Patent application number | Description | Published |
20120080636 | PIEZOELECTRIC CERAMIC, PIEZOELECTRIC ELEMENT COMPRISING IT, AND PIEZOELECTRIC DEVICE COMPRISING PIEZOELECTRIC ELEMENT - According to a preferred embodiment, the piezoelectric ceramic includes a complex oxide having the composition represented by formula (1) or (2), and Mn at 0.2-1.2 mass % or 0.2-3 mass %, respectively, in terms of MnCO | 04-05-2012 |
20150348709 | DIELECTRIC CERAMIC COMPOSITION AND DIELECTRIC DEVICE - To provide a dielectric ceramic composition having a high dielectric constant, i.e., 3,000 or more, at elevated temperatures at or above 150° C. and having a practically sufficient relative dielectric constant at an applied DC electric field of 2 V/μm, and to provide a dielectric device including such a dielectric ceramic composition, a dielectric ceramic composition is a composite oxide represented by formula (1): | 12-03-2015 |
20160049248 | DIELECTRIC CERAMIC COMPOSITION AND DIELECTRIC ELEMENT - The present invention relates to a dielectric ceramic composition which is complex oxides represented by the following formula (1), {[(Bi | 02-18-2016 |
Patent application number | Description | Published |
20090307588 | Apparatus for controlling pointer operation - An apparatus for controlling operation of an operation device controls the operation device in the following manner. That is, when a pointer on a display screen is controlled by the operation device, the operation of the operation device is regarded as an equivalent of a press operation of an OK button that affirms a certain decision, or as an equivalent of a press operation of a switch button that switches a current screen to the next one, upon detecting an exit of the pointer from a wall area of the screen. | 12-10-2009 |
20100005412 | In-vehicle display apparatus - An in-vehicle display apparatus includes (i) an operation device having an operation knob, and (ii) a display control device having a display section. The operation device has a drive section which gives force to the operation knob. When the display section displays a display window to enable a scroll display in which several selection buttons are circulated, the display control device acquires a reactive force map. The map specifies that a vibration is applied to the operation knob when the cursor is located on the selection button at the tail end of the series of the selection buttons in the display window. The display control device then instructs the drive section to apply the vibration to the operation knob based on the acquired reactive force map. | 01-07-2010 |
20110128139 | Information presentation apparatus - An information presentation apparatus includes an action determination section to execute a determination as to whether a driver becomes aware of an attention-seeking display sign or an alarm display sign, and an information presentation control circuit to cause a display device to perform a display changeover to change a display mode of an attention-seeking display sign or alarm display sign into an attenuation display mode based on an affirmative result from the determination by the action determination section. Herein, the action determination section executes the above determination based on reference information such as driver action confirmation information or vehicle information, which is a signal generated by a switch manipulation or a driving operation of the driver when noticing the attention-seeking display sign or alarm display sign displayed in the display device. | 06-02-2011 |
Patent application number | Description | Published |
20080228388 | Map display apparatus for vehicle - A transit time period from a departure point is inputted. A first road map is once displayed to have a broad covering range to include the departure point and an estimated reachable point, which the vehicle reaches after the transit time period elapses. Then, a second road map having a covering range narrower than that of the first road map is displayed to include only the estimated reachable point without including the departure point. This allows the user to easily recognize the positional relationship between the estimated reachable point and the departure point, and an approximate position of the estimated reachable point against the guide route. | 09-18-2008 |
20080294339 | Route display apparatus and route display system - A navigation system includes a control circuit that controls scrolling of a navigation route together with economical driving information pertaining to a part of the navigation route on a display unit so as to match a moving point along the navigation route to a standard point of the display unit (e.g., a center of the display), thereby allowing a user of the navigation system to recognize the economical driving information of the navigation route prior to the travel of the navigation route in the course of confirmation of the navigation route and enabling the user to imagine required operation condition of economic driving. | 11-27-2008 |
20100030419 | Information processing apparatus - When it is determined that a head light is turned on, the sunset time is calculated. Thus, the frequency of calculating the sunset time is significantly decreased as compared with that of continuously calculating the sunset time, thereby reducing the processing load. Further, as compared with the case where the sunset time is calculated regardless of the time of lighting on, the calculated sunset time can evaluate the time of lighting on appropriately. | 02-04-2010 |
20100030420 | APPARATUS AND METHOD FOR ADVICE PROVISION AND DRIVING CONDITION DIAGNOSIS - An advice provision apparatus calculates the driving condition of the vehicle for every predetermined travel section, for the purpose of comparison with the driving condition in the previous travel section. The driving condition of the current section is evaluated in a relative manner based on the comparison of at least two travel sections, even when the absolute assessment of the driving condition is difficult. Thus, the advice provision apparatus can accurately and precisely diagnose the driving condition of the driver. | 02-04-2010 |
20100030422 | Vehicle apparatus - A navigation apparatus carries out a diagnosing process for vehicle behavior, for example, whether sudden accelerating operation or sudden braking operation has been done, wherein the diagnosing process is carried out based on vehicle acceleration. It is necessary to accurately calculate the vehicle acceleration in order to perform a reliable diagnosing process. The navigation apparatus calculates a difference between a first vehicle acceleration defined by an output from an acceleration sensor and a second vehicle acceleration calculated based on a vehicle speed and vehicle angular speed. The navigation apparatus carries out the diagnosing process, for example, when the above difference between the first and second vehicle accelerations is less than a predetermined value. | 02-04-2010 |
20100185359 | DRIVING DIAGNOSIS APPARATUS AND DRIVING DIAGNOSIS SYTEM - A driving diagnosis apparatus temporarily records a diagnosis result of the user before changed when a user is switched, and starts to diagnose the user after changed. Accordingly, since driving status of each user is independently diagnosed, the diagnosis result is proper. Further, when a driving distance of the vehicle is smaller than a threshold, the diagnosis result of a driving interval is not recorded so that the driving interval is removed from an object of giving a point. Influence to environment is also considered in evaluation of the driving status. Accordingly, in the driving diagnosis apparatus and a driving diagnosis system for diagnosing driving status and for evaluating a driver based on the diagnosis result, the diagnosis and the evaluation are properly performed. | 07-22-2010 |
20110140874 | DRIVING DIAGNOSIS INFORMATION PROVIDING APPARATUS AND SYSTEM - A driving diagnosis information providing apparatus for a vehicle is disclosed. The driving diagnosis information providing apparatus acquires vehicle information indicative of a vehicle state, and makes a diagnosis of a driving state of the vehicle based on the vehicle information. The driving diagnosis information providing apparatus acquires, as useful information, one of announce information and helpful information. The announce information includes information to be reported to a driver of the vehicle. The helpful information includes information helpful for driving. The driving diagnosis information providing apparatus notifies the driver of diagnosis information indicative of a result of the diagnosis, and notifies the useful information in place of the diagnosis information under a predetermined condition. | 06-16-2011 |
Patent application number | Description | Published |
20080217295 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - The present invention provides a plasma processing apparatus or a plasma processing method that can etch a multilayer film structure for constituting a gate structure with high accuracy and high efficiency. A plasma processing method of, on processing a sample on a sample stage | 09-11-2008 |
20080317581 | Vacuum Processing Apparatus - A vacuum processing apparatus includes an outer chamber comprising a vacuum container, an inner chamber in which a plasma used for processing a wafer is generated, the inner chamber being detachably disposed inside of the outer chamber, a wafer holder on which the wafer is located is disposed inside of the inner chamber, and an exhausting device disposed below the wafer holder which exhausts the inside of the inner chamber. The inner chamber is sealed in air-tight manner with respect to a space between the inner chamber and the outer chamber while the space is maintained at a vacuum pressure. | 12-25-2008 |
20090000739 | Vacuum processing apparatus - A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and amass flow controller unit interposed between two processing chambers for supplying gas to the chambers. | 01-01-2009 |
20100043976 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber. | 02-25-2010 |
20100171061 | VACUUM PROCESSING APPARATUS - The invention provides a highly reliable plasma processing apparatus having stable sealing performance. The vacuum processing apparatus comprises a vacuum vessel having its inside decompressed; an opening disposed in a wall of the vacuum vessel for communicating the inside with the outside thereof and through which a sample to be processed is taken in and out; a valve body | 07-08-2010 |
20110110751 | VACUUM PROCESSING SYSTEM AND VACUUM PROCESSING METHOD OF SEMICONDUCTOR PROCESSING SUBSTRATE - A vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same comprises an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer transferred from the atmospheric transfer chamber, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, a second vacuum transfer chamber connected to the transfer intermediate chamber, at least one vacuum processing chamber connected to the first vacuum transfer chamber, and two or more vacuum processing chambers connected to a rear side of the second vacuum transfer chamber, wherein the number of vacuum processing chambers connected to the first vacuum transfer chamber is smaller than the number of vacuum processing chambers connected to the second vacuum transfer chamber, or the number of use of vacuum processing chambers connected to the first vacuum transfer chamber is restricted to one. | 05-12-2011 |
20110110752 | VACUUM PROCESSING SYSTEM AND VACUUM PROCESSING METHOD OF SEMICONDUCTOR PROCESSING SUBSTRATE - The invention provides a vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same, comprising an atmospheric transfer chamber having a plurality of cassette stands, a lock chamber arranged on a rear side of the atmospheric transfer chamber, and a first vacuum transfer chamber connected to a rear side of the lock chamber, wherein the first vacuum transfer chamber does not have any vacuum processing chamber connected thereto and has transfer intermediate chambers connected thereto, and the transfer intermediate chambers have subsequent vacuum transfer chambers connected thereto, and wherein the wafers are transferred via the lock chamber to the first vacuum transfer chamber to be processed in each of the subsequent vacuum processing chambers, which are further transferred via any of the transfer intermediate chambers connected to the first vacuum transfer chamber to the subsequent vacuum transfer chambers, and the respective wafers transferred to the subsequent vacuum transfer chambers other than the first vacuum transfer chamber are transferred to the respective vacuum processing chambers connected to each of the vacuum processing chambers and processed therein. | 05-12-2011 |
20110259522 | Vacuum Processing Apparatus - A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow controller unit interposed between two of the processing chambers for supplying gas to the chambers. | 10-27-2011 |
20120091386 | VACUUM PROCESSING APPARATUS - A vacuum processing apparatus that includes a vacuum vessel; an opening disposed in a wall of the vacuum vessel, through which a sample to be processed is taken in and out; a valve body disposed outside the wall for airtightly sealing the opening; and a drive unit driving the valve body to carry out a sealing or opening operation. The drive unit includes a first member coupled to an actuator that moves along a substantially linear first direction as a result of operation of the actuator, and a second member coupled to the first member that moves along a substantially linear second direction that intersects with the first direction. The valve body, coupled to the second member, seals the opening as a result of movement of the second member. | 04-19-2012 |
20150194327 | VACUUM PROCESSING SYSTEM AND VACUUM PROCESSING METHOD OF SEMICONDUCTOR PROCESSING SUBSTRATE - A vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same comprises an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer transferred from the atmospheric transfer chamber, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, a second vacuum transfer chamber connected to the transfer intermediate chamber, at least one vacuum processing chamber connected to the first vacuum transfer chamber, and two or more vacuum processing chambers connected to a rear side of the second vacuum transfer chamber, wherein the number of vacuum processing chambers connected to the first vacuum transfer chamber is smaller than the number of vacuum processing chambers connected to the second vacuum transfer chamber, or the number of use of vacuum processing chambers connected to the first vacuum transfer chamber is restricted to one. | 07-09-2015 |
Patent application number | Description | Published |
20090152242 | PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD - The invention provides a plasma treatment apparatus or a plasma treatment method having a high productivity while maintaining a stable treatment performance. In a plasma treatment apparatus feeding a plurality of gases fed into the treatment chamber and treating a sample arranged within the treatment chamber by a plasma formed by using the plurality of gases, the plasma treatment apparatus has a plurality of feeding gas lines in which the plurality of gases respectively pass, a plurality of gas flow rate regulators respectively arranged on the feeding gas lines and respectively regulating flow rates of the plurality of gases, and a testing gas flow path coupled to the gas line so as to be arranged outside the treatment chamber and arranging a tester testing a flow rate of a gas from a gas flow rate controller therein, and the plasma treatment apparatus tests the gas flow rate regulator on a gas line corresponding to the gas which is not used for the treatment in the plurality of gases in parallel with the treatment. | 06-18-2009 |
20090165952 | VACUUM PROCESSING APPARATUS - The invention provides a semiconductor manufacturing apparatus having a high productivity per installed area. In a vacuum processing apparatus provided with a plurality of cassettes on which a cassette is stored, a vacuum feed chamber arranged in a back face side of the atmospheric air feed chamber in a state of being coupled thereto, having a polygonal plane shape and structured such that the wafer is fed in a depressurized inner portion, and a plurality of vacuum processing chambers detachably coupled to a side surface of the vacuum feed chamber, arranged in adjacent thereto and processing the wafer fed to an inner portion from the vacuum feed chamber, a plurality of vacuum processing apparatuses includes a plurality of etching processing chamber carrying out an etching process of the wafer and at least one ashing processing chamber carrying out an ashing process of the wafer, the ashing processing chamber is coupled to a side surface in one of right and left sides as seen from the front face of the vacuum feed chamber, and the atmospheric air feed chamber is arranged so as to be biased to the one side to which the ashing processing chamber is coupled. | 07-02-2009 |
20110217148 | VACUUM PROCESSING APPARATUS AND PROGRAM - The present invention provides an efficient transferring control method in a vacuum processing apparatus of a linear tool in which plural vacuum robots are arranged in transferring mechanical units to which process chambers are connected and processing-target members are passed and received among the plural vacuum robots. In addition, the present invention provides a vacuum processing apparatus in which there are provided plural controlling methods, and a unit which determines whether rates of the transferring robots are to be controlled or rates of the process chambers are to be controlled on the basis of processing time of each processing-target member and switches the controlling method in accordance with a site whose rate is controlled. | 09-08-2011 |
20110218662 | VACUUM PROCESSING APPARATUS AND PROGRAM - Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules. | 09-08-2011 |
20110229289 | VACUUM PROCESSING APPARATUS - The apparatus includes a load lock adapted to store the workpiece inside and to be switched between atmosphere and vacuum; vacuum transport chambers connected to the load lock and to the corresponding process chambers in a state where the load lock and each of the process chambers are isolated mutually; transfer means for transferring the workpiece between each of the process chambers and the load lock via the corresponding vacuum transport chamber; load lock valves adapted to switch between interrupt and opening at a position between the load lock and the corresponding vacuum transport chambers; process chamber valves adapted to switch between interrupt and opening at a position between the process chambers and the corresponding vacuum transport chambers; and control means for controlling timing of the opening and closing of the valves whose timings are controlled in synchronization with the transfer of the workpieces. | 09-22-2011 |
20110318143 | VACUUM PROCESSING APPARATUS - A vacuum processing apparatus includes a first lock chamber and a second lock chamber coupled to a back face side of the atmospheric transfer chamber in parallel, a first transfer chamber coupled to a rear side of the first lock chamber, a second transfer chamber coupled, on the rear side of the first transfer chamber, a third transfer chamber coupled to the rear side of the second lock chamber, a first and a second relay chamber disposed between the first transfer chamber/the second transfer chamber and the first transfer chamber/the third transfer chamber to transfer a wafer between these chambers, and a plurality of processing chambers coupled to either the first, the second or the third transfer chamber, in addition, the number of the processing chambers coupled to the second transfer chamber is greater than that of the processing chambers coupled to either the first or the third transfer chamber, and the wafer alone processed in the processing chamber coupled to either the first or the second transfer chamber is transferred to the third robot in the second relay chamber. | 12-29-2011 |
20120027542 | Vacuum processor - A vacuum processor includes a first transfer vessel that is connected on the back of a lock chamber connected on the back of an atmospheric transfer vessel and has a first robot; a second transfer vessel that is arranged at the back of this first transfer vessel, connected to the first transfer vessel, and has a second robot; a repeating vessel that connects the transfer vessels, and has a storage section in which the wafer is transferred between the robots; and a processing vessel that is connected, on an almost perpendicular side, to the repeating vessel around the second transfer vessel and in which the wafer is processed at a processing chamber, wherein the first robot has two arms that are expanded and contracted to both directions across a pivot axis, and the second robot has two arms that are expanded and contracted to the same direction around the pivot axis. | 02-02-2012 |
20120163943 | VACUUM PROCESSING APPARATUS - The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened. | 06-28-2012 |
20130142595 | VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME - A vacuum processing apparatus includes a row of containers of vacuum transfer chambers connected to each other behind a lock chamber, a wafer being transferred through depressurized inside of the row of the containers of the vacuum transfer containers, an intermediate chamber disposed between the containers of the vacuum transfer chambers, a plurality of processing units including processing containers respectively connected to left or right side walls of the containers of the vacuum transfer chambers and the wafer is processed therein, and a bypass chamber which constitutes a bypass path connecting the processing units, where only either the wafer which is being transferred from the lock chamber toward one of the processing units or the wafer which was processed in one of the processing units and is being transferred toward the lock chamber is transferred through the containers of the vacuum transfer chambers. | 06-06-2013 |
20130183121 | VACUUM PROCESSING APPARATUS - In a vacuum processing apparatus having a plurality of vacuum processing chambers at least one of which are coupled to each of a plurality of vacuum transfer chambers which are behind an atmospheric transfer chamber and have vacuum transfer robots in their interior to transfer a wafer, taking out a plurality of wafers in a cassette and transferring successively to the plurality of the vacuum processing chambers, and thereafter returning to the cassette, the wafers are controlled to be transferred to all of the vacuum processing chambers coupled to the backmost vacuum transfer chamber and thereafter a next wafer is transferred to a vacuum processing chamber which becomes possible for the next wafer to be transferred in before they are possible to be transferred out from the vacuum processing chambers coupled to the backmost vacuum transfer chamber and arranged backmost. | 07-18-2013 |
Patent application number | Description | Published |
20150063856 | IMAGE FORMING APPARATUS - An image forming apparatus includes a sheet conveyance passage, a photosensitive drum, a transfer unit, a fixing section, a conveyance unit, one or more detection sensors, an airflow generating section, a cooling airflow passage, and a shielding member. The conveyance unit is at an opposite side of the transfer unit from the photosensitive drum with a predetermined clearance from the transfer unit. Each detection sensor is disposed to face the transfer unit in cross section intersecting the axial direction of the photosensitive drum. The sheet detection sensor performs a predetermined detection. The airflow generating section causes a cooling airflow to flow between the transfer unit and the conveyance unit in the axial direction. The cooling airflow passage guides the cooling airflow toward each detection sensor. The shielding member blocks an airflow from a location around the transfer unit toward the cooling airflow passage in a direction intersecting the axial direction. | 03-05-2015 |
20150177642 | DEVELOPING ROLLER, DEVELOPING DEVICE, AND IMAGE FORMING APPARATUS INCLUDING DEVELOPING DEVICE - A developing roller includes a roller main body disposed to face, without contact, an outer circumferential surface of an image carrier. A resin coat layer has been formed on an outer circumferential surface of the roller main body, the resin coat layer being made of a resin material having electric conductivity. A product of resistance component Rs [Ω] and electrostatic capacitance component Cs [F] in AC impedance Z of the roller main body is in a range from 2.79×10 | 06-25-2015 |
20150293470 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS INCLUDING THE SAME - A developing device includes a housing, a development roller, and a roller gear. The roller gear is disposed at one axial end of the development roller and transmits a rotational drive force to the development roller. The development roller includes a sleeve and a coating layer. The coating layer is formed by dipping the sleeve in a dipping bath with the sleeve directed axially vertically. The development roller is mounted to the housing such that a lower axial end of the development roller at the time of the dipping is an opposite axial end to the one axial end at which the roller gear is disposed. | 10-15-2015 |
Patent application number | Description | Published |
20090075109 | SILVER ALLOY REFLECTIVE FILMS FOR OPTICAL INFORMATION RECORDING MEDIA, SILVER ALLOY SPUTTERING TARGETS THEREFOR, AND OPTICAL INFORMATION RECORDING MEDIA - A silver alloy reflective film is used in an optical information recording medium and contains silver as a main component, a total of 0.01 to 3 atomic percent of at least one of Bi and Sb, and a total of 3 to 42 atomic percent of at least one of Cu, Ge, Mg, and Zn. The silver alloy reflective film preferably further contains 0.1 to 3 atomic percent of yttrium. An optical information recording medium includes the silver alloy reflective film. A sputtering target for depositing the silver alloy reflective film contains silver as a main component, 0.01 to 3 atomic percent of Sb (or 0.03 to 10 atomic percent of Bi), and a total of 3 to 42 atomic percent of at least one of Cu, Ge, Mg, and Zn. | 03-19-2009 |
20100227107 | RECORDING LAYER FOR OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING MEDIUM, AND SPATTERING TARGET - Disclosed are optical information recording layers to create recording marks upon irradiation with a laser beam, in which the recording layers are composed of: an indium alloy containing 0.1 to 15 atomic percent of one or more rare-earth elements; an indium alloy containing 0.1 to 50 atomic percent of one element selected from the group consisting of palladium (Pd), cobalt (Co), platinum (Pt), and vanadium (V); an indium alloy containing 6 to 50 atomic percent of nickel (Ni); or an indium alloy containing 0.1 or more and less than 50 atomic percent of gold (Au). Also disclosed are information storage media provided with the recording layers, and sputtering targets for the deposition of the recording layers, which have the alloy compositions. | 09-09-2010 |
20120177863 | RECORDING LAYER FOR OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING MEDIUM, AND SPUTTERING TARGET - A recording layer excellent in recording property, an optical information recording medium including the recording layer, and a sputtering target for producing the recording layer. The recording layer on which recording is performed through irradiation with a laser light, contains: a Pd oxide; a Ag oxide; and an oxide of a metal X of having an absolute value of the standard free energy of oxide formation per 1 mol of oxygen that is larger than an oxide of Pd and Ag, wherein a ratio of Pd atom to a total (metal X atom+Pd atom+Ag atom) is from 10 to 60 atomic %, a ratio of Ag atom to the total is from 5 to 45 atomic %, and a ratio of Pd atom and the Ag atom to the total is 75 atomic % or less. | 07-12-2012 |
20120225323 | Ag ALLOY THERMAL DIFFUSION CONTROL FILM FOR USE IN MAGNETIC RECORDING MEDIUM FOR HEAT-ASSISTED MAGNETIC RECORDING, MAGNETIC RECORDING MEDIUM FOR HEAT-ASSISTED MAGNETIC RECORDING, AND SPUTTERING TARGET - Disclosed is a thermal diffusion control film to be used in a magnetic medium for thermally assisted recording, said thermal diffusion control film maintaining a high heat conductivity, and at the same time, having all of a high thermal diffusivity, a smooth surface roughness, and a high heat resistance. The thermal diffusion control film, i.e., an Ag alloy thermal diffusion control film, is composed of an Ag alloy having Ag as a main component, and satisfies a surface roughness (Ra) of 1.0 nm or less, a heat conductivity of 100 W/(m·K) or more, and a thermal diffusivity of 4.0×10 | 09-06-2012 |
20140093672 | RECORDING FILM FOR OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING MEDIUM, AND SPUTTERING TARGET USED TO FORM SAID RECORDING FILM - Provided is a recording film for an optical information recording medium with which it is possible to meet all predetermined characteristics requirements and increase productivity while reducing the number of layers in the optical information recording medium. The present invention relates to a recording film for an optical information recording medium on which recording is performed by laser light irradiation, wherein the recording film for an optical information recording medium includes: Mn; at least one element (group X element) selected from the group consisting of Bi, Ag, Co, Cu, In, Sn, and Zn (group X); and oxygen (O). At least some of the Mn and at least some of the group X element are oxidized. | 04-03-2014 |
20140342104 | AG ALLOY FILM FOR REFLECTIVE ELECTRODES, AND REFLECTIVE ELECTRODE - An Ag alloy film for use in reflective electrodes is provided, which has a low electrical resistivity and a high reflectance that are almost at the same levels as those of an Ag film, and has excellent oxidation resistance. An Ag alloy film for reflective electrodes, which can be used in a reflective electrode and is characterized in that at least one element selected from the group consisting of In and Zn is contained in an amount of 0.1 to 2.0 atomic %. | 11-20-2014 |
20140369884 | AG ALLOY FILM TO BE USED AS REFLECTING FILM AND/OR TRANSMITTING FILM OR AS ELECTRICAL WIRING AND/OR ELECTRODE, AG ALLOY SPUTTERING TARGET, AND AG ALLOY FILLER - The present invention provides an Ag alloy film which exhibits a low-level electrical resistivity nearly equivalent to that of a pure Ag film and which is superior to a conventional Ag alloy film in durability (specifically, resistances to salt water and halogen) and in the adhesion to a substrate. Further, the deposition rate of this Ag alloy film by sputtering is as high as that of a pure Ag film. Provided is an Ag alloy film useful as a reflecting film and/or a transmitting film or as an electrical wiring and/or an electrode, including 0.1 to 1.5 atomic % of at least one element selected from Pd, Au and Pt, and 0.02 to 1.5 atomic % of at least one element selected from at least one rare earth element, Bi and Zn with the balance being Ag and inevitable impurities. | 12-18-2014 |