Patent application number | Description | Published |
20090096055 | METHOD TO FORM CMOS CIRCUITS WITH SUB 50NM STI STRUCTURES USING SELECTIVE EPITAXIAL SILICON POST STI ETCH - An STI field oxide element in an IC which includes a layer of epitaxial semiconductor on sidewalls of the STI trench to increase the width of the active area adjacent to the STI trench and decrease a width of dielectric material in the STI trench is disclosed. STI etch residue is removed from the STI trench surface prior to growth of the epitaxial layer. The epitaxial semiconductor composition is matched to the composition of the adjacent active area. The epitaxial semiconductor may be undoped or doped to match the active area. The STI trench with the epitaxial layer is compatible with common STI passivation and fill processes. The thickness of the as-grown epitaxial semiconductor layer is selected to provide a desired active area width or a desired STI dielectric width. | 04-16-2009 |
20090098702 | Method to Form CMOS Circuits Using Optimized Sidewalls - A method of forming reduced width STI field oxide elements using sidewall spacers on the isolation hardmask to reduce the STI trench width is disclosed. The isolation sidewall spacers are formed by depositing a conformal layer of spacer material on the isolation hardmask and performing an anisotropic etch. The isolation sidewall spacers reduce the exposed substrate width during the subsequent STI trench etch process, leading to a reduced STI trench width. A method of forming the isolation sidewall spacers of a material that is easily removed from the isolation hardmask to provide an exposed shoulder width on the substrate defined by the sidewall thickness is also disclosed. | 04-16-2009 |
20090253253 | METHOD OF ADJUSTING FDSOI THRESHOLD VOLTAGE THROUGH OXIDE CHARGES GENERATION IN THE BURIED OXIDE - Different performance MOSFET Fully Depleted devices can be achieved on a single chip by varying the Vt through ion implantation. The integration of multiple Vt can be achieved through the selection of a metal gate stack with suitable effective WF for one semiconductor device to be included on a chip. Then, an ion implantation, with a dopant such as F, can be selectively performed to achieve proper Vt for other semiconductor devices on the chip. | 10-08-2009 |
20100052025 | SOI MUGFETS HAVING SINGLE GATE ELECTRODE LEVEL - A silicon on insulator (SOI) multi-gate field effect transistor electrically Programmable Read-Only Memory (MuFET EPROM) includes a substrate having a dielectric surface. A first semiconducting region is in or on the dielectric surface. A source region, a drain region and a channel region interposed between the source and drain are formed in first semiconducting region. A gate dielectric layer is on the channel region. At least a second semiconducting region in or on the dielectric surface is spaced apart from the first semiconducting region. A first electrode layer comprises a first electrode portion including a transistor gate electrode and a control gate electrode electrically isolated from one another. The transistor gate overlies the channel region to form a transistor. The control gate extends to overlay a portion of the second semiconducting region. The transistor gate and thus the transistor and the control gate are capacitively coupled to one another by at least one MOS coupling capacitor, with one plate of the MOS coupling capacitor ohmically coupled to or including the second semiconducting region. | 03-04-2010 |
20110070703 | Disposable Spacer Integration with Stress Memorization Technique and Silicon-Germanium - An integrated process flow for forming an NMOS transistor ( | 03-24-2011 |
20120045874 | CMOS INTEGRATION METHOD FOR OPTIMAL IO TRANSISTOR VT - Various embodiments provide methods for fabricating dual supply voltage CMOS devices with a desired I/O transistor threshold voltage. The dual supply voltage CMOS devices can be fabricated in a semiconductor substrate that includes isolated regions for a logic NMOS transistor, a logic PMOS transistor, an I/O NMOS transistor, and an I/O PMOS transistor. Specifically, the fabrication can first set and/or adjust the threshold voltage (V | 02-23-2012 |
20120108027 | IMPROVED SILICIDE METHOD - A process for forming an integrated circuit with reduced sidewall spacers to enable improved silicide formation between minimum spaced transistor gates. A process for forming an integrated circuit with reduced sidewall spacers by first forming sidewall spacer by etching a sidewall dielectric and stopping on an etch stop layer, implanting source and drain dopants self aligned to the sidewall spacers, followed by removing a portion of the sidewall dielectric and removing the etch stop layer self aligned to the reduced sidewall spacers prior to forming silicide. | 05-03-2012 |
20120119824 | BIAS VOLTAGE SOURCE - An integrated circuit that includes a data storage cell. The data storage cell has a PMOS transistor in an n-well. In addition, the data storage cell has a PMOS diode connecting a voltage source to a bias node of the n-well. Alternatively, an integrated circuit that includes a data storage cell. The alternative data storage cell has an NMOS transistor in an isolated p-well. In addition, the alternative data storage cell has an NMOS diode connecting a voltage source to a bias node of the isolated p-well. | 05-17-2012 |
20120280324 | SRAM STRUCTURE AND PROCESS WITH IMPROVED STABILITY - An SRAM memory cell with reduced SiGe formation area using a gate extension ( | 11-08-2012 |