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| 20090071176 | REFRIGERATOR UNIT FOR CONTAINER - A refrigerator unit is configured for a container in which it is possible to know the quantity of air that is ventilated. The refrigerator unit is equipped with a ventilation mechanism, an opening degree detecting mechanism, and a recording unit. The ventilation mechanism ventilates the air inside the container. The opening degree detecting mechanism acquires ventilation data related to the quantity of air ventilated by the ventilation mechanism. The recording unit records the ventilation data acquired by the opening degree detecting mechanism. | 03-19-2009 |
| 20090077986 | REFRIGERATOR UNIT FOR CONTAINER - A refrigerator unit is configured for a container in which it is possible to know the quantity of air that is ventilated. The refrigerator unit is equipped with a ventilation mechanism, an opening degree detecting mechanism, and a recording unit. The ventilation mechanism ventilates the air inside the container. The opening degree detecting mechanism acquires ventilation data related to the quantity of air ventilated by the ventilation mechanism. The recording unit records the ventilation data acquired by the opening degree detecting mechanism. | 03-26-2009 |
| 20090080943 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A developing device includes a rotator that rotates around a shaft, and a bearing element that supports the shaft to a housing. A sliding element formed of a composite material that contains self-lubricating thermoplastic olefin resin as a base material is used as the bearing element. The sliding element formed of the composite material has at least a ratio of numerical values of “Rockwell hardness”/“bending elastic modulus” in a range from 25 to 45, and provides a sliding surface of which a frictional coefficient is lower than that of the sliding element formed of the base material. | 03-26-2009 |
| 20100057540 | TERM CATERING SYSTEM AND TERM CATERING METHOD - In a term catering system, a management device held by a delivery agent and a manufacturer of cooking appliances outputs reservation sequence information including sequence identification data corresponding to a reserved cooking menu for each customer and obtains feedback information from the customer. The cooking appliance lent to the customer for a certain term controls cooking of a food material delivered by the delivery agent, according to cooking sequence data specified by the output reservation sequence information, among a plurality of cooking sequence data stored beforehand. | 03-04-2010 |
| 20100180917 | CLEANER COMPOSITION FOR REMOVING LEAD-FREE SOLDERING FLUX, AND METHOD FOR REMOVING LEAD-FREE SOLDERING FLUX - The object of the present invention is to provide a novel cleaner composition that not only reduces ignition by flame and has a small influence on the environment, but that also has an excellent property of dissolving flux residues adhered on narrow portions or in narrow gaps in an object to be cleaned that was subjected to soldering with a lead-free solder, and reduces recontamination of the object in the water-rinsing process. The present invention uses a halogen-free organic solvent (A) represented by a specific Formula; an amine-based compound (B) represented by a specific Formula; a chelating agent having no amino group (C); and, as required, water. | 07-22-2010 |
| 20110094545 | CLEANING COMPOSITION FOR REMOVING LEAD-FREE SOLDER FLUX AND SYSTEM FOR REMOVING LEAD-FREE SOLDER FLUX - An object of this invention is to provide a cleaner composition that has a desirable cleaning property and is easily separable from pre-rinsing water even when cleaning an object produced by using a lead-free soldering flux; and a lead-free soldering flux removal system using a pre-rinsing method that can reduce the amount of waste fluid. | 04-28-2011 |
| 20120090646 | CLEANING AGENT FOR REMOVAL OF, REMOVAL METHOD FOR, AND CLEANING METHOD FOR WATER-SOLUBLE, LEAD-FREE SOLDER FLUX - An object of this invention is to provide a cleaner for the removal of water-soluble, lead-free soldering flux, the cleaner capable of cleaning off, in a short period of time, water-soluble flux residues generated during soldering with lead-free solder using water-soluble flux, the cleaner further having excellent dissolution property as well as excellent narrow gap cleaning property. The cleaner for removing water-soluble, lead-free soldering flux of the present invention comprises 5 to 100 parts by weight of a glycol ether compound (A) per 100 parts by weight of water. | 04-19-2012 |
| 20130056767 | LED UNIT - An LED unit includes: a plurality of LED modules each having an LED chip for generating ultraviolet ray provided in a package which has an opening formed on one surface and a lens formed to cover the opening of the package; a substrate-shaped base block where the LED modules are mounted in a first direction; and a heat radiation member where a plurality of the base blocks is provided in a second direction perpendicular to the first direction. The heat radiation member has a plurality of inclined surfaces where each of the base blocks is disposed. Further, one inclined surface and the other inclined surface of the heat radiation member are inclined to face each other in the second direction. | 03-07-2013 |
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| 20080218861 | Zoom lens capable of image stabilization and imaging apparatus - A zoom lens capable of image stabilization is provided and includes: in order from the object side, a positive first group fixed in variable magnification, a negative second group having a variable magnification function, a positive third group fixed in variable magnification, and a positive fourth group having a correction function for an image plane variation depending upon variable magnification and a focusing function. In the third group, there are arranged a positive 3a-th group, a negative 3b-th group, and a positive 3c-th group in this order from the object side. Blurring of a taken image caused by a vibration of this variable magnification optical system is corrected by moving the 3b-th group in a direction approximately orthogonal to the optical axis. Further, a specific conditional expression relating to power of the third group and a specific conditional expression relating to a power distribution of lens groups of the third group G | 09-11-2008 |
| 20090128925 | ZOOM LENS AND IMAGING APPARATUS - A fourth lens group of a four-lens group zoom lens includes, in order from an object side, a single positive lens having aspheric surfaces on both sides, and a cemented lens formed of a negative lens and a positive meniscus lens having a convex surface directed to the object side. The object-side surface of the positive single lens is convex and has a stronger refractive power. The cemented lens has a negative refractive power as a whole. The following conditional expressions are satisfied: | 05-21-2009 |
| 20100289926 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens includes a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, which are arranged in this order from an object side. The gap between the lens groups is changed to change power. The third lens group includes at least two partial lens groups. One of the partial lens groups is a camera shake correction group and is moved in a direction vertical to an optical axis to correct a camera shake. The camera shake correction group includes two single lenses, and at least one of the single lenses is a plastic lens. | 11-18-2010 |
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| 20080320389 | Mobile Information Terminal and Display Control Program - The present invention aims at grasping comprehensively files including contents that meet a search condition and also improving a convenience. A mobile information terminal of the present invention having a display portion | 12-25-2008 |
| 20100280095 | THERAPEUTIC AGENT FOR WOUNDS AND SCREENING METHOD FOR THE SAME - The present invention provides an agent for treating wound, containing a substance that suppresses the expression or function of PDLIM2. The substance that suppresses the expression or function of PDLIM2 is preferably an siRNA or antisense nucleic acid capable of specifically suppressing the expression of PDLIM2, or an expression vector capable of expressing said polynucleotide. In addition, the present invention provides a method of screening for a substance capable of treating wounds, including determining whether or not a test substance is capable of suppressing the expression or function of PDLIM2. | 11-04-2010 |
| 20140183420 | SEAMLESS BELT AND PRODUCTION METHOD THEREOF, AND IMAGE FORMING APPARATUS - To provide a seamless belt, which includes: a polyether imide containing a siloxane bond; at least one selected from the group consisting of a polyphenylene sulfide, a polyether ether ketone, a thermoplastic fluororesin, and a liquid crystal polymer; an ethylene-glycidyl (meth)acrylate copolymer; and an electrical conductivity-imparting agent. | 07-03-2014 |
| 20150072148 | CONDUCTIVE RESIN BELT, METHOD OF MANUFACTURING THE CONDUCTIVE RESIN BELT, AND IMAGE FORMING APPARATUS EMPLOYING THE CONDUCTIVE RESIN BELT - A conductive resin belt includes at least one amorphous polymer selected from a first group consisting of polyether imide and polyether sulfone, at least one crystalline polymer selected from a second group consisting of polyether ether ketone and polyphenylene sulfide, at least one reactive polymer selected from a third group consisting of a copolymer of ethylene and glycidyl methacrylate and a polymer including an oxazoline group, and a conductivity imparting material. Surface resistivity of the conductive resin belt at 500V is 10 | 03-12-2015 |
| 20150227090 | ELECTROCONDUCTIVE RESIN BELT, METHOD OF PREPARING THE SAME, AND IMAGE FORMING APPARATUS HAVING THE SAME - An electroconductive resin belt having a flame resistance of VTM-0 in UL94 standard when having a thickness of from 50 to 150 μm includes a first resin selected from the group consisting of polyetherimide-siloxane block copolymer, polyphenylene sulfide and polyimide; a second resin selected from the group consisting of polyetherimide, polyether sulfone, polyester, aliphatic polyamide, polyetherimide-siloxane block copolymer and polyamideimide; carbon as a first conductant; and at least one second conductant selected from the group consisting of particulate Al-doped ZnO, particulate Ga-doped ZnO, particulate Sb-doped SnO | 08-13-2015 |
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| 20100128390 | METHOD FOR FORMING MAGNETIC LAYER, MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS - The invention provides a method of forming a magnetic layer with stable magnetic properties and stable recording-and-reproducing properties, by uniformizing the distribution of oxygen radical concentration upon reactive sputtering, and thereby uniformizing the concentration of oxygen to be taken into the magnetic layer along the plane direction. That is, the invention relates to a method of forming a magnetic layer by reactive sputtering, which comprises: placing a substrate in a reaction container; arranging a pair of electrode units comprising sputtering electrodes and targets which are disposed on surfaces of the sputtering electrodes and which contain chromium other than the oxide thereof, so that the electrode units respectively face both sides of the substrate while the targets are on the substrate sides; feeding an argon-water mixture gas to vicinities of the respective surfaces on the substrate sides of the pair of electrode units; and applying reactive sputtering so that the chromium other than the oxide thereof contained in the targets can be made into chromium oxide as a constituent to form the magnetic layer having the granular structure. | 05-27-2010 |
| 20120200958 | MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING AND REPRODUCING APPARATUS - A perpendicular magnetic recording medium of the present invention comprises a non-magnetic substrate, and at least a backing layer, an under layer, an intermediate layer and a perpendicular magnetic recording layer, which are sequentially laminated on the non-magnetic substrate, wherein the backing layer is formed of a soft magnetic film having an amorphous structure, the under layer contains a NiW alloy containing any one or both of Co and Fe, the W content of the NiW alloy is within a range from 3 to 10 atom %, the total of the Co and Fe contents of the NiW alloy is 5 atom % or more and less than 40 atom %, the saturation magnetic flux density Bs of the NiW alloy is 280 emu/cm | 08-09-2012 |
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| 20090009661 | Captioned Still Picture Contents Producing Apparatus, Captioned Still Picture Contents Producing Program and Captioned Still Picture Contents Producing System - There is provided a captioned still picture contents producing technique capable of opening caption broadcasting contents being a closed caption and synthesizing it with a still picture obtained from a TV video to automatically produce new captioned still picture contents. In a captioned still picture contents producing system, a captioned video signal generating apparatus generates a captioned video signal, and a still picture contents producing apparatus produces captioned still picture contents from the captioned video signal. The captioned video signal generating apparatus receives the original video signal and caption signal, and generates a control signal based on whether or not the caption is a real time caption. Then, the captioned video signal generating apparatus synthesizes the caption signal and the video signal and inserts the control signal to a predetermined position to generate a captioned video signal. On the contrary, the still picture contents producing apparatus extracts the caption signal and the control signal from the captioned video signal, and captures the image in the video signal based on the control signal to generate a still picture. At the same time, the still picture contents producing apparatus generates the caption video from the caption signal. Then, the still picture contents producing apparatus synthesizes the still picture and the caption image to produce the captioned still picture contents. | 01-08-2009 |
| 20100084055 | TUNGSTEN WIRE, CATHODE HEATER AND VIBRATION SERVICE LAMP FILAMENT - A tungsten wire containing 1 to 10% by mass of rhenium has a point which indicates a 2% elongation within a quadrangle formed by joining points with straight lines, where the values of x and y are point (20, 75), point (20, 87), point (90, 75), and point (90, 58), in this order, wherein the wire diameter of the aforementioned tungsten wire is represented by x μm, and the elongation of the tungsten wire is 2% after electrically heating with an electrical current which is a ratio of y % to the fusion current (FC) at the wire diameter x μm, and wherein a semi-logarithmic system of coordinates is expressed by a horizontal axis using a logarithmic scale of the aforementioned wire diameter x and a vertical axis using a normal scale of ratio y to the fusion current. According to the above-described configuration, a tungsten wire having a great elongation even under conditions of high temperature can be provided, and the tungsten wire can exhibit an excellent durability when used as component material for constituting cathode heaters and so forth, and the tungsten wire can be manufactured efficiently. | 04-08-2010 |
| 20110117531 | MOLD FOR PRODUCING SIMULATED BLOOD VESSEL, METHOD OF PRODUCING SIMULATED BLOOD VESSEL AND SIMULATED BLOOD VESSEL - Disclosed is a method whereby a narrowed part similar to an actual lesioned blood vessel can be easily obtained. A mold ( | 05-19-2011 |
| 20120285586 | TUNGSTEN WIRE, CATHODE HEATER AND VIBRATION SERVICE LAMP FILAMENT - One embodiment provides a tungsten wire containing 1 to 10% by mass of rhenium, the wire having a point indicating a 2% elongation within a quadrangle formed by joining points with straight lines, where the values of x and y are point (20, 75), point (20, 87), point (90, 75), and point (90, 58), in this order; wherein the wire diameter of the tungsten wire is represented by x μm, and the elongation of the tungsten wire is 2% after electrically heating with an electrical current which is a ratio of y % to the fusion current (FC) at the wire diameter x μm, and wherein a semi-logarithmic system of coordinates is expressed by a horizontal axis using a logarithmic scale of the wire diameter x and a vertical axis using a normal scale of ratio y to the fusion current. | 11-15-2012 |
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| 20080226826 | Substrate Processing Method and Substrate Processing Apparatus - A substrate processing method includes applying electroless plating of CoWB onto a Cu interconnection line formed on a wafer W, and then performing a post-cleaning process by use of a cleaning liquid on the target substrate or wafer before a by-product is precipitated on the surface of the CoWB film formed by the electroless plating to cover the Cu interconnection line. | 09-18-2008 |
| 20080280437 | Substrate Processing Method and Substrate Processing Apparatus - A CoWB film is formed as a cap metal on a Cu interconnection line formed on a substrate or wafer W, by repeating a plating step and a post-cleaning step a plurality of times. The plating step is arranged to apply electroless plating containing CoWB onto the Cu interconnection line. The post-cleaning step is arranged to clean the wafer W by use of a cleaning liquid, after the plating step. | 11-13-2008 |
| 20090253258 | SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD - A plated film having a uniform film thickness is formed on a surface of a substrate. A semiconductor manufacturing apparatus includes: a holding mechanism for holding a substrate rotatably; a nozzle for supplying a processing solution for performing a plating process on a processing target surface of the substrate; a substrate rotating mechanism for rotating the substrate held by the holding mechanism in a direction along the processing target surface; a nozzle driving mechanism for moving the nozzle in a direction along the processing target surface at a position facing the processing target surface of the substrate held by the holding mechanism; and a control unit for controlling the supply of the processing solution by the nozzle and the movement of the nozzle by the nozzle driving mechanism. | 10-08-2009 |
| 20100015791 | SUPPLY APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD - A film of uniform thickness can be formed on the entire surface of a substrate. A processing solution supply apparatus includes: a nozzle provided with a supply hole for discharging a plating solution toward a processing surface of a substrate held in a substantially horizontal direction; a temperature controller for accommodating therein the plating solution in an amount necessary for processing a preset number of substrates, for controlling a temperature of the accommodated plating solution up to a preset temperature; a heat insulator disposed between the nozzle and the temperature controller, for maintaining the plating solution, whose temperature has been controlled by the temperature controller, at the preset temperature; and a transporting mechanism for transporting the plating solution, whose temperature has been controlled up to the preset temperature by the temperature controller, toward the supply hole of the nozzle via the heat insulator. | 01-21-2010 |
| 20100062159 | CAP METAL FORMING METHOD - A cap metal forming method capable of obtaining a uniform film thickness on the entire surface of a substrate is provided. A method for forming a cap metal on a processing surface of a substrate provided with two or more regions having different water-repellent properties, includes: holding the substrate horizontally by a rotatable holding mechanism installed in an inner chamber; supplying a gas between the inner chamber and an outer chamber covering the inner chamber via a gas supply hole provided in a top surface of the outer chamber; forming a pressure gradient between the inner chamber and the outer chamber; and supplying a plating solution to a preset position on the processing surface of the substrate after a pressure of the gas inside the inner chamber reaches a preset value so as to form the cap metal on at least one of the regions. | 03-11-2010 |
| 20100075027 | CAP METAL FORMING METHOD - A cap metal forming method capable of obtaining a uniform film thickness on the entire surface of a substrate is provided. The method for forming a cap metal on a copper wiring formed on a processing target surface of a substrate includes: holding the substrate so as to be rotatable; rotating the substrate in a processing target surface direction of the substrate; locating an end portion of an agitation member so as to face the processing target surface of a periphery portion of the substrate with a preset gap maintained therebetween; supplying a plating processing solution onto the processing target surface; and stopping the supply of the plating processing solution and moving the agitation member such that the end portion of the agitation member is separated away from the processing target surface of the substrate. | 03-25-2010 |
| 20110265718 | SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD - A plated film having a uniform film thickness is formed on a surface of a substrate. A semiconductor manufacturing apparatus includes: a holding mechanism for holding a substrate rotatably; a nozzle for supplying a processing solution for performing a plating process on a processing target surface of the substrate; a substrate rotating mechanism for rotating the substrate held by the holding mechanism in a direction along the processing target surface; a nozzle driving mechanism for moving the nozzle in a direction along the processing target surface at a position facing the processing target surface of the substrate held by the holding mechanism; and a control unit for controlling the supply of the processing solution by the nozzle and the movement of the nozzle by the nozzle driving mechanism. | 11-03-2011 |
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| 20100040980 | METHOD AND APPARATUS FOR REFORMING FILM AND CONTROLLING SLIMMING AMOUNT THEREOF - In a film reforming method for reforming a film layer to be reformed by irradiating electron beams thereon, the electron beams are irradiated in a state where the film layer is cooled. Further, in a slimming amount controlling method for controlling a slimming amount of a resist film layer, the slimming amount thereof is controlled by the irradiation amount of electron beams irradiated thereon in a state where the resist film layer having a specified opening dimension is cooled. Furthermore, in a film reforming apparatus including a mounting unit for mounting thereon an object to be processed and an electron beam irradiating unit for irradiating electron beams on the object disposed on the mounting unit to thereby reform a film layer to be reformed, formed on an object, the electron beams are irradiated from the electron beam irradiating unit in a state where the film layer is cooled by a cooling unit provided in the mounting unit. | 02-18-2010 |
| 20110318925 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate processing method includes applying electroless plating of CoWB onto a Cu interconnection line formed on a wafer W, and then performing a post-cleaning process by use of a cleaning liquid on the target substrate or wafer before a by-product is precipitated on the surface of the CoWB film formed by the electroless plating to cover the Cu interconnection line. | 12-29-2011 |
| 20120135358 | COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COATING TREATMENT APPARATUS - A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution. | 05-31-2012 |
| 20130011555 | COATING APPARATUS AND COATING METHOD - The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate to thereby spread out the chemical on a surface of the substrate by centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate. | 01-10-2013 |
| 20130302525 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM - A plating apparatus includes a substrate holding/rotating device that holds/rotates a substrate; and a plating liquid supplying device that supplies a plating liquid onto the substrate. The plating liquid supplying device includes a supply tank that stores the plating liquid; a discharge nozzle that discharges the plating liquid onto the substrate; and a plating liquid supplying line through which the plating liquid of the supply tank is supplied into the discharge nozzle. Further, a first heating device is provided at either one of the supply tank and the plating liquid supplying line of the plating liquid supplying device, and heats the plating liquid to a first temperature. Furthermore, a second heating device is provided at the plating liquid supplying line between the first heating device and the discharge nozzle, and heats the plating liquid to a second temperature equal to or higher than the first temperature. | 11-14-2013 |
| 20140120264 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM - A plating apparatus | 05-01-2014 |
| 20140127410 | PLATING METHOD, PLATING APPARATUS AND STORAGE MEDIUM - A liquid displacement is performed by supplying a plating liquid onto a substrate | 05-08-2014 |
| 20140134345 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM - A plating apparatus of performing a plating process by supplying a plating liquid onto a substrate includes a substrate holding/rotating device configured to hold and rotate the substrate; a discharging device configured to discharge the plating liquid toward the substrate; a plating liquid supplying device configured to supply the plating liquid to the discharging device; and a controller configured to control the discharging device and the plating liquid supplying device. Further, the discharging device includes a first nozzle having a discharge opening, and a second nozzle having a discharge opening configured to be positioned closer to a central portion of the substrate than the discharge opening of the first nozzle. Furthermore, the plating liquid supplying device is configured to set a temperature of the plating liquid supplied to the first nozzle to be higher than a temperature of the plating liquid supplied to the second nozzle. | 05-15-2014 |
| 20140356539 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM - A plating apparatus | 12-04-2014 |
| 20150030774 | PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM - A plating method can improve adhesivity with an underlying layer. The plating method of performing a plating process on a substrate includes forming a first plating layer | 01-29-2015 |
| 20150079785 | PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM - A plating method can improve adhesivity with a substrate. The plating method of performing a plating process on the substrate includes forming a vacuum-deposited layer | 03-19-2015 |
| 20150099355 | PLATING APPARATUS, PLATING METHOD, AND STORAGE MEDIUM - A plating apparatus | 04-09-2015 |
| 20150147476 | PLATING METHOD, PLATING APPARATUS, AND STORAGE MEDIUM - A plating method can improve uniformity in a thickness of a plating layer formed on an inner surface of a recess. The plating method includes a loading process of loading the substrate in which the recess is formed into a casing; and a plating process of supplying a plating liquid to the substrate and forming a plating layer having a specific function on an inner surface of the recess. The plating process includes a first plating process of supplying a first plating liquid to the substrate and forming a first plating layer; and a second plating process of supplying a second plating liquid to the substrate and forming a second plating layer on the first plating layer after the first plating process. Further, a concentration of an additive contained in the first plating liquid is different from a concentration of an additive contained in the second plating liquid. | 05-28-2015 |
| 20150232994 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM - A plating apparatus can perform a plating process on an entire surface of a substrate uniformly. A plating apparatus | 08-20-2015 |
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| 20120275202 | SERIES MULTIPLEX POWER CONVERSION APPARATUS - A series multiplex power conversion apparatus includes a plurality of phases. Each of the plurality of phases includes a plurality of power conversion cells coupled in series to each other. Each of the plurality of power conversion cells includes a current detector configured to detect a current through one phase among the plurality of phases corresponding to the current detector. Each of the plurality of power conversion cells is configured to independently stop a power conversion operation based on the current detected by the current detector. | 11-01-2012 |
| 20130107589 | POWER CONVERSION DEVICE | 05-02-2013 |
| 20130328309 | MATRIX CONVERTER APPARATUS FOR WIND-POWER GENERATION, METHOD FOR CONTROLLING MATRIX CONVERTER, WIND-POWER GENERATOR APPARATUS, WIND FARM, AND METHOD FOR MANUFACTURING WIND TURBINE - A matrix converter apparatus for wind-power generation according to an embodiment includes a matrix converter and a controller. The controller adds information about a voltage phase of the power grid or information about a voltage phase of the generator to a power-grid-side power factor to generate information about a current phase, and generates a control signal for controlling the matrix converter based on the information about the current phase. | 12-12-2013 |
| 20140117917 | MATRIX CONVERTER - A matrix converter includes: a power conversion unit provided between an AC power supply and a rotational machine; and a controller for performing power conversion control therebetween by controlling the power conversion unit. The power conversion unit includes multiple bidirectional switches each of which has at least one first directional switching element and at least one second directional switching element. Further, the controller includes a first drive control unit performing the power conversion by simultaneously turning on both of the first directional switching element and the second directional switching element, and a second drive control unit performing the power conversion by turning on one of the first directional switching element and the second directional switching element. | 05-01-2014 |
| 20140160824 | MATRIX CONVERTER AND METHOD FOR CONTROLLING MATRIX CONVERTER - A matrix converter according to an embodiment includes a plurality of bidirectional switches and a controller. The bidirectional switches connect each of phases of an alternating current (AC) power supply with each of phases of a rotary electric machine. The controller controls the bidirectional switches to perform power conversion control between the AC power supply and the rotary electric machine. The controller performs on/off control individually on a plurality of unidirectional switching elements constituting the bidirectional switches by using both 120-degree conduction control and PWM control. | 06-12-2014 |
| 20140268970 | MATRIX CONVERTER AND METHOD FOR CONTROLLING MATRIX CONVERTER - A matrix converter according to an embodiment includes a power converter having a plurality of bidirectional switches, a controller, and a current detector. The controller controls the power converter. The correct detector detects a current flowing to an output side of the power converter. The controller extracts a high-frequency component contained in the current detected by the current detector, adjusts an output current reference on the basis of the high-frequency component, and controls the power converter on the basis of the adjusted output current reference. | 09-18-2014 |
| 20150188443 | MATRIX CONVERTER, WIND POWER GENERATION SYSTEM, AND METHOD FOR CONTROLLING MATRIX CONVERTER - A matrix converter according to embodiments includes a power conversion unit and drive controllers. The power conversion unit includes a plurality of bidirectional switches for connecting each phase of an alternating-current (AC) power supply with each phase of a rotary electric machine. When the voltage of the AC power supply is a predetermined value or less, the drive controllers control the power conversion unit to supply reactive power from the power conversion unit to the AC power supply and to control the torque of the rotary electric machine. | 07-02-2015 |
| 20150280597 | POWER CONVERTING APPARATUS, CONTROL DEVICE OF POWER CONVERTING APPARATUS, AND CONTROL METHOD OF POWER CONVERTING APPARATUS - A power converting apparatus includes a power converter, a controller, and a filter. Further, the controller includes a command generator, an estimator, a voltage error calculator, and an output voltage controller. The command generator is configured to generate an output voltage command. The estimator is configured to estimate the output voltage based on an output current of the power converter. The voltage error calculator is configured to calculate a voltage difference between the output voltage command and the estimated output voltage. The output voltage controller is configured to control the output voltage to suppress a resonance of the filter based on the voltage difference. | 10-01-2015 |
| 20150295506 | POWER CONVERTING APPARATUS, CONTROL DEVICE OF POWER CONVERTING APPARATUS, AND CONTROL METHOD OF POWER CONVERTING APPARATUS - A power converting apparatus includes: a power converter provided between each phase of an AC power source and each phase of a load; a controller for controlling the power converter to perform a power conversion control between the AC power source and the load; and a filter provided between the AC power source and the power converter. The controller has: an oscillation component detector to detect an oscillation component of an input voltage of the power converter or an oscillation component included in a current flowing through the filter; and an output voltage controller to control an output voltage of the power converter to suppress a resonance of the filter based on the oscillation component. | 10-15-2015 |
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| 20130217225 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method comprising the steps of: forming a copper film ( | 08-22-2013 |
| 20140302242 | PLATING APPARATUS, PLATING METHOD AND STORAGE MEDIUM HAVING PLATING PROGRAM STORED THEREON - A plating apparatus | 10-09-2014 |
| 20150096490 | APPARATUS FOR PLATING PROCESS - An apparatus for a plating process includes: an outer chamber; an inner chamber covered by the outer chamber; a rotatable holding mechanism configured to hold a substrate horizontally and installed in the inner chamber; a fluid supply unit configured to supply a plating solution to a preset position on the substrate; a gas supply device configured to generate a nonreactive gas and control a temperature of the nonreactive gas; a gas supply hole configured to supply the nonreactive gas into the outer chamber and provided in a top surface of the outer chamber; a plurality of gas inlet openings provided at a sidewall of the inner chamber and spaced apart at equal distances; and a rectifying plate disposed above the substrate and below the plurality of gas inlet openings inside the inner chamber, the rectifying plate having a plurality of rectifying holes uniformly disposed in the rectifying plate. | 04-09-2015 |
| 20150140209 | PRE-TREATMENT METHOD FOR PLATING AND STORAGE MEDIUM - A pre-treatment method for plating can form a plating layer having sufficient adhesivity on an inner surface of a recess and on a surface of a substrate at an outside of the recess even when the recess has a high aspect ratio. The pre-treatment method for plating includes a preparation process of preparing the substrate having the recess; a first coupling layer forming process of forming a first coupling layer 21 | 05-21-2015 |
| 20150140816 | PRE-TREATMENT METHOD FOR PLATING AND STORAGE MEDIUM - Catalytic metal nanoparticles can be attached on a base. A pre-treatment method for plating includes a catalytic particle-containing film forming process of forming a catalytic particle-containing film on a surface of a substrate by supplying, onto the substrate, a catalytic particle solution which is prepared by dispersing the catalytic metal nanoparticles and a dispersing agent in a solvent containing water; a first heating process of removing moisture contained at least in the catalytic particle-containing film by heating the substrate to a first temperature; and a second heating process of polymerizing the dispersing agent to have a sheet shape by heating the substrate to a second temperature higher than the first temperature after the first heating process and fixing the catalytic metal nanoparticles on a base layer by covering the catalytic metal nanoparticles with the sheet-shaped dispersing agent. | 05-21-2015 |
| 20150218702 | ELECTROLESS PLATING METHOD, ELECTROLESS PLATING APPARATUS AND STORAGE MEDIUM - A multiple number of accurately-patterned metal layers can be formed on a substrate. On a substrate | 08-06-2015 |
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| 20140085733 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying magnification from the wide angle end to the telephoto end, a distance between the first lens group and the second lens group is always increased, a distance between the second lens group and the third lens group is always decreased, a distance between the third lens group and the fourth lens group is always decreased, and a distance between the fourth lens group and the fifth lens group is changed, while all of the lens groups are moved with respect to an image formation position. Formulas (Ca): −5.00≦1−(β | 03-27-2014 |
| 20140085734 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying magnification, the distances between adjacent lens groups are changed, while all of the lens groups are moved with respect to an image formation position. When focusing, only the fifth lens group is shifted. The fifth lens group has at least one negative lens and at least one positive lens. | 03-27-2014 |
| 20140092477 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying magnification, the distances between adjacent lens groups) are changed, while all of the lens groups are moved with respect to an image formation position. When focusing, only the fifth lens group is shifted, and the third lens group has a third-a lens group having positive refractive power and a third-b lens group having negative refractive power, which are arranged in this order from the object side, only the third-b lens group is moved in a direction perpendicular to the optical axis to achieve camera shake correction. | 04-03-2014 |
| 20140092484 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying, the distances between adjacent lens groups are changed, while all of the lens groups are moved with respect to an image formation position. Further, when focusing, only the fifth lens group is shifted to the image side. If f | 04-03-2014 |
| 20140098426 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying magnification, the distances between adjacent lens groups are changed, while all of the lens groups are moved with respect to an image formation position. If f | 04-10-2014 |
| 20140104697 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of, in order from the object side, a positive first lens group, a negative second lens group, a positive third lens group, a positive fourth lens group, and a negative fifth lens group. When varying magnification, the distances between adjacent lens groups are changed, while all of the lens groups are moved with respect to an image formation position. If β | 04-17-2014 |
| 20140307320 | ZOOM LENS AND IMAGING APPARATUS - A zoom lens substantially consists of a positive first lens group, a negative second lens group, a positive third lens group, and a positive fourth lens group in this order from the object side, wherein the distance between the first lens group and the second lens group increases and the distance between the second lens group and the third lens group decreases, and the distance between the third lens group and the fourth lens group decreases while changing magnification. The fourth lens group substantially consists of a positive fourth-a lens group composed of a biconvex-shape lens, a negative meniscus-shape lens, and a biconvex-shape lens and a negative fourth-b lens group composed of a positive meniscus-shape lens and a biconcave-shape lens in this order from the object side, and only the fourth-b lens group is moved toward the image side while focusing. | 10-16-2014 |
