Patent application number | Description | Published |
20100117080 | SEMICONDUCTOR TEST PAD STRUCTURES - A semiconductor test pad interconnect structure with integrated die-separation protective barriers. The interconnect structure includes a plurality of stacked metal layers each having an electrically conductive test pad separated from other test pads by a dielectric material layer. In one embodiment, at least one metallic via bar is embedded into the interconnect structure and electrically interconnects each of the test pads in the metal layers together. The via bar extends substantially along an entire first side defined by each test pad in some embodiments. In other embodiments, a pair of opposing via bars may be provided that are arranged on opposite sides of a die singulation saw cut line defined in a scribe band on a semiconductor wafer. | 05-13-2010 |
20100123246 | Double Solid Metal Pad with Reduced Area - An integrated circuit structure includes a bond pad; an Mtop pad located directly underlying the bond pad; an Mtop-1 pad having at least a portion directly underlying the Mtop pad, wherein at least one of the Mtop pad and the Mtop-1 pad has a horizontal dimension smaller than a horizontal dimension of the bond pad; a plurality of vias interconnecting the Mtop pad and the Mtop-1 pad; and a bond ball on the bond pad. Each of the Mtop pad and the Mtop-1 pad has positive enclosures to the bond ball in all horizontal directions. | 05-20-2010 |
20100187687 | Underbump Metallization Structure - A system and method for forming an underbump metallization (UBM) is presented. A preferred embodiment includes a raised UBM which extends through a passivation layer so as to make contact with a contact pad while retaining enough of the passivation layer between the contact pad and the UBM to adequately handle the peeling and shear stress that results from CTE mismatch and subsequent thermal processing. The UBM contact is preferably formed in either an octagonal ring shape or an array of contacts. | 07-29-2010 |
20100252916 | STRUCTURE FOR IMPROVING DIE SAW QUALITY - A semiconductor device is provided that includes a semiconductor substrate, a plurality of dies formed on the semiconductor substrate, the plurality of dies being separated from one another by a first region extending along a first direction and a second region extending along a second direction different from the first direction, a dummy metal structure formed within a third region that includes a region defined by an intersection of the first region and the second region, a plurality of metal interconnection layers formed over the substrate, and a plurality of dielectric layers formed over the substrate. Each of the metal interconnection layers is disposed within each of the dielectric layers and a dielectric constant of at least one of the dielectric layers is less than about 2.6. | 10-07-2010 |
20100283148 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 11-11-2010 |
20100283149 | STRUCTURE AND METHOD OF FORMING A PAD STRUCTURE HAVING ENHANCED RELIABILITY - A semiconductor substrate is provided having a first metal layer formed over a first insulating layer. A second insulating layer is formed having a first damascene opening, the first opening having a second insulating layer portion formed therein. A resist layer is deposited to fill the first opening and the resist layer is thereafter patterned to form an etching mask for etching a second damascene opening. The second opening is etched into a portion of the second insulating layer, the second opening exposing a portion of the first metal layer. A second metal layer is formed to include filling the first and second damascene openings embedding the second insulating layer portion in the second metal layer. The second metal layer is planarized and a passivation layer is formed above the second insulating layer and the second metal layer, wherein the passivation layer partially covers the second metal layer. | 11-11-2010 |
20110018128 | PACKAGE STRUCTURE AND METHOD FOR REDUCING DIELECTRIC LAYER DELAMINATION - A semiconductor package structure is provided. The structure includes a semiconductor chip having a plurality of interconnect layers formed thereover. A first passivation layer is formed over the plurality of interconnect layers. A stress buffer layer is formed over the first passivation layer. A bonding pad is formed over the stress buffer layer. A second passivation layer is formed over a portion of the bonding pad, the second passivation having at least one opening therein exposing a portion of the bonding pad. | 01-27-2011 |
20110284843 | Probe Pad On A Corner Stress Relief Region In A Semiconductor Chip - A semiconductor chip includes a corner stress relief (CSR) region. An enhanced structure connects sides of a seal ring structure to surround the CSR region. A device under test (DUT) structure is disposed on the CSR region. A set of probe pad structures is disposed on the CSR region. Two of the set of probe pad structures are electrically connect to the DUT structure. | 11-24-2011 |
20110287627 | SEMICONDUCTOR TEST PAD STRUCTURES - A semiconductor test pad interconnect structure with integrated die-separation protective barriers. The interconnect structure includes a plurality of stacked metal layers each having an electrically conductive test pad separated from other test pads by a dielectric material layer. In one embodiment, at least one metallic via bar is embedded into the interconnect structure and electrically interconnects each of the test pads in the metal layers together. The via bar extends substantially along an entire first side defined by each test pad in some embodiments. In other embodiments, a pair of opposing via bars may be provided that are arranged on opposite sides of a die singulation saw cut line defined in a scribe band on a semiconductor wafer. | 11-24-2011 |
20120018875 | Reducing Delamination Between an Underfill and a Buffer layer in a Bond Structure - A die includes a metal pad, a passivation layer, and a patterned buffer layer over the passivation layer. The patterned buffer layer includes a plurality of discrete portions separated from each other. An under-bump-metallurgy (UBM) is formed in an opening in the patterned buffer layer and an opening in the passivation layer. A metal bump is formed over and electrically coupled to the UBM. | 01-26-2012 |
20120091455 | PAD STRUCTURE HAVING CONTACT BARS EXTENDING INTO SUBSTRATE AND WAFER HAVING THE PAD STRUCTURE - A pad structure in a semiconductor wafer for wafer testing is described. The pad structure includes at least two metal pads connected there-between by a plurality of conductive vias in one or more insulation layers. A plurality of contact bars in contact with the bottom-most metal pad extends substantially vertically from the bottom-most metal pad into the substrate. An isolation structure substantially surrounds the plurality of contact bars to isolate the pad structure. | 04-19-2012 |
20120092033 | MEASUREMENT OF ELECTRICAL AND MECHANICAL CHARACTERISTICS OF LOW-K DIELECTRIC IN A SEMICONDUCTOR DEVICE - Provided is a test structure for testing an unpackaged semiconductor wafer. The test structure includes a force-application component that is coupled to an interconnect structure of the semiconductor wafer. The force-application component is operable to exert a force to the semiconductor wafer. The test structure also includes first and second test portions that are coupled to the interconnect structure. The first and second test portions are operable to measure an electrical performance associated with a predetermined region of the interconnect structure. The first and second test portions are operable to measure the electrical performance while the force is exerted to the semiconductor wafer. | 04-19-2012 |
20120098121 | CONDUCTIVE FEATURE FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURE - A conductive feature on a semiconductor component is disclosed. A first passivation layer is formed over a substrate. A bond pad is formed over the first passivation layer. A second passivation layer overlies the first passivation layer and the bond pad. The second passivation layer has a first opening overlying the bond pad and a plurality of second openings exposing a top surface of the first passivation layer. A buffer layer overlies the second passivation layer and fills the plurality of second openings. The buffer layer has a third opening overlapping the first opening and together exposes a portion the bond pad. The combined first opening and third opening has sidewalls. An under bump metallurgy (UBM) layer overlies the sidewalls of the combined first opening and third opening, and contacts the exposed portion of the bond pad. A conductive feature overlies the UBM layer. | 04-26-2012 |
20130043598 | BOND PAD STRUCTURE TO REDUCE BOND PAD CORROSION - Mechanisms of forming a bond pad structure are provided. The bond pad has a recess region, which is formed by an opening in the passivation layer underneath the bond pad. An upper passivation layer covers at least the recess region of the bond pad to reduce trapping of patterning and/or etching residues in the recess region. As a result, the likelihood of bond pad corrosion is reduced. | 02-21-2013 |
20130093077 | POST-PASSIVATION INTERCONNECT STRUCTURE - A semiconductor device includes a passivation layer, a first protective layer, an interconnect layer, and a second protective layer successively formed on a semiconductor substrate. The interconnect layer has an exposed portion, on which a barrier layer and a solder bump are formed. At least one of the passivation layer, the first protective layer, the interconnect layer and the second protective layer includes at least one slot formed in a region outside a conductive pad region. | 04-18-2013 |
20130113097 | METHODS OF AND SEMICONDUCTOR DEVICES WITH BALL STRENGTH IMPROVEMENT - In a method of improving ball strength of a semiconductor device, a ball pattern of a plurality of connection balls to be formed as electrical connections for the semiconductor device is received. The pattern includes a number of columns and rows crossing each other. The balls are arranged at intersections of the columns and rows. An arrangement of balls in a region of the ball pattern is modified so that the region includes no isolated balls. | 05-09-2013 |
20130140706 | UBM Structures for Wafer Level Chip Scale Packaging - A wafer level chip scale semiconductor device comprises a semiconductor die, a first under bump metal structure and a second under bump metal structure. The first under bump metal structure having a first enclosure is formed on a corner region or an edge region of the semiconductor die. A second under bump metal structure having a second enclosure is formed on an inner region of the semiconductor die. The first enclosure is greater than the second enclosure. | 06-06-2013 |
20130181347 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 07-18-2013 |
20130240883 | Contact Test Structure and Method - A system and method for testing electrical connections is provided. In an embodiment one or more floating pads may be manufactured in electrical connection with an underbump metallization structure. A test may then be performed to measure the electrical characteristics of the underbump metallization structure through the floating pad in order to test for defects. Alternatively, a conductive connection may be formed on the underbump metallization and the test may be performed on the conductive connection and the underbump metallization together. | 09-19-2013 |
20130241683 | Inductor for Post Passivation Interconnect - An inductor device and method of forming the inductor device are provided. In some embodiments the inductor device includes a post passivation interconnect (PPI) layer disposed and an under bump metallization (UBM) layer, each disposed over a substrate. The PPI layer forms a coil and dummy pads. The dummy pads are disposed around a substantial portion of the coil to shield the coil from electromagnetic interference. A first portion of the UBM layer is electrically coupled to the coil and configured to interface with an electrical coupling member. | 09-19-2013 |
20130270698 | STRAIN REDUCED STRUCTURE FOR IC PACKAGING - A semiconductor device includes a semiconductor die having first and second conductive pads, and a substrate having third and fourth bonding pads. A width ratio of the first conductive pad over the third bonding pad at an inner region is different from a width ratio of the second conductive pad over the fourth bonding pad at an outer region. | 10-17-2013 |
20140045326 | METHOD OF MAKING A SEMICONDUCTOR DEVICE HAVING A POST-PASSIVATION INTERCONNECT STRUCTURE - A method of making a semiconductor device includes forming a passivation layer overlying a semiconductor substrate, the semiconductor substrate having a first region and a second region, wherein the first region is a conductive pad and the second region is adjacent to the first region. The method further includes forming a first protective layer overlying the passivation layer and forming an interconnect layer overlying the first protective layer. The method further includes forming a plurality of slots in the second region and forming a second protective layer overlying the interconnect layer, wherein the second protective layer fills each slot of the plurality of slots. The method further includes exposing a portion of the interconnect layer through the second protective layer; forming a barrier layer on the exposed portion of the interconnect layer; and forming a solder bump on the barrier layer. | 02-13-2014 |
20140045327 | Double Solid Metal Pad with Reduced Area - An integrated circuit structure includes a bond pad; an Mtop pad located directly underlying the bond pad; an Mtop-1 pad having at least a portion directly underlying the Mtop pad, wherein at least one of the Mtop pad and the Mtop-1 pad has a horizontal dimension smaller than a horizontal dimension of the bond pad; a plurality of vias interconnecting the Mtop pad and the Mtop-1 pad; and a bond ball on the bond pad. Each of the Mtop pad and the Mtop-1 pad has positive enclosures to the bond ball in all horizontal directions. | 02-13-2014 |
20140077356 | Post Passivation Interconnect Structures and Methods for Forming the Same - A device includes a metal pad, a passivation layer overlapping edge portions of the metal pad, and a first polymer layer over the passivation layer. A Post-Passivation-Interconnect (PPI) has a level portion overlying the first polymer layer, and a plug portion that has a top connected to the level portion. The plug portion extends into the first polymer layer. A bottom surface of the plug portion is in contact with a dielectric material. A second polymer layer is overlying the first polymer layer. | 03-20-2014 |
20140087522 | Reducing Delamination Between an Underfill and a Buffer Layer in a Bond Structure - A die includes a metal pad, a passivation layer, and a patterned buffer layer over the passivation layer. The patterned buffer layer includes a plurality of discrete portions separated from each other. An under-bump-metallurgy (UBM) is formed in an opening in the patterned buffer layer and an opening in the passivation layer. A metal bump is formed over and electrically coupled to the UBM. | 03-27-2014 |
20140170850 | UBM Structures for Wafer Level Chip Scale Packaging - A wafer level chip scale semiconductor device comprises a semiconductor die, a first under bump metal structure and a second under bump metal structure. The first under bump metal structure having a first enclosure is formed on a corner region or an edge region of the semiconductor die. A second under bump metal structure having a second enclosure is formed on an inner region of the semiconductor die. The first enclosure is greater than the second enclosure. | 06-19-2014 |
20140183693 | Capacitor in Post-Passivation Structures and Methods of Forming the Same - A device includes a metal pad and a passivation layer having a portion overlapping the metal pad. A capacitor includes a bottom capacitor electrode underlying the passivation layer, wherein the bottom capacitor includes the metal pad. The capacitor further includes a top capacitor electrode over the portion of the passivation layer; and a capacitor insulator including the portion of the passivation layer. | 07-03-2014 |
20140203438 | Methods and Apparatus of Packaging of Semiconductor Devices - Methods and apparatuses for forming an under-bump metallization (UBM) pad above a dielectric layer are disclosed. The dielectric layer may be above a metal layer and comprises a first opening and a second opening surrounding the first opening, which divide the dielectric layer into a first area and a second area. An UBM pad extends into and fills the first opening of the dielectric layer, above the first area between the first opening and the second opening, and may further extends down at least partly into the second opening covering a part or the whole of the second opening of the dielectric layer. The UBM pad may further extend over a part of the second area of the dielectric layer if the UBM pad fills the whole of the second opening of the dielectric layer. A solder ball may be mounted on the UBM pad. | 07-24-2014 |
20140242791 | METHOD OF FORMING BUMP STRUCTURE - A method of forming a bump structure includes forming a metallization layer on a top metal layer by electroless plating process, forming a polymer layer over the metallization layer; forming an opening on the polymer layer to expose the metallization layer, and forming a solder bump over the exposed metallization layer to make electrical contact with the top metal layer. | 08-28-2014 |
20140264922 | SEMICONDUCTOR STRUCTURE - One or more embodiments of techniques or systems for forming a semiconductor structure are provided herein. A first metal region is formed within a first dielectric region. A cap region is formed on the first metal region. A second dielectric region is formed above the cap region and the first dielectric region. A trench opening is formed within the second dielectric region. A via opening is formed through the second dielectric region, the cap region, and within some of the first metal region by over etching. A barrier region is formed within the trench opening and the via opening. A via plug is formed within the via opening and a second metal region is formed within the trench opening. The via plug electrically connects the first metal region to the second metal region and has a tapered profile. | 09-18-2014 |
20150017778 | Capacitor in Post-Passivation Structures and Methods of Forming the Same - A device includes a metal pad and a passivation layer having a portion overlapping the metal pad. A capacitor includes a bottom capacitor electrode underlying the passivation layer, wherein the bottom capacitor includes the metal pad. The capacitor further includes a top capacitor electrode over the portion of the passivation layer; and a capacitor insulator including the portion of the passivation layer. | 01-15-2015 |
20150028481 | SEMICONDUCTOR DEVICES WITH BALL STRENGTH IMPROVEMENT - A semiconductor device includes a contact region over a substrate. The semiconductor device further includes a metal pad over the contact region. Additionally, the semiconductor device includes a post passivation interconnect (PPI) line over the metal pad, where the PPI line is in contact with the metal pad. Furthermore, the semiconductor device includes an under-bump-metallurgy (UBM) layer over the PPI line. Moreover, the semiconductor device includes a plurality of solder balls over the UBM layer, the plurality of solder balls being arranged at some, but not all, intersections of a number of columns and rows of a ball pattern. | 01-29-2015 |
20150031200 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 01-29-2015 |
20150061079 | Wafer Level Dicing Method - Disclosed herein is a method for dicing a wafer, the method comprising forming a molding compound layer over each of one or more dies disposed on a wafer, the one or more dies separated by scribe lines, the molding compound layer having gaps over the respective scribe lines. The wafer is separated into individual dies along the gaps of the molding compound in the scribe lines. Separating the wafer into individual dies comprises cutting at least a portion of the substrate with a laser. Forming the molding compound layer comprises applying a stencil over the one or more dies and using the stencil to form the molding compound layer. | 03-05-2015 |
20150091191 | Contact Pad for Semiconductor Devices - Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a packaging device includes a contact pad disposed over a substrate, and a passivation layer and/or polymer layer disposed over the substrate and a portion of the contact pad. A post passivation interconnect (PPI) line is disposed over the passivation layer and is coupled to an exposed portion of the contact pad. A PPI pad is disposed over the passivation layer. A transition element is disposed over the passivation layer and is coupled between the PPI line and the PPI pad. The transition element includes a stepped region. | 04-02-2015 |
20150130057 | Post Passivation Interconnect Structures and Methods for Forming the Same - A device includes a metal pad, a passivation layer overlapping edge portions of the metal pad, and a first polymer layer over the passivation layer. A Post-Passivation-Interconnect (PPI) has a level portion overlying the first polymer layer, and a plug portion that has a top connected to the level portion. The plug portion extends into the first polymer layer. A bottom surface of the plug portion is in contact with a dielectric material. A second polymer layer is overlying the first polymer layer. | 05-14-2015 |
20150137352 | MECHANISMS FOR FORMING POST-PASSIVATION INTERCONNECT STRUCTURE - Embodiments of mechanisms for forming a semiconductor device are provided. The semiconductor device includes a contact pad over a substrate. The semiconductor device also includes a passivation layer over the substrate and a first portion of the contact pad, and a second portion of the contact pad is exposed through an opening. The semiconductor device further includes a post-passivation interconnect layer over the passivation layer and coupled to the second portion of the contact pad. In addition, the semiconductor device includes a bump over the post-passivation interconnect layer and outside of the opening. The semiconductor device also includes a diffusion barrier layer physically insulating the bump from the post-passivation interconnect layer while electrically connecting the bump to the post-passivation interconnect layer. | 05-21-2015 |
20150214148 | Inductor for Post Passivation Interconnect and A Method of Forming - An inductor device and method of forming the inductor device are provided. In some embodiments the inductor device includes a post passivation interconnect (PPI) layer disposed and an under bump metallization (UBM) layer, each disposed over a substrate. The PPI layer forms a coil and dummy pads. The dummy pads are disposed around a substantial portion of the coil to shield the coil from electromagnetic interference. A first portion of the UBM layer is electrically coupled to the coil and configured to interface with an electrical coupling member. | 07-30-2015 |
20150228580 | SEMICONDUCTOR PACKAGE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include semiconductor packages and methods of forming the same. An embodiment is a semiconductor package including a first package including one or more dies, and a package substrate bonded to a first side of the first package with by a first set of connectors. The semiconductor package further includes a surface mount device mounted to the first side of the first package, the surface mount device consisting essentially of one or more passive devices. | 08-13-2015 |
20150228606 | SEMICONDUCTOR DEVICE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include devices and methods of forming the same. An embodiment is a device including a solder resist coating over a first side of a substrate, an active surface of a die bonded to the first side of the substrate by a first connector, and a surface mount device mounted to the die by a second set of connectors, the surface mount device being between the die and the first side of the substrate, the surface mount device being spaced from the solder resist coating. | 08-13-2015 |
20150262895 | Pillar Structure having Cavities - An apparatus comprises a pillar formed on a top surface of a semiconductor substrate, wherein the pillar comprises a first pillar region, a second pillar region and a first cavity formed between the first pillar region and the second pillar region, and wherein the first cavity is configured to accommodate a probe pin. | 09-17-2015 |
20150318225 | WAFER HAVING PAD STRUCTURE - A wafer including a substrate having a plurality of integrated circuits formed above the substrate, and at least one scribe line between two of the integrated circuits. The wafer further includes a plurality of dielectric layers formed in the at least one scribe line having a process control monitor (PCM) pad structure formed therein, the PCM pad structure having: a plurality of metal pads interconnected by a plurality of conductive vias. The PCM pad further includes a plurality of contact bars in contact with a bottom-most metal pad, the contact bars extending substantially vertically from the bottom-most metal pad into the substrate. Additionally, the PCM pad includes an isolation structure substantially surrounding the plurality of contact bars to isolate the PCM pad structure. | 11-05-2015 |
20150348916 | RING STRUCTURES IN DEVICE DIE - A die includes a metal pad, a passivation layer over the metal pad, and a polymer layer over the passivation layer. A metal pillar is over and electrically coupled to the metal pad. A metal ring is coplanar with the metal pillar. The polymer layer includes a portion coplanar with the metal pillar and the metal ring. | 12-03-2015 |
20150357302 | STRUCTURE AND METHOD FOR PACKAGE WARPAGE CONTROL - Presented herein is a package comprising a molding compound layer and an active device in the molding compound layer. A conductive via passes through the molding compound layer and is adjacent to the active device. A passivation layer is disposed on the molding compound layer. An active PPI is disposed on the passivation layer and is electrically connected to the conductive via. A dummy PPI is disposed on the passivation layer and is electrically isolated from the conductive via and the active device. | 12-10-2015 |
20150380329 | Contact Test Structure and Method - A system and method for testing electrical connections is provided. In an embodiment one or more floating pads may be manufactured in electrical connection with an underbump metallization structure. A test may then be performed to measure the electrical characteristics of the underbump metallization structure through the floating pad in order to test for defects. Alternatively, a conductive connection may be formed on the underbump metallization and the test may be performed on the conductive connection and the underbump metallization together. | 12-31-2015 |
20160079158 | Contact Pad for Semiconductor Devices - Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a packaging device includes a contact pad disposed over a substrate, and a passivation layer and/or polymer layer disposed over the substrate and a portion of the contact pad. A post passivation interconnect (PPI) line is disposed over the passivation layer and is coupled to an exposed portion of the contact pad. A PPI pad is disposed over the passivation layer. A transition element is disposed over the passivation layer and is coupled between the PPI line and the PPI pad. The transition element includes line having a width greater than the PPI line. | 03-17-2016 |
20160079171 | SEMICONDUCTOR PACKAGE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include semiconductor packages and methods of forming the same. An embodiment is a semiconductor package including a first package including one or more dies, and a package substrate bonded to a first side of the first package with by a first set of connectors. The semiconductor package further includes a surface mount device mounted to the first side of the first package, the surface mount device consisting essentially of one or more passive devices. | 03-17-2016 |
20160093590 | Package-on-Package Structure and Method - A device comprises a top package mounted on a bottom package through a joint structure, wherein the joint structure comprises a solder ball of the top package coupled to a metal structure embedded in the bottom package and an epoxy protection layer having a first edge in direct contact with a top surface of the bottom package and a second edge surrounding a lower portion of the solder ball. | 03-31-2016 |
Patent application number | Description | Published |
20090167705 | METHOD FOR OPERATING SOFTWARE INPUT PANEL - A method for operating a software input panel (SIP) is provided for an electronic device having a screen. In the present method, a signal generated corresponding to an operation performed on the electronic device by a user is used for switching types and input modes of the SIP, or for modifying appearances of the SIP. Consequently, a user need not switch the functions of the SIP described above through a SIP menu. As a result, the convenience of operating the SIP can be increased, and the efficiency of using the SIP can also be improved. | 07-02-2009 |
20090273699 | IMAGE PROCESSING METHOD, ELECTRONIC DEVICE THEREOF, AND RECORDING MEDIUM THEREOF - An image processing method, an electronic device thereof, and a recording medium thereof are provided, which are applicable for processing an image captured by an electronic device. In this method, a default direction is defined first, and a current usage direction of the electronic device is obtained then. If the usage direction is not consistent with the default direction, the image is adjusted to a correct direction according to both the usage direction and the default direction. Finally, the adjusted image is recorded. Therefore, regardless of the direction along which the user holds the electronic device when capturing the image, the recorded image is always in the correct direction. The rotation operations performed to the images that are not in the correct direction can be omitted when browsing the images, so as to greatly increase the convenience and smoothness in browsing images. | 11-05-2009 |
20110207210 | Isolated or synthesized Rhopalosiphum padi virus polynucleotides having a promotor activity - Provided herein are isolated or synthesized Rhopalosiphum padi virus (RhPV) nucleic acids having promotor activities, and vectors containing the isolated or synthesized RhPV nucleic acids for gene delivery in insect expression systems. | 08-25-2011 |
20120137255 | NOTE MANAGEMENT METHODS AND SYSTEMS - Note management methods and systems are provided. First, inputs are received along a timeline, and at least one note is generated according to the inputs. The at least one note is recorded and arranged along the timeline. In some embodiments, a thumbnail is generated for a respective predefined interval on the timeline according to the at least one node in the respective predefined interval, and the thumbnail of the respective predefined interval is displayed along the timeline. | 05-31-2012 |
20120206374 | SYSTEMS AND METHODS FOR SCREEN DATA MANAGEMENT - Methods and systems for screen data management are provided. First, a screenshot is generated for screen data displayed in a touch-sensitive display unit. Contacts and movements of an object on the touch-sensitive display unit are received. It is determined whether the object is a pen or not. When the object is a pen, gestures corresponding to the contacts and movements of the object are recorded. Then, an event is received. In response to the event, the screenshot and the gestures corresponding to the contacts and movements of the object are merged to generate an integrated screenshot. | 08-16-2012 |
20130069893 | ELECTRONIC DEVICE, CONTROLLING METHOD THEREOF AND COMPUTER PROGRAM PRODUCT - A method of controlling an electronic device, an electronic device and a computer program product using the method are provided. The method includes displaying part or all of a ring and a function image outside the ring on the touch screen while the electronic device is in a user-interface lock state, detecting a user input applied to the function image and/or the ring on or near the touch screen, moving the function image and/or the ring in accordance with the user input, wherein the function image corresponds to an application, transitioning the electronic device to a user-interface unlock state and launching the application if the function image and the ring approach each other within a predetermined distance, and maintaining the electronic device in the user-interface lock state if the function image and the ring do not approach each other within the predetermined distance. | 03-21-2013 |
20130069896 | PORTABLE ELECTRONIC APPARATUS AND OPERATION METHOD THEREOF AND COMPUTER READABLE MEDIA - A portable electronic apparatus and an operation method thereof and a computer readable media are provided. The portable electronic apparatus comprises a touch display unit, and an electronic notebook is displayed in the touch display unit. When the touch display enters a power saving mode, and a trigger event is detected, the power saving mode is ended, and the electronic notebook is directly displayed in the touch display unit without displaying a screen lock mode before displaying the electronic notebook. | 03-21-2013 |
20130212492 | METHOD AND ELECTRONIC APPARATUS FOR ASSOCIATING NOTE AND CALENDAR EVENT - A method and an electronic apparatus for associating a note and a calendar event are provided. In the method, when the note is added, at least one event with an event time close to a creating time of the note is inquired from a plurality of events recorded in a calendar, and the note is associated with one of the events. | 08-15-2013 |