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| 20150323930 | UNMANNED AERIAL VEHICLE AUTHORIZATION AND GEOFENCE ENVELOPE DETERMINATION - Methods, systems, and apparatus, including computer programs encoded on computer storage media, for unmanned aerial vehicle authorization and geofence envelope determination. One of the methods includes determining, by an electronic system in an Unmanned Aerial Vehicle (UAV), an estimated fuel remaining in the UAV. An estimated fuel consumption of the UAV is determined. Estimated information associated with wind affecting the UAV is determined using information obtained from sensors included in the UAV. Estimated flights times remaining for a current path, and one or more alternative flight paths, are determined using the determined estimated fuel remaining, determined estimated fuel consumption, determined information associated wind, and information describing each flight path. In response to the electronic system determining that the estimated fuel remaining, after completion of the current flight path, would be below a first threshold, an alternative flight path is selected. | 11-12-2015 |
| 20150323931 | UNMANNED AERIAL VEHICLE AUTHORIZATION AND GEOFENCE ENVELOPE DETERMINATION - Methods, systems, and apparatus, including computer programs encoded on computer storage media, for unmanned aerial vehicle authorization and geofence envelope determination. One of the methods includes maintaining, by a cloud system in wireless communication with Unmanned Aerial Vehicles (UAVs), allocated geofence envelopes for one or more of the UAVs, with each geofence envelope being a virtual barrier for a real-world geographic area. A request for approval of an updated geofence envelope is received from a first UAV in flight. The cloud system determines that the updated geofence envelope has not been allocated and/or the updated geofence envelope does not interfere with allocated geofence envelopes. In response to the determination, a response indicating approval of the request is generated. The generated response is provided to the first UAV. | 11-12-2015 |
| 20150325064 | UNMANNED AERIAL VEHICLE AUTHORIZATION AND GEOFENCE ENVELOPE DETERMINATION - Methods, systems, and apparatus, including computer programs encoded on computer storage media, for unmanned aerial vehicle authorization and geofence envelope determination. One of the methods includes maintaining, in a datastore, flight operation information associated with UAV flight operations. A request to generate a risk assessment report is received, with the request including aspects of a UAV flight operation, with the risk assessment report describing risk associated with each aspect. Flight operation information accessed from the datastore is analyzed. Performance characteristics are determined based at least in part on the analysis of the flight operation information, with the performance characteristics including information that can inform, or affect, a safe or functional UAV flight operation. Risk assessments for each aspects in the request are determined using the performance characteristics. The risk assessment report is generated using the determined risk assessments. | 11-12-2015 |
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| 20120003448 | BARRIER ASSEMBLY WITH ENCAPSULANT AND PHOTOVOLTAIC CELL - An assembly that includes a barrier film interposed between a first polymeric film substrate and a first major surface of a pressure sensitive adhesive layer is provided. The first polymeric film substrate has a first coefficient of thermal expansion that is, in some embodiments, up to 50 parts per million per Kelvin. The pressure sensitive adhesive layer has a second major surface opposite the first major surface that is disposed on a second polymeric film substrate. The second polymeric film substrate is typically resistant to degradation by ultraviolet light. In some embodiments, the second polymeric film substrate has a second coefficient of thermal expansion that is at least 40 parts per million per Kelvin higher than the first coefficient of thermal expansion. The assembly is transmissive to visible and infrared light. | 01-05-2012 |
| 20120003451 | BARRIER ASSEMBLY - An assembly that includes a barrier film interposed between a first polymeric film substrate and a first major surface of a pressure sensitive adhesive layer is provided. The first polymeric film substrate has a first coefficient of thermal expansion that is, in some embodiments, up to 50 parts per million per Kelvin. The pressure sensitive adhesive layer has a second major surface opposite the first major surface that is disposed on a second polymeric film substrate. The second polymeric film substrate is typically resistant to degradation by ultraviolet light. In some embodiments, the second polymeric film substrate has a second coefficient of thermal expansion that is at least 40 parts per million per Kelvin higher than the first coefficient of thermal expansion. The assembly is transmissive to visible and infrared light. | 01-05-2012 |
| 20120003484 | MOISTURE RESISTANT COATING FOR BARRIER FILMS - A barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer includes a silane and an acrylate co-deposited to form the top coat layer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers. | 01-05-2012 |
| 20120208033 | BARRIER FILM - A barrier film is disclosed that includes a polymeric film substrate and at least first and second polymer layers separated by an inorganic barrier layer. The first polymer layer is disposed on the polymeric film substrate. At least one of the first or second polymer layers is prepared from co-deposited amino silane and acrylate or methacrylate monomer. A method of making the barrier film is also disclosed. | 08-16-2012 |
| 20120227809 | FLEXIBLE ASSEMBLY AND METHOD OF MAKING AND USING THE SAME - An assembly including a pressure sensitive adhesive layer at least 0.25 mm in thickness disposed on a barrier assembly, wherein the barrier assembly comprises a polymeric film substrate and a barrier film. The assembly is flexible and transmissive to visible and infrared light. A pressure sensitive adhesive in the form of a film at least 0.25 mm thick is also provided, the pressure sensitive adhesive including a polyisobutylene having a weight average molecular weight less than 300,000 grams per mole; and a hydrogenated hydrocarbon tackifier. Methods of making and using the assembly and the pressure sensitive adhesive are also included. | 09-13-2012 |
| 20120229893 | MULTI-LAYER OPTICAL FILMS - Multi-layer optical film ( | 09-13-2012 |
| 20140230892 | EDGE PROTECTED BARRIER ASSEMBLIES - The present application is directed to an assembly comprising an electronic device, and a multilayer film. The multilayer film comprises a substrate adjacent the electronic device, a barrier stack adjacent the substrate opposite the electronic device, and a weatherable sheet adjacent the barrier stack opposite the substrate. The multilayer film has been fused. | 08-21-2014 |
| 20140246090 | METHOD OF MAKING DELAMINATED RESISTANT ASSEMBLIES - The present application is directed to a method of reducing delamination in an assembly. The method comprises providing an assembly and limiting visible light exposure to parts of the assembly to maintain a peel force of 20 grams/inch or greater where the light is limited. The assembly comprises an electronic device, a substrate having a first surface and a second surface opposite the first surface, wherein the second surface of the substrate is disposed on the electronic device, a barrier stack disposed on the first surface of the substrate, and a weatherable sheet adjacent the barrier film opposite the substrate. The assembly is transmissive to visible and infrared light. | 09-04-2014 |
| 20140283910 | EDGE PROTECTED BARRIER ASSEMBLIES - The present application is directed to an assembly comprising an electronic device, and a multilayer film. The multilayer film comprises a substrate adjacent the electronic device, a barrier stack adjacent the substrate opposite the electronic device, and a weatherable sheet adjacent the barrier stack opposite the substrate. The multilayer film is transparent and flexible and the barrier stack and the substrate are insulated from the environment. | 09-25-2014 |
| 20140290736 | BARRIER ASSEMBLIES - The present application is directed to an assembly comprising an electronic device and a multilayer film. The multilayer film comprises a barrier stack adjacent the electronic device, and a weatherable sheet adjacent the barrier stack opposite the electronic device. The weatherable sheet is bonded to the electronic device. | 10-02-2014 |
| 20150027533 | EDGE PROTECTED BARRIER ASSEMBLIES - The present application is directed to an assembly comprising an electronic device; and a multilayer film. The multilayer film comprises a barrier stack adjacent the electronic device, and a weatherable sheet adjacent the barrier stack opposite the electronic device. The assembly additionally comprises an opaque protective layer adjacent the barrier stack opposite the electronic device. | 01-29-2015 |
| 20150114457 | CONTINUOUS EDGE PROTECTED BARRIER ASSEMBLIES - This disclosure generally relates to films capable of use in a flexible photovoltaic solar module, rolls of films capable of use in a flexible photovoltaic solar module, processes of making the films and rolls of films, to flexible photovoltaic solar modules including such films, and to methods of making flexible solar modules. One exemplary process involves providing at least two discrete segments of a multilayer barrier film and placing a segment of protective layer adjacent to two of the adjacent discrete segments of multilayer barrier film such that the first and second terminal edges of the segment of protective layer span the gap between the discrete segments of barrier film to form a continuous film. | 04-30-2015 |
| 20150214405 | METHODS OF MAKING BARRIER ASSEMBLIES - The present disclosure generally relates to methods of forming barrier assemblies. Some embodiments include application of an adhesive layer and/or a topsheet to protect the exposed uppermost layer of the barrier stack during roll-to-roll processing. Some embodiments include application of an adhesive layer and/or a topsheet before the exposed, uppermost layer of the barrier film contacts a solid surface or processing roll. Inclusion of an adhesive layer and/or a topsheet protects the oxide layer during processing, which creates an excellent barrier assembly that can be manufactured using roll-to-roll processing. | 07-30-2015 |
| 20150243816 | METHODS OF MAKING BARRIER ASSEMBLIES - The present disclosure generally relates to methods of forming barrier assemblies. Some embodiments include application and removal of a protective layer followed by application of a topsheet. Some embodiments include application and removal of a protective layer including a release agent and a monomer. | 08-27-2015 |
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| 20130026070 | Hydrocracking Catalysts Containing Stabilized Aggregates of Small Crystallites of Zeolite Y Associated Hydrocarbon Conversion Processes - This invention relates to hydrocracking catalysts utilizing stabilized aggregates of small primary crystallites of zeolite Y that are clustered into larger secondary particles. At least 80% of the secondary particles may comprise at least 5 primary crystallites. The size of the primary crystallites may be at most about 0.5 micron, or at most about 0.3 micron, and the size of the secondary particles may be at least about 0.8 micron, or at least about 1.0 μm. The silica to alumina ratio of the resulting stabilized aggregated Y zeolite may be 4:1 or more. This invention also relates to the use of such catalysts in hydrocracking processes for the conversion of heavy oils into lighter fuel products. The invention is particularly suited for the selective production of diesel range products from gas oil range feedstock materials under hydrocracking conditions. | 01-31-2013 |
| 20130333391 | INTEGRATION OF PRESSURE SWING ADSORPTION WITH A POWER PLANT FOR CO2 CAPTURE/UTILIZATION AND N2 PRODUCTION - Systems and methods are provided for combined cycle power generation while reducing or mitigating emissions during power generation. Recycled exhaust gas from a power generation combustion reaction can be separated using a swing adsorption process so as to generate a high purity CO | 12-19-2013 |
| 20140140921 | SYNTHESIS OF MSE-FRAMEWORK TYPE MOLECULAR SIEVES - An aspect of the invention relates to a method of synthesizing a crystalline molecular sieve having an MSE framework type, the method comprising crystallizing a reaction mixture comprising a source of water, a source of an oxide of a tetravalent element, Y, selected from at least one of silicon, tin, titanium, vanadium, and germanium, optionally but preferably a source of a trivalent element, X, a source of an alkali or alkaline earth metal, M, a source of a tetraethylammonium cation, Q1, and optionally a source of a second organic cation, Q2, which can include a cyclic nitrogen-containing ammonium cation. | 05-22-2014 |
| 20140274664 | DEWAXING CATALYSTS - Provided are catalysts including: a zeolite component selected from zeolites having 10-member ring pores, zeolites having 12-member ring pores and a combination thereof, 0.1 to 5 weight % of a hydrogenation component selected from Pt, Pd, Ag, Ni, Co, Mo, W, Rh, Re, Ru, Ir and a mixture thereof, and a hydrothermally stable binder component selected from tantalum oxide, tungsten oxide, molybdenum oxide, vanadium oxide, magnesium oxide, calcium oxide, yttrium oxide, lanthanum oxide, cerium oxide, niobium oxide, tungstated zirconia, cobalt molybdenum oxide, cobalt molybdenum sulfide, nickel molybdenum oxide, nickel molybdenum sulfide, nickel tungsten oxide, nickel tungsten sulfide, cobalt tungsten oxide, cobalt tungsten sulfide, nickel molybdenum tungsten oxide and nickel molybdenum tungsten sulfide, cobalt molybdenum tungsten oxide and cobalt molybdenum tungsten sulfide, wherein the weight ratio of the zeolite to the hydrothermally stable binder is 85:15 to 25:75. | 09-18-2014 |
| 20140275688 | METHODS FOR PRODUCING BASESTOCKS FROM RENEWABLE SOURCES USING DEWAXING CATALYST - Provided are methods for producing a lube base stock and/or a fuel from a feedstock of biological origin, the method including: contacting the feedstock in the presence of a catalyst to produce a lube base stock and/or a fuel, wherein the catalyst comprises: a zeolite component selected from a zeolite having 10-member ring pores, a zeolite having 12-member ring pores and a combination thereof, 0.1 to 5 weight % of a hydrogenation component selected from Pt, Pd, Ag, Ni, Co, Mo, W, Rh, Re, Ru, Ir and a mixture thereof, and a hydrothermally stable binder component. | 09-18-2014 |
| 20140378697 | Hydroalkylation Catalyst and Process for Use Thereof - This invention relates to process for producing biphenyl esters, the process comprising:
| 12-25-2014 |
| 20150152343 | HYDROCRACKING OF GAS OILS WITH INCREASED DISTILLATE YIELD - Methods are provided for improving the yield of distillate products from hydroprocessing of gas oil feedstocks, such as vacuum gas oils. It has been unexpectedly found that stripping of gases or fractionation to separate out a distillate fraction during initial hydrotreatment of a feed can provide a substantial increase in distillate yield at a desired amount of feedstock conversion. The improvement in yield of distillate products can allow a desired level of conversion to be performed on a feedstock for generating lubricating base oil products while reducing or minimizing the amount of naphtha (or lower) boiling range products. Alternatively, the improvement in yield of distillate products can correspond to an improved yield during a single pass through a reaction system, so that distillate yield is increased even though a lubricant boiling range product is not generated. | 06-04-2015 |
| 20160101985 | REMOVAL OF OCCLUDED ALKALI METAL CATIONS FROM MSE-FRAMEWORK TYPE MOLECULAR SIEVES - A method for reducing the level of occluded alkali metal cations from an MSE-framework type molecular sieve comprises either (a) contacting the molecular sieve with a solution containing ammonium ions at a temperature of at least about 50° C. to ammonium-exchange at least part of the occluded potassium ions or (b) contacting the molecular sieve with steam at a temperature of at least about 300° C. and then subjecting the steamed molecular sieve to ammonium exchange. | 04-14-2016 |
| 20160102590 | METHODS OF MAKING POROUS CRYSTALLINE MATERIALS AND THEIR USE IN HYDROCARBON SORPTION - The present invention relates to a hydrothermally stable form of a porous crystalline material useful in applications where sorbing hydrocarbons is desired. Among such applications is sorption of hydrocarbons from an exhaust stream from an engine in a cold-start condition. A hydrocarbon sorption apparatus including the hydrothermally stable porous crystalline material is provided. In either case, the hydrothermally stable porous crystalline material can contain both 10- and 12-membered ring pore channels, or alternately an 11-membered ring pore channel, as well as have one or more other properties. | 04-14-2016 |
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| 20080199977 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films - A method for restoring a dielectric constant of a layer of a silicon-containing dielectric material having a first dielectric constant and at least one surface, wherein the first dielectric constant of the layer of silicon-containing dielectric material has increased to a second dielectric constant, the method comprising the steps of: contacting the at least one surface of the layer of silicon-containing dielectric material with a silicon-containing fluid; and exposing the at least one surface of the layer of silicon-containing dielectric material to an energy source selected from the group consisting of: UV radiation, heat, and an electron beam, wherein the layer of silicon-containing dielectric material has a third dielectric constant that is lower than the second dielectric constant after exposing the layer of silicon-containing dielectric material to the energy source. | 08-21-2008 |
| 20080264672 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same - A process for preparing a photoimprinted film, a composition for forming a photoimprinted film and a photoimprinted film comprising a dielectric constant of less than about 3.5. The method includes providing a material film having a composition including at least one silica source capable of being sol-gel processed, at least one photoactive compound and at least one solvent; and water. The composition contains less than about 0.1% by weight of an added acid. A mold having mold features is provided. The mold is positioned in sufficient contact with the material film to allow the material to contact at least a portion of the mold features. The material film is then exposed to a radiation source and the film is cured to form a solidified material film. The mold is separated from the solidified material, wherein the material includes film features corresponding to the mold features. | 10-30-2008 |
| 20090298671 | Compositions for Preparing Low Dielectric Materials Containing Solvents - Silica-based materials and films having a dielectric constant of 3.7 or below and compositions and methods for making and using same are disclosed herein. In one aspect, there is provided a composition for preparing a silica-based material comprising an at least one silica source, a solvent, an at least one porogen, optionally a catalyst, and optionally a flow additive wherein the solvent boils at a temperature ranging from 90° C. to 170° C. and is selected from the group of compounds represented by the following formulas: HO—CHR | 12-03-2009 |
| 20100009546 | Aminosilanes for Shallow Trench Isolation Films - The present invention is a process for spin-on deposition of a silicon dioxide-containing film under oxidative conditions for gap-filling in high aspect ratio features for shallow trench isolation used in memory and logic circuit-containing semiconductor substrates, such as silicon wafers having one or more integrated circuit structures contained thereon, comprising the steps of:
| 01-14-2010 |
| 20100041234 | Process For Restoring Dielectric Properties - A method for preparing an interlayer dielectric to minimize damage to the interlayer's dielectric properties, the method comprising the steps of: depositing a layer of a silicon-containing dielectric material onto a substrate, wherein the layer has a first dielectric constant and wherein the layer has at least one surface; providing an etched pattern in the layer by a method that includes at least one etch process and exposure to a wet chemical composition to provide an etched layer, wherein the etched layer has a second dielectric constant, and wherein the wet chemical composition contributes from 0 to 40% of the second dielectric constant; contacting the at least one surface of the layer with a silicon-containing fluid; optionally removing a first portion of the silicon-containing fluid such that a second portion of the silicon-containing fluid remains in contact with the at least one surface of the layer; and exposing the at least one surface of the layer to UV radiation and thermal energy, wherein the layer has a third dielectric constant that is restored to a value that is at least 90% restored relative to the second dielectric constant. | 02-18-2010 |
| 20100151206 | Method for Removal of Carbon From An Organosilicate Material - Described herein is a method for removing at least a portion of the carbon-containing species within an organosilicate (OSG) film by treating the OSG film with a chemical, such as but not limited to an oxidizer, exposing the OSG film to an energy source comprising ultraviolet light, or treating the OSG film with a chemical and exposing the OSG film to an energy source. | 06-17-2010 |
| 20130295334 | Method for Removal of Carbon from an Organosilicate Material - Described herein is a method for removing at least a portion of the carbon-containing species within an organosilicate (OSG) film by treating the OSG film with a chemical, such as but not limited to an oxidizer, exposing the OSG film to an energy source comprising ultraviolet light, or treating the OSG film with a chemical and exposing the OSG film to an energy source. | 11-07-2013 |
