Xiaoming He
Xiaoming He, Lexington, SC US
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20100203148 | Encapsulation and Controlled Release of Small Molecules for Intracellular Delivery Using Thermally Responsive Nanocapsules - In accordance with certain embodiments of the present disclosure, a method for intracellular delivery of small molecules is provided. The method includes encapsulation of small molecules in a thermally responsive nanocapsule by decreasing the temperature of the nanocapsule to increase the permeability of the nanocapsule and allowing the small molecules to be suck into or diffuse into the nanocapsule. The nanocapsule is delivered into a cell by increasing the temperature of the nanocapsule. The small molecules are released from the nanocapsule into the cell in a controllable manner by cooling and heating treatments. | 08-12-2010 |
20100221351 | Controlled Drug Delivery Using a Thermally Responsive Nanocapsule to Augment Cryoablation - In accordance with certain embodiments of the present disclosure, A method for intracellular delivery of cytotoxin in combination with cyoablation is provided. The method includes encapsulation of one or more cytotoxins in a thermally responsive nanocapsule by decreasing the temperature of the nanocapsule to increase the permeability of the nanocapsule whereby the one or more cytotoxins are sucked into or diffuse into the nanocapsule. The temperature of the nanocapsule is increased and the nanocapsule is delivered into a cell. Cryoablation is performed in proximity to the cell resulting in the release of the one or more cytotoxins from the nanocapsule into the cell. | 09-02-2010 |
20100311036 | Methods for Augmentation of Cell Cryopreservation - In accordance with certain embodiments of the present disclosure, a method for cryopreserving a cell is described. The method includes encapsulating a cell in a microcapsule, the microcapsule having a diameter of less than about 100 μM. The method further includes vitrifying the encapsulated cell in a vitrifying solution comprising a cryoprotectant, wherein the cell is cooled at a rate of equal to or greater than 30,000° C./min and the cryoprotectant is present at a concentration of less than or equal to 1.5 M. | 12-09-2010 |
Xiaoming He, Arcadia, CA US
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20080213496 | Method of coating semiconductor processing apparatus with protective yttrium-containing coatings - Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic materials have been modified to provide a resistivity which reduces the possibility of arcing within a semiconductor processing chamber. | 09-04-2008 |
20090036292 | Plasma-resistant ceramics with controlled electrical resistivity - Specialty ceramic materials which resist corrosion/erosion under semiconductor processing conditions which employ a corrosive/erosive plasma. The corrosive plasma may be a halogen-containing plasma. The specialty ceramic materials have been modified to provide a controlled electrical resistivity which suppresses plasma arcing potential. | 02-05-2009 |
20090214825 | Ceramic coating comprising yttrium which is resistant to a reducing plasma - Particulate generation has been a problem in semiconductor device processing in highly corrosive plasma environments. The problem is exacerbated when the plasma is a reducing plasma. Empirically produced data has shown that the formation of a plasma spray coated yttrium-comprising ceramic such as yttrium oxide, Y | 08-27-2009 |
20090302002 | METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE - A method and an apparatus for removing polymer from a substrate are provided. In one embodiment, an apparatus utilized to remove polymer from a substrate includes a processing chamber having a chamber wall and a chamber lid defining a process volume, a substrate support assembly disposed in the processing chamber, and a remote plasma source coupled to the processing chamber through an outlet port formed within the chamber wall, the outlet port having an opening pointing toward an periphery region of a substrate disposed on the substrate support assembly, wherein the remote plasma source is fabricated from a material resistant to hydrogen species. | 12-10-2009 |
20120091095 | METHOD AND APPARATUS FOR REDUCING PARTICLE DEFECTS IN PLASMA ETCH CHAMBERS - In-situ low pressure chamber cleans and gas nozzle apparatus for plasma processing systems employing in-situ deposited chamber coatings. Certain chamber clean embodiments for conductor etch applications include an NF | 04-19-2012 |
20130022838 | Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber - Specialty ceramic materials which resist corrosion/erosion under semiconductor processing conditions which employ a corrosive/erosive plasma. The corrosive plasma may be a halogen-containing plasma. The specialty ceramic materials have been modified to provide a controlled electrical resistivity which suppresses plasma arcing potential. | 01-24-2013 |
Xiaoming He, Winchester, MA US
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20090305224 | Methods for the Cryopreservation of Mammalian Cells - The present invention features novel methods for the cryopreservation of mammalian cell that combine the advantages of the slow-freezing and vitrification approaches while avoiding their shortcomings. Generally, the methods include the use of a capillary tube made of a thermally conductive wall material and a thin wall such that the ratio of the thermal conductivity of the wall material to the wall thickness is at least 1,000-500,000. The solution is then exposed to temperatures equal to or less than −80° C. and the vitrification solution containing the mammalian cells is cooled at a rate equal to or greater than 30,000-100,000,000° C./minute. The exposure of the capillary tube with a thermally conductive and thin wall allows for vitrification of the solution in the absence of ice formation. Cryoprotectants can also be added to the vitrification solution to further prevent ice formation. | 12-10-2009 |
Xiaoming He, Henderson, NV US
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20080314435 | Nano engineered photo electrode for photoelectrochemical, photovoltaic and sensor applications - A unit nano photo cell comprised of a first component of conductive or semi conductive crystalline material, forming a backbone which spreads out in a three dimensional structural fashion, a second component of at least one photo active material bound to the first component, and a third component of carrier mobility promoter material bound to the second component, all of which together constitute a framework for separating electrons from holes when a light source is provide to the unit nano photo cell such that the second component acts as a photo active center, converting incoming photons into pairs of electron-holes, the first component transports electrons from the second component to a common bottom plate, and the third component extracts the holes from the second component and discharges them via a conductive pathway to a common top plate. | 12-25-2008 |
Xiaoming He, Hanover, NH US
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20120040304 | System And Method For Post-Exposure Dosimetry Using Electron Paramagnetic Resonance Spectroscopy - An apparatus and method for triaging patients according to radiation exposure operates by measuring electron paramagnetic resonance spectra of fingernails, toenails, and/or teeth. When operating in vivo, radiation induced spectra are obtained from intact fingernails, toenails, or teeth placed within a magnet and with pickup coils located over nails between the cut edge at the end of the fingernail and skin proximal to the nail or placed adjacent to at least one tooth. When operating in vitro with fingernail clippings, one or more spectra are obtained. In an embodiment, at least three spectra are obtained with at least one after a delay at above twenty degrees Celsius, and at least one at power levels different from the others. The three spectra are used to determine and remove a mechanically induced signal from EPR spectra to determine radiation-induced spectra. The radiation induced spectra are used to determine a radiation dose, the dose is compared to triage limits, and a radiological triage tag is printed for the patients. | 02-16-2012 |
Xiaoming He, Dublin, OH US
Patent application number | Description | Published |
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20120231443 | MICROCAPSULES FOR CELL MICROENCAPSULATION - In accordance with certain embodiments of the present disclosure, a method for formation of a microcapsule is described. The method includes encapsulating a cell in a microcapsule, the microcapsule having a diameter of less than about 100 μm. The method further includes coating the microcapsule with chitosan and alginate. | 09-13-2012 |
20130129829 | Encapsulation and Controlled Release of Small Molecules for Intracellular Delivery Using Thermally Responsive Nanocapsules - In accordance with certain embodiments of the present disclosure, a method for intracellular delivery of small molecules is provided. The method includes encapsulation of small molecules in a thermally responsive nanocapsule by decreasing the temperature of the nanocapsule to increase the permeability of the nanocapsule and allowing the small molecules to be suck into or diffuse into the nanocapsule. The nanocapsule is delivered into a cell by increasing the temperature of the nanocapsule. The small molecules are released from the nanocapsule into the cell in a controllable manner by cooling and heating treatments. | 05-23-2013 |
20140127290 | Microcapsules Encapsulating Living Cells - Disclosed are devices and methods for encapsulating living cells, microencapsulated cells produced by the disclosed devices and methods, as well as methods of using the disclosed microencapsulated cells. | 05-08-2014 |
Xiaoming He, Shanghai CN
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20140116338 | COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS - A plasma processing chamber having advanced coating for the showerhead and for an extended bottom electrode. The extended bottom electrode can be formed by one or more of the focus ring, cover ring, and plasma confinement ring. The extended electrode can be formed using a one-piece composite cover ring. The composite cover ring may be made of Al | 05-01-2014 |
20140117120 | COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCTOR APPARATUS - An advanced coating for showerhead used in plasma processing chamber is provided. The advanced coating is formed using plasma enhanced physical vapor deposition. The coating formation involved a physical process, such as condensation of source material on the showerhead surface, and chemical process, wherein active species from plasma interact with the condensed source materials. Also, non-reactive species from the plasma impinge on the bottom surface to condense the formed coating. | 05-01-2014 |
20140118880 | PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR APPARATUS - An advanced coating for electrostatic chuck used in plasma processing chamber is provided. The advanced coating is formed using plasma enhanced physical vapor deposition. The coating is generally of Y | 05-01-2014 |
20140120312 | COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS - An advanced coating for parts used in plasma processing chamber. The advanced coating is formed over an anodized surface that has not been sealed. After the coating is formed, the coated area is masked, and the remaining anodized surface is sealed. The porous and rough structure of the anodized but un-sealed aluminum enhances adhesion of the coating. However, to prevent particle generation, the exposed anodized surface is sealed after formation of the coating. The coating can be of yttria, formed by plasma enhanced atomic deposition techniques which results in a dense and smooth coating. | 05-01-2014 |