Van De Kerkhof, NL
Antonius Marinus Coenraad Petrus Van De Kerkhof, Handel NL
Patent application number | Description | Published |
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20100227480 | APPARATUS AND METHOD FOR MAINTAINING A NEAR-ATMOSPHERIC PRESSURE INSIDE A PROCESS CHAMBER - A process chamber ( | 09-09-2010 |
Antonius M.c.p.l. Van De Kerkhof, Handel NL
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20090004384 | Processing Assembly and Method for Processing a Wafer in Such a Processing Assembly - Processing assembly comprising a processing chamber ( | 01-01-2009 |
Ernst Van De Kerkhof, Bd Sittard NL
Patent application number | Description | Published |
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20090310644 | THERMOANALYTICAL INSTRUMENT - A thermoanalytical instrument, and especially a differential scanning calorimeter, has first and second measurement positions, a heater and a temperature sensor associated with each of the measurement positions, and a controller. The controller, which has an associated means for setting a predetermined temperature program, controls a heating power of the first heater to cause the temperature measured at the first position to follow the temperature program. The controller also controls both heaters to eliminate any temperature difference between the measured first and second temperatures. The controller also provides a means for determining the lower of the measured first and second measured temperatures and applies additional power to the heater associated with that lower measured temperature. | 12-17-2009 |
20140233601 | THERMOANALYTICAL INSTRUMENT - A thermoanalytical instrument, and especially a differential scanning calorimeter, has first and second measurement positions, a heater and a temperature sensor associated with each of the measurement positions, and a controller. The controller, which has an associated means for setting a predetermined temperature program, controls a heating power of the first heater to cause the temperature measured at the first position to follow the temperature program. The controller also controls both heaters to eliminate any temperature difference between the measured first and second temperatures. The controller also provides a means for determining the lower of the measured first and second measured temperatures and applies additional power to the heater associated with that lower measured temperature. | 08-21-2014 |
Ernst Van De Kerkhof, Sittard NL
Patent application number | Description | Published |
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20100195695 | THERMO-ANALYTICAL INSTRUMENT - A thermo-analytical instrument, especially a differential scanning calorimeter has a sample position ( | 08-05-2010 |
20140146847 | THERMO-ANALYTICAL INSTRUMENT - A thermo-analytical instrument, especially a differential scanning calorimeter has a sample position ( | 05-29-2014 |
Leon Van De Kerkhof, Eindhoven NL
Patent application number | Description | Published |
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20090245526 | DEVICE FOR AND METHOD OF ADDING REVERBERATION TO AN INPUT SIGNAL | 10-01-2009 |
Leon Maria Van De Kerkhof, Eindhoven NL
Patent application number | Description | Published |
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20080275710 | Scale Searching for Watermark Detection - The present invention relates to a method, device ( | 11-06-2008 |
20110106540 | STEREO CODING AND DECODING METHOD AND APPARATUS THEREOF - A method of encoding input signals (l, r) to generate encoded data ( | 05-05-2011 |
20140297296 | AUDIO OBJECT ENCODING AND DECODING - An audio object encoder comprises a receiver ( | 10-02-2014 |
20140358567 | SPATIAL AUDIO RENDERING AND ENCODING - An encoder ( | 12-04-2014 |
Marcus Adrianus Van De Kerkhof, Gt Helmond NL
Patent application number | Description | Published |
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20110013163 | DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM AND LITHOGRAPHIC APPARATUS - In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus. | 01-20-2011 |
Marcus Adrianus Van De Kerkhof, Halmond NL
Patent application number | Description | Published |
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20110200246 | Method of Measuring Overlay Error and a Device Manufacturing Method - The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined. | 08-18-2011 |
Marcus Adrianus Van De Kerkhof, Veldhoven NL
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20150323872 | Projection System and Mirror and Radiation Source for a Lithographic Apparatus - Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror ( | 11-12-2015 |
Marcus Andrianus Van De Kerkhof, Helmond NL
Patent application number | Description | Published |
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20100233599 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 09-16-2010 |