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Yi Zheng, San Ramon US

Yi Zheng, San Ramon, CA US

Patent application numberDescriptionPublished
20080271308METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD HAVING A WRAP-AROUND TRAILING SHIELD AND A CONCAVE TRAILING EDGE MAIN POLE - A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method allows the write head to be formed with a write pole having a concave trailing edge. The method further allows the amount of concavity of the trailing edge to be accurately and carefully controlled both within a wafer and between wafers. A write pole is formed using a mask that includes a hard mask, a RIEable layer and an endpoint detection layer. A layer of non-magnetic material (ALD layer) h deposited, and then, an ion milling process is used to remove a portion of the ALD layer disposed over the write pole and mask. A reactive ion etch process is performed to remove the RIEable layer leaving the ALD layer to form non-magnetic side walls with upper portions that extend above the write pole. Another ion milling is then performed, preferably at an angle relative to normal, such that shadowing from the upper portions of the non-magnetic side walls causes the ion milling to form the write pole with a concave trailing edge.11-06-2008
20080278861STITCHED WRAP AROUND SHIELD FABRICATION FOR PERPENDICULAR MAGNETIC RECORDING WRITE HEADS - A wrap around shield of a write head is fabricated in multiple processes, with side shields fabricated in one process, and a trailing shield formed in another process. These multiple processes form a stitched wrap around shield, resulting in more flexible and accurate placement of the trailing shield and side shields with respect to the write pole. These processes also independently form the dimensions (shapes and sizes) of the side shields and the trailing shield which allows better control of writeability, saturation, and adjacent track interference of the perpendicular recording write head.11-13-2008
20080316652SIMULTANEOUS POLE-TIP AND SIDE SHIELD FABRICATION AND INTEGRATED ELG - A method for manufacturing a write pole for perpendicular magnetic recording for accurately defining a side shield throat height and write pole flare point. The method includes the formation of a magnetic structure that provides an electronic lapping guide as well as providing the structure for both the side shields and the write pole. The magnetic structure includes a write pole portion and first and second side shield portions. The side shields portions are magnetically connected with the write pole portion in a region in front of an intended air hearing surface plane (e.g. in the direction from which lapping will progress). The side shields portions are each separated from the write pole portion in a region behind the intended air bearing surface plane by notches that terminate at a desired location relative to the intended air bearing surface plane and which open up in a region behind the intended air bearing surface plane.12-25-2008
20090021863PERPENDICULAR MAGNETIC RECORDING WRITE HEAD WITH TRAILING SHIELD HAVING THROAT HEIGHT DEFINED BY ELECTROPLATED NONMAGNETIC PAD LAYER AND METHOD FOR MAKING THE HEAD - A perpendicular magnetic recording write head has a magnetic write pole (WP) and a trailing shield (TS). The TS has a height (TS-HT) and a throat height (TS-TH) in a direction perpendicular to the ABS, with TS-TH being less than TS-HT. Nonmagnetic material is located between the TS and the WP and separates the TS from the WP. The nonmagnetic material includes a gap layer and a nonmagnetic electroplated “bump” or pad between the WP and the TS. The pad has a front edge generally parallel to and recessed from the ABS so that the TS-TH is generally equal to the distance from the ABS to the pad's front edge. An electrical lapping guide (ELG) is formed adjacent to the write head, with the back edge of the ELG being defined in the same process step that defines the location of the recessed front edge of the electroplated pad.01-22-2009
20090117407SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD - A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.05-07-2009
20090139080FENCELESS MAIN POLE DEFINITION FOR ADVANCED PERPENDICULAR MAGNETIC WRITE HEAD - A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.06-04-2009
20090139958FENCELESS MAIN POLE DEFINITION FOR ADVANCED PERPENDICULAR MAGNETIC WRITE HEAD - A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.06-04-2009
20090144966LEADING EDGE TAPERED BUMP WITH ELECTRICAL LAPPING GUIDE CONTROL FOR WRAP AROUND SHIELD - A method for manufacturing a perpendicular magnetic write head having a trailing shield and with a tapered step. The method includes forming a write pole with a non-magnetic trailing gap and first and second non-magnetic side gap layers. A mask is formed having an opening over a portion of the write pole that is configured to define a non-magnetic bump. A non-magnetic bump material is deposited into the opening in a manner that defines a non-magnetic bump having a tapered front edge. A magnetic wrap around shield can then be formed over the non-magnetic bump, so that the bump forms a tapered stepped feature on the wrap-around magnetic shield. The bump location can be controlled by an electric lapping guide, which is defined to be aligned to the bump front edge.06-11-2009
20090152234PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING - A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.06-18-2009
20090152235METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH STEPPED TRAILING MAGNETIC SHIELD WITH ELECTRICAL LAPPING GUIDE CONTROL - A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.06-18-2009
20090166183METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH STEPPED TRAILING MAGNETIC SHIELD USING COLLIMATED SPUTTER DEPOSITION - A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. This bump is formed by constructing a mask having an opening configured to define the non-magnetic bump. A magnetic material is then sputter deposited. In order to decrease deposition of the magnetic material on the sides of the mask, a collimator is used to align the deposited material along a plane substantially parallel with an air bearing surface plane. This collimation of the deposited magnetic material greatly facilitates liftoff, and more importantly prevents the formation of fences which would otherwise have to be removed by a harsh, aggressive process.07-02-2009
20090168257INDEPENDENT SIDE SHIELD AND TOP SHIELD THROAT HEIGHT CONTROL FOR HIGH LINEAR DENSITY WRAP AROUND SHIELD WRITE HEAD - A magnetic write head for perpendicular magnetic recording. The magnetic write head includes a write pole having a pole tip region and a flared region. The write pole also has a trailing, wrap-around magnetic shield that is separated from the sides of the write pole by a non-magnetic side gap layer. The write head is formed such that the side gap spacing is larger in the flared region than in the pole tip region. This varying gap spacing can be formed by depositing a non-magnetic material using a collimated sputter deposition aligned substantially perpendicular to the air bearing surface. This collimated sputtering deposits the non-magnetic material more readily on the sides of the write pole in the flared region than in the pole tip region.07-02-2009
20090184091DIAMOND-LIKE CARBON (DLC) HARDMASK AND METHODS OF FABRICATION USING SAME - A method according to one embodiment comprises forming a thin film layer; forming a hardmask layer above the thin film layer, the hardmask layer comprising laminated layers of diamond-like carbon; removing a portion of the hardmask layer; and removing a portion of the thin film layer that is unprotected by the hardmask layer. A method according to another embodiment comprises forming a thin film layer; forming a patterned hardmask layer above the thin film layer, the hardmask layer comprising laminated layers of diamond-like carbon; and implanting a material into a portion of the thin film layer that is unprotected by the patterned hardmask layer. Additional methods are disclosed.07-23-2009
20090197208METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE POLE USING AN ELECTRICAL LAPPING GUIDE FOR TIGHT WRITE POLE FLARE POINT CONTROL - A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method provides for accurate definition of a device feature such as a write pole flare point. A functional lapping guide is formed to determine when a lapping operation should be terminated to define an air bearing surface of a slider. In order to provide accurate compensation for manufacturing variations in the functional lapping guide, a dummy lapping guide is provided. An amount of variation of a front edge of the dummy lapping guide, which is defined by the same process step as a writer pole flare point, can be calculated by measuring the width (stripe height) of the dummy lapping guide based on its electrical resistance. Since the back edges of the dummy lapping guide and functional lapping guide are defined by the same manufacturing steps, the back edge of the functional lapping guide can then be determined, and used for accurately control of the writer flare point through their correlation established from the dummy lapping guide.08-06-2009
20090284867DEVICE HAVING SIDEGAP AND METHOD FOR FABRICATING SAME - A method in one approach includes forming a first layer of a nonmagnetic material over two sides of a structure, the first layer being substantially absent from above a top of the structure; depositing an overlayer of an etchable, nonmagnetic material over the first layer and the top of the structure; and etching the overlayer for substantially removing the overlayer from above the top of the structure, wherein a substantial portion of the overlayer remains along the two sides of the structure after the etching. Additional systems and methods are also presented.11-19-2009
20100062177METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD HAVING A SLANTED WRITE POLE - A method for manufacturing a write head having write pole with a tapered upper surface to improve the channeling of magnetic flux to a pole tip of the write pole. The method includes depositing a first layer of magnetic material over a substrate. A CMP stop layer, image transfer layer and mask structure are deposited over the first magnetic layer, the mask structure being formed with an edge located a desired distance from an air bearing surface plane. An ion milling operation is performed to remove portions of the magnetic layer that are not protected by the mask structure, the ion milling being performed in a manner to form a tapered surface on the first magnetic layer. Then, a second magnetic layer is deposited over the first magnetic layer to form a tapered magnetic write pole.03-11-2010
20100155232METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE TRAILING EDGE TAPER - A method for manufacturing a magnetic write head for perpendicular magnetic data recording, having a write pole with a tapered trailing edge for improved write field at small bit lengths. The trailing edge taper is formed by a deposition process that can be performed after the write pole flare point has already been formed, and especially after a wrap around shield side gap has been formed. This advantageously allows the distance between the write pole flare point and the trailing edge taper to be closely controlled.06-24-2010
20100155363METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A TRAILING EDGE TAPER USING A RIEABLE HARD MASK - A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.06-24-2010
20100155364MAGNETIC WRITE HEAD HAVING A STEPPED TRAILING SHIELD AND WRITE POLE WITH A SLOPED TRAILING EDGE - A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge.06-24-2010
20100155367METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A HARD MASK DEFINED WRITE POLE TRAILING EDGE STEP - A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.06-24-2010
20100157472MAGNETIC WRITE HEAD HAVING A SELF-ALIGNED SIDE WRAP-AROUND SHIELD WITH MULTI-ANGLE SLANTED BUMP - A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.06-24-2010
20100157474METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF - A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.06-24-2010
20100157475STEPPED MAIN POLE FOR PERPENDICULAR WRITE HEADS IN HARD DISK DRIVES AND METHOD OF MAKING SAME - A stepped main pole for a perpendicular write head and methods of making the stepped main pole. The stepped main pole has a main pole tip and a base portion. The main pole tip has a surface that forms part of the ABS and a first thickness. The base portion extends from the main pole tip and has a thickness that varies from the first thickness to a second thickness to form a slanted surface with an apex angle adjacent the main pole tip. By placing the base portion away from the ABS and providing a thickness that increases in a direction away from the ABS, the stepped pole can provide the necessary magnetic flux for writing, while avoiding undesired leakage and fringing. To form embodiments of the stepped main pole of the invention, a fluorine-based reactive ion etch (RIE) may be used. By using an RIE to define the stepped main pole, the apex angle can be better controlled and tight edge control can be achieved.06-24-2010
20100163422ASSISTED DEPOSITION, NARROW TRENCH DAMASCENE PROCESS FOR MANUFACTURING A WRITE POLE OF A MAGNETIC WRITE HEAD - A method for forming a magnetic write head using a damascene process that does not form voids in the magnetic structure. An opening is formed in an alumina layer, the opening being configured to define a trench. Then a first layer of magnetic material is deposited into the trench. A CMP process is then performed to remove any voids that have formed in the first magnetic layer. Then a second layer of magnetic material is deposited over the first layer of magnetic material. In another embodiment of the invention, a opening is formed in the alumina layer, and a first layer of magnetic material is electroplated into the opening. A thin layer of non-magnetic material is then deposited, and a second layer of magnetic material is deposited over the thin layer of non-magnetic material. The thin layer of alumina advantageously provides a laminate structure that avoids data erasure.07-01-2010
20100163522METHOD FOR MANUFACTURING A WRITE POLE OF A MAGNETIC WRITE HEAD FOR MAGNETIC DATA RECORDING - A method for manufacturing a magnetic write head. The write head is constructed by a method that includes depositing a magnetic write pole material and then depositing a hard mask over the magnetic material. An inorganic image transfer layer is formed over the hard mask. SiC, alumina, SiO07-01-2010
20110075295SLANTED BUMP DESIGN FOR MAGNETIC SHIELDS IN PERPENDICULAR WRITE HEADS AND METHOD OF MAKING SAME - Embodiments provide a slanted bump magnetic shield in a perpendicular write head and a method of making the shield. The slanted bump magnetic shield provides a small throat height to maximize magnetic flux for writing to a magnetic media such as a magnetic storage disk in a hard disk drive, while avoiding saturation. An etch process is used to form a taper in non-magnetic gap material. The magnetic shield is then deposited on the taper, forming the slanted bump of the shield. The etch process may be a multiple etch process to provide better edge and thickness control when forming the taper.03-31-2011
20110120878METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD HAVING A TAPERED WRITE POLE AND NON-MAGNETIC BUMP STRUCTURE - A method for manufacturing a magnetic write head having a write pole and a trailing wrap around magnetic shield, and having a non-magnetic step layer and a non-magnetic bump to provide additional spacing between the write pole and the trailing wrap around shield at a location removed from the air bearing surface. A magnetic write pole material is deposited on a substrate and a non-magnetic step layer is deposited over the write pole. A reactive ion milling can he used to pattern the non-magnetic step layer to have a front edge that is located a desired distance from an air hearing surface. A patterning and ion milling process is then performed to define a write pole, and then a layer of alumina is deposited and ion milled to from a tapered, non-magnetic bump at the front the non-magnetic step layer.05-26-2011
20110132869MAGNETIC WRITE HEAD MANUFACTURED BY DAMASCENE PROCESS PRODUCING A TAPERED WRITE POLE WITH A NON-MAGNETIC STEP AND NON-MAGNETIC BUMP - A method for manufacturing a magnetic write head having a non-magnetic step layer, non-magnetic bump at the front of the non-magnetic step layer and a write pole with a tapered trailing edge. The tapered portion of the trailing edge of the write pole is formed by a two step process that allows the write pole taper to be formed with greater accuracy and repeatability than would be possible using a single step taper process. An alternative method is also described on how to make a non-magnetic bump structure with adjustable bump throat height prior to Damascene side shield gap formation in a Damascene wrap around shield head.06-09-2011
20110134569PMR WRITER AND METHOD OF FABRICATION - Methods for fabrication of tapered magnetic poles with a non-magnetic front bump layer. A magnetic pole may have a plurality of tapered surfaces at or near and air bearing surface (ABS), wherein a thickness of the write pole increases in a direction away from the ABS. A non-magnetic front bump layer may be formed on one or more of the tapered surfaces of the magnetic pole at a distance from the ABS. The front bump layer may increase the separation distance between a shield layer and the magnetic pole near the tapered surface, thereby improving the performance of the write head.06-09-2011
20110135962PMR WRITER AND METHOD OF FABRICATION - Methods for fabrication of tapered magnetic poles with a non-magnetic front bump layer. A magnetic pole may have a tapered surface at or near and air bearing surface (ABS), wherein a thickness of the write pole increases in a direction away from the ABS. A non-magnetic front bump layer may be formed on the tapered surface of the magnetic pole and away from the ABS. The front bump layer may increase the separation distance between a shield layer and the magnetic pole near the tapered surface, thereby improving the performance of the write head.06-09-2011
20110146062METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRAP AROUND SHIELD THAT IS MAGNETICALLY COUPLED WITH A LEADING MAGNETIC SHIELD - A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.06-23-2011
20110147222METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD HAVING A TAPERED WRITE POLE AND A STEPPED WRAP AROUND SIDE SHIELD GAP - A method for manufacturing a magnetic write head that has a trailing magnetic shield with a tapered write pole trailing edge, a non-magnetic step layer and a Ru bump and an alumina bump formed at the front of the non-magnetic step layer. The process forms a Ru/alumina side wall at the sides of the write pole, such that the Ru side wall is closest to the write pole. The Ru is removed more readily than the alumina during the ion milling that is performed to taper the write pole. This causes the Ru portion of the side wall to taper away from the write pole rather than forming an abrupt step. This tapering prevents dishing of the trailing edge of the write pole for improved write head performance.06-23-2011
20110151279MAGNETIC WRITE HEAD MANUFACTURED BY AN ENHANCED DAMASCENE PROCESS PRODUCING A TAPERED WRITE POLE WITH A NON-MAGNETIC SPACER AND NON-MAGNETIC BUMP - A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.06-23-2011
20110212388ADVANCED PHASE SHIFT LITHOGRAPHY AND ATTENUATED PHASE SHIFT MASK FOR NARROW TRACK WIDTH D WRITE POLE DEFINITION - A method for patterning a wafer using a phase shifting photolithography that can produce a critical symmetrical 2-dimensional structure such as a magnetic write pole of a magnetic write head. In one aspect of the invention, a photolithographic mask has an opaque portion with narrow, transparent phase shifting regions at either side of the opaque portion. A non-phase shifted region extends beyond the narrow phase shifted portion at either side of the structure. The phase shifted regions are symmetrical about the opaque region so that the image produced on the wafer is completely symmetrical. In another aspect of the invention, a phase shifted region in formed in a transparent medium with non-phase shifted regions at either side of the phase shifted region. The transition between the phase shifted region and non-phase shifted region alone defines a pattern on the wafer, without the need for an opaque structure on the mask.09-01-2011
20110233167METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD HAVING A TAPERED WRITE POLE - A method for manufacturing a magnetic write head having a write pole with a tapered leading edge and a tapered trailing edge. The method includes forming a non-magnetic bump player over a surface, forming a mask over the non-magnetic bump layer and performing a first ion milling to form a tapered back edge on the non-magnetic bump layer. A magnetic write pole material is then deposited over the surface and over the non-magnetic bump layer. Then a non-magnetic step structure is formed over the magnetic write pole material and an ion milling is performed to form a taper on the upper surface of the write pole. The write pole lateral dimensions can then be defined, and a non-magnetic bump formed over the tapered portion of the upper surface of the write pole. Another ion milling can then be performed to extend the taper of the surface of the write pole.09-29-2011
20110261485MAGNETIC WRITE HEAD HAVING A WRAP AROUND TRAILING SHIELD WITH AN ASYMETRICAL SIDE GAP - A magnetic write head having a magnetic write pole with a wrap around magnetic trailing shield. The wrap around magnetic trailing shield is separated by a first non-magnetic side gap at a first side of the write pole and by a second non-magnetic side gap at a second side of the write pole. The first second non-magnetic side gap is larger than the first non-magnetic side gap and is preferably at least twice the thickness of the first non-magnetic side gap. This design provides additional protection adjacent track interference at one side of the write pole and additional protection against magnetic write field loss at the other side of the write pole.10-27-2011
20110262774METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRAP AROUND TRAILING MAGNETIC SHIELD WITH A TAPERED SIDE GAP - A magnetic write head having write pole and a wrap-around-trailing magnetic shield having side portions that are separated from the write pole by tapered non-magnetic side gap layers. The tapered non-magnetic side gap layers provide a non-magnetic side gap width that increases with increasing distance from the ABS, thereby providing optimal protection against adjacent track interference at the ABS while minimizing write field loss to the shield in regions away from the ABS.10-27-2011
20120107645METHOD FOR MANUFACTURING A SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD - A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.05-03-2012
20120125883METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE USING A MULTI-LAYERED HARD MASK STRUCTURE - A method for manufacturing a magnetic write pole using a mask that includes a multi-layer hard mask. The multi-layer hard mask hard mask includes a first hard mask layer that is constructed of a Si containing material that can be spun on and a second hard mask material that is deposited by a deposition process such as sputter deposition. The first hard mask layer has optical properties that allow it to function well as a bottom anti-reflective coating (BARC) and also has optical properties that match well with an underlying image transfer layer. The second hard mask material has good selectivity for reactive ion etching so that it functions well as a RIE hard mask.05-24-2012
20120154951METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE POLE HAVING A WRITE POLE AND TRAILING SHIELD WITH A TAPERED TRAILING GAP - A method for manufacturing a magnetic write head having a that has a write pole with a tapered trailing edge in a pole tip region, and a trailing shield that has a leading edge that tapers away from the write pole at an angle that is greater than that taper angle of the trailing edge of the write pole. The magnetic head has a step feature with a front edge that is recessed from the ABS. In one embodiment a magnetic wedge is formed over the tapered surface of the write pole. In another embodiment, a non-magnetic bump is formed over a first tapered portion of the write pole adjacent to the front edge of the step feature, and a non-magnetic wedge is formed over a second tapered portion of the write pole and extends from the non-magnetic bump to the air bearing surface.06-21-2012
20130019467METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE HAVING STRAIGHT SIDE WALLS AND A WELL DEFINED TRACK-WIDTH - A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.01-24-2013
20130020204MAGNETIC WRITE HEAD HAVING AN ELECTROPLATED WRITE POLE WITH A LEADING EDGE TAPER - A method for manufacturing a magnetic write head having a tapered leading edge. The method includes depositing a sacrificial non-magnetic layer to a thickness that is at least as great as the thickness of the write pole to be formed. The sacrificial non-magnetic layer is then masked and ion milled so as to form a tapered edge on the sacrificial non-magnetic layer that extends through the thickness of the non-magnetic fill layer. A magnetic material is then deposited and planarized by chemical mechanical polishing. The remaining magnetic material forms the entirety of the magnetic write pole so that there is no need to deposit additional magnetic layers further construct the write pole.01-24-2013
20130022840METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD WITH A FLOATING LEADING SHIELD - A method for manufacturing a magnetic write head having a write pole with a tapered leading edge formed on a substrate having a tapered surface and a wrap-around, trailing magnetic shield. The method uses a multi-layer anti-reflective coating prior to formation of the shield so that reflection from the tapered surface of the substrate does not affect the lithography of the mask used to form the trailing shield. The multi-layer antireflective coating is constructed of materials that can be left in the finished head, thereby eliminating problems associated with removal of the anti-reflective coating.01-24-2013
20130081263METHOD FOR MANUFACTURING A MAGNETIC WRITE POLE OF A PERPENDICULAR MAGNETIC WRITE HEAD USING NOVEL MASK FABRICATION - A method for manufacturing a magnetic write pole of a magnetic write head for perpendicular magnetic recording. A magnetic write pole material is deposited, followed by union milling hard mask, a polymer mask under-layer followed by a dielectric hard mask material, followed by a photoresist. The photoresist is patterned to define a write pole shape and the shape of the patterned photoresist is transferred onto the underlying dielectric hard mask by a novel reactive ion etching that is performed in a chemistry that includes one or more fluorine containing gases and He. The presence of He in the reactive ion etching tool helps to improve the profile of the patterned dielectric hard mask. In addition, RIE parameters such a gas ratio (e.g. CF4 to CHF3 gas ratio) and power ratio (e.g. source power to bias power) are adjusted to optimize the profile of the patterned dielectric mask.04-04-2013
20130082027METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD USING NOVEL REACTIVE ION ETCHING CHEMISTRY - A method for manufacturing a magnetic write head for magnetic data recording. The method includes forming a depositing a magnetic write pole material and forming a mask structure over the write pole material that includes a polymer mask under-layer, a dielectric hard mask formed over the polymer mask under-layer and a photoresist mask formed over the dielectric hard mask. The image of the photoresist mask is transferred onto the underlying dielectric hard mask and then a reactive ion etching is performed to transfer the image of the dielectric hard mask onto the polymer mask under-layer. This reactive ion etching is performed in an atmosphere chemistry that includes both an oxygen containing gas and a nitrogen containing gas.04-04-2013
20130104388NOVEL HIGH BEVEL ANGLE MAGNETIC WRITER POLE FABRICATION PROCESS05-02-2013
20130284693DIFFERENTIATED LIFTOFF PROCESS FOR ULTRA-SHALLOW MASK DEFINED NARROW TRACKWIDTH MAGNETIC SENSOR - A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process variations across a wafer. The process involves depositing a plurality of sensor layers and forming a first mask structure. The first mask structure has a relatively large opening that encompasses a sensor area and an area adjacent to the sensor area where a hard bias structure can be deposited. A second mask structure is formed over the first mask structure and includes a first portion that is configured to define a sensor dimension and a second portion that is over the first mask structure in the field area.10-31-2013
20140144872METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD USING NOVEL MASK STRUCTURE - A method for manufacturing a magnetic write pole of a magnetic write head that achieves improved write pole definition reduced manufacturing cost and improves ease of photoresist mask re-work. The method includes the use of a novel bi-layer hard mask beneath a photoresist mask. The bi-layer mask includes a layer of silicon dielectric, and a layer of carbon over the layer of silicon dielectric. The carbon layer acts as an anti-reflective coating layer that is unaffected by the photolithographic patterning process used to pattern the write pole and also acts as an adhesion layer for resist patterning. In the event that the photoresist patterning is not within specs and a mask re-work must be performed, the bi-layer mask can remain intact and need not be removed and re-deposited. In addition, the low cost and ease of use silicon dielectric and carbon reduce manufacturing cost and increase throughput.05-29-2014
20140168823MAGNETIC WRITE HEAD HAVING A RESIDUAL SHIELD SEED LAYER FOR REDUCING OVERWRITING - A magnetic write head having a write pole and a trailing, wrap-around magnetic shield formed over the write pole and separated from the write pole by a non-magnetic trailing gap layer and non-magnetic side gap layers. The write head includes a remnant magnetic seed layer, that while being used to facilitate electroplating of the magnetic shield, is left intentionally extending beyond the back edge of the magnetic shield. This extended portion of the magnetic seed layer acts as a shunt for magnetic flux and prevents data erasure due to over-writing.06-19-2014
20140170774METHOD FOR MANUFACTURING A MAGNETORESISTIVE SENSOR - A method for manufacturing a magnetic sensor that allows the sensor to be constructed with a very narrow track width and with smooth, well defined side walls. A tri-layer mask structure is deposited over a series of sensor layers. The tri-layer mask structure includes an under-layer, a Si containing hard mask deposited over the under-layer and a photoresist layer deposited over the Si containing hard mask. The photoresist layer is photolithographically patterned to define a photoresist mask. A first reactive ion etching is performed to transfer the image of the photoresist mask onto the Si containing hard mask. The first reactive ion etching is performed in a chemistry that includes CF06-19-2014
20140268420MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A CONSTANT FLARE ANGLE AND MULTIPLE YOKE ANGLES - A magnetic write head having a write pole with a novel configuration improving write field strength and field gradient while also reducing adjacent track interference and far track interference. The write pole is configured with a pole tip portion that has a narrow track width, preferably 15-30 degrees and a main yoke portion with a larger flare angle of about 45 degrees. The write pole also has an intermediate portion located between the pole tip and main pole portions. The intermediate portion includes a first portion adjacent to the pole tip that has a flare angle greater than the flare angle of the main yoke and has a second portion with a flare angle less than the flare angle of the yoke.09-18-2014
20140313614MAGNETIC WRITE HEAD HAVING A STACKED COIL ARCHITECTURE FOR HIGH DATA RATE PERFORMANCE - Approaches for a magnetic write head having a stacked coil architecture. Embodiments utilize the better process control capability available with thin films' thicknesses, compared to the control capability of vertical gap-filling processes, which provides for better scalability to shorter yoke length magnetic write heads, which are faster at writing data bits than are magnetic write heads having a longer yoke length.10-23-2014
20140353276SUPER SHALLOW LAMINATED HARD MASK STENCIL FOR MAGNETIC READ SENSOR FABRICATION - The present invention generally relates to methods for forming a sensor structure utilizing a shallow and narrow hard mask stencil. In one embodiment, a sensor structure is formed by utilizing a four-layered hard mask stencil. The four-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first hard mask, a third mask layer disposed over the second mask layer, and a forth mask layer disposed over the third mask layer. In another embodiment, a sensor structure is formed by utilizing a three-layered hard mask stencil. The three-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first mask layer, and a third mask layer disposed over the second mask layer. The sensor structure is formed with a two-step chemical mechanical planarization (CMP) process.12-04-2014
20150036244SYSTEM AND METHOD OF FORMING SPACER STRUCTURES USING ULTRA NARROW MAGNETIC HEAD FABRICATION - A magnetic head, according to one embodiment, includes a sensor structure extending from an air bearing surface end thereof in a stripe height direction, the sensor structure having sidewalls on opposite sides thereof, the sidewalls extending between a top and a bottom of the sensor structure, the sidewalls extending in the stripe height direction, wherein a spacing between the sidewalls in a track width direction along the top of the sensor structure is about constant therealong in the stripe height direction.02-05-2015

Patent applications by Yi Zheng, San Ramon, CA US

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