Yuji Ono
Yuji Ono, Miyagi JP
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20100126417 | DEPOSITION SOURCE UNIT, DEPOSITION APPARATUS AND TEMPERATURE CONTROLLER OF DEPOSITION SOURCE UNIT - A deposition apparatus includes a deposition source unit, a transport mechanism for transporting a vaporized film forming material and a blowing device for blowing off the transported film forming material. The deposition source unit includes a vapor deposition source assembly, a housing and a water cooling jacket. The vapor deposition source assembly includes a gas supply mechanism, a gas inlet and a first material evaporating chamber formed as one body. A heater of the housing heats a film forming material in the first material evaporating chamber and the carrier gas flowing in a plurality of gas passages. The vaporized film forming material is transported by an argon gas. The water cooling jacket is installed apart from an outer peripheral surface of the housing at a certain distance and cools the deposition source unit. | 05-27-2010 |
20110240223 | SUBSTRATE PROCESSING SYSTEM - There is provided a substrate processing system having high maintainability by widening a gap between various processing apparatuses connected with side surfaces of transfer modules and capable of achieving sufficient productivity by avoiding deterioration in throughput. The substrate processing system for manufacturing an organic EL device by forming a multiple number of layers including, e.g., an organic layer on a substrate includes at least one transfer module configured to be evacuable and arranged along a straight transfer route. Within the transfer module, a multiple number of loading/unloading areas for loading/unloading the substrate with respect to a processing apparatus and at least one stocking area positioned between the loading/unloading areas are alternately arranged along the transfer route in series, and the processing apparatus is connected with a side surface of the transfer module at a position facing each of the loading/unloading areas. | 10-06-2011 |
20120031339 | DEPOSITION HEAD AND FILM FORMING APPARATUS - There is provided a deposition head capable of discharging a material gas having a uniform flow rate and equi-thermal property from each component in a large-sized substrate as well as a conventional small-sized one for forming a uniform thin film. A deposition apparatus including the deposition head is also provided. The deposition head is provided within a deposition apparatus for forming a thin film on a substrate and configured to discharge a material gas toward the substrate. The deposition head includes an outer casing, and an inner casing provided within the outer casing and into which the material gas is introduced. In the inner casing, an opening configured to discharge the material gas toward the substrate is formed, and a heater configured to heat the material gas is provided at an outer surface of the outer casing or in a space between the outer casing and the inner casing. | 02-09-2012 |
20120074339 | REGULATING VALVE DEVICE - [Problem] To provide a regulating valve device having a valve element opened or closed by a working fluid. | 03-29-2012 |
20120094014 | VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD - There is provided a vapor deposition apparatus and a vapor deposition method capable of efficiently sublimating/melting a granular organic material with high mobility. The vapor deposition apparatus for forming a thin film on a substrate by vapor deposition includes a depressurizable material supply apparatus configured to supply a material gas, and a film forming apparatus configured to form a thin film on the substrate. The material supply apparatus includes a quantity control unit configured to control a quantity of a material, and a material gas generating unit configured to vaporize the material supplied from the quantity control unit. | 04-19-2012 |
Yuji Ono, Sendai City JP
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20100000469 | DEPOSITION APPARATUS FOR ORGANIC EL AND EVAPORATING APPARATUS - Provided is a deposition apparatus for organic EL capable of allowing vapor of a film forming material to be vapor deposited on a target object to be uniformly heated. A deposition apparatus, which performs a film forming process by vapor depositing a film forming material on a target object in a depressurized processing chamber, includes an evaporating head having a vapor discharge opening, disposed in the processing chamber, for discharging vapor of the film forming material. Inside the evaporating head, provided is a heater receiving member which is sealed with respect to an inside of the processing chamber, and installed is a communication path which allows the heater receiving member to communicate with an outside of the processing chamber. A power supply line for a heater received in the heater receiving member is disposed in the communication path and extended to the outside of the processing chamber. | 01-07-2010 |
20100028534 | EVAPORATION UNIT, EVAPORATION METHOD, CONTROLLER FOR EVAPORATION UNIT AND THE FILM FORMING APPARATUS - In order to increase temperature controllability of a material container, an evaporation unit for forming a film includes a material supply mechanism having a material container, an outer case having a hollow interior in which the material supply mechanism is detachably secured, an internal heater provided in the material supply mechanism and heating the material supply mechanism, and a transfer path which is formed by securing the material supply mechanism to the outer case and which transfers the film forming material vaporized by heating the inner heater. | 02-04-2010 |
20120160671 | SPUTTERING DEVICE - Provided is a sputtering device which can achieve a sputtering while blocking light that enters from a sputtering space onto a substrate as an object to be sputtered on which an organic thin film is formed, thereby preventing the deterioration in properties of the organic thin film. Specifically provided is a sputtering device for achieving a sputtering of a substrate that is placed on the side of a sputtering space, wherein the sputtering space is formed between a pair of targets that are so placed as to face each other. The sputtering device comprises: an electric power source configured to apply a voltage between the pair of targets; a gas supply unit configured to supply an inert gas to the sputtering space; and a light-shielding mechanism configured to be placed between the sputtering space and the substrate. | 06-28-2012 |
Yuji Ono, Fukaya-Shi JP
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20090163049 | ELECTRONIC MODULE - An electronic module includes: a first circuit board and a second circuit board; and a conductive connector for electrically connecting a first conductive pattern of the first circuit board with a second conductive pattern of the second circuit board, wherein at least one of the first circuit board and the second circuit board is connected with the conductive connector through intrusion thereof. | 06-25-2009 |
Yuji Ono, Zama JP
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20090054129 | GAMING MACHINE AND METHOD FOR DISPLAYING SYMBOLS - A gaming machine comprises a display unit that displays video reels using computer graphics. Symbols are moved and stopped on each video reel. A game controller unit selects a type of symbols and an arrangement of symbols at random, and provides a player with an award if a winning combination appears on a payline in the arrangement of symbols and the player has placed a bet on the payline. A display controller unit causes the display unit to move symbols on each video reel, and then stop symbols in the arrangement. The display controller unit further causes the display unit to change a symbol of the selected type to a special symbol while moving symbols. Special symbols appear in a prominent form, e.g., in a background color complementary to a background color of other symbols, or in a metallic color, or in a blinking, flashing, or sparkling pattern. | 02-26-2009 |
Yuji Ono, Ehime JP
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20080225299 | Apparatus and Method for Appearance Inspection - Rotating polygon mirrors are configured such that angles formed by a rotation axis and mirror surfaces differs from one another in the mirror surfaces in order to shift a collecting point of a scanning light flux in a sub-scanning direction in association with rotation at constant angular speed. A collecting point position forming optical system is configured such that the collecting point is moved in an inspection range Zr in a height direction Z. The XYZ scanning is performed by moving the inspection object in the sub-scanning direction such that the collecting point shifted in the sub-scanning direction and the height direction is linearly scanned in the height direction of the inspection object in synchronization with the rotation of the rotating polygon mirror at the constant angular speed, and the an appearance positional coordinate of the inspection object is determined by a confocal method to perform the appearance inspection. | 09-18-2008 |
Yuji Ono, Tokyo JP
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20120001102 | HIGHLY CLEAN AND HOT VALVE - A highly clean and high temperature valve apparatus includes a valve driving unit and a valve casing connected to a bonnet supporting a valve stem slidably. A stem portion has one end positioned in a circumferential wall closed at its two ends by upper and lower covers, and supports one end of the valve stem with its other end extending through the lower cover. The stem portion has its ends supported respectively by first and second bellows for closing an axial through hole of the lower cover tightly. A first pipe communicates with a first space isolated by the first bellows, and a second pipe communicates with a second space isolated by the first bellows. The fluid quantities in the first and second spaces are increased or decreased relative to each other, thereby to drive the stem portion supported in a floating state by the first and second bellows. | 01-05-2012 |
Yuji Ono, Himeji-Shi JP
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20120202923 | AMORPHOUS SILICA AND PROCESS FOR PRODUCING SAME - Provided are amorphous silica particles for application to industrial fields where there are increasing desires for high purity and colorlessness. The amorphous silica particles are produced through the steps of hydrolysis of an alkoxide, vacuum drying, and firing. The amorphous silica particles have been reduced in coloration and in Fe content, which is causative of coloration of the silica, and can meet the desires. The amorphous silica is characterized by having an Fe content of 20 ppm or less. | 08-09-2012 |
Yuji Ono, Sendai JP
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20120241023 | CONTROL VALVE DEVICE - A control valve device develops opening/closing accuracy of a valve assembly. The valve head | 09-27-2012 |
Yuji Ono, Oshu JP
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20130209666 | EVAPORATING APPARATUS AND EVAPORATING METHOD - An evaporating method is capable of forming a thin film on a substrate by a vapor deposition process. The evaporating method includes measuring a vapor concentration of a material gas discharged to the substrate by a detector; and controlling a film forming condition based on a measurement result from the detector. | 08-15-2013 |
20130330928 | FILM FORMING DEVICE, SUBSTRATE PROCESSING SYSTEM AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A substrate processing system of forming a resist pattern having a molecular resist of a low molecular compound on a substrate includes a film forming device configured to form a resist film on the substrate; an exposure device configured to expose the formed resist film; and a developing device configured to develop the exposed resist film. The film forming device includes a processing chamber configured to accommodate therein the substrate; a holding table that is provided in the processing chamber and configured to hold the substrate thereon; a resist film deposition head configured to supply a vapor of the molecular resist to the substrate held on the holding table; and a depressurizing device configured to depressurize an inside of the processing chamber to a vacuum atmosphere. | 12-12-2013 |
Yuji Ono, Oshu-Shi JP
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20140080307 | PATTERN-FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A pattern-forming method for forming a predetermined pattern serving as a mask when etching film on a substrate includes the steps of: an organic film pattern-forming step for forming an organic film pattern on a film to be processed; forming a silicon nitride film on the organic film pattern; etching the silicon nitride film so that the silicon nitride film remains only on the lateral wall sections of the organic film pattern; and removing the organic film, thereby forming the predetermined silicon nitride film pattern on the film to be processed on a substrate. With the temperature of the substrate maintained at no more than 100° C., the film-forming step excites a processings gas and generates a plasma, performs plasma processing with the plasma, and forms a silicon nitride film having stress of no more than 100 MPa. | 03-20-2014 |
Yuji Ono, Iwate JP
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20140284321 | MAGNETIC ANNEALING APPARATUS - Disclosed is a magnetic annealing apparatus which performs a magnetic annealing on workpieces held in a workpiece boat by using a horizontal superconducting magnet as a magnetic field generating unit. The magnetic annealing apparatus includes a carrier configured to accommodate the workpieces before the magnetic annealing process; and a workpiece conveyance mechanism configured to convey the workpieces held in the carrier to the workpiece boat. The workpiece conveyance mechanism is capable of holding the workpieces in either a horizontal state or in a horizontal state. | 09-25-2014 |
20140287926 | MAGNETIC ANNEALING APPARATUS - Disclosed is a magnetic annealing apparatus including a carrier conveyance region and a workpiece conveyance region. The carrier conveyance region includes: a first mounting table where a carrier is disposed; second mounting tables where carriers are disposed to convey workpieces from the carrier conveyance region to the workpiece conveyance region; a storage unit that stores carriers; and a carrier conveyance mechanism that performs carrying-out/carrying-in of the carriers. The workpiece conveyance region includes: an aligner device that aligns workpieces; a workpiece boat that holds plural groups of workpieces; a workpiece conveyance mechanism that conveys the workpieces from the carriers disposed on the second mounting tables to the workpiece boat via the aligner device; a heating unit that heats the workpieces; a magnetic field generating unit that applies a magnetic field to the workpieces; and a transfer mechanism that transfers the workpieces held by the workpiece boat into the magnetic field generating unit. | 09-25-2014 |
Yuji Ono, Kanagawa JP
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20150130947 | SURVEILLANCE CAMERA MANAGEMENT DEVICE, SURVEILLANCE CAMERA MANAGEMENT METHOD, AND PROGRAM - Information about link relations between cameras is to be accurately and readily acquired. | 05-14-2015 |