Patent application number | Description | Published |
20080220229 | Method for Structured Application of Molecules to a Strip Conductor and Molecular Memory Matrix - The invention relates to a method for a structured application of molecules on a strip conductor and to a molecular memory matrix. The inventive method makes it possible, for the first time, to economically and simply apply any number of molecular memory elements on the strip conductor in a structured and targeted way, thereby making available, also for the first time, a memory matrix at a molecular level. | 09-11-2008 |
20100077839 | IN SITU MONITORING OF METAL CONTAMINATION DURING MICROSTRUCTURE PROCESSING - By providing a tool internal sensor device in a process tool in a semiconductor facility, metal contamination may be monitored in situ, thereby avoiding or at least significantly reducing the requirement for sophisticated sample preparation techniques, such as vapor phase decomposition tests in combination with subsequent analysis procedures. Thus, a full time inspection of process tools may be accomplished. | 04-01-2010 |
20100078689 | TRANSISTOR WITH EMBEDDED SI/GE MATERIAL HAVING REDUCED OFFSET TO THE CHANNEL REGION - A strain-inducing semiconductor alloy may be formed on the basis of cavities which may have a non-rectangular shape, which may be maintained even during corresponding high temperature treatments by providing an appropriate protection layer, such as a silicon dioxide material. Consequently, a lateral offset of the strain-inducing semiconductor material may be reduced, while nevertheless providing a sufficient thickness of corresponding offset spacers during the cavity etch process, thereby preserving gate electrode integrity. For instance, P-channel transistors may have a silicon/germanium alloy with a hexagonal shape, thereby significantly enhancing the overall strain transfer efficiency. | 04-01-2010 |
20100163939 | TRANSISTOR DEVICE COMPRISING AN EMBEDDED SEMICONDUCTOR ALLOY HAVING AN ASYMMETRIC CONFIGURATION - In sophisticated semiconductor devices, an asymmetric transistor configuration may be obtained on the basis of a strain-inducing semiconductor alloy. To this end, strain relaxation implantation processes may be performed at the drain side according to some illustrative embodiments, while, in other cases, the deposition of the strain-inducing alloy may be performed in an asymmetric manner with respect to the drain side and the source side of the transistor. | 07-01-2010 |
20100164014 | REDUCTION OF THRESHOLD VOLTAGE VARIATION IN TRANSISTORS COMPRISING A CHANNEL SEMICONDUCTOR ALLOY BY REDUCING DEPOSITION NON-UNIFORMITIES - A threshold adjusting semiconductor material, such as a silicon/germanium alloy, may be provided selectively for one type of transistors on the basis of enhanced deposition uniformity. For this purpose, the semiconductor alloy may be deposited on the active regions of any transistors and may subsequently be patterned on the basis of a highly controllable patterning regime. Consequently, threshold variability may be reduced. | 07-01-2010 |
20100164016 | ADJUSTING OF STRAIN CAUSED IN A TRANSISTOR CHANNEL BY SEMICONDUCTOR MATERIAL PROVIDED FOR THRESHOLD ADJUSTMENT - The threshold voltage of a sophisticated transistor may be adjusted by providing a specifically designed semiconductor alloy in the channel region of the transistor, wherein a negative effect of this semiconductor material with respect to inducing a strain component in the channel region may be reduced or over-compensated for by additionally incorporating a strain-adjusting species. For example, a carbon species may be incorporated in the channel region, the threshold voltage of which may be adjusted on the basis of a silicon/germanium alloy of a P-channel transistor. Consequently, sophisticated metal gate electrodes may be formed in an early manufacturing stage. | 07-01-2010 |
20100164020 | TRANSISTOR WITH AN EMBEDDED STRAIN-INDUCING MATERIAL HAVING A GRADUALLY SHAPED CONFIGURATION - In a transistor, a strain-inducing semiconductor alloy, such as silicon/germanium, silicon/carbon and the like, may be positioned very close to the channel region by providing gradually shaped cavities which may then be filled with the strain-inducing semiconductor alloy. For this purpose, two or more “disposable” spacer elements of different etch behavior may be used in order to define different lateral offsets at different depths of the corresponding cavities. Consequently, enhanced uniformity and, thus, reduced transistor variability may be accomplished, even for sophisticated semiconductor devices. | 07-01-2010 |
20100193881 | REDUCTION OF THICKNESS VARIATIONS OF A THRESHOLD SEMICONDUCTOR ALLOY BY REDUCING PATTERNING NON-UNIFORMITIES PRIOR TO DEPOSITING THE SEMICONDUCTOR ALLOY - The growth rate in a selective epitaxial growth process for depositing a threshold adjusting semiconductor alloy, such as a silicon/germanium alloy, may be enhanced by performing a plasma-assisted etch process prior to performing the selective epitaxial growth process. For example, a mask layer may be patterned on the basis of the plasma-assisted etch process, thereby simultaneously providing superior device topography during the subsequent growth process. Hence, the threshold adjusting material may be deposited with enhanced thickness uniformity, thereby reducing overall threshold variability. | 08-05-2010 |
20100219474 | TRANSISTOR COMPRISING AN EMBEDDED SEMICONDUCTOR ALLOY IN DRAIN AND SOURCE REGIONS EXTENDING UNDER THE GATE ELECTRODE - A strain-inducing semiconductor alloy may be formed on the basis of cavities that may extend deeply below the gate electrode structure, which may be accomplished by using a sequence of two etch processes. In a first etch process, the cavity may be formed on the basis of a well-defined lateral offset to ensure integrity of the gate electrode structure and, in a subsequent etch process, the cavity may be increased in a lateral direction while nevertheless reliably preserving a portion of the channel region. Consequently, the strain-inducing efficiency may be increased by appropriately positioning the strain-inducing material immediately below the channel region without compromising integrity of the gate electrode structure. | 09-02-2010 |
20100219475 | INTEGRATION OF SEMICONDUCTOR ALLOYS IN PMOS AND NMOS TRANSISTORS BY USING A COMMON CAVITY ETCH PROCESS - Different strain-inducing semiconductor alloys may be incorporated into the drain and source areas of different transistors in sophisticated semiconductor devices by at least patterning the corresponding cavities in a common manufacturing sequence. Thus, the etch process may be performed on the basis of a high degree of uniformity and the subsequent epitaxial growth processes may, in some illustrative embodiments, be accomplished on the basis of only one additional lithography step. | 09-02-2010 |
20100219719 | STRAIN ENGINEERING IN SEMICONDUCTOR DEVICES BY USING A PIEZOELECTRIC MATERIAL - An efficient strain-inducing mechanism may be provided on the basis of a piezoelectric material so that performance of different transistor types may be enhanced by applying a single concept. For example, a piezoelectric material may be provided below the active region of different transistor types and may be appropriately connected to a voltage source so as to obtain a desired type of strain. | 09-02-2010 |
20100221883 | ADJUSTING OF A NON-SILICON FRACTION IN A SEMICONDUCTOR ALLOY DURING TRANSISTOR FABRICATION BY AN INTERMEDIATE OXIDATION PROCESS - The concentration of a non-silicon species in a semiconductor alloy, such as a silicon/germanium alloy, may be increased after a selective epitaxial growth process by oxidizing a portion of the semiconductor alloy and removing the oxidized portion. During the oxidation, preferably the silicon species may react to form a silicon dioxide material while the germanium species may be driven into the remaining semiconductor alloy, thereby increasing the concentration thereof. Consequently, the threshold adjustment of sophisticated transistors may be accomplished with enhanced process uniformity on the basis of a given parameter setting for the epitaxial growth process while nevertheless providing a high degree of flexibility in adjusting the composition of the threshold adjusting material. In other cases, in addition to or alternatively to forming a threshold adjusting semiconductor alloy, a strain-inducing semiconductor alloy may also be provided with enhanced flexibility using the above-described process sequence. | 09-02-2010 |
20100244107 | REDUCING SILICIDE RESISTANCE IN SILICON/GERMANIUM-CONTAINING DRAIN/SOURCE REGIONS OF TRANSISTORS - In sophisticated P-channel transistors, a high germanium concentration may be used in a silicon/germanium alloy, wherein an additional semiconductor cap layer may provide enhanced process conditions during the formation of a metal silicide. For example, a silicon layer may be formed on the silicon/germanium alloy, possibly including a further strain-inducing atomic species other than germanium, in order to provide a high strain component while also providing superior conditions during the silicidation process. | 09-30-2010 |
20100289090 | ENHANCING UNIFORMITY OF A CHANNEL SEMICONDUCTOR ALLOY BY FORMING STI STRUCTURES AFTER THE GROWTH PROCESS - When forming sophisticated gate electrode structures of transistor elements of different type, the threshold adjusting channel semiconductor alloy may be provided prior to forming isolation structures, thereby achieving superior uniformity of the threshold adjusting material. Consequently, threshold variability on a local and global scale of P-channel transistors may be significantly reduced. | 11-18-2010 |
20100289094 | ENHANCING DEPOSITION UNIFORMITY OF A CHANNEL SEMICONDUCTOR ALLOY BY AN IN SITU ETCH PROCESS - When forming sophisticated gate electrode structures requiring a threshold adjusting semiconductor alloy for one type of transistor, a recess is formed in the corresponding active region, thereby providing superior process uniformity during the deposition of the semiconductor material. Due to the recess, any exposed sidewall surface areas of the active region may be avoided during the selective epitaxial growth process, thereby significantly contributing to enhanced threshold stability of the resulting transistor including the high-k metal gate stack. | 11-18-2010 |
20100289114 | SEMICONDUCTOR ELEMENT FORMED IN A CRYSTALLINE SUBSTRATE MATERIAL AND COMPRISING AN EMBEDDED IN SITU DOPED SEMICONDUCTOR MATERIAL - The PN junction of a substrate diode in a sophisticated SOI device may be formed on the basis of an embedded in situ doped semiconductor material, thereby providing superior diode characteristics. For example, a silicon/germanium semiconductor material may be formed in a cavity in the substrate material, wherein the size and shape of the cavity may be selected so as to avoid undue interaction with metal silicide material. | 11-18-2010 |
20100301421 | STRAIN ENHANCEMENT IN TRANSISTORS COMPRISING AN EMBEDDED STRAIN-INDUCING SEMICONDUCTOR ALLOY BY CREATING A PATTERNING NON-UNIFORMITY AT THE BOTTOM OF THE GATE ELECTRODE - Performance of P-channel transistors may be enhanced on the basis of an embedded strain-inducing semiconductor alloy by forming a gate electrode structure on the basis of a high-k dielectric material in combination with a metal-containing cap layer in order to obtain an undercut configuration of the gate electrode structure. Consequently, the strain-inducing semiconductor alloy may be formed on the basis of a sidewall spacer of minimum thickness in order to position the strain-inducing semiconductor material closer to a central area of the channel region. | 12-02-2010 |
20100327358 | SEMICONDUCTOR ELEMENT FORMED IN A CRYSTALLINE SUBSTRATE MATERIAL AND COMPRISING AN EMBEDDED IN SITU N-DOPED SEMICONDUCTOR MATERIAL - The PN junction of a substrate diode in a sophisticated semiconductor device may be formed on the basis of an embedded in situ N-doped semiconductor material thereby providing superior diode characteristics. For example, a silicon/carbon semiconductor material may be formed in a cavity in the substrate material, wherein the size and shape of the cavity may be selected so as to avoid undue interaction with metal silicide material. | 12-30-2010 |
20100327368 | ENHANCING SELECTIVITY DURING FORMATION OF A CHANNEL SEMICONDUCTOR ALLOY BY A WET OXIDATION PROCESS - High-k metal gate electrode structures are formed on the basis of a threshold adjusting semiconductor alloy formed in the channel region of one type of transistor, which may be accomplished on the basis of selective epitaxial growth techniques using an oxide hard mask growth mask. The hard mask may be provided with superior thickness uniformity on the basis of a wet oxidation process. Consequently, this may allow re-working substrates prior to the selective epitaxial growth process, for instance in view of queue time violations, while also providing superior transistor characteristics in the transistors that do not require the threshold adjusting semiconductor alloy. | 12-30-2010 |
20110024912 | CMOS DEVICE INCLUDING MOLECULAR STORAGE ELEMENTS IN A VIA LEVEL - Memory cells in integrated circuit devices may be formed on the basis of functional molecules which may be positioned within via openings on the basis of appropriate patterning techniques, which may also be used for forming semiconductor-based integrated circuits. Consequently, memory cells may be formed on a “molecular” level without requiring extremely sophisticated patterning regimes, such as electron beam lithography and the like. | 02-03-2011 |
20110024914 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICE COMPRISING AN INTER-DIE CONNECTION ON THE BASIS OF FUNCTIONAL MOLECULES - In a stacked chip configuration, the “inter chip” connection is established on the basis of functional molecules, thereby providing a fast and space-efficient communication between the different semiconductor chips. | 02-03-2011 |
20110049637 | BURIED ETCH STOP LAYER IN TRENCH ISOLATION STRUCTURES FOR SUPERIOR SURFACE PLANARITY IN DENSELY PACKED SEMICONDUCTOR DEVICES - Material erosion of trench isolation structures in advanced semiconductor devices may be reduced by incorporating an appropriate mask layer stack in an early manufacturing stage. For example, a silicon nitride material may be incorporated as a buried etch stop layer prior to a sequence for patterning active regions and forming a strain-inducing semiconductor alloy therein, wherein, in particular, the corresponding cleaning process prior to the selective epitaxial growth process has been identified as a major source for causing deposition-related irregularities upon depositing the interlayer dielectric material. | 03-03-2011 |
20110101469 | STRAIN ENHANCEMENT IN TRANSISTORS COMPRISING AN EMBEDDED STRAIN-INDUCING SEMICONDUCTOR ALLOY BY CORNER ROUNDING AT THE TOP OF THE GATE ELECTRODE - In MOS transistor elements, a strain-inducing semiconductor alloy may be embedded in the active region with a reduced offset from the channel region by applying a spacer structure of reduced width. In order to reduce the probability of creating semiconductor residues at the top area of the gate electrode structure, a certain degree of corner rounding of the semiconductor material may be introduced, which may be accomplished by ion implantation prior to epitaxially growing the strain-inducing semiconductor material. This concept may be advantageously combined with the provision of sophisticated high-k metal gate electrodes that are provided in an early manufacturing stage. | 05-05-2011 |
20110129970 | ENHANCING INTERFACE CHARACTERISTICS BETWEEN A CHANNEL SEMICONDUCTOR ALLOY AND A GATE DIELECTRIC BY AN OXIDATION PROCESS - In sophisticated transistor elements, long-term threshold voltage shifts in transistors comprising a threshold adjusting semiconductor alloy may be reduced by reducing the roughness of an interface formed between the threshold adjusting semiconductor material and the gate dielectric material. To this end, a portion of the threshold adjusting semiconductor material may be oxidized and may be removed prior to forming the high-k dielectric material. | 06-02-2011 |
20110129971 | PERFORMANCE ENHANCEMENT IN TRANSISTORS COMPRISING HIGH-K METAL GATE STACK BY REDUCING A WIDTH OF OFFSET SPACERS - In sophisticated semiconductor devices including transistors having a high-k metal gate electrode structure, disposable spacers may be provided on the encapsulating spacer element with a reduced width so as to not unduly increase a lateral offset of a strain-inducing material to be incorporated into the active region. For this purpose, a multi-layer deposition may be used in combination with a low pressure CVD process. | 06-02-2011 |
20110156172 | ENHANCING DEPOSITION UNIFORMITY OF A CHANNEL SEMICONDUCTOR ALLOY BY FORMING A RECESS PRIOR TO THE WELL IMPLANTATION - When forming sophisticated gate electrode structures requiring a threshold adjusting semiconductor alloy for one type of transistor, a recess is formed in the corresponding active region, thereby providing superior process uniformity during the deposition of the semiconductor material. Moreover, the well dopant species is implanted after the recessing, thereby avoiding undue dopant loss. Due to the recess, any exposed sidewall surface areas of the active region may be avoided during the selective epitaxial growth process, thereby significantly contributing to enhanced threshold stability of the resulting transistor including the high-k metal gate stack. | 06-30-2011 |
20110156857 | SILICON-BASED SEMICONDUCTOR DEVICE COMPRISING eFUSES FORMED BY AN EMBEDDED SEMICONDUCTOR ALLOY - An electronic fuse may receive a silicon/germanium material in the fuse body, which in turn may result in the formation of a metal silicide material of reduced thickness. Consequently, the current density and, thus, the electromigration and heat generation in the metal silicide material may be increased for a given amount of current. Consequently, transistor switches for applying the programming pulse to the electronic fuse may be reduced in size. | 06-30-2011 |
20110159654 | ENHANCED CONFINEMENT OF HIGH-K METAL GATE ELECTRODE STRUCTURES BY REDUCING MATERIAL EROSION OF A DIELECTRIC CAP LAYER UPON FORMING A STRAIN-INDUCING SEMICONDUCTOR ALLOY - When forming the strain-inducing semiconductor alloy in one type of transistor of a sophisticated semiconductor device, superior thickness uniformity of a dielectric cap material of the gate electrode structures may be achieved by forming encapsulating spacer elements on each gate electrode structure and providing an additional hard mask material. Consequently, in particular, in sophisticated replacement gate approaches, the dielectric cap material may be efficiently removed in a later manufacturing stage, thereby avoiding any irregularities upon replacing the semiconductor material by an electrode metal. | 06-30-2011 |
20110189831 | REDUCING CONTAMINATION IN A PROCESS FLOW OF FORMING A CHANNEL SEMICONDUCTOR ALLOY IN A SEMICONDUCTOR DEVICE - In sophisticated approaches for forming high-k metal gate electrode structures in an early manufacturing stage, a threshold adjusting semiconductor alloy may be deposited on the basis of a selective epitaxial growth process without affecting the back side of the substrates. Consequently, any negative effects, such as contamination of substrates and process tools, reduced surface quality of the back side and the like, may be suppressed or reduced by providing a mask material and preserving the material at least during the selective epitaxial growth process. | 08-04-2011 |
20110269277 | Reduced STI Topography in High-K Metal Gate Transistors by Using a Mask After Channel Semiconductor Alloy Deposition - In a manufacturing strategy for providing high-k metal gate electrode structures in an early manufacturing stage, process-related non-uniformities during and after the patterning of the gate electrode structures may be reduced by providing a superior surface topography. To this end, the material loss in the isolation region may generally be reduced and a more symmetrical exposure to reactive etch atmospheres during the subsequent removal of the growth mask may be accomplished by providing an additional etch mask when removing the growth mask from the active regions of N-channel transistors, after the growth of the threshold adjusting semiconductor material on the active regions of the P-channel transistors. | 11-03-2011 |
20110269293 | Reduced STI Loss for Superior Surface Planarity of Embedded Stressors in Densely Packed Semiconductor Devices - A reduction in material loss of trench isolation structures prior to forming a strain-inducing semiconductor alloy in transistor elements may result in superior device uniformity, for instance with respect to drive current and threshold voltage. To this end, at least one etch process using diluted hydrofluoric acid may be omitted when forming the shallow trench isolations, while at the same time providing a high degree of compatibility with conventional process strategies. | 11-03-2011 |
20110291163 | Reduction of Defect Rates in PFET Transistors Comprising a Si/Ge Semiconductor Material Formed by Epitaxial Growth - In sophisticated semiconductor devices, the defect rate that may typically be associated with the provision of a silicon/germanium material in the active region of P-channel transistors may be significantly decreased by incorporating a carbon species prior to or during the selective epitaxial growth of the silicon/germanium material. In some embodiments, the carbon species may be incorporated during the selective growth process, while in other cases an ion implantation process may be used. In this case, superior strain conditions may also be obtained in N-channel transistors. | 12-01-2011 |
20120001174 | Test Structure for Controlling the Incorporation of Semiconductor Alloys in Transistors Comprising High-K Metal Gate Electrode Structures - When forming critical threshold adjusting semiconductor alloys and/or strain-inducing embedded semiconductor materials in sophisticated semiconductor devices, at least the corresponding etch processes may be monitored efficiently on the basis of mechanically gathered profile measurement data by providing an appropriately designed test structure. Consequently, sophisticated process sequences performed on bulk semiconductor devices may be efficiently monitored and/or controlled by means of the mechanically obtained profile measurement data without significant delay. For example, superior uniformity upon providing a threshold adjusting semiconductor alloy in sophisticated high-k metal gate electrode structures for non-SOI devices may be achieved. | 01-05-2012 |
20120001254 | Transistor With Embedded Si/Ge Material Having Reduced Offset and Superior Uniformity - In sophisticated semiconductor devices, a strain-inducing embedded semiconductor alloy may be provided on the basis of a crystallographically anisotropic etch process and a self-limiting deposition process, wherein transistors which may not require an embedded strain-inducing semiconductor alloy may remain non-masked, thereby providing superior uniformity with respect to overall transistor configuration. Consequently, superior strain conditions may be achieved in one type of transistor, while generally reduced variations in transistor characteristics may be obtained for any type of transistors. | 01-05-2012 |
20120001295 | Semiconductor Device Comprising High-K Metal Gate Electrode Structures and Precision eFuses Formed in the Active Semiconductor Material - In a complex semiconductor device, electronic fuses may be formed in the active semiconductor material by using a semiconductor material of reduced heat conductivity selectively in the fuse body, wherein, in some illustrative embodiments, the fuse body may be delineated by a non-silicided semiconductor base material. | 01-05-2012 |
20120009751 | REDUCING CONTAMINATION IN A PROCESS FLOW OF FORMING A CHANNEL SEMICONDUCTOR ALLOY IN A SEMICONDUCTOR DEVICE - In sophisticated approaches for forming high-k metal gate electrode structures in an early manufacturing stage, a threshold adjusting semiconductor alloy may be deposited on the basis of a selective epitaxial growth process without affecting the back side of the substrates. Consequently, any negative effects, such as contamination of substrates and process tools, reduced surface quality of the back side and the like, may be suppressed or reduced by providing a mask material and preserving the material at least during the selective epitaxial growth process. | 01-12-2012 |
20120025315 | Transistor with Embedded Strain-Inducing Material and Dummy Gate Electrodes Positioned Adjacent to the Active Region - The uniformity of transistor characteristics may be enhanced for transistors having incorporated therein a strain-inducing semiconductor material by using appropriately positioned dummy gate electrode structures. To this end, the dummy gate electrode structures may be positioned such that these structures may connect to or may overlap with the edge of the active region, thereby preserving a portion of the initial semiconductor material of the active region at the edge thereof upon forming the corresponding cavities. | 02-02-2012 |
20120153350 | SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATING THE SAME - Embodiments of semiconductor devices and methods for fabricating the semiconductor devices are provided. The method includes forming a cavity in a semiconductor region laterally adjacent to a gate electrode structure of a transistor. The gate electrode structure is disposed on a channel region of a first silicon-germanium alloy. A strain-inducing silicon-germanium alloy is formed in the cavity and in contact with the first silicon-germanium alloy. The strain-inducing silicon-germanium alloy includes carbon and has a composition different from the first silicon-germanium alloy. | 06-21-2012 |
20120153354 | PERFORMANCE ENHANCEMENT IN TRANSISTORS COMPRISING HIGH-K METAL GATE STACKS AND AN EMBEDDED STRESSOR BY PERFORMING A SECOND EPITAXY STEP - When forming sophisticated transistors, for instance comprising high-k metal gate electrode structures, a significant material loss of an embedded strain-inducing semiconductor material may be compensated for, or at least significantly reduced, by performing a second epitaxial growth step after the incorporation of the drain and source extension dopant species. In this manner, superior strain conditions may be achieved, while also the required drain and source dopant profile may be implemented. | 06-21-2012 |
20120153402 | EMBEDDED SIGMA-SHAPED SEMICONDUCTOR ALLOYS FORMED IN TRANSISTORS BY APPLYING A UNIFORM OXIDE LAYER PRIOR TO CAVITY ETCHING - When forming sophisticated transistors requiring an embedded semiconductor alloy, the cavities may be formed with superior uniformity on the basis of, for instance, crystallographically anisotropic etch steps by providing a uniform oxide layer in order to reduce process related fluctuations or queue time variations. The uniform oxide layer may be formed on the basis of an APC control regime. | 06-21-2012 |
20120156846 | Semiconductor Devices Comprising a Channel Semiconductor Alloy Formed with Reduced STI Topography - In sophisticated semiconductor devices, a semiconductor alloy, such as a threshold adjusting semiconductor material in the form of silicon/germanium, may be provided in an early manufacturing stage selectively in certain active regions, wherein a pronounced degree of recessing and material loss, in particular in isolation regions, may be avoided by providing a protective material layer selectively above the isolation regions. For example, in some illustrative embodiments, a silicon material may be selectively deposited on the isolation regions. | 06-21-2012 |
20120156864 | Formation of a Channel Semiconductor Alloy by a Nitride Hard Mask Layer and an Oxide Mask - When forming sophisticated high-k metal gate electrode structures, the uniformity of the device characteristics may be enhanced by growing a threshold adjusting semiconductor alloy on the basis of a hard mask regime, which may result in a less pronounced surface topography, in particular in densely packed device areas. To this end, in some illustrative embodiments, a deposited hard mask material may be used for selectively providing an oxide mask of reduced thickness and superior uniformity. | 06-21-2012 |
20120161240 | Transistor Comprising an Embedded Sigma-Shaped Semiconductor Alloy Having Superior Uniformity - When incorporating a strain-inducing semiconductor alloy in one type of sophisticated transistors, the removal of sacrificial cap materials, such as a spacer layer, sacrificial spacer elements and dielectric cap materials, may be accomplished by using, at least in a first phase of the removal process, an efficient etch stop liner material, which may thus reduce the material loss in the drain and source extension regions that are formed prior to the deposition of the strain-inducing semiconductor material. Moreover, the drain and source extension regions of the other type of transistor may be formed with superior process uniformity due to a reduced material erosion of the corresponding spacer elements. | 06-28-2012 |
20120161243 | High-K Metal Gate Electrode Structures Formed by Cap Layer Removal Without Sacrificial Spacer - In sophisticated semiconductor devices, high-k metal gate electrode structures may be formed in an early manufacturing stage with superior integrity of sensitive gate materials by providing an additional liner material after the selective deposition of a strain-inducing semiconductor material in selected active regions. Moreover, the dielectric cap materials of the gate electrode structures may be removed on the basis of a process flow that significantly reduces the degree of material erosion in isolation regions and active regions by avoiding the patterning and removal of any sacrificial oxide spacers. | 06-28-2012 |
20120196417 | Sophisticated Gate Electrode Structures Formed by Cap Layer Removal with Reduced Loss of Embedded Strain-Inducing Semiconductor Material - When forming sophisticated gate electrode structures, such as high-k metal gate electrode structures, an appropriate encapsulation may be achieved, while also undue material loss of a strain-inducing semiconductor material that is provided in one type of transistor may be avoided. To this end, the patterning of the protective spacer structure prior to depositing the strain-inducing semiconductor material may be achieved for each type of transistor on the basis of the same process flow, while, after the deposition of the strain-inducing semiconductor material, an etch stop layer may be provided so as to preserve integrity of the active regions. | 08-02-2012 |
20120211838 | Complementary Transistors Comprising High-K Metal Gate Electrode Structures and Epitaxially Formed Semiconductor Materials in the Drain and Source Areas - When forming sophisticated semiconductor devices including complementary transistors having a reduced gate length, the individual transistor characteristics may be adjusted on the basis of individually provided semiconductor alloys, such as a silicon/germanium alloy for P-channel transistors and a silicon/phosphorous semiconductor alloy for | 08-23-2012 |
20120223363 | TRANSISTOR WITH AN EMBEDDED STRAIN-INDUCING MATERIAL HAVING A GRADUALLY SHAPED CONFIGURATION - In a transistor, a strain-inducing semiconductor alloy, such as silicon/germanium, silicon/carbon and the like, may be positioned very close to the channel region by providing gradually shaped cavities which may then be filled with the strain-inducing semiconductor alloy. For this purpose, two or more “disposable” spacer elements of different etch behavior may be used in order to define different lateral offsets at different depths of the corresponding cavities. Consequently, enhanced uniformity and, thus, reduced transistor variability may be accomplished, even for sophisticated semiconductor devices. | 09-06-2012 |
20120267683 | EARLY EMBEDDED SILICON GERMANIUM WITH INSITU BORON DOPING AND OXIDE/NITRIDE PROXIMITY SPACER - Devices are formed with an oxide liner and nitride layer before forming eSiGe spacers. Embodiments include forming first and second gate stacks on a substrate, forming an oxide liner over the first and second gate stacks, forming a nitride layer over the oxide liner, forming a resist over the first gate stack, forming nitride spacers from the nitride layer over the second gate stack, forming eSiGe source/drain regions for the second gate stack, subsequently forming halo/extension regions for the first gate stack, and independently forming halo/extension regions for the second gate stack. Embodiments include forming the eSiGe regions by wet etching the substrate with TMAH using the nitride spacers as a soft mask, forming sigma shaped cavities, and epitaxially growing in situ boron doped eSiGe in the cavities. | 10-25-2012 |
20120282744 | Reduced Threshold Voltage-Width Dependency and Reduced Surface Topography in Transistors Comprising High-K Metal Gate Electrode Structures by a Late Carbon Incorporation - Performance and/or uniformity of sophisticated transistors may be enhanced by incorporating a carbon species in the active regions of the transistors prior to forming complex high-k metal gate electrode structures. On the other hand, increased yield losses observed in conventional strategies may be reduced by taking into consideration the increased etch rate of the carbon-doped silicon material in the active regions. To this end, the carbon species may be incorporated after the application of at least some aggressive wet chemical processes. | 11-08-2012 |
20120282760 | ENHANCING INTERFACE CHARACTERISTICS BETWEEN A CHANNEL SEMICONDUCTOR ALLOY AND A GATE DIELECTRIC BY AN OXIDATION PROCESS - In sophisticated transistor elements, long-term threshold voltage shifts in transistors comprising a threshold adjusting semiconductor alloy may be reduced by reducing the roughness of an interface formed between the threshold adjusting semiconductor material and the gate dielectric material. To this end, a portion of the threshold adjusting semiconductor material may be oxidized and may be removed prior to forming the high-k dielectric material. | 11-08-2012 |
20120282763 | Process Flow to Reduce Hole Defects in P-Active Regions and to Reduce Across-Wafer Threshold Voltage Scatter - Disclosed herein is a method of forming a semiconductor device. In one example, the method comprises performing at least one etching process to reduce a thickness of a P-active region of a semiconducting substrate to thereby define a recessed P-active region, performing a process in a process chamber to selectively form an as-deposited layer of a semiconductor material on the recessed P-active region, wherein the step of performing the at least one etching process is performed outside of the process chamber, and performing an etching process in the process chamber to reduce a thickness of the as-deposited layer of semiconductor material. | 11-08-2012 |
20120302023 | PMOS Threshold Voltage Control by Germanium Implantation - Disclosed herein is a method of forming a semiconductor device. In one example, the method comprises forming a P-active region in a silicon containing semiconducting substrate, performing an ion implantation process to implant germanium into the P-active region to form an implanted silicon-germanium region in the P-active region, and forming a gate electrode structure for a PMOS transistor above the implanted silicon-germanium region. | 11-29-2012 |
20120302037 | Method of Protecting STI Structures From Erosion During Processing Operations - Generally, the present disclosure is directed to a method of at least reducing unwanted erosion of isolation structures of a semiconductor device during fabrication. One illustrative method disclosed includes forming an isolation structure in a semiconducting substrate and forming a conductive protection ring above plurality isolation structure. | 11-29-2012 |
20120305995 | PERFORMANCE ENHANCEMENT IN TRANSISTORS BY PROVIDING AN EMBEDDED STRAIN-INDUCING SEMICONDUCTOR MATERIAL ON THE BASIS OF A SEED LAYER - In sophisticated semiconductor devices, transistors may be formed on the basis of a high-k metal gate electrode structure provided in an early manufacturing phase, wherein an efficient strain-inducing mechanism may be implemented by using an embedded strain-inducing semiconductor alloy. In order to reduce the number of lattice defects and provide enhanced etch resistivity in a critical zone, i.e., in a zone in which a threshold voltage adjusting semiconductor alloy and the strain-inducing semiconductor material are positioned in close proximity, an efficient buffer material or seed material, such as a silicon material, is incorporated, which may be accomplished during the selective epitaxial growth process. | 12-06-2012 |
20130105900 | Methods of Forming PFET Devices With Different Structures and Performance Characteristics | 05-02-2013 |
20130105917 | Methods of Epitaxially Forming Materials on Transistor Devices | 05-02-2013 |
20130113019 | SEMICONDUCTOR DEVICE WITH REDUCED THRESHOLD VARIABILITY HAVING A THRESHOLD ADJUSTING SEMICONDUCTOR ALLOY IN THE DEVICE ACTIVE REGION - Generally, the subject matter disclosed herein is directed to semiconductor devices with reduced threshold variability having a threshold adjusting semiconductor material in the device active region. One illustrative semiconductor device disclosed herein includes an active region in a semiconductor layer of a semiconductor device substrate, the active region having a region length and a region width that are laterally delineated by an isolation structure. The semiconductor device further includes a threshold adjusting semiconductor alloy material layer that is positioned on the active region substantially without overlapping the isolation structure, the threshold adjusting semiconductor alloy material layer having a layer length that is less than the region length. Additionally, the disclosed semiconductor device includes a gate electrode structure that is positioned above the threshold adjusting semiconductor alloy material layer, the gate electrode structure including a high-k dielectric material and a metal-containing electrode material formed above the high-k dielectric material. | 05-09-2013 |
20130130449 | STRAIN ENHANCEMENT IN TRANSISTORS COMPRISING AN EMBEDDED STRAIN-INDUCING SEMICONDUCTOR ALLOY BY CREATING A PATTERNING NON-UNIFORMITY AT THE BOTTOM OF THE GATE ELECTRODE - Performance of P-channel transistors may be enhanced on the basis of an embedded strain-inducing semiconductor alloy by forming a gate electrode structure on the basis of a high-k dielectric material in combination with a metal-containing cap layer in order to obtain an undercut configuration of the gate electrode structure. Consequently, the strain-inducing semiconductor alloy may be formed on the basis of a sidewall spacer of minimum thickness in order to position the strain-inducing semiconductor material closer to a central area of the channel region. | 05-23-2013 |
20130161695 | REDUCTION OF THICKNESS VARIATIONS OF A THRESHOLD SEMICONDUCTOR ALLOY BY REDUCING PATTERNING NON-UNIFORMITIES PRIOR TO DEPOSITING THE SEMICONDUCTOR ALLOY - The growth rate in a selective epitaxial growth process for depositing a threshold adjusting semiconductor alloy, such as a silicon/germanium alloy, may be enhanced by performing a plasma-assisted etch process prior to performing the selective epitaxial growth process. For example, a mask layer may be patterned on the basis of the plasma-assisted etch process, thereby simultaneously providing superior device topography during the subsequent growth process. Hence, the threshold adjusting material may be deposited with enhanced thickness uniformity, thereby reducing overall threshold variability. | 06-27-2013 |
20130175577 | NFET Device with Tensile Stressed Channel Region and Methods of Forming Same - Disclosed herein is an NFET device with a tensile stressed channel region and various methods of making such an NFET device. In one example, the NFET transistor includes a semiconducting substrate, a first layer of semiconductor material positioned above the substrate, a second capping layer of semiconductor material positioned above the first layer of semiconductor material and a gate electrode structure positioned above the second capping layer of semiconductor material. | 07-11-2013 |
20130175585 | Methods of Forming Faceted Stress-Inducing Stressors Proximate the Gate Structure of a Transistor - Disclosed herein are various methods of forming faceted stress-inducing stressors proximate the gate structure of a transistor. In one example, a method includes forming a first recess in an active region of a semiconducting substrate, forming a first semiconductor material in the first recess and forming a gate structure above the first semiconductor material. In this example, the method includes the additional steps of performing a crystalline orientation-dependent etching process on the first semiconductor material to define a plurality of second recesses proximate the gate structure, wherein each of the second recesses has a faceted edge, and forming a first region of stress-inducing semiconductor material in each of the second recesses, wherein each of the first regions of stress-inducing semiconductor material has a faceted edge that engages a corresponding faceted edge in one of the second recesses. | 07-11-2013 |
20130203244 | METHODS FOR PFET FABRICATION USING APM SOLUTIONS - A method for fabricating an integrated circuit is disclosed that includes, in accordance with an embodiment, providing an integrated circuit comprising a p-type field effect transistor (pFET), recessing a surface region of the pFET using an ammonia-hydrogen peroxide-water (APM) solution to form a recessed pFET surface region, and depositing a silicon-based material channel on the recessed pFET surface region. | 08-08-2013 |
20130203245 | METHODS FOR PFET FABRICATION USING APM SOLUTIONS - A method for fabricating an integrated circuit from a semiconductor substrate having formed thereon over a first portion of the semiconductor substrate a hard mask layer and having formed thereon over a second portion of the semiconductor substrate an oxide layer. The first portion and the second portion are electrically isolated by a shallow trench isolation feature. The method includes removing the oxide layer from over the second portion and recessing the surface region of the second portion by applying an ammonia-hydrogen peroxide-water (APM) solution to form a recessed surface region. The APM solution is provided in a concentration of ammonium to hydrogen peroxide ranging from about 1:1 to about 1:0.001 and in a concentration of ammonium to water ranging from about 1:1 to about 1:20. The method further includes epitaxially growing a silicon-germanium (SiGe) layer on the recessed surface region. | 08-08-2013 |
20130210216 | EPITAXIAL CHANNEL FORMATION METHODS AND STRUCTURES - A method for forming field effect transistors (FETs) in a multiple wafers per batch epi-reactor includes, providing substrates having therein at least one semiconductor (SC) region with a substantially flat outer surface, modifying such substantially flat outer surface to form a convex-outward curved surface, forming an epitaxial semiconductor layer on the curved surface, and incorporating the epitaxial layer in a field effect transistor formed on the substrate. Where the SC region is of silicon, the epitaxial layer can include silicon-germanium. In a preferred embodiment, the epi-layer forms part of the FET channel. Because of the convex-outward curved surface, the epi-layer grown thereon has much more uniform thickness even when formed in a high volume reactor holding as many as 100 or more substrates per batch. FETs with much more uniform properties are obtained, thereby greatly increasing the manufacturing yield and reducing the cost. | 08-15-2013 |
20130214381 | METHODS OF FORMING ISOLATION STRUCTURES FOR SEMICONDUCTOR DEVICES - Disclosed herein are various methods of forming isolation structures, such as trench isolation structures, for semiconductor devices. In one example, the method includes forming a trench in a semiconducting substrate, forming a lower isolation structure in the trench, wherein the lower isolation structure has an upper surface that is below an upper surface of the substrate, and forming an upper isolation structure above the lower isolation structure, wherein a portion of the upper isolation structure is positioned within the trench. | 08-22-2013 |
20130214392 | METHODS OF FORMING STEPPED ISOLATION STRUCTURES FOR SEMICONDUCTOR DEVICES USING A SPACER TECHNIQUE - Disclosed herein are various methods of forming stepped isolation structures for semiconductor devices using a spacer technique. In one example, the method includes forming a first trench in a semiconducting substrate, wherein the first trench has a bottom surface, a width and a depth, the depth of the first trench being less than a target final depth for a stepped trench isolation structure, performing an etching process through the first trench on an exposed portion of the bottom surface of the first trench to form a second trench in the substrate, wherein the second trench has a width and a depth, and wherein the width of the second trench is less than the width of the first trench, and forming the stepped isolation structure in the first and second trenches. | 08-22-2013 |
20130221478 | METHODS OF FORMING ISOLATION STRUCTURES FOR SEMICONDUCTOR DEVICES BY EMPLOYING A SPIN-ON GLASS MATERIAL OR A FLOWABLE OXIDE MATERIAL - Disclosed herein are various methods of forming isolation structures, such as trench isolation structures, for semiconductor devices using a spin-on glass material or a flowable oxide material. In one example, the method includes forming a trench in a semiconducting substrate, forming a lower isolation structure comprised of an insulating material in at least the trench, wherein the lower isolation structure has an upper surface that is below an upper surface of the substrate, and forming an upper isolation structure above the lower isolation structure, wherein a portion of the upper isolation structure is positioned within the trench. | 08-29-2013 |
20130221540 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICE COMPRISING AN INTER-DIE CONNECTION ON THE BASIS OF FUNCTIONAL MOLECULES - In a stacked chip configuration, the “inter chip” connection is established on the basis of functional molecules, thereby providing a fast and space-efficient communication between the different semiconductor chips. | 08-29-2013 |
20130299874 | TMAH RECESS FOR SILICON GERMANIUM IN POSITIVE CHANNEL REGION FOR CMOS DEVICE - CMOS devices are enhanced by forming a recess in the positive channel for depositing SiGe. Embodiments include providing a positive channel region and a negative channel region in a silicon substrate for a CMOS device, with an STI region therebetween; removing a native oxide from above the positive channel region to expose a silicon substrate; forming a recess in the silicon substrate in the positive channel region adjacent the STI region; and depositing SiGe in the recess in the positive channel region, where an upper surface of the SiGe is substantially level with an upper surface of the negative channel region. | 11-14-2013 |
20130302973 | HORIZONTAL EPITAXY FURNACE FOR CHANNEL SIGE FORMATION - A method and apparatus are provided for recessing a channel region of the PFET and epitaxially growing channel SiGe in the recessed region inside of a horizontally oriented processing furnace. Embodiments include forming an n-channel region and a p-channel region in a front side of a wafer and at least one additional wafer, the n-channel and p-channel regions corresponding to locations for forming an NFET and a PFET, respectively; placing the wafers inside a horizontally oriented furnace having a top surface and a bottom surface, with the wafers oriented vertically between the top and bottom surfaces; recessing the p-channel regions of the wafers inside the furnace; and epitaxially growing cSiGe without hole defects in the recessed p-channel regions inside the furnace. | 11-14-2013 |
20130307090 | ADJUSTING OF STRAIN CAUSED IN A TRANSISTOR CHANNEL BY SEMICONDUCTOR MATERIAL PROVIDED FOR THE THRESHOLD ADJUSTMENT - The threshold voltage of a sophisticated transistor may be adjusted by providing a specifically designed semiconductor alloy in the channel region of the transistor, wherein a negative effect of this semiconductor material with respect to inducing a strain component in the channel region may be reduced or over-compensated for by additionally incorporating a strain-adjusting species. For example, a carbon species may be incorporated in the channel region, the threshold voltage of which may be adjusted on the basis of a silicon/germanium alloy of a P-channel transistor. Consequently, sophisticated metal gate electrodes may be formed in an early manufacturing stage. | 11-21-2013 |
20130316511 | SUPERIOR STABILITY OF CHARACTERISTICS OF TRANSISTORS HAVING AN EARLY FORMED HIGH-K METAL GATE - When forming sophisticated transistors on the basis of a high-k metal gate electrode structure and a strain-inducing semiconductor alloy, a superior wet cleaning process strategy is applied after forming cavities in order to reduce undue modification of sensitive gate materials, such as high-k dielectric materials, metal-containing electrode materials and the like, and modification of a threshold voltage adjusting semiconductor alloy. Thus, the pronounced dependence of the threshold voltage of transistors of different width may be significantly reduced compared to conventional strategies. | 11-28-2013 |
20140057415 | METHODS OF FORMING A LAYER OF SILICON ON A LAYER OF SILICON/GERMANIUM - Disclosed herein are various methods of forming a layer of silicon on a layer of silicon/germanium. In one example, a method disclosed herein includes forming a silicon/germanium material on a semiconducting substrate, after forming the silicon/germanium material, performing a heating process to raise a temperature of the substrate to a desired silicon formation temperature while flowing a silicon-containing precursor and a chlorine-containing precursor into the deposition chamber during the heating process, and, after the temperature of the substrate reaches the desired silicon formation temperature, forming a layer of silicon on the silicon/germanium material. | 02-27-2014 |
20140131805 | TRANSISTOR WITH EMBEDDED SI/GE MATERIAL HAVING REDUCED OFFSET AND SUPERIOR UNIFORMITY - A semiconductor device includes a first transistor positioned in and above a first semiconductor region, the first semiconductor region having a first upper surface and including a first semiconductor material. The semiconductor device further includes first raised drain and source portions positioned on the first upper surface of the first semiconductor region, the first drain and source portions including a second semiconductor material having a different material composition from the first semiconductor material. Additionally, the semiconductor device includes a second transistor positioned in and above a second semiconductor region, the second semiconductor region including the first semiconductor material. Finally, the semiconductor device also includes strain-inducing regions embedded in the second semiconductor region, the embedded strain-inducing regions including the second semiconductor material. | 05-15-2014 |
20140191332 | PFET DEVICES WITH DIFFERENT STRUCTURES AND PERFORMANCE CHARACTERISTICS - Disclosed herein is a device that includes a first PFET transistor formed in and above a first active region of a semiconducting substrate, a second PFET transistor formed in and above a second active region of the semiconducting substrate, wherein at least one of a thickness of the first and second channel semiconductor materials or a concentration of germanium in the first and second channel semiconductor materials are different. | 07-10-2014 |
20140217480 | METHODS OF FORMING SILICON/GERMANIUM PROTECTION LAYER ABOVE SOURCE/DRAIN REGIONS OF A TRANSISTOR AND A DEVICE HAVING SUCH A PROTECTION LAYER - Disclosed herein are various methods of forming a silicon/germanium protection layer above source/drain regions of a transistor. One method disclosed herein includes forming a plurality of recesses in a substrate proximate the gate structure, forming a semiconductor material in the recesses, forming at least one layer of silicon above the semiconductor material, and forming a cap layer comprised of silicon germanium on the layer of silicon. One device disclosed herein includes a gate structure positioned above a substrate, a plurality of recesses formed in the substrate proximate the gate structure, at least one layer of semiconductor material positioned at least partially in the recesses, a layer of silicon positioned above the at least one layer of semiconductor material, and a cap layer comprised of silicon/germanium positioned on the layer of silicon. | 08-07-2014 |
20140339604 | STRAIN ENHANCEMENT IN TRANSISTORS COMPRISING AN EMBEDDED STRAIN-INDUCING SEMICONDUCTOR ALLOY BY CREATING A PATTERNING NON-UNIFORMITY AT THE BOTTOM OF THE GATE ELECTRODE - A semiconductor device includes a gate electrode structure of a transistor, the gate electrode structure being positioned above a semiconductor region and having a gate insulation layer that includes a high-k dielectric material, a metal-containing cap material positioned above the gate insulation layer, and a gate electrode material positioned above the metal-containing cap material. A bottom portion of the gate electrode structure has a first length and an upper portion of the gate electrode structure has a second length that is different than the first length, wherein the first length is approximately 50 nm or less. A strain-inducing semiconductor alloy is embedded in the semiconductor region laterally adjacent to the bottom portion of the gate electrode structure, and drain and source regions are at least partially positioned in the strain-inducing semiconductor alloy. | 11-20-2014 |
20150054083 | STRAIN ENGINEERING IN SEMICONDUCTOR DEVICES BY USING A PIEZOELECTRIC MATERIAL - An efficient strain-inducing mechanism may be provided on the basis of a piezoelectric material so that performance of different transistor types may be enhanced by applying a single concept. For example, a piezoelectric material may be provided below the active region of different transistor types and may be appropriately connected to a voltage source so as to obtain a desired type of strain. | 02-26-2015 |