Patent application number | Description | Published |
20090014125 | SUBSTRATE PROCESSING SYSTEM AND METHOD - A substrate processing system includes a resist pattern forming apparatus including modules each configured to perform a predetermined process on a substrate with an underlying film formed thereon, an etched pattern forming apparatus including chambers each configured to perform patterning of the underlying film by use of a resist pattern as a mask, and examination devices configured to perform measurement and examination of a pattern attribute rendered on a substrate after a process in the resist pattern forming apparatus and after a process in the etched pattern forming apparatus. A controller is preset to utilize measurement results and transfer data to calculate correction value ranges respectively settable in the modules and the chambers and to determine combinations of the modules and the chambers such that corrections made within the correction value ranges cause a pattern attribute to approximate a predetermined value for each of the substrates. | 01-15-2009 |
20090269686 | SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM - A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern. | 10-29-2009 |
20100323306 | SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT METHOD, AND COMPUTER READABLE STORAGE MEDIUM - In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided which transfer a substrate in zones between adjacent heat treatment plates. At the time when performing a pre-baking treatment in the heat treatment apparatus, the substrate is transferred in order to the heat treatment plates at the same temperature, whereby the heat treatment is dividedly performed on the heat treatment plates. According to the present invention, substrates are subjected to heat treatment along the same route, so that the thermal histories are made uniform among the substrates. | 12-23-2010 |
20110086514 | SUBSTRATE PROCESSING METHOD AND APPARATUS - A substrate processing method is arranged to perform a heat process on a substrate with a coating film formed thereon to bake and cure the coating film. At first, the substrate, with the coating film formed thereon, is held at a preparatory temperature lower than a lower limit of temperature for baking and curing the coating film, to adjust distribution of a predetermined component in the coating film. Then, the substrate, with distribution of the predetermined component thus adjusted, is subjected to a heat process at a temperature not lower than the lower limit of temperature. | 04-14-2011 |
20110242513 | SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM - A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing is performed at the corrected processing temperature is measured, a distribution within the substrate of the second dimension is classified into a linear component expressed by an approximated curved surface and a nonlinear component, a processing condition of exposure processing is corrected based on the linear component from a previously obtained relation between a dimension of a resist pattern and a processing condition of exposure processing, and thermal processing at the processing temperature corrected in a temperature correcting step and exposure processing under the processing condition corrected in an exposure condition correcting step are performed to form a predetermined pattern. | 10-06-2011 |
Patent application number | Description | Published |
20090002414 | INKJET PRINTING APPARATUS AND PRINTING METHOD - There is provided an inkjet printing apparatus which prints using a printhead for discharging ink by a plurality of scanning operations of the printhead including forward scanning and reverse scanning in a single area of a print medium. In the inkjet printing apparatus, the ink discharge amount is acquired for each unit area obtained by dividing the end area of the single area in the scanning direction. The acquired ink discharge amount of each unit area is compared with a predetermined threshold. The printing ratios of the plurality of scanning operations are controlled to set the printing ratio of the final scanning operation lower than the average one of the remaining scanning operations in a unit area where the ink discharge amount is larger than the predetermined threshold. | 01-01-2009 |
20090161130 | INK JET RECORDING APPARATUS AND INK JET PRINTING METHOD - There is provided an ink jet printing apparatus in which unevenness that may occur at the edges of printing areas can be reduced also for various printing media including unspecified printing media. In the ink jet printing apparatus which uses a print head for ejecting ink and performs printing by scanning a predetermined area on a printing medium with the print head multiple times, the multiple times of scan including a forward scan and a backward scan, the apparatus comprising: a control unit that cases the print head to print patterns each of which is printed through multiple times of scan of the print head and has different portions in a time interval between the multiple times of scan, with different printing ratios for the multiple times of scan; and a setting unit that sets the printing ratios based on the test patterns. | 06-25-2009 |
20090189934 | RECORDING APPARATUS AND RECORDING METHOD - A recording apparatus for recording an image on a recording medium by scanning the recording medium with a recording head for discharging ink includes a thinning unit configured to thin data for discharging ink by the recording head on a plurality of areas formed by dividing scanning regions including at least a first scanning region and a second scanning region to be recorded each by one scan of the recording head in the scan direction, and a recording head drive unit configured to discharge ink by driving the recording head based on data which has been thinned by the thinning unit, wherein a boundary between the areas in the first scanning region is located in a different position from that of a boundary between areas in the second scanning region, which is adjacent to the first scanning region, in the scan direction. | 07-30-2009 |
20100033526 | PRINTING APPARATUS AND PRINTING METHOD - A multipass printing is performed by setting the print permission ratios, predetermined for the nozzles in adjoining first and second blocks, in a way that satisfies the following conditions (i) and (ii). (i) The print permission ratio in the boundary section between the first and second blocks represents a value between the print permission ratio in the non-boundary section of the first block and that of the second block. (ii) The print permission ratios in the non-boundary sections of the first and second blocks are each set substantively constant. This arrangement allows the print permission ratio to be adjusted among nozzle blocks, thus satisfying the condition that the print permission ratio in a boundary between adjoining nozzles blocks does not change sharply and that the print permission ratio is substantively constant in each of the nozzle blocks. It is possible to suppress “interband variations”, “seam lines” and “intraband variations” coincidentally. | 02-11-2010 |
20100118079 | INK JET RECORDING METHOD AND INK JET RECORDING DEVICE - An inkjet printing apparatus, which ejects ink from a printing head to print, is provided for reducing an ejection amount increase caused by a temperature increase of the printing head due to ink ejection in the case of high speed printing, thereby suppressing density unevenness which occurs in a printing area in the main scanning direction due to the ejection amount increase. A scanning region of the printing head is divided into a plurality of count areas provided for counting the number of times of ink ejection based on image data and the count is carried out for each of the plurality of the counting areas. The scanning region of the printing head is divided into a plurality of printing areas provided for correcting the image data in response to the count value to print the image data and the correction of the image data is carried out for each of the plurality of the printing areas. In this way, the count of image data and their correction are carried out in one main scanning region. | 05-13-2010 |
20100328385 | INK JET PRINTING APPARATUS AND INK JET PRINTING METHOD - The present invention provides an ink jet printing apparatus configured to allow the ejection performance of a print head with a large number of nozzles densely arranged therein to be kept in a favorable condition by preliminary ejection and to enable degradation of images caused by the preliminary ejection to be alleviated. Preliminary ejection data generation unit is provided which generates preliminary ejection data designed to allow ink not contributing to image printing to be ejected through nozzles | 12-30-2010 |
Patent application number | Description | Published |
20080318923 | 1,3-Dihydro-2H-Indole-2-One Compound and Pyrrolidine-2-One Compound Fused With Aromatic Heterocycle - It is intended to provide a drug which is efficacious against pathological conditions relating to arginine-vasopressin V1b receptor. More particularly speaking, it is intended to provide a drug which has a therapeutic or preventive effect on depression, anxiety, Alzheimer's disease, Parkinson's disease, Huntington's chorea, eating disorders, hypertension, digestive diseases, drug addiction, epilepsy, brain infarction, brain ischemia, brain edema, head injury, inflammation, immune diseases, alopecia and so on. As the results of intensive studies, a novel 1,3-dihydro-2H-indol-2-one compound and a pyrrolidin-2-one compound fused with a heteroaromatic ring, which are highly selective antagonists of arginine-vasopressin V1b receptor, have high metabolic stabilities and show favorable brain penetration and high plasma concentrations, are found, thereby achieving the above objective. | 12-25-2008 |
20090109414 | LITHOGRAPHY APPARATUS, METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a trans-porting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus. | 04-30-2009 |
Patent application number | Description | Published |
20110178304 | 7-PIPERIDINOALKYL-3, 4-DIHYDROQUINOLONE DERIVATIVE - Problem To provide a novel compound, a pharmaceutically acceptable salt or a hydrate thereof useful for preventing or treating for depression, anxiety disorders (such as generalized anxiety disorder, posttraumatic stress disorder, panic disorder, obsessive-compulsive disorder or social anxiety disorder), attention deficit disorder, mania, manic-depressive illness, schizophrenia, mood disorders, stress, sleep disorders, attacks, memory impairment, cognitive impairment, dementia, amnesia, delirium, obesity, eating disorder, appetite disorder, hyperphagia, bulimia, cibophobia, diabetes, cardiovascular diseases, hypertension, dyslipidemia, myocardial infarction, movement disorder (such as Parkinson's disease, epilepsy, convulsion or tremor), drug abuse, drug addiction or sexual dysfunction, based on a melanin-concentrating hormone receptor (MCH receptor) antagonistic action. | 07-21-2011 |
20120010414 | GLYCINE TRANSPORTER INHIBITING SUBSTANCES - The present invention aims to provide novel compounds of formula [I] or pharmaceutically acceptable salts thereof that are based on a glycine uptake inhibiting action and which are useful in the prevention or treatment of such diseases as schizophrenia, Alzheimer's disease, cognitive dysfunction, dementia, anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsory disorder, social anxiety disorder, posttraumatic stress disorder, specific phobia, acute stress disorder, etc.), depression, drug addiction, spasm, tremor, and sleep disorder: | 01-12-2012 |
20130123500 | ETHINYL-PYRAZOLE DERIVATIVE - Provided is a novel compound represented by formula [I] or a pharmaceutically acceptable salt thereof having antagonistic activity against group II metabolism-type glutamic acid (m-Glu) receptors. The compound or pharmaceutically acceptable salt thereof is useful as a prophylactic or therapeutic agent for diseases such as new mood disorders (depressive and bipolar disorders), anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsive disorder, social anxiety disorder, post-traumatic stress disorder, specific phobias, and acute stress disorder), schizophrenia, Alzheimer's disease, cognitive dysfunction, dementia, drug dependence, convulsions, tremors, pain, sleep disorders, and the like. | 05-16-2013 |
20130137865 | HETEROARYL-PYRAZOLE DERIVATIVE - A compound represented by formula [I] and a pharmaceutically accepted salt of said compound are a novel compound and a pharmaceutically accepted salt thereof which exert antagonistic activity against group II metabotropic glutamate (mGlu) receptors, and are effective as a novel preventive or therapeutic agent for disorders such as mood disorders (depressive disorder, bipolar disorder, etc.), anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsive disorder, social anxiety disorder, posttraumatic stress disorder, a specific phobic disorder, acute stress disorder, etc.), schizophrenia, Alzheimer's disease, cognitive impairment, dementia, drug dependence, convulsions, shivering, pain, sleep disorders, and the like. | 05-30-2013 |