Yukako Anryu, Osaka-Shi JP
Yukako Anryu, Osaka-Shi JP
Patent application number | Description | Published |
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20120135351 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - The present invention provides a salt represented by the formula (I): | 05-31-2012 |
20120251946 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising the following components (A), (B) and (X): | 10-04-2012 |
20120258403 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - The present invention provides a salt represented by the formula (I): | 10-11-2012 |
20120328986 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A salt represented by formula (I): | 12-27-2012 |
20130022920 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), | 01-24-2013 |
20150118619 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A salt represented by the formula (I): | 04-30-2015 |
20150118620 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME - A salt represented by formula (I): | 04-30-2015 |
20150338735 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN - A salt represented by formula (I): | 11-26-2015 |