Patent application number | Description | Published |
20080286885 | METHODS AND SYSTEMS FOR CREATING OR PERFORMING A DYNAMIC SAMPLING SCHEME FOR A PROCESS DURING WHICH MEASUREMENTS ARE PERFORMED ON WAFERS - Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process. | 11-20-2008 |
20080316442 | FEEDFORWARD/FEEDBACK LITHO PROCESS CONTROL OF STRESS AND OVERLAY - A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The lithographic patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables. | 12-25-2008 |
20110051150 | UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY AND REGISTRATION OF RETICLES COMBINED WITH WAFER OVERLAY CAPABILITY - A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure. | 03-03-2011 |
20120022679 | ADVANCED PROCESS CONTROL OPTIMIZATION - A method for automatic process control (APC) performance monitoring may include, but is not limited to: computing one or more APC performance indicators for one or more production lots of semiconductor devices; and displaying a mapping of the one or more APC performance indicators to the one or more production lots of semiconductor devices. | 01-26-2012 |
20120094400 | FEEDFORWARD/FEEDBACK LITHO PROCESS CONTROL OF STRESS AND OVERLAY - A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables. | 04-19-2012 |
20120208301 | Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers - Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process. | 08-16-2012 |
20140037187 | Inspecting a Wafer and/or Predicting One or More Characteristics of a Device Being Formed on a Wafer - Methods for inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer are provided. One method includes acquiring images for multiple die printed on a wafer, each of which is printed by performing a double patterning lithography process on the wafer and which include two or more die printed at nominal values of overlay for the double patterning lithography process and one or more die printed at modulated values of the overlay; comparing the images acquired for the multiple die printed at the nominal values to the images acquired for the multiple die printed at the modulated values; and detecting defects in the multiple die printed at the modulated values based on results of the comparing step. | 02-06-2014 |
20140199791 | Method and System for Universal Target Based Inspection and Metrology - Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool. | 07-17-2014 |
Patent application number | Description | Published |
20110106448 | Database System and Method of Obtaining and Communicating Data - A database system and method for obtaining and communicating data is provided, wherein the system includes a plurality of mobile nodes, wherein at least a first mobile node has an environmental data collection device, a location determination device configured to determine a geographical location that is associated with environmental data obtained by the environmental data collection device, and a memory device configured to store the environmental data and the associated geographical location. The first mobile node further includes a processor, and a communication device configured to transmit the environmental data and the associated geographical location to a database, wherein at least one of the database and the processor is configured to categorize the environmental data and the associated geographical location, and communicate data that is a function of the environmental data and the associated geographical location to a second mobile node of the plurality of mobile nodes based upon the categorization. | 05-05-2011 |
20110251755 | Parallel Parking Assistant System and Method Thereof - A parallel parking assistant system integrated with a vehicle and method thereof are provided, the parking assistant system including a first sensor configured to determine a first distance, a second sensor configured to determine a second distance, and a controller configured to provide commands as a function of the first and second determined distances. The commands include a first command configured to command a steering system to be in a clockwise position while the vehicle is moving in a reverse direction for a first reversing distance, a second command configured to command the steering system to be in a substantially straight position while the vehicle is moving in a reverse direction for a second reversing distance, and a third command configured to command the steering system to be in a counter-clockwise position while the vehicle is a moving in a reverse direction for a third reversing distance. | 10-13-2011 |
20130151059 | PARALLEL PARKING ASSISTANT SYSTEM AND METHOD THEREOF - A parallel parking assistant system integrated with a vehicle and method thereof are provided, the parking assistant system including a first sensor configured to determine a first distance, a second sensor configured to determine a second distance, and a controller configured to provide commands as a function of the first and second determined distances. The commands include a first command configured to command a steering system to be in a clockwise position while the vehicle is moving in a reverse direction for a first reversing distance, a second command configured to command the steering system to be in a substantially straight position while the vehicle is moving in a reverse direction for a second reversing distance, and a third command configured to command the steering system to be in a counter-clockwise position while the vehicle is a moving in a reverse direction for a third reversing distance. | 06-13-2013 |
Patent application number | Description | Published |
20110144117 | Pharmaceutical Dosage Form Containing Tetrahydrobiopterin - Pharmaceutical dosage form comprising tetrahydrobiopterin, or a metabolic precursor thereof, comprising an aqueous solution of tetrahydrobiopterin, or a metabolic precursor thereof, and an antioxidant in a dispensing container and a dosing means for the dosed dispensation of the aqueous solution, as well as the use of an antioxidant for stabilizing an aqueous solution of tetrahydrobiopterin, or a metabolic precursor thereof, for a storage period of more than at least one month. | 06-16-2011 |
20110262380 | THEAPEUTIC USE OF PROTEIN-POLYMER CONJUGATES - This invention relates to use protein-polymer conjugates described in the specification to treat various diseases, including disease is idiopaic myelofibrsis, polycythaemia vera, and essential thromobocythaemia. | 10-27-2011 |
20130028945 | NOVEL COMPOSITION FOR TREATMENT OF ESSENTIAL THROMBOCYTHEMIA - The present invention relates to a novel pharmaceutical composition free of gastric coating comprising anagrelide hydrochloride in combination with a non-pH dependent polymer and a pharmaceutically acceptable watersoluble acid and its use for the treatment of essential thrombocythemia. | 01-31-2013 |
20150086637 | NOVEL COMPOSITION FOR TREATMENT OF ESSENTIAL THROMBOCYTHEMIA - The present invention relates to a novel pharmaceutical composition free of gastric coating comprising anagrelide hydrochloride in combination with a non-pH dependent polymer and a pharmaceutically acceptable watersoluble acid and its use for the treatment of essential thrombocythemia. | 03-26-2015 |
20150087704 | PARENTERAL ESMOLOL FORMULATION - A parenteral formulation of esmolol hydrochloride for use in the treatment of a patient suffering from tachycardia comprising a lyophilized powder consisting of pure esmolol hydrochloride, wherein said powder is reconstituted to obtain a ready-to-use i.v. solution of esmolol hydrochloride at a concentration of 20-100 mg/mL, and said i.v. solution is directly administered to the patient, and further a method of producing a ready-to-use i.v. solution of esmolol hydrochloride by reconstituting a lyophilized powder consisting of pure esmolol hydrochloride with a solvent, characterized in that said solvent is an i.v. solvent devoid of alcohol or a buffer excipient, in an amount necessary to obtain a ready-to-use i.v. solution at a concentration of 20-100 mg/mL, and the ready-to-use i.v. solution containing a parenteral formulation of 20-100 mg/mL pure esmolol hydrochloride in an infusion device or consisting of a parenteral formulation of 20-100 mg/mL pure esmolol hydrochloride, WFI and/or saline solution, devoid of any alcohol or buffer excipients. | 03-26-2015 |