Yang-Chih

Yang-Chih Hsueh, Hsinchu TW

Patent application number	Description	Published
20140140904	ENCLOSED-CHANNEL REACTOR SYSTEM AND METHOD TO MANUFACTURE CATALYSTS OR SUPPORT - The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.	05-22-2014

Yang-Chih Hsueh, Hsin-Chu TW

Patent application number	Description	Published
20150054174	Interconnection Structure with Confinement Layer - An interconnection structure and method disclosed for providing an interconnection structure that includes conductive features having reduced topographic variations. The interconnection structure includes a contact pad disposed over a substrate. The contact pad includes a first layer of a first conductive material and a second layer of a second conductive material over the first layer. The first conductive material and the second conductive material are made of substantially the same material and have a first average grain size and a second average grain size that is smaller than the first average grain size. The interconnection structure also includes a passivation layer covering the substrate and the contact pad, and the passivation layer has an opening exposing the contact pad.	02-26-2015

Yang-Chih Huang, Hsinchu City TW

Patent application number	Description	Published
20140367911	TOUCH POSITION DETERMINING APPARATUS AND METHOD THEREOF - A touch position determining apparatus and method thereof are provided. The touch position determining apparatus is adapted to a sphere. The touch position determining apparatus includes a pressure sensing array and a processing unit. The pressure sensing array is coupled below the sphere and includes a plurality of pressure sensing nodes. The pressure sensing array generates a pressure deformation area in response to a touch operation performed on a surface of the sphere, and generates a pressure signal set by the pressure sensing nodes corresponding to the pressure deformation area. The processing unit is connected to the pressure sensing array and determines a touch position of the touch operation performed on the surface of the sphere according to the pressure signal set.	12-18-2014

Yang-Chih Huang, Taipei City TW

Patent application number	Description	Published
20150349739	COMMON MODE NOISE SUPPRESSING DEVICE - An all-pass filtering module of a common mode noise suppressing device includes first and second differential transmission circuits coupled to a reference node. Each of the first and second differential transmission circuits has an input terminal and an output terminal, and includes: first and second capacitive elements coupled in series between the input terminal and the output terminal; a first inductor coupled between the input terminal and the output terminal; and a third capacitive element and a second inductor coupled in series between the reference node and a common node between the first and second capacitive elements.	12-03-2015

Yang-Chih Lee, New Taipei City TW

Patent application number	Description	Published
20140220854	ADAPTOR BRICK - An adaptor brick includes a main body having a first coupling structure and a second coupling structure. The first coupling structure is used for coupling with a bottom portion of a first brick or a second brick while the second coupling structure is used for coupling with a top portion of the first brick or the second brick.	08-07-2014