Patent application number | Description | Published |
20090078197 | Substrate processing system, control method for substrate processing apparatus and program - The present invention provides a substrate processing system, a control method for a substrate processing apparatus, and a program for the system and/or method, each of which is intended to achieve effective control for a film-forming amount on processed substrates. The substrate processing system includes a substrate processing unit adapted for forming a film on each of the plurality of substrates; a pattern obtaining unit adapted for obtaining information about an arrangement pattern concerning arrangement of unprocessed substrates and processed substrates among the plurality of substrates; and a memory unit adapted for storing therein an arrangement/film-forming-amount model indicative of influence exerted on the film-forming amount on the substrates by the arrangement of the unprocessed substrates and processed substrates among the plurality of substrates. A calculation unit calculates an estimated film-forming amount on the substrates, in the case of the arrangement pattern, based on the arrangement/film-forming-amount model. Then, a determination unit determines whether or not the estimated film-forming amount calculated by the calculation unit is within a predetermined range. If the estimated film-forming amount calculated by the calculation unit is determined to be within the predetermined range, a control unit will control and drive the substrate processing unit to process the substrates. | 03-26-2009 |
20090117259 | Processing system, processing method, and computer program - The present invention provides a processing system, a processing method and a program, which can readily control a gas flow rate. A vertical-type heating apparatus | 05-07-2009 |
20090232967 | THERMAL PROCESSING APPARATUS, METHOD FOR REGULATING TEMPERATURE OF THERMAL PROCESSING APPARATUS, AND PROGRAM - There are provided a thermal processing apparatus, a method for regulating a temperature of a thermal processing apparatus, and a program, by which a temperature can be easily regulated. A control part | 09-17-2009 |
Patent application number | Description | Published |
20120064469 | VERTICAL-TYPE HEAT TREATMENT APPARATUS, AND CONTROL METHOD FOR SAME - A heat treatment apparatus and control method enabling the apparatus to settle down the internal temperature of a treating vessel to a target temperature accurately and quickly. The apparatus includes a furnace body with a heater on an inner circumferential surface thereof, a treating vessel disposed inside the furnace body, a cooling medium supply blower and cooling medium release blower connected to the furnace body, and a temperature sensor provided inside the treating vessel. A signal from the temperature sensor is sent to a heater output computing unit of a controller. The computing unit determines a heater output level to be obtained during temperature regulation with the heater only, the heater output level being based on a preset temperature that has been determined by a temperature determining unit and temperature detected by the temperature sensor. A blower output computing unit activates blower output based on the heater output level. | 03-15-2012 |
20120064472 | VERTICAL-TYPE HEAT TREATMENT APPARATUS - A heat treatment apparatus and control method enabling the apparatus to settle down an internal temperature of a treating vessel to a target temperature accurately and quickly. The heat treatment apparatus includes a furnace body with a heater on an inner circumferential surface thereof, the treating vessel disposed inside the furnace body, a cooling medium supply blower and cooling medium release blower each connected to the furnace body, and a temperature sensor provided inside the treating vessel. A signal from the temperature sensor is sent to a heater output computing unit and blower output computing unit included in a controller. The heater output computing unit determines a heater output level based on a heater output numerical model and the signal from the temperature sensor. The blower output computing unit determines a blower output level based on a blower output numerical model and the signal from the temperature sensor. | 03-15-2012 |
20120223066 | THERMAL PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME - A control unit can select a large-number control zone model in which the number of control zones, which are independently controlled, is large, and a small-number control zone model in which the number of control zones, which are independently controlled, is small. When a temperature is increased or decreased, the control unit can select the small-number control zone model so as to control, based on signals from temperature sensors of the respective control zones C | 09-06-2012 |
20120251966 | HEAT TREATMENT CONTROL SYSTEM AND HEAT TREATMENT CONTROL METHOD - There is provided a heat treatment control system and method which can accurately estimate the temperatures of wafers upon loading of the wafers, enabling quick heat treatment of the wafers. The heat treatment control system includes: a processing container for processing wafers held in a boat; a lid for hermetically closing the processing container; heaters for heating the processing container; and a controller for controlling the heaters. A profile temperature sensor holding tool is installed on the lid. To the sensor holding tool are mounted profile temperature sensors which are connected to a temperature estimation section. The temperature estimation section estimates the temperature of a wafer by applying a first-order lag filter to a detection signal from a profile temperature sensor. The controller controls the heaters based on the temperatures of wafers thus determined by the temperature estimation section. | 10-04-2012 |
20120258415 | HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD - A heat treatment apparatus including: a processing container for processing wafers held in a boat; heaters for heating the processing container; and a control section for controlling the heaters. Heater temperature sensors are provided between the heaters and the processing container, in-container temperature sensors are provided in the processing container, and movable temperature sensors are provided in the boat. The temperature sensors are connected to a temperature estimation section. The temperature estimation section selects two of the three types of temperature sensors, e.g. the movable temperature sensors and the in-container temperature sensors, and determines the temperature of a wafer according to the following formula: T=T | 10-11-2012 |
20140238972 | THERMAL PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME - A control unit can select a large-number control zone model in which the number of control zones, which are independently controlled, is large, and a small-number control zone model in which the number of control zones, which are independently controlled, is small. When a temperature is increased or decreased, the control unit can select the small-number control zone model so as to control, based on signals from temperature sensors of the respective control zones C1 . . . C5 whose number is small, heaters located on the respective control zones C1 . . . C5. When a temperature is stabilized, the control unit can select the large-number control zone model so as to control, based on signals signals from the temperature sensors of the respective control zones C1 . . . C10 whose number is large, the heaters located on the respective control zones C1 . . . C10. | 08-28-2014 |
Patent application number | Description | Published |
20120269970 | CLEANING METHOD AND FILM DEPOSITING METHOD - A cleaning method for a film deposition apparatus that deposits a polyimide film conveyed into a film deposition chamber by feeding a first source gas formed of dianhydride and a second source gas formed of diamine into the film deposition chamber, the method including the steps of: generating an oxygen atmosphere in the film deposition chamber, and removing polyimide remaining in the film deposition chamber by heating the film deposition chamber at a temperature of 360° C. to 540° C. in the oxygen atmosphere and oxidizing the polyimide. | 10-25-2012 |
20130068163 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a film deposition chamber into which a substrate is carried, a heating mechanism that heats the substrate carried into the film deposition chamber, an adhesion accelerating agent feed mechanism that feeds an adhesion accelerating agent gas into the film deposition chamber, and a control part that controls the heating mechanism and the adhesion accelerating agent feed mechanism. When depositing a polyimide film on the substrate by feeding a first source gas formed of dianhydride and a second source gas formed of diamine into the film deposition chamber, the control part is configured to control the adhesion accelerating agent feed mechanism to treat a surface of the substrate with the adhesion accelerating agent gas by feeding the adhesion accelerating agent gas into the film deposition chamber until the substrate is heated to a predetermined temperature for depositing the polyimide film. | 03-21-2013 |
20130072029 | SURFACE TREATING METHOD AND FILM DEPOSITING METHOD - A surface treating method for treating a surface of a substrate inside a process chamber includes the steps of generating an atmosphere containing no moisture in the process chamber, heating the substrate inside the atmosphere containing no moisture in the process chamber; and causing a reaction between the substrate and an adhesion accelerating agent by feeding the adhesion accelerating agent gas into the process chamber. | 03-21-2013 |
Patent application number | Description | Published |
20130037534 | TEMPERATURE CONTROL METHOD, STORAGE MEDIUM STORING A PROGRAM THEREFOR, TEMPERATURE CONTROL APPARATUS, AND HEAT TREATMENT APPARATUS - Provided is a method of controlling temperatures of objects to be heated in a heating unit by adjusting a heating rate of each of a plurality of heating elements, based on temperature detection values detected at a plurality of temperature detection elements, wherein the plurality of temperature detection elements are positioned at different positions and the plurality of heating elements are positioned at different positions. The method includes estimating a temperature of each of the plurality of temperature detection elements by using a first estimation algorithm when one of the plurality of temperature detection elements is broken, based on the temperature detection values of the temperature detection elements excluding the broken temperature detection element, and controlling the temperatures of the objects to be heated based on the estimated temperatures. | 02-14-2013 |
20130065189 | THERMAL TREATMENT APPARATUS, TEMPERATURE CONTROL SYSTEM, THERMAL TREATMENT METHOD, TEMPERATURE CONTROL METHOD, AND NON-TRANSITORY COMPUTER READABLE MEDIUM EMBODIED WITH PROGRAM FOR EXECUTING THE THERMAL TREATMENT METHOD OR THE TEMPERATURE CONTROL METHOD - A thermal treatment apparatus includes a processing container, a substrate holding unit for holding a plurality of substrates at predetermined intervals in a direction inside the processing container, a heating unit for heating the processing container, a supply unit for supplying gas, a plurality of supply ports provided respectively at different locations in the direction, and a cooling unit for cooling the processing container by supplying the gas into the processing container by the supply unit via each of the supply ports, wherein the supply unit is provided in such a way that the supply unit independently controls flow rates of the gases supplied via each of the supply ports. | 03-14-2013 |
20130186878 | HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME - The heat treatment apparatus includes: a processing chamber which accommodates a processing object; a heating unit which heats the processing object accommodated in the processing chamber; a temperature detecting unit which detects an internal temperature of the processing chamber; and a controller which sets a second setting temperature identical to as a temperature detected by the temperature detecting unit when the temperature detected by the temperature detecting unit falls below a predetermined first setting temperature due to an external disturbance; controls the heating unit so that a third setting temperature between the second setting temperature and the first setting temperature becomes identical to the temperature detected by the temperature detecting unit; and controls the heating unit so that the first setting temperature becomes identical to the temperature detected by the temperature detecting unit after the third setting temperature becomes identical to the temperature detected by the temperature detecting unit. | 07-25-2013 |
20130204416 | HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME - The heat treatment apparatus that increases a temperature of a processing object and performs a heat treatment in a constant temperature, the heat treatment apparatus includes: a processing chamber which accommodates the processing object; a heating unit which heats the processing object accommodated in the processing chamber; a memory unit which stores two or more temperature control models that are previously created, a temperature controller which controls a temperature of the heating unit; and an apparatus controller which controls the temperature controller and the memory unit, wherein the apparatus controller selects a temperature control model among the two or more temperature control models according to desired heat treatment conditions, and wherein the temperature controller reads out the selected temperature control model from the memory unit to control the heating unit. | 08-08-2013 |
Patent application number | Description | Published |
20130316080 | FILM FORMING METHOD - According to an embodiment of the present disclosure, a method of forming a polyimide film on a substrate is disclosed. Such method can be easily controlled and form a polyimide film applicable as an insulation film. While a wafer is heated at a temperature at which a polyimide film is formed, a cycle, in which the wafer is sequentially supplied with a first processing gas, for example, containing a PMDA-based first monomer, and a second processing gas containing a non-aromatic monomer, for example, an HMDA-based second monomer, is performed for a predetermined number of times. When the processing gases are switched, a replacement gas is supplied into a reaction tube so that the monomers are not mixed together under the atmosphere in the reaction tube. | 11-28-2013 |
20130316545 | FILM FORMING METHOD - A method of forming a polyimide film on a surface of a substrate by dehydration condensation of a first monomer including a bifunctional acid anhydride and a second monomer including a bifunctional amine is disclosed. The method includes loading the substrate into a processing chamber, heating the substrate at a temperature at which a polyimide film is formed, and performing a cycle a predetermined number of times. The cycle comprises supplying a first processing gas containing the first monomer to the substrate, supplying a second processing gas containing the second monomer to the substrate. The method further includes supplying a replacement gas in the processing chamber between supplying the first processing gas and supplying the second processing gas thereby replacing atmosphere in the processing chamber by the replacement gas, and evacuating the first and/or the second processing gas out of the processing chamber. | 11-28-2013 |