Tomasch
Alfred Tomasch, Wien AT
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20110013661 | LASER CRYSTAL DEVICE - The present disclosure relates to a laser crystal device ( | 01-20-2011 |
Alfred Tomasch, Vienna AT
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20140328365 | MULTIFUNCTIONAL LASER DEVICE - A multifunctional laser device configured to be applicable as such in each of: multiple photon processes, nano structuring processes, optical coherence tomography, Terahertz (THZ) spectroscopy, THz imaging; or a combination of such processes; and comprising a mode-locked linear (X or Z-folded) fs laser resonator having a repetition rate of at least 300 MHz and 600 MHz at most and, thus, a corresponding short resonator length, said fs laser resonator further being a dispersive mirrors cavity having an average negative GDD (Group Delay Dispersion) in the spectral range of the laser operation, and being arranged to generate laser pulses with a pulse width of less than 30 fs, and comprising a pump laser operating at an optical output pump power of less than 2 W. | 11-06-2014 |
Greg Tomasch, Kelseyville, CA US
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20140251382 | Methods for Confinement of Foam Delivered by a Proximity Head - A method suctions liquid from an upper surface of a substrate as the substrate is transported by a carrier under a head in a chamber. This operation is performed by the first section of the head. The method causes a first film of cleaning foam to flow onto the upper surface of the substrate as the substrate proceeds under the head. This operation is performed by a second section which is contiguous to the first section in the head. The method causes a second film of rinsing fluid to flow onto the upper surface of the substrate as the substrate is carried under the head. This rinsing operation is performed by a third section which is contiguous to the second section in the head and which is defined partially around the second section and up to the first section. | 09-11-2014 |
Gregogry A. Tomasch, Kelseyville, CA US
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20100126528 | Confinement of Foam Delivered by a Proximity Head - In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber. | 05-27-2010 |
Gregory A. Tomasch, Kelseyville, CA US
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20090320942 | SINGLE SUBSTRATE PROCESSING HEAD FOR PARTICLE REMOVAL USING LOW VISCOSITY FLUID - A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate. | 12-31-2009 |
20100024842 | GENERATOR FOR FOAM TO CLEAN SUBSTRATE - In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system. | 02-04-2010 |
20120255618 | Method for Using Generator for Foam to Clean Substrate - A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system. | 10-11-2012 |
20140041581 | Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid - A head for dispensing a thin film of a fluid over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extends to an outlet slot. The plurality of feeds has a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. The fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the outlet slot onto the substrate. | 02-13-2014 |
Gregrory A. Tomasch, Kelseyville, CA US
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20110100399 | IN SITU MORPHOLOGICAL CHARACTERIZATION OF FOAM FOR A PROXIMITY HEAD - In an example embodiment, a wet system delivers a flow of cleaning foam through a channel in a proximity head to a meniscus interfacing with a semiconductor wafer. The wet system diverts a sample of the flow from the channel through a transparent cell that is connected to the channel by an input passage that leads from the channel to the transparent cell and by an output passage that leads from the transparent cell back to the channel. The wet system illuminates the sample in the transparent cell with an LED from the top or the back and captures an image of the illuminated sample with a CCD camera. The image shows a morphological attribute of the cleaning foam such as bubble diameter or spacing. The wet system generates a statistical characterization from the morphological attribute and adjusts other attributes of the cleaning foam based on the statistical characterization. | 05-05-2011 |