the exhaust device side than the step of the exhaust gas flow path, a deposition film forming method using the deposition film forming apparatus and a method of manufacturing an electrophotographic photosensitive member using the deposition film forming method. | 06-24-2010 |
20110287350 | ELECTROPHOTOGRAPHIC APPARATUS AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER - An electrophotographic apparatus and an electrophotographic photosensitive member for use in the electrophotographic apparatus are provided. The number of intermediate layers between a photoconductive layer and a surface layer is an odd number more than 2, and the refractive index monotonically decreases from the photoconductive layer toward the surface layer. The refractive index of an odd-numbered intermediate layer is in a predetermined range of the geometrical mean of the refractive indices of the two layers adjacent to the odd-numbered intermediate layer, and the product of the refractive index and the thickness is in a specific range of an odd multiple of λ/4n. The sum of the products of the refractive indices and the thicknesses of one or more intermediate layers disposed between at least two odd-numbered intermediate layers is in a range of −π/2<θ<π/2 in the terms of phases. | 11-24-2011 |
20130065177 | METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER - A method for manufacturing an electrophotographic photosensitive member using plasma CVD includes steps of placing a cylindrical base member in a reactor which can be evacuated, the reactor having an electrode therein, so as to be spaced apart from the electrode, introducing a raw material gas for deposited film formation into the reactor, and applying an alternating voltage of a rectangular wave having a frequency in the range of 3 kHz to 300 kHz between the electrode and the cylindrical base member so that a potential at one of the electrode and the cylindrical base member with respect to a potential at the other becomes alternately positive and negative, to decompose the raw material gas, and forming a deposited film on the cylindrical base member. The magnitude of the potential difference between the electrode and the cylindrical base member is selectively controlled. | 03-14-2013 |
20130302734 | DEPOSITION FILM FORMING APPARATUS, DEPOSITION FILM FORMING METHOD AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER MANUFACTURING METHOD - The present invention provides a deposition film forming apparatus including a reaction container, an exhaust device and an exhaust gas flow path for causing a material gas to flow from the reaction container to the exhaust device, wherein the exhaust gas flow path includes a portion whose cross section expands with a step with respect to a direction in which the material gas flows and the deposition film forming apparatus further includes a cleaning gas flow device for causing the cleaning gas to directly flow into a region closer to the exhaust device side than the step of the exhaust gas flow path, a deposition film forming method using the deposition film forming apparatus and a method of manufacturing an electrophotographic photosensitive member using the deposition film forming method. | 11-14-2013 |
20140349226 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS - Provided is an electrophotographic photosensitive member that improves the sensitivity characteristic and high-humidity deletion resistance, and achieves compatibility between a high image-resolving power and the suppression of an image memory. The electrophotographic photosensitive member comprises an electrophotographic photosensitive member, including: a photoconductive layer; and a surface layer comprising hydrogenated amorphous silicon carbide on the photoconductive layer, in which: a ratio (C/(Si+C)) of a number of carbon atoms (C) to a sum of a number of silicon atoms (Si) and the number of the carbon atoms (C) in the surface layer is 0.50 or more and 0.65 or less; a sum of an atom density of the silicon atoms and an atom density of the carbon atoms in the surface layer is 6.60×10 | 11-27-2014 |