Patent application number | Description | Published |
20150152767 | EXHAUST GAS AFTERTREATMENT DEVICE - A compact exhaust gas aftertreatment device for an internal combustion engine comprises a catalytic converter, wherein the catalytic converter comprises an encapsulating member, a pipe member, an exhaust gas guiding means and two catalytic converter substrates. The exhaust gas aftertreatment device provides very good exhaust gas mixing properties. Additionally, the exhaust gas guiding means is configured to withstand thermal stress due to exposure to hot exhaust gas emissions. | 06-04-2015 |
20150377110 | ANGLED AND COMPACT EXHAUST GAS AFTERTREATMENT DEVICE - An exhaust gas aftertreatment device for an internal combustion engine comprises a housing, first and second catalytic substrates arranged inside the housing such that the first catalytic substrate is arranged upstream of the second catalytic substrate, and a reductant injector arranged in between the first and second catalytic substrates. Further, the first and second catalytic substrates are arranged such that a fluid flow direction through the exhaust gas aftertreatment device is angled. A flow redirecting wall is arranged downstream of the first catalytic substrate such that the fluid flow between the first and second catalytic substrates at least partially passes an outer circumference of the first catalytic substrate before reaching the second catalytic substrate. The redirecting wall is inclined to an outlet surface of the first catalytic substrate and the reductant injector is arranged at the redirecting wall at a position distant from the outlet surface. | 12-31-2015 |
20150377111 | PRESSURE DIFFERENTIATED EXHAUST AFTERTREATMENT DEVICE - The disclosure relates to an exhaust gas aftertreatment device for purification of exhaust gas emissions. The exhaust gas aftertreatment device is arranged in an exhaust gas passage subsequently of an internal combustion engine and includes an encapsulating portion, a first catalytic substrate and a second catalytic substrate. The second catalytic substrate may be of SCR type. The exhaust gas aftertreatment device includes a reductant injecting device, a pipe and an obstructing portion, where the reductant injecting device is arranged such that reductant is injectable within the pipe and the exhaust gas flow through the pipe can be controlled by the obstructing portion. | 12-31-2015 |