| Patent application number | Description | Published |
|---|
| 20100314913 | OPEN ROOF CONSTRUCTION FOR A VEHICLE - An open roof construction for a vehicle is provided, comprises a roof opening defined in a stationary roof part of the vehicle. A roof assembly having a movable panel for opening and closing said roof opening, of which panel the rear end, as viewed in the longitudinal direction of the car, can be moved upward and downward by a moving mechanism comprising at least a tilting lever having a first end slideably and rotatably engaging the stationary roof part and an opposite second end rotatably engaging the panel, wherein the first end of the tilting lever is drivable by drive means for its sliding motion relative to the stationary roof part and wherein the tilting lever for realising its rotational movement comprises a follower positioned between its first and second ends cooperating with a guide curve. The guide curve has an open end at which the follower can leave the guide curve when the rear end of the panel has moved upward a certain distance and wherein the moving mechanism further comprises an auxiliary lever having a first end rotationally engaging the stationary roof part and an opposite second end adapted for rotationally engaging the tilting lever at an engagement location when the follower leaves the guide pin and for carrying out then such a rotating movement around its first end that the rotational movement of the tilting lever is continued after the follower has left the guide curve. | 12-16-2010 |
| 20110233971 | OPEN ROOF CONSTRUCTION FOR A VEHICLE - An open roof construction for a vehicle is provided, comprising a stationary roof, a roof opening provided therein, a movable panel for opening and closing said roof opening and two stationary guides positioned along opposite longitudinal edges of the roof opening for guiding two guide shoes provided close to the forward edge of the movable panel. The guides each comprise at least a vertically extending guide part for a guiding cooperation with a corresponding vertically extending guide shoe part. The guide shoes are attached to the movable panel in a substantially vertically and horizontally adjustable manner by means of substantially transversally extending adjustment screws. In a position of the movable panel fully closing the roof opening the adjustment screws are covered by the stationary guides as seen in a transverse direction. The vertically extending guide parts of the stationary guides are provided with openings for, in said position, allowing access to the adjustment screws by means of an appropriate tool. | 09-29-2011 |
| 20120112497 | ROOF ASSEMBLY FOR A ROOF OF A VEHICLE, AND METHOD OF MOVING A CLOSURE PANEL AND WIND DEFLECTOR OF A ROOF ASSEMBLY - A roof assembly for a vehicle having a roof opening in its fixed roof, comprises a frame, a movable closure for opening and closing the roof opening, and guide rails in or on the frame extending laterally of the roof opening. A closure moving mechanism is guided in the guide rails. A wind deflector is positioned at a front edge of said roof opening and is movable between an inoperative lower position in which it is positioned substantially below the level of the vehicle roof and at least one operative upper position in which it at least partially extends above said level. The wind deflector is supported by arms, each extending substantially rearwards. The arms are adapted to move the wind deflector between the inoperative and operative positions. The wind deflector arms are positioned in plan view at least partly within the lateral boundaries of the respective guide rails. | 05-10-2012 |
| Patent application number | Description | Published |
|---|
| 20110228239 | LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS - A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus. | 09-22-2011 |
| 20120092631 | GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor. | 04-19-2012 |
| 20120218532 | GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFATURING METHOD - A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates. | 08-30-2012 |
| 20120236275 | PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment. | 09-20-2012 |
| 20120249983 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat. | 10-04-2012 |
| 20130010270 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction. | 01-10-2013 |
| 20130038854 | SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K. | 02-14-2013 |
| 20130088694 | LITHOGRAPHIC APPARATUS AND METHOD OF COOLING A COMPONENT IN A LITHOGRAPHIC APPARATUS - A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component. | 04-11-2013 |
| 20130149649 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system. | 06-13-2013 |
| 20130155380 | PUMP SYSTEM, A CARBON DIOXIDE SUPPLY SYSTEM, AN EXTRACTION SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude. | 06-20-2013 |
| 20150241796 | Reticle Cooling System In A Lithographic Apparatus - A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets. | 08-27-2015 |
| Patent application number | Description | Published |
|---|
| 20100062668 | EMULSION POLYMER BINDER WITH AZIRIDINE CROSSLINKING AGENT FOR MINERAL FIBER WEBS - A binder composition for mineral fiber mats or the like, where the binder composition includes a carboxylated emulsion resin and a polyfunctional aziridine crosslinking agent. The binder composition is formaldehyde free, exhibits good crosslinking density, and enables the economical production of strong, flexible fiberglass mats which may be used as thermal and acoustic insulation. | 03-11-2010 |
| 20110275752 | ALKYL METHACRYLATE/ALKYL ACRYLATE COPOLYMERS USED AS SIZING FOR REINFORCING FIBER - Reinforcing fiber for use in thermoplastic or thermosetting matrix resin are sized with one or more copolymer composition(s) obtainable by reacting: a) 5-90 pphwm of at least one alkyl methacrylate having a Tg of more than 40° C.; and b) 5-50 pphwm of at least one alkyl acrylate having a Tg of less than 0° C.; and c) 0.1-20 pphwm of at least one C3-C6 unsaturated carboxylic acid; and d) at least one further comonomer selected from the group comprising: (i) 5-50 pphwm of at least one vinyl ester of neoalkanoic acid, and (ii) 10-60 pphwm of at least one vinyl ester of α-monosubstituted fatty acids, and (iii) 5-50 pphwm of vinyl esters of an aromatic carboxylic acid, and (iv) other comonomers. | 11-10-2011 |
| 20120028783 | Plasticized vinyl acetate coplymer binder compositions for chopped strand mat - A plasticized binder composition suitable as a binder for chopped strand mats comprising (a) a copolymer obtainable by reacting; (i) 60-95 pphwm of vinyl acetate; and (ii) 5-40 pphwm of vinyl ester of α-substituted alkanoic acid; and b) a plasticizer, wherein the weight ratio of copolymer/plasticizer is from 1 to 6. | 02-02-2012 |
| 20130203927 | Plasticized Vinyl Acetate Copolymer Binder Compositions for Chopped Strand Mat - A plasticized binder composition suitable as a binder for chopped strand mats comprising (a) a copolymer obtainable by reacting; (i) 60-95 pphwm of vinyl acetate; and (ii) 5-40 pphwm of vinyl ester of α-substituted alkanoic acid; and b) a plasticizer, wherein the weight ratio of copolymer/plasticizer is from 1 to 6. | 08-08-2013 |
| 20130338253 | EMULSION POLYMERS WITH IMPROVED WET SCRUB RESISTANCE HAVING ONE OR MORE SILICON CONTAINING COMPOUNDS - Aqueous copolymer dispersions for a variety of uses, including coating compositions or binders for plasters and paints, are disclosed. The aqueous copolymer dispersions may comprise one or more silicon containing compounds, in particular hydrolyzable silane compounds without any additional reactive group. | 12-19-2013 |
