Patent application number | Description | Published |
20080248432 | NEAR-FIELD EXPOSURE METHOD - A near-field exposure method wherein an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used and wherein an object to be exposed is exposed by near-field light produced at the opening of the exposure mask based on the exposure light from the exposure light source, includes a step of determining a width of the opening so as to satisfy equations (1), (2) and (3) below, where the width of the opening of the exposure mask is denoted by s (nm), a processing pitch of the object to be exposed is denoted by p (nm) and coefficients are denoted by a and b, | 10-09-2008 |
20080305412 | NEAR-FIELD EXPOSURE MASK AND NEAR-FIELD EXPOSURE METHOD - A near-field exposure mask and a near-field exposure method, the exposure mask including a light blocking film having an opening and configured to expose an object to be exposed by use of near-field light generated at the opening, wherein the opening of the exposure mask has a plurality of processing pitches and an opening width, and wherein, when the opening width of the opening is denoted by s (nm), the processing pitch is denoted by p (nm), a dimensionless parameter is denoted by E and coefficients are denoted by | 12-11-2008 |
20090208850 | Near-Field Exposure Mask, Method of Producing that Mask, Near-Field Exposure Apparatus Having that Mask, and Resist Pattern Forming Method - Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction. | 08-20-2009 |
20090233232 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS - A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): | 09-17-2009 |
20090311631 | NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD - A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative alignment of the near-field exposure mask and the substrate to be exposed, a mechanism to closely contact the near-field exposure mask and the substrate to be exposed, with each other, a mechanism to project exposure light to the near-field exposure mask, and a soft X-ray irradiating device to remove static electricity charged in at least one of the near-field exposure mask and the substrate to be exposed. The soft X-ray irradiating device is disposed at a side of the near-field exposure mask remote from the substrate to be exposed. | 12-17-2009 |
20090311633 | PATTERN FORMING METHOD - A pattern forming method includes a step of forming a photosensitive organic material layer by providing, on a substrate, a photosensitive organic material which is protected by a hydrophobic photodegradable group and is capable of generating a hydrophilic group selected from the group consisting of amino group, hydroxyl group, carboxyl group, and sulfo group by light irradiation; a step of selectively exposing the photosensitive organic material layer to light in a pattern to generate the hydrophilic group at an exposed portion; a step of providing a block polymer having a hydrophilic segment and a hydrophobic segment, on the photosensitive organic material layer after the exposure, to separate segments of the block polymer into the hydrophilic segment at a portion where the hydrophilic group generated by the exposure is present and the hydrophobic segment at a portion where the hydrophilic group is not present; and a step of removing one of the separated segments to form a pattern of the other segment. | 12-17-2009 |
20090311637 | BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD - A block copolymer that can form selectively a microphase-separated structure under exposure with an ultraviolet exposure device, and a substrate processing method by which a micropattern can be formed at a low cost on the substrate by using the block copolymer. The block copolymer has as a basic skeleton a hydrophobic block that has a repeating structure of a hydrophobic monomer and a hydrophilic block that has a repeating structure of a hydrophilic monomer having a hydrophilic functional group. At least some of the hydrophilic functional groups are covered with a hydrophobic protective group and the hydrophobic protective group, which covers the hydrophilic functional group, is dissociated from the hydrophilic functional group by light irradiation. The substrate processing method uses the block copolymer to form a micropattern on the substrate. | 12-17-2009 |
20100147796 | METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, METHOD FOR MANUFACTURING METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, AND METHOD FOR MANUFACTURING PATTERNED STRUCTURAL BODY - A method for manufacturing a patterned structural body by which a patterned structural body having a micropattern can be manufactured, a metal structural body-containing polymer film that can be used in the manufacture of the patterned structural body, and a method for manufacturing the polymer film are provided. The metal structural body-containing polymer film comprises a polymer film that includes a block copolymer having an ion-conductive segment and a non-ion-conductive segment and has a microphase-separated structure including ion-conductive domains and non-ion-conductive domains, and a metal structural body localized at the ion-conductive domains. | 06-17-2010 |
20100200544 | PRODUCTION PROCESS OF STRUCTURE - A process for producing a structure containing silicon oxide includes a step of forming a first layer of organic spin-on glass on a substrate and a step of forming a second layer of inorganic spin-on glass on the first layer. Thereafter, the first layer is etched by using a pattern formed on the second layer as a mask and then the first layer and the second layer are calcined to prepare the structure containing silicon oxide. | 08-12-2010 |
20100221656 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS - A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): | 09-02-2010 |
20100270264 | NEAR FIELD EXPOSURE MASK, METHOD OF FORMING RESIST PATTERN USING THE MASK, AND METHOD OF PRODUCING DEVICE - Provided are a near field exposure mask which can suppress heat generation of a mask during exposure and can also suppress variation in size of a resist pattern for each shot, and a resist pattern forming method using the same. The near field exposure mask includes a transparent mask matrix l | 10-28-2010 |
20100273109 | METHOD FOR PRODUCING OPTICAL PART - A method for producing an optical part includes an irradiation process for irradiating a radiation-sensitive polymerizable composition with a radiation. The radiation-sensitive polymerizable composition includes at least a polymerizable compound (a) and a polymerizable or non-polymerizable component (c). The irradiation process includes at least a first step of irradiating with a radiation only a first irradiation region that is a portion of the radiation-sensitive polymerizable composition and a second step of irradiating with a radiation only a second irradiation region that is a portion of the radiation-sensitive polymerizable composition and is different from the first irradiation region in at least one of size and position. When the component (c) is polymerizable, the polymerization rate of the component (c) is controlled to be lower than that of the polymerizable compound (a) in the first and the second steps. | 10-28-2010 |
20110242672 | LENS AND METHOD FOR PRODUCING LENS - A lens includes a transparent member, wherein the transparent member contains a plurality of polymers formed from organic monomers; the transparent member has a refractive index distribution due to the plurality of polymers; and particles having a lower thermal expansion coefficient than the transparent member are dispersed in the transparent member. | 10-06-2011 |
20120061864 | METHOD FOR MANUFACTURING LENS, APPARATUS FOR MANUFACTURING LENS, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS - A method for manufacturing a lens having a refractive index distribution includes: a step of contacting a monomer with a structural member of a polymer, the monomer and a material obtained by polymerization of the monomer showing refractive indices which are different from the refractive index of the polymer; a step of diffusing the contacted monomer in the structural member; and a step of polymerizing the monomer. In the step of diffusing the contacted monomer in the structural member, the method further includes the steps of: irradiating light on at least 50% of one of the surfaces of the structural member which is parallel to the diffusion direction of the monomer, and measuring the intensity of the light passing through the structural member in a predetermined region, and when the measured intensity of the light reaches a predetermined value, the step of polymerizing the monomer is started. | 03-15-2012 |
20120164395 | MANUFACTURING METHOD FOR PLASTIC MEMBER AND PLASTIC MEMBER - A manufacturing method for a plastic member having composition distribution includes: charging a first radiation polymerizable composition containing a first monomer being radiation-polymerizable into a casting cell having formed thereon a radiation irradiation surface; obtaining a polymer of a first composition by irradiating the radiation irradiation surface of the casting cell with the radiation, to polymerize a part of the first radiation polymerizable composition; removing an unpolymerized part of the first radiation polymerizable composition from the casting cell; bringing into contact with the polymer of the first composition by charging a second radiation polymerizable composition containing a second monomer being radiation-polymerizable into gaps of the casting cell, which are generated by the removal; dispersing the second radiation polymerizable composition into the polymer of the first composition; and curing an entire of the second radiation polymerizable composition and the polymer of the first composition dispersed within the casting cell. | 06-28-2012 |
20130136901 | CURABLE COMPOSITION AND METHOD OF FORMING PATTERN - A curable composition that can be released from a mold simply within a short period of time after photo-curing by a small mold-releasing force is provided. The curable composition contains a gas-generating agent that generates a gas by pressure application. A method of forming a pattern is also provided. In the method, the mold can be released with a small force. | 05-30-2013 |
20130137252 | PATTERN FORMING METHOD - In a pattern forming method, a pattern having at least either a recess or a protrusion of a curable composition is formed of a curable composition by curing the curable composition into a cured film with a mold having a surface provided with at least either a recess or a protrusion, and separating the mold from the curable composition. The method includes (i) forming a gas generation region containing a gas generator agent so that the gas generation region will be disposed in contact with both the mold and the cured film between the mold and the cured film, (ii) generating a gas from the gas generation region, and (iii) separating the mold from the cured film during or after the step of (ii). | 05-30-2013 |
20140217063 | METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, METHOD FOR MANUFACTURING METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, AND METHOD FOR MANUFACTURING PATTERNED STRUCTURAL BODY - A method for manufacturing a patterned structural body by which a patterned structural body having a micropattern can be manufactured, a metal structural body-containing polymer film that can be used in the manufacture of the patterned structural body, and a method for manufacturing the polymer film are provided. The metal structural body-containing polymer film comprises a polymer film that includes a block copolymer having an ion-conductive segment and a non-ion-conductive segment and has a microphase-separated structure including ion-conductive domains and non-ion-conductive domains, and a metal structural body localized at the ion-conductive domains. | 08-07-2014 |
20140329057 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD - A photo-curable composition having a high polymerization rate and a high polymerization conversion is provided. A patterning method having a high throughput is also provided. | 11-06-2014 |
20140349086 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME - The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. | 11-27-2014 |
20140363584 | METHOD OF PRODUCING CURED PRODUCT AND METHOD OF FORMING PATTERN - The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas. | 12-11-2014 |
20150050426 | METHOD OF FORMING FILM - Provided is a method of manufacturing a film, including: applying, onto a substrate, a photocurable composition containing a polymerizable monomer, a photopolymerization initiator, and a photosensitive gas generator that generates a gas through light stimulation to form an applied film; bringing a mold into contact with the applied film; irradiating the applied film with light through the mold to cure the applied film and to generate the gas in the applied film; and releasing the mold from the applied film after the irradiation of the applied film with the light to form a film (cured film) having a predetermined pattern shape on the substrate, in which in the irradiation of the applied film with the light, a reaction rate of a polymerization reaction of the polymerizable monomer in the applied film is higher than a reaction rate of a gas-generating reaction of the photosensitive gas generator in the applied film. | 02-19-2015 |
20150075855 | METHOD FOR MANUFACTURING PHOTO CURED MATERIAL - Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is −1.0% to 3.0%. | 03-19-2015 |
20150086755 | PHOTOCURED PRODUCT - To provide a photocured product having small mold releasing force. A photocured product obtained by curing with light and containing a surface active agent, wherein a peak area of the ether bond derived peak is 3.0 times or more as large as a peak area of the ester bond derived peak, wherein the peak areas are obtained by peak separation processing by curve fitting of an X-ray photoelectron spectroscopy spectrum obtained as an analytical result on a chemical state of carbon at topmost surface of the photocured product, the analytical result being among analytical results on the topmost surface of the photocured product obtained by surface analysis of the photocured product with angle resolved X-ray photoelectron spectroscopy. | 03-26-2015 |