Patent application number | Description | Published |
20100252865 | ELECTRONIC DEVICE - The invention relates to an electronic device having a semiconductor die comprising at least one RF-transistor (RFT) occupying a total RF-transistor active area (ARFT) on the die (DS). The total RF-transistor active area (ARFT) includes at least one transistor channel (C) having a channel width (W) and a channel length (L), and at least one bias cell (BC) for biasing the RF-transistor (RFT). The total bias cell active area (ABC) includes at least one transistor channel (C) having a channel width (W) and a channel length (L). The at least one bias cell (BC) occupies a total bias cell active area (ABC) on the die (SD). The total RF-transistor active area (ARFT) is substantially greater than the total bias cell active area (ABC). The total bias cell active area (ABC) has a common centre of area (COABC). The total RF-transistor active area (ARFT) has a common centre of area (COARF). The active areas (ABC, ARFT) are arranged such that both, the common centre of area or sub-areas of the RF-transistor (COARF) and the common centre of area or sub-areas of the bias cell (COABC) are positioned on an axis (AX | 10-07-2010 |
20120132969 | COMPENSATION NETWORK FOR RF TRANSISTOR - A compensation network for a radiofrequency transistor is disclosed. The compensation network comprises first and second bonding bars for coupling to a first terminal of the RF transistor and a compensation capacitor respectively; one or more bond wires coupling the first and second bonding bars together; and a compensation capacitor formed from a first set of conductive elements coupled to the second bonding bar, the first set of conductive elements interdigitating with a second set of conductive elements coupled to a second terminal of the RF transistor. | 05-31-2012 |
20130120061 | Doherty Amplifier Circuit - The present invention relates to an amplifier comprising a plurality of Doherty amplifier cells each Doherty amplifier cell comprising an input and an output respectively connected to an input and an output of the amplifier, a main amplifier stage, a peak amplifier stage and a signal combining circuit configured to combine signals from outputs of the main and peak amplifiers and provide a combined signal to the output of the Doherty amplifier cell. Each cell comprises a controllable splitter having an input connected to the input of the Doherty amplifier cell. The controllable splitter is configured to receive a splitter control signal and modify an amplitude and phase of a signal at the input of the Doherty amplifier cell in response to the splitter control signal. | 05-16-2013 |
20140132353 | AMPLIFIER CIRCUIT - An integrated power amplifier circuit is disclosed. The circuit comprises: first and second amplifiers fabricated on one or more dies, the one or more dies being mounted on a support structure; a first set of one or more connection elements connected to the first amplifier and passing above a portion of the support structure; and a second set of one or more connection elements connected to the second amplifier and passing above a portion of the support structure. The support structure comprises at least one void, at least a portion of the at least one void being positioned directly underneath at least one of the first and second sets of one or more connection elements. | 05-15-2014 |
20140167858 | AMPLIFER DEVICE - The disclosure relates to an amplifier device comprising an integrated circuit die ( | 06-19-2014 |
20150115343 | TRANSISTOR ARRANGEMENT - A transistor arrangement comprising an electrically conductive substrate; a semiconductor body including a transistor structure, the transistor structure including a source terminal connected to said substrate; a bond pad providing a connection to the transistor structure configured to receive a bond wire; wherein the semiconductor body includes an RF-return current path for carrying return current associated with said bond wire, said RF-return current path comprising a strip of metal arranged on said body, said strip configured such that it extends beneath said bond pad and is connected to said source terminal of the transistor structure. | 04-30-2015 |
Patent application number | Description | Published |
20090237632 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife. | 09-24-2009 |
20100157260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 06-24-2010 |
20110255062 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings. | 10-20-2011 |
20110273679 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 11-10-2011 |
20120120376 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening. | 05-17-2012 |
20150055103 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening. | 02-26-2015 |