Yashima, JP
Ayako Yashima, Osaka JP
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20140320907 | IMAGE PROCESSING APPARATUS - The preview unit displays on a display a preview image of image data in the image data retaining unit. The position receiving unit receives a position that user designates on the preview image displayed on the display. The selection receiving unit receives a user selection of additional information retained in the additional information retaining unit. The information imparting unit imparts the additional information received by the selection receiving unit to the position received by the position receiving unit. The image processing unit extracts a page imparted with the additional information from the image data in the image data retaining unit, and executes the processing associated with the additional information. | 10-30-2014 |
20150062630 | INFORMATION PROCESSING APPARATUS, PRINTING APPARATUS, PRINTING SYSTEM, AND COMPUTER-READABLE NON-TRANSITORY STORAGE MEDIUM - An information processing apparatus includes print condition receiving portion, save information holding portion, save information re-setting portion, print data generating portion. Save information holding portion temporarily holds a set value of a predetermined setting item among setting items of print conditions that have already been received via print condition receiving portion. Save information re-setting portion, after print condition receiving portion restarts the input of the print conditions, reads out the set value held by save information holding portion and set the set value in a corresponding setting item of the print conditions. Print data generating portion, after a print execution instruction is input via print condition receiving portion, generates print data in accordance with the print conditions received by print condition receiving portion. The print data generated by print data generating portion is printed by an image forming portion of a printing apparatus. | 03-05-2015 |
Daisuke Yashima, Tachikawa-Shi JP
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20100011180 | INFORMATION PROCESSING APPARTAUS, CONTENT CONTROL METHOD, AND STORAGE MEDIUM - According to one embodiment, a storage medium configured to be connectable to apparatuses for processing an encrypted content, the medium stores a content key of the encrypted content, and a copy control list includes information indicating one of the apparatuses which is a copying destination of the encrypted content. | 01-14-2010 |
Eiji Yashima, Nagoya-Shi JP
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20110144262 | SYNTHETIC POLYMERS CONTROLLED IN SPIRAL STRUCTURE, HOST-GUEST COMPOUNDS PREPARED BY USING THE SAME, AND PROCESSES FOR PRODUCTION OF BOTH - The invention provides a process for producing spiral polymers controlled in the direction of spiral winding easily from inexpensive general-purpose polymers; and spiral polymers controlled in the direction of spiral winding. The invention relates to a process for the production of syndiotactic polymethacrylate- or polyacrylate-type spiral polymers controlled in the direction of spiral winding which comprises dissolving a syndiotactic polymethacrylate- or polyacrylate-type polymer and a chiral compound in a solvent preferably under heating, subjecting the obtained solution to cooling or concentration to form a solid matter, and separating the solid matter; and so on. | 06-16-2011 |
20120149851 | SEPARATING AGENT FOR OPTICAL ISOMERS - To provide a novel separating agent for optical isomers based on a polymer having an optically active moiety, provided is a separating agent for optical isomers formed of: a helical polymer obtained by using an aromatic isonitrile as a monomer having an amide group in which an optically active amino acid is amide-bonded to an aromatic ring; and a carrier for carrying the helical polymer by being chemically bonded to an end of the helical polymer. | 06-14-2012 |
Eiji Yashima, Aichi JP
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20090030227 | Polyisocyanide Derivative Having Controlled Helical Main Chain Structure - The object is to provide: a method for producing a polymer having a stable right-handed or left-handed helical structure from a single type of monomer in a per-selective manner and controlling the proportion between a polymer having the right-handed helical structure and a polymer having the left-handed helical structure; and a polymeric material which can be used for the formation of any of the right-handed and left-handed helical structures. Thus, disclosed are: a method for production of a polyisocyanide derivative having a stable helical main chain structure with a right-handed or left-handed helix or a mixture thereof from a single type of monomer by polymerizing an aromatic isocyanate having a substituent harboring a structure —CONH in the aromatic ring and a hydrophobic moiety having 6 or more carbon atoms in a polymerization solvent, wherein the direction of the helix depends on the polarity of the polymerization solvent; a poly(aromatic isocyanide) derivative produced by the method; and an aromatic isocyanide which is useful as a monomer for use in the production of the poly(aromatic isocyanide) derivative. | 01-29-2009 |
20120007011 | Separating agent for optical isomer - Disclosed is a separating agent for optical isomer which is excellent in optical separation ability. Specifically disclosed is a separating agent for optical isomer comprising: an inclusion complex including a π-conjugated polymer in a polymer compound having a hydroxy group or an amino group; and a carrier, the inclusion complex being carried by the carrier. | 01-12-2012 |
Hiroshi Yashima, Kawasaki-Shi JP
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20150130987 | IMAGE CAPTURING APPARATUS, METHOD OF CONTROLLING THE SAME, AND STORAGE MEDIUM - An image capturing apparatus comprises an imaging unit, a sensor unit, a first focus detection unit configured to detect a first in-focus position based on a pair of image signals, a second focus detection unit configured to detect a second in-focus position based on a signal output from the imaging unit, a control unit configured to control a position of the focus lens and control display indicating the focus detection areas, and a correction unit configured to acquire a correction amount for correcting the first in-focus position, wherein the correction unit determines a first focus detection area from which the correction amount is to be acquired while the focus lens is moved to the second in-focus position, and wherein the control unit controls the first focus detection area to be identifiable. | 05-14-2015 |
Hiroyuki Yashima, Itoigawa-City JP
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20140011936 | POLYCHLOROPRENE LATEX, RUBBER COMPOSITION AND DIP-MOLDED ARTICLE - Provided is a polychloroprene latex that shows favorable low-temperature stability without deterioration in the rubber agglutinating property during production of the dip-molded article, a rubber composition, and a dip-molded article, prepared by using the same. | 01-09-2014 |
Hiroyuki Yashima, Niigata JP
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20120022196 | POLYCHLOROPRENE ELASTOMER COMPOSITION, AND PRODUCTION METHOD- AND THE VULCANIZATE AND MOLDED ARTICLES THEREOF - Provided is a polychloroprene elastomer composition superior in extrusion processability and mechanical properties, a production method thereof, and vulcanized and molded articles thereof. | 01-26-2012 |
Isamu Yashima, Saitama JP
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20090246556 | DEHUMIDIFYING DEOXIDIZER - A dehumidifying deoxidizer containing oxygen-deficient cerium oxide and a dehumidifier is provided. The oxygen-deficient cerium oxide is preferably doped with an element increasing the oxygen absorption of the cerium oxide. The oxygen absorption sites of the cerium oxide are preferably obstructed by a site obstructing factor. The cerium oxide preferably has a fluorite type superlattice structure. Also provided are a dehumidifying and deoxidizing packet having the dehumidifying deoxidizer sealed in a bag-shaped, gas permeable casing and a dehumidifying and deoxidizing resin composition containing the dehumidifying deoxidizer and a gas permeable resin. | 10-01-2009 |
20100267545 | NIOBIUM MONOXIDE - An object of the present invention is to provide a niobium monoxide able to realize large capacitance in a miniature sized capacitor. The invention relates to a niobium monoxide having a porous structure comprising particles, characterized in that the niobium monoxide has a full-width at half maximum of an X-ray diffraction peak corresponding to a (111) plane or an X-ray diffraction peak corresponding to a (200) plane of 0.21° to 1.0°. The niobium monoxide has a large specific surface area and porosity, and is especially suitable for use in a capacitor. | 10-21-2010 |
20110076202 | PARTICULATE COMBUSTION CATALYST, PARTICULATE FILTER AND EXHAUST GAS PURIFYING APPARATUS - Provided is a particulate combustion catalyst including a carrier formed of monoclinic zirconium oxide particles, and metallic Ag or Ag oxide, which serves as a catalyst component and is supported on the carrier, wherein the amount of the catalyst component is 0.5 to 10 mass %, as reduced to metallic Ag, on the basis of the mass of the carrier, and preferably, the catalyst has a BET specific surface area of 8 to 21 m | 03-31-2011 |
20110086757 | DEOXIDIZER - A deoxidizer includes a porous body of fluorite-type cerium oxide represented by CeO | 04-14-2011 |
20120085979 | TIN OXIDE PARTICLES AND PROCESS FOR PRODUCING THE SAME - A tin oxide particle having at least two diffraction peaks at 2θ (deg) of 9±1° and 28±1° in XRD measurement by Cu/Kα radiation. The tin oxide particle preferably shows diffraction peaks at 2θ (deg) of 19±1°, 48±1°, and 59±1°. The tin oxide particle preferably has electroconductivity. The tin oxide particle is preferably produced by mixing an aqueous solution containing tin (II) and a hydroxyl-containing organic compound in a heated condition with an alkali. | 04-12-2012 |
20130202521 | MANGANESE OXIDE PARTICLES AND PROCESS FOR PRODUCING SAME - A manganese oxide particle having a hexagonal crystal structure or an analogous hexagonal crystal structure with an a-axis length of 8.73±1 Å and a c-axis length of 14.86±1 Å. The manganese oxide particle is preferably produced by a process including mixing an aqueous solution containing manganese (II) and an organic compound having a hydroxyl group while in a heated state with an alkali. | 08-08-2013 |
20130256607 | TIN OXIDE PARTICLES AND METHOD FOR PRODUCING SAME - A tin oxide particle having a structure characterized by peaks in Raman spectroscopy at at least 37±9 cm | 10-03-2013 |
20130344336 | CHLORINE-DOPED TIN-OXIDE PARTICLES AND MANUFACTURING METHOD THEREFOR - A chlorine-doped tin oxide particle exhibits peaks at at least 108±5 cm | 12-26-2013 |
20140004026 | METHOD FOR COMBUSTING DIESEL EXHAUST GAS | 01-02-2014 |
20140093734 | FLUORINE-DOPED TIN-OXIDE PARTICLES AND MANUFACTURING METHOD THEREFOR - Fluorine-doped tin oxide particles having a structure characterized by peaks at at least 123±5 cm | 04-03-2014 |
Jun Yashima, Kanagawa JP
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20090200488 | CHARGED PARTICLE BEAM WRITING APPARATUS, AND APPARATUS AND METHOD FOR CORRECTING DIMENSION ERROR OF PATTERN - A charged particle beam writing apparatus includes a first area density calculation unit configured to calculate a first area density occupied by a pattern of a first dimension in a predetermined region, a first dimension error calculation unit configured to calculate a first dimension error caused by a loading effect, using the first area density, a first dimension calculation unit configured to calculate a second dimension of a pattern obtained by correcting the first dimension error of the first dimension, a second area density calculation unit configured to calculate a second area density occupied by the pattern of the second dimension in the predetermined region, a second dimension error calculation unit configured to calculate a second dimension error caused by the loading effect, using the second area density, a second dimension calculation unit configured to calculate a third dimension by adding the second dimension error to the second dimension, a judgment unit configured to judge whether a difference between the first dimension and the third dimension is within a predetermined range or not, and a writing unit configured to write the pattern of the second dimension in which the difference is within the predetermined range, onto a target workpiece by using a charged particle beam. | 08-13-2009 |
20100015537 | BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS - A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object. | 01-21-2010 |
20100072390 | CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD - The present invention provides a charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput. | 03-25-2010 |
20100173235 | METHOD AND APPARATUS FOR WRITING - A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose. | 07-08-2010 |
20100237253 | CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS - A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through. | 09-23-2010 |
20110012031 | CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS - A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame. | 01-20-2011 |
20110046762 | CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS OF PROCESSING DATA FOR CHARGED PARTICLE BEAM WRITING - There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A charged particle beam writing apparatus includes: a data storage unit to which layout data defining a plurality of figure patterns in a chip region is input and which stores the layout data; a dividing unit configured to divide the chip region into a plurality of process regions; a shot data generating unit configured to perform distributed processing on pattern data in the process regions using a plurality of computing processors so as to convert the pattern data to shot data for shooting a charged particle beam onto a target object; a determining and instructing unit configured to compare an amount of output data from each of the computing processors with a predetermined threshold, and when the amount of the output data is larger than the threshold, instruct corresponding one of the computing processors to divide corresponding one of the process regions and continue the data processing; and a writing unit configured to write on the target object using the shot data. | 02-24-2011 |
20110291029 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF - In a charged particle beam drawing apparatus, if at least one of calculating portions is free and at least one memory includes a free portion, a report that a next process can be additionally started by using at least one free calculating portion and the free portion of the memory, is transferred from a daemon to a writing control unit, and the next process is additionally started by the daemon on the basis of a start request transferred from the writing control unit to the daemon. If there is a possibility of a shortage of the calculating portions and the memory, and if a start request for starting a next process is transferred from the writing control unit to the daemon, the start request for starting the next process is refused by the daemon. | 12-01-2011 |
20120001097 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF - A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect correction dose is obtained, wherein a proximity effect correction dose is incorporated in the predetermined dose, and the fogging effect correction dose is not incorporated in the predetermined dose, then, the charged particle beam drawing apparatus applies a predetermined dose of the charged particle beam for drawing the patterns which overlap the patterns drawn before the result of calculation of the fogging effect correction dose is obtained, in the whole of the drawing area of the workpiece, after the calculation of the fogging effect correction dose, wherein the proximity effect correction dose and the fogging effect correction dose are incorporated in the predetermined dose. | 01-05-2012 |
20120036486 | METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD - A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing. | 02-09-2012 |
20120068089 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a unit calculating a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having different deflection sizes respectively deflected by deflectors of a plurality of levels for deflecting charged particle beams, a unit calculating a representative temperature of the each minimum deflection region based on heat transfer from other minimum deflection regions having been written before the each minimum deflection region is written, a unit inputting a first dose of a shot of each charged particle beam irradiating the each minimum deflection region, and modulating the first dose by using the representative temperature of the each minimum deflection region, and a unit including the deflectors of a plurality of levels and writing a pattern in the each minimum deflection region with a second dose, which has been modulated, by using the deflectors of a plurality of levels. | 03-22-2012 |
20120104286 | METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD - A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing. | 05-03-2012 |
20120108063 | BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS - A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object. | 05-03-2012 |
20120126145 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam. | 05-24-2012 |
20120292536 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated. | 11-22-2012 |
20120292537 | CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF SAME - A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height. | 11-22-2012 |
20130099139 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function, a unit to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient, a unit to calculate a proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient, a unit to calculate a dose by using the proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient, and a unit to write a figure pattern concerned on a target object, based on the dose. | 04-25-2013 |
20130256519 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A apparatus according to an embodiment includes a unit to generate first blocks in a writing region in which at least one of writing groups respectively using different base doses is to be written, a unit to generate second blocks for proximity effect correction, in the each of the regions of the groups, a unit to calculate an area density in each of the first blocks, a unit to perform a weighting calculation on the area density for each of the first blocks by using a base dose of a corresponding group, a unit to calculate a dose coefficient for proximity effect correction, for each of the second blocks, by using a corresponding weighted area density, and a unit to calculate a dose by using the base dose of the each of the groups and the dose coefficient of the each of the second blocks. | 10-03-2013 |
20140017349 | CHARGED PARTICLE BEAM WRITING APPARATUS AND IRRADIATION TIME APPORTIONMENT METHOD OF CHARGED PARTICLE BEAMS FOR MULTIPLE WRITING - A beam writing apparatus includes a unit to obtain a specific value by calculating an integer by dividing a total irradiation time by a multiplied value of a region number and a repeating times number, and by multiplying the integer by the repeating times number, to add the repeating times number to the specific value when a region is in the multiple writing unit regions and is not a specific region and when a region number of the multiple writing unit region, defined excluding the specific region, is below or equal to a value obtained by dividing the total irradiation time by the multiplied value of the region number and the repeating times number, to obtain a first remainder, and dividing the first remainder by the repeating times number, and to treat an added value of the repeating times number and the specific value, as a total irradiation time. | 01-16-2014 |
20140237196 | CHARGED PARTICLE BEAM WRITING APPARATUS, AND BUFFER MEMORY DATA STORAGE METHOD - A charged particle beam writing apparatus includes a buffer memory including a memory region capable of contemporarily storing writing data for data processing regions, wherein writing data including data files is temporarily stored for each of the data processing regions, a dividing unit to divide the memory region of the buffer memory into a first region being large and a second region being small, a specifying unit to specify the memory region such that a data file being large is preferentially stored in the first region and a data file being small is stored at least in the second region, concerning the data files for each of the data processing regions included in the writing data, and a data processing unit to read data files corresponding to each of the data processing regions from the buffer memory, and to perform data processing using the read data files. | 08-21-2014 |
20150014549 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD - A charged particle beam writing apparatus includes first and second transmission units to perform first and second transmission processing, where, in the first transmission processing, while one of the units performs data transmission processing, the other unit inputs processing data for N processing regions more than pre-set, data-converted, n processing regions, and while one of the units performs data input processing, the other transmits processing data for (N-n) processing regions in order, and in the second transmission processing, processing data for remaining n processing regions are transmitted in order after the first transmission processing, where one of the units starts inputting the processing data while the other performs the first transmission processing, and does not input processing data for a new processing region after starting the second transmission processing. | 01-15-2015 |
20150060690 | CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM WRITING METHOD - Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type. | 03-05-2015 |
Katsunori Yashima, Shibukawa-City JP
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20130056439 | METHOD OF MANUFACTURING METAL-BASE SUBSTRATE AND METHOD OF MANUFACTURING CIRCUIT BOARD - A method of manufacturing a metal-base substrate having an insulative adhesive layer and a conductor layer on a metal-based material is provided. The method includes the steps of dispersing a disperse phase in an insulative adhesive-dispersing medium that contains a wetting dispersant and constitutes the insulative adhesive layer; laminating step of laminating the insulative adhesive on the conductor foil as feeding the roll-shaped conductor foil; curing the insulative adhesive on the conductor foil under heat into a B stage state and thus forming a composite of the conductor foil and the insulative adhesive layer in the B stage state; laminating the metal-based material on the insulative adhesive layer in the B stage state to give a laminate; and then curing the insulative adhesive layer in the B stage state into a C stage state by heat pressurization of the laminate. | 03-07-2013 |
Katsunori Yashima, Gunma JP
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20090032295 | METAL BASE CIRCUIT BOARD, LED, AND LED LIGHT SOURCE UNIT - To provide a thin metal base circuit board which can be not only installed on a flat portion but also closely attached to a side or bottom surface of a case or to a stepped or curved portion and which is excellent in heat dissipation performance, electrical insulating performance and flexibility; a process for its production; and a hybrid integrated circuit, an LED module and a bright, ultra-long-life LED light source employing it. | 02-05-2009 |
20090279300 | LED LIGHT SOURCE UNIT - To provide an LED light source unit which is excellent in heat dissipation performance, able to prevent damage to LED and bright, and which has a long life. | 11-12-2009 |
20100027261 | LED LIGHT SOURCE UNIT - To provide an LED light source unit which is excellent in heat dissipation performance, able to prevent damage to LED and bright, and which has a long life. | 02-04-2010 |
Kiyotaka Yashima, Miyagi JP
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20100047947 | Semiconductor light-emitting element, fabrication method thereof, convex part formed on backing, and convex part formation method for backing - A convex part formation method of forming a convex part in parallel with a <110> direction of a backing on the backing having a {100} face as the top surface thereof, includes: (a) forming a mask layer in parallel with the <110> direction on the backing; (b) etch the backing so as to form a convex-part upper layer whose sectional shape on a cutting plane corresponding to a {110} face is an isosceles trapezoid, the base of which is longer than the upper side thereof, and the side surface of which has an inclination of θ | 02-25-2010 |
20120122257 | SEMICONDUCTOR LIGHT-EMITTING ELEMENT, FABRICATION METHOD THEREOF, CONVEX PART FORMED ON BACKING, AND CONVEX PART FORMATION METHOD FOR BACKING - A convex part formation method of forming a convex part in parallel with a < | 05-17-2012 |
Koji Yashima, Nishitokyo JP
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20090120020 | COMPOSITE INTEGRATED MODULE - A composite integrated module, comprising a formwork; a plurality of frame members mounted on one surface of the formwork; and at least one embedded plate, to which a support member for supporting a first plant structure member is attached, mounted directly to at least one the frame member, wherein one surface, which does not mounted on the frame member, of the embedded plate faces to a direction in which another surface, which does not mounted on the frame member, of the formwork faces. | 05-14-2009 |
Mamoru Yashima, Nagoya-Shi JP
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20100115934 | Vehicle Structure in which Exhaust Heat Recovery Apparatus is Installed - An exhaust heat recovery apparatus is installed below a floor supported by both side members of a vehicle to recover heat from exhaust gas passing through an exhaust pipe of an internal combustion engine. Assistance members, which extend in the fore-and-aft direction of the vehicle, are provided between the both side members of the vehicle. The exhaust heat recovery apparatus is installed close to one of the assistance members. | 05-13-2010 |
20130127209 | Vehicle Structure In Which Exhaust Heat Recovery Apparatus Is Installed - An exhaust heat recovery apparatus ( | 05-23-2013 |
Masatomo Yashima, Kanagawa JP
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20150060743 | PEROVSKITE RELATED COMPOUND - Perovskite related compound of the present invention have layered structures in which perovskite units and A-rare earth structure units are alternately arranged. The reduced cell parameters a | 03-05-2015 |
Mieko Yashima, Kirishima JP
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20110253924 | Sliding Part, Mechanical Seal, Faucet Valve, and Rolling Support Device Each Including the Sliding Part - Provided are a sliding component, such as a mechanical seal ring, which is capable of maintaining superior sliding characteristics even in the long-term continuous use thereof, as well as a mechanical seal, a faucet valve, and a rolling support device, each of which includes the sliding component. The sliding component includes a stationary member, and a movable member contactedly sliding on the stationary member. The stationary member and the movable member are respectively composed of a silicon carbide sintered body containing graphite. The content of the graphite in one of the stationary member and the movable member is at least 4% by mass greater than in the other. Thus, the sliding component includes the stationary member and the movable member which are a combination of those having different contents of graphite. Owing to a high lubricating effect, the superior sliding characteristics can be maintained, permitting a long-term continuous sliding. | 10-20-2011 |
Mieko Yashima, Kirishima-Shi JP
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20100327204 | Sliding Member, Mechanical Seal Ring, Mechanical Seal and Faucet Valve - Provided is a sliding member which includes a plurality of open pores in a sliding surface, which each comprises one or more opening portions having a circularity of 0.24 or more and a circle equivalent diameter of 10 μm to 150 μm. A ratio of the number of open pores having the overlapping degree of 10% or more between the opening portions is 3% or less. Another sliding member includes a plurality of open pores in a sliding surface, which each comprises one or more opening portions having a circularity of 0.24 or more and a circle equivalent diameter of not less than 10 μm nor more than 78 μm. A coefficient of variation of the opening portions satisfies the following equation: 1.03≦√V/X≦1.51 where √V is a standard deviation of circle equivalent diameters, and X is an average value of the circle equivalent diameters. A mechanical seal ring, a mechanical seal and a faucet valve each using the sliding member are also provided. | 12-30-2010 |
20120321853 | SILICON CARBIDE SINTERED BODY AND SLIDING COMPONENT USING THE SAME, AND PROTECTIVE BODY - Disclosed are a silicon carbide sintered body and a sliding component using the same, and a protective body which, even when fine cracks are generated due to thermal shock or mechanical impact over prolonged use, are capable of inhibiting development of the cracks. The silicon carbide sintered body contains silicon carbide grains as a major component and has a relative density of 95% or more. On an observation surface of the silicon carbide sintered body, coarse silicon carbide grains | 12-20-2012 |
Shinji Yashima, Toyama-Shi JP
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20090255630 | Substrate processing apparatus and electrode member - Disclosed is a substrate processing apparatus, including: a reaction chamber to process a substrate; a substrate placing member to stack a plurality of substrates thereon in multi-layers at a predetermined distance from one another in the reaction chamber; an introducing section to introduce processing gas into the reaction chamber; an exhaust section to exhaust an inside of the reaction chamber; and a plurality of pairs of comb electrodes, to which alternating current electric power is to be applied, to generate plasma, the plurality of pairs of comb electrodes being disposed in the reaction chamber, wherein each pair of the plurality of pairs of comb electrodes are disposed at a predetermined distance from each of plasma processing faces of the plurality of the substrates to be placed on the substrate placing member. | 10-15-2009 |
20120108061 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A substrate processing apparatus includes a processing chamber configured to process a substrate having a front surface including a dielectric, a substrate support member provided within the processing chamber to support the substrate, a microwave supplying unit configured to supply a microwave to a front surface side of the substrate supported on the substrate support member; and a conductive substrate cooling unit which is provided at a rear surface side of the substrate supported on the substrate support member and has an opposing surface facing the rear surface of the substrate. A distance between the top of the substrate support member and the opposing surface of the substrate cooling unit corresponds to an odd multiple of ¼ wavelength of the microwave supplied when the substrate is processed. | 05-03-2012 |
20120108080 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A substrate processing apparatus includes a processing chamber configured to process a substrate, a substrate support member provided within the processing chamber to support the substrate, a microwave generator provided outside the processing chamber, a waveguide launch port configured to supply a microwave generated by the microwave generator into the processing chamber, wherein the central position of the waveguide launch port is deviated from the central position of the substrate supported on the substrate support member and the waveguide launch port faces a portion of a front surface of the substrate supported on the substrate support member, and a control unit configured to change a relative position of the substrate support member in a horizontal direction with respect to the waveguide launch port. | 05-03-2012 |
Shinji Yashima, Toyama JP
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20110234100 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A processing speed may be easily controlled over the wide range within the impedance variation range. A substrate processing apparatus includes: a processing chamber configured to process a substrate; a substrate support unit configured to support the substrate in the processing chamber; a processing gas supply unit configured to supply a processing gas into the processing chamber; a plasma generation electrode configured to convert the processing gas supplied into the processing chamber to be in a plasma state; a radio frequency power source configured to apply a radio frequency power to the plasma generation electrode; a variable impedance electrode installed at the substrate support unit and configured to control an electric potential of the substrate; a variable impedance mechanism connected to the variable impedance electrode and configured to vary an impedance according to a reciprocal of a peak-to-peak voltage of the plasma generation electrode; an exhaust unit configured to exhaust an atmosphere in the processing chamber; and a controller configured to control at least the variable impedance mechanism. | 09-29-2011 |
20120129358 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device that are capable of uniformly heating a substrate while reducing an increase in substrate temperature to reduce a thermal budget. The substrate processing apparatus includes a process chamber configured to process a substrate; a substrate support unit installed in the process chamber to support the substrate; a microwave supply unit configured to supply a microwave toward a process surface of the substrate supported by the substrate support unit, the microwave supply unit including a microwave radiating unit radiating the microwave supplied from a microwave source to the process chamber while rotating; a partition installed between the microwave supply unit and the substrate support unit; a cooling unit installed at the substrate support unit; and a control unit configured to control at least the substrate support unit, the microwave supply unit and the cooling unit. | 05-24-2012 |
20130072034 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A substrate processing apparatus includes a process chamber which processes a substrate, a conductive substrate support table which is installed within the process chamber, a dielectric plate on which the substrate is mounted, the dielectric plate being placed on the substrate support table, a microwave generator which is installed outside the process chamber, and a microwave supplying unit which supplies a microwave generated by the microwave generator into the process chamber. | 03-21-2013 |
Shun Yashima, Ebina-Shi JP
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20090250864 | RECORDING MEDIUM TRANSPORT APPARATUS AND IMAGE FORMING APPARATUS - A recording medium transport apparatus includes: plural storage units each storing a recording medium; a transport unit that transports the recording medium from one of the storage units to a recording position where an image is recorded on the recording medium; a memory that stores a reference position of a recording medium prescribed for each storage unit; a measuring unit that measures a position of the transported recording medium; and a movement unit that reads the reference position corresponding to the storage unit that stored the transported recording medium, from the memory, and moves the recording medium according to the difference between the reference position and the measured position such that the position of the recording medium approaches the reference position when the recording medium is located upstream of the recording position in the transport direction thereof. | 10-08-2009 |
20090256308 | RECORDING SHEET MOVING DEVICE, IMAGE FORMING DEVICE, AND RECORDING SHEET MOVING METHOD - A recording sheet moving device includes: a moving unit that moves a recording sheet; a recording sheet specifying unit that specifies a length in the transport direction and a weight per unit area of the recording sheet; a first memory configured to record, for each of plural recording sheets, a threshold for a length in the transport direction in association with a weight per unit area; and a movement control unit that retrieves a threshold for a length on the basis of the specified weight per unit area from the first memory, and compares the retrieved threshold for a length and the specified length, to determine whether to cause the moving unit to move the recording sheet, and if it is determined that the recording sheet should be moved, causes the moving unit to move the recording sheet. | 10-15-2009 |
20090257074 | RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE - A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied. | 10-15-2009 |
20090324305 | Image Forming Apparatus, Control Apparatus, Computer Readable Medium and Control Method - The image forming apparatus is provided with: a toner image carrying member that moves while carrying a toner image; a transferring member that transfers, on a recording medium, the toner image that the toner image carrying member carries; a transporting unit that transports the recording medium along a transport path that passes through a transfer region where the transferring member transfers the toner image onto the recording medium; and a controller that controls a movement speed of the toner image carrying member. The controller changes the movement speed of the toner image carrying member in accordance with a position, on the transport path, of the recording medium that the transporting unit transports. | 12-31-2009 |
20110116818 | IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD - An image forming apparatus includes a plurality of toner-image forming units that receive image data and form electrostatic latent images on image bearing members in accordance with the image data, and form toner images of respective colors by developing the electrostatic latent images, an intermediate transfer member onto which the toner images are transferred, a transfer unit that transfers the toner images of the respective colors onto the intermediate transfer member, a controller that performs transfer control for changing a transfer pressure applied when the transfer unit transfers the toner images onto the intermediate transfer member, and a misregistration detector that detects a difference of a transfer position of each of the toner images of the respective colors on the intermediate transfer member when the transfer control is performed by the controller. | 05-19-2011 |
Shun Yashima, Kanagawa JP
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20110122461 | IMAGE-FORMING APPARATUS - An image-forming apparatus includes: a memory that stores a plurality of image forming modes; a contact controller that controls a status of contact between a plurality of image-forming units and an intermediate transfer member on the basis of an image forming mode selected from among the plurality of image forming modes, so that an image-forming unit used for image forming represented in the selected image forming mode is contacted with the intermediate transfer member, and another image-forming unit is moved away from the intermediate transfer member; and an image-quality adjusting unit that adjusts, if the status of contact is changed by the contact controller, an image quality of an image that is to be transferred onto the intermediate transfer member from the image-forming unit that is in contact with the intermediate transfer member. | 05-26-2011 |
Taiki Yashima, Sagamihara JP
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20100103208 | INK FILLING METHOD AND INKJET PRINTER - An ink circulating unit is configured by including an ink head for spraying ink, a first tank, which is arranged upper than the ink head in a gravitational direction, for storing the ink to be supplied to the ink head, a second tank, which is arranged lower than the ink head in the gravitational direction, for storing the ink not sprayed from the ink head, and a pump for conveying the ink within the second tank to the first tank. A first step of driving the pump for a predetermined amount of time in a state where the first tank is sealed, and a second step of stopping the pump for a predetermined amount of time in a state where the air within the first tank is released are executed to fill the ink head with the ink. | 04-29-2010 |
Tetsushi Yashima, Isesaki-Shi JP
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20110122046 | Antenna component and antenna device - Two harness engagement grooves are provided at each end in the longitudinal direction of a rod-shaped antenna component, on one side thereof, and midway in the longitudinal direction, on one side thereof, a uniting groove is provided, having a width, which is smaller than the outermost width of the two harness engagement grooves. | 05-26-2011 |
20120160647 | Push switch and method of manufacturing the same - A push switch comprising: a button made of a flexible material having a cap shaped top operation part, a flat part formed extending laterally from an edge of an opening in the top operation part, and a side wall formed extending downward from an outer edge of the flat part; a switch substrate fitted in close contact with the inner circumference of the side wall and abutting the bottom face of the flat part of the button; and a switch arranged inside the button, on the switch substrate, wherein the outer circumferential face of the side wall of the button and the bottom face of the switch substrate are covered by integrally molded resin. | 06-28-2012 |
Tooru Yashima, Yamagata JP
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20130071958 | MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In wafer probe inspection for a flip-chip semiconductor device having a solder bump, electric test may be performed at a high temperature by causing a probe needle to directly contact a solder bump over a wafer. The inventors have examined such high temperature probe tests in various ways and revealed the following problems. When a high temperature probe test is performed at 90° C. or higher using a palladium alloy probe needle, tin diffusion due to a solder bump occurs at the needle point to raise resistance, resulting in causing open failure. According to the invention of the present application, at least the tip of a palladium-based probe needle has mainly a granular grain structure in a high temperature probe test performed with the palladium-based probe needle contacting a solder bump electrode over a semiconductor wafer. | 03-21-2013 |
Tsukasa Yashima, Imizu-Shi JP
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20090020408 | Substrate Processing Method and Substrate Processing Apparatus - A substrate processing method that achieves enhancement in productivity by making it possible to confirm the end point in the ashing process precisely is provided. The substrate processing method includes: detecting emission intensity; calculating an amount of variance in emission intensity that has been detected; detecting an end point from the calculated amount of variance in emission intensity; making a comparison between the detected end point and a predetermined time; and displaying a result of the comparison. | 01-22-2009 |
20090114346 | Substrate processing apparatus - To eliminate unrequited maintenance by re-executing the sequence that is the cause of an error in a substrate processing apparatus. | 05-07-2009 |
Yoshinobu Yashima, Sendai-Shi JP
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20120318751 | BALLAST WATER TREATMENT EQUIPMENT, A BALLAST WATER DETOXIFYING TREATMENT SYSTEM USING THE SAME, AND A METHOD FOR TREATING THE BALLAST WATER - The present invention provides ballast water treatment equipment which can decompose fungicide included in ballast water and reduce the amount of use of fungicide adsorbing material by passing through the ballast water. | 12-20-2012 |