Patent application number | Description | Published |
20090033924 | Defects Inspecting Apparatus And Defects Inspecting Method - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 02-05-2009 |
20100259751 | DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 10-14-2010 |
20110310382 | DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 12-22-2011 |
20120262709 | DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 10-18-2012 |
20140198321 | SURFACE SHAPE MEASURING APPARATUS - In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated. | 07-17-2014 |
20140375988 | SURFACE MEASUREMENT DEVICE - In conventional technologies in surface measurement and defect inspection, considerations are not made for the following points: (1) coarseness of resolution of spatial frequency; (2) variation of detection signal resulting from anisotropy of microroughness; and (3) variation of background signal resulting from anisotropy of microroughness. The present invention is characterized by acquiring a feature quantity about the anisotropy of the microroughness of the substrate surface. Further, the present invention is characterized by acquiring a surface state in consideration of the anisotropy of the microroughness of the substrate surface. Further the present invention is characterized by detecting a defect over the substrate in consideration of the anisotropy of the microroughness of the substrate surface. | 12-25-2014 |
20150109434 | INSPECTION DEVICE AND IMAGE CAPTURE ELEMENT - An imaging device includes multiple sensor pixels that are arranged in a predetermined direction, each sensor pixel having multiple sensor pixel borders defining an outer edge part of the sensor pixel, among which at least one of a pair of sensor pixel borders that are opposed in the arrangement direction is oblique to a passage direction of a defect image that is vertical to the predetermined direction. This can provide an inspection tool enabling high sensitivity inspection and/or having improved detection reproducibility of a defect. | 04-23-2015 |
20150116702 | DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE - To enable the detection of a more minute defect with a defect detection device, the defect inspection device is provided with: an illumination light irradiating section that irradiates illumination light on a linear area of a specimen from an inclined direction; a detection optical system section provided with multiple detection optical systems that comprise objective lenses and two-dimensional detectors, said objective lenses being placed in a direction substantially orthogonal to the length direction of the linear area, being placed in a surface that contains a normal line to the specimen front surface, and condensing scattered light generated from the linear area on the specimen, and said two-dimensional detectors detecting the scattered light condensed by the objective lenses; and a signal processing section that processes a signal detected by the detection optical system section and detects the defect on the specimen. | 04-30-2015 |