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| 20130043127 | MANDREL FOR ELECTROFORM FILTER INCLUDING UNIFORM PORES - A mandrel, suitable for use when producing an electroform metal structure including, for example, a filter, includes a conductive material layer. A plurality of first photoresist pegs is located in a first area of the conductive material layer. Each of the plurality of first photoresist pegs includes a first diameter and a first center-to-center spacing relative to each other. A plurality of second photoresist pegs is located in a second area of the conductive material layer. Each of the plurality of second photoresist pegs includes a second diameter and a second center-to-center spacing. The first diameter is greater than the second diameter and the first center-to-center spacing is greater than the second center-to-center spacing. | 02-21-2013 |
| 20130043184 | ELECTROFORM FILTER STRUCTURE INCLUDING UNIFORM PORE SIZE - An electroformed metal filter structure includes a plurality of first recesses, a plurality of second recesses, a plurality of first pores, and a plurality of second pores. Each of the plurality of first recesses includes a first recess diameter and a first recess center-to-center spacing relative to each other. Each of the plurality of second recesses includes a second recess diameter and a second recess center-to-center spacing relative to each other. Each of the plurality of first pores is in fluid communication with a corresponding one of the plurality of first recesses and each of the plurality of second pores is in fluid communication with a corresponding one of the plurality of second recesses. The first recess diameter is not equal to the second recess diameter and the first recess center-to-center spacing is not equal to the second recess center-to-center spacing. | 02-21-2013 |
| 20130044166 | PRINTING SYSTEM INCLUDING FILTER WITH UNIFORM PORES - A printing system includes a filter, a printhead including nozzles through which liquid is emitted, and a liquid supply system in liquid communication with the printhead through the filter. The filter, an electroformed metal structure, includes a plurality of first recesses, a plurality of second recesses, a plurality of first pores, and a plurality of second pores. Each of the plurality of first recesses includes a first recess diameter and a first recess center-to-center spacing relative to each other. Each of the plurality of second recesses includes a second recess diameter and a second recess center-to-center spacing relative to each other. Each of the plurality of first pores is in fluid communication with a corresponding one of the plurality of first recesses and each of the plurality of second pores is in fluid communication with a corresponding one of the plurality of second recesses. In the filter, the first recess diameter is not equal to the second recess diameter and the first recess center-to-center spacing is not equal to the second recess center-to-center spacing. | 02-21-2013 |
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| 20090142942 | ELECTRICAL DEVICE HAVING A LUBRICATED JOINT AND A METHOD FOR LUBRICATING SUCH A JOINT - An electrical device, particularly a control unit, having at least one joint having a first joining partner, especially a sleeve, and a second joining partner, especially a pin, the joint between the two joining partners having a junction ; at least at the junction an at least partially solidified lubricant being present. Furthermore, in a method for lubricating a joint of an electrical device, the joint having a first joining partner, particularly a sleeve, and a second joining partner, particularly a pin; in a step one of the joining partners being wetted with a lubricant, in a following step the joining partner wetted with the lubricant being joined to the other joining partner and the lubricant subsequently solidifying. | 06-04-2009 |
| 20090152654 | MICROMECHANICAL SYSTEM - A micromechanical system includes a substrate, a first planar electrode, a second planar electrode, and a third planar electrode. The second planar electrode is movably positioned at a distance above the first planar electrode and the third planar electrode is positioned at a distance above the second electrode. | 06-18-2009 |
| 20100107762 | ACCELERATION SENSOR AND METHOD FOR ITS MANUFACTURE - An acceleration sensor is described that has a base substrate, a first electrode structure situated in stationary fashion relative to the base substrate, a sensor element having a first electrode area, and a spring device having at least one spring element. Via the spring element, the sensor element is coupled to the base substrate so that the sensor element is deflected relative to the base substrate as the result of an acceleration acting on the sensor element, thus changing the distance between the first electrode structure and the first electrode area. The sensor element and the first electrode structure are situated at least partially one over the other and are formed from a common functional layer. | 05-06-2010 |
| 20110226059 | SENSOR AND METHOD FOR MANUFACTURING A SENSOR - A sensor having a substrate, a cap and a seismic mass is proposed, the substrate having a main extension plane, the seismic mass being deflectable perpendicular to the main extension plane, a first stop of the cap covering a first area of the seismic mass perpendicular to the main extension plane in a first coverage region and a second stop of the cap covering a second area of the seismic mass perpendicular to the main extension plane in a second coverage region, and furthermore the first and second coverage regions parallel to the main extension plane being essentially equal in size. The distances of the coverage regions from a pivot axis of the mass designed as a rocker are equal so that the torques caused by electronic forces offset one another. | 09-22-2011 |
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| 20130176825 | SENSOR STRUCTURE AND YAW RATE SENSOR - A sensor structure includes a substrate having a main extension plane, a first seismic mass and a second seismic mass, the first and the second seismic masses being deflectable relative to the substrate along a direction of deflection essentially perpendicular to the main extension plane. The first and second seismic masses are coupled together via a rigid coupling rocker pivotable around a rocker axis parallel to the main extension plane. The first seismic mass is suspended from the substrate with the aid of a first suspension spring, and an essentially rigid first coupling bar is situated between the first suspension spring and the first seismic mass. | 07-11-2013 |
| 20130299927 | HYBRID INTERGRATED COMPONENT AND METHOD FOR THE MANUFACTURE THEREOF - Measures are proposed by which the design freedom is significantly increased in the case of the implementation of the micromechanical structure of the MEMS element of a component, which includes a carrier for the MEMS element and a cap for the micromechanical structure of the MEMS element, the MEMS element being mounted on the carrier via a standoff structure. The MEMS element is implemented in a layered structure, and the micromechanical structure of the MEMS element extends over at least two functional layers of this layered structure, which are separated from one another by at least one intermediate layer. | 11-14-2013 |
| 20130333469 | METHOD FOR OPERATING AND/OR FOR MEASURING A MICROMECHANICAL DEVICE, AND MICROMECHANICAL DEVICE - A method for operating and/or measuring a micromechanical device. The device has a first and second seismic mass which are movable by oscillation relative to a substrate; a first drive device for deflecting the first seismic mass and a second drive device for deflecting the second seismic mass, parallel to a drive direction in a first orientation; a third drive device for deflecting the first seismic mass, and a fourth drive device for deflecting the second seismic mass in parallel to the drive direction and according to a second orientation opposite from the first orientation; a first detection device for detecting drive motion of the first seismic mass; and a second detection device for detecting drive motion of the second seismic mass. A first and a second detection signal are generated by the first and second detection devices, the first detection signal being evaluated separately from the second detection signal. | 12-19-2013 |
| 20140083190 | ACCELERATION SENSOR AND METHOD FOR OPERATING AN ACCELERATION SENSOR - An acceleration sensor has a substrate, a seismic mass and a detection unit. The seismic mass is configured to be deflected based on an external acceleration acting on the acceleration sensor, the deflection being in the form of a deflection motion with respect to the substrate along a deflection direction. The detection unit is configured to be deflected for the detection of a deflection of the seismic mass, the detection being in the form of a detection motion with respect to the substrate along a detection direction. The detection unit is connected to the seismic mass in such a way that the amplitude of the deflection motion along the deflection direction is greater than the amplitude of the detection motion along the detection direction. | 03-27-2014 |
| 20140110800 | Method for manufacturing a cap for a mems component, and hybrid integrated component having such a cap - A manufacturing method for a cap, for a hybrid vertically integrated component having a MEMS component a relatively large cavern volume having a low cavern internal pressure, and a reliable overload protection for the micromechanical structure of the MEMS component. A cap structure is produced in a flat cap substrate in a multistep anisotropic etching, and includes at least one mounting frame having at least one mounting surface and a stop structure, on the cap inner side, having at least one stop surface, the surface of the cap substrate being masked for the multistep anisotropic etching with at least two masking layers made of different materials, and the layouts of the masking layers and the number and duration of the etching steps being selected so that the mounting surface, the stop surface, and the cap inner side are situated at different surface levels of the cap structure. | 04-24-2014 |
| 20140117475 | HYBRID INTEGRATED COMPONENT - A component has at least one MEMS element and at least one cap made of a semiconductor material. The cap, in addition to its mechanical function as a terminus of a cavity and protection of the micromechanical structure, is provided with an electrical functionality. The micromechanical structure of the MEMS element of the component is situated in a cavity between a carrier and the cap, and includes at least one structural element which is deflectable out of the component plane within the cavity. The cap includes at least one section extending over the entire thickness of the cap, which is electrically insulated from the adjoining semiconductor material in such a way that it may be electrically contacted independently from the remaining sections of the cap. | 05-01-2014 |
