Sho, JP
Abe Sho, Kawasaki-Shi JP
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20090274976 | Negative resist composition for immersion exposure and method of forming resist pattern - A negative resist composition for immersion exposure including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C); and a method of forming a resist pattern including applying the negative resist composition for immersion exposure to a substrate to form a resist film, subjecting the resist film to immersion exposure, and subjecting the resist film to alkali developing to form a resist pattern. | 11-05-2009 |
20120164581 | NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group. | 06-28-2012 |
Kenji Sho, Kitakatsuragi-Gun JP
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20090276939 | SOCK - A sock may include a first low-elasticity area disposed on a dorsal portion of the foot, the first low-elasticity area being band-shaped and having a lower elasticity than other areas of the sock. The first low-elasticity area may include a curved ankle portion and an end portion, the end portion being disposed below the curved ankle portion and extending to the base of the toes. The end portion may be positioned within a range from the base of the third toe to the base of the small toe. A center line in the course direction with respect to the width of the first low-elasticity area may gradually shift toward the side of the small toe in the course direction. Preferably, the first low-elasticity area applies a force that raises the side of the fifth toe toward the ankle curve portion thereby providing a resistive force against the ankle twisting inwards. | 11-12-2009 |
Kinkou Sho, Osaka JP
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20090297909 | PRODUCTION METHOD OF ELECTROLYTE MEMBRANE, ELECTROLYTE MEMBRANE AND SOLID POLYMER FUEL CELL USING SAME - Disclosed is an electrolyte membrane which enables a fuel cell to have a high maximum output when used therein since it has high proton conductivity and high hydrogen gas impermeability. Also disclosed are a method for producing such an electrolyte membrane, and a solid polymer fuel cell using such an electrolyte membrane. A method for producing an electrolyte membrane including a step for impregnating a porous base with a solution containing a sulfonic acid group-containing vinyl monomer and then polymerizing the monomer is characterized in that 80% by mole or more of vinyl sulfonic acid having purity of 90% or more, and/or a salt thereof is contained as the sulfonic acid group-containing vinyl monomer, and the concentration of the vinyl sulfonic acid and/or a salt thereof in the solution is set at 35% by weight or more. | 12-03-2009 |
20100239900 | BATTERY SEPARATOR AND NONAQUEOUS LITHIUM ION SECONDARY BATTERY HAVING THE SAME - The invention provides a battery separator comprising a porous resin film and a crosslinked polymer supported thereon and having iminodiacetic acid groups in side chains of the polymer chains. The iminodiacetic acid group is preferably represented by the formula | 09-23-2010 |
20110135988 | BATTERY SEPARATOR AND BATTERY USING THE SAME - The present invention relates to a battery separator including: a porous substrate; and a layer of a crosslinked polymer supported on at least one surface of the porous substrate, in which the crosslinked polymer is obtained by reacting (a) a reactive polymer having, in the molecule thereof, a first reactive group containing active hydrogen and a second reactive group having cationic polymerizability with (b) a polycarbonate urethane prepolymer terminated by an isocyanate group. | 06-09-2011 |
20110135989 | BATTERY SEPARATOR AND BATTERY USING THE SAME - The present invention relates to a battery separator including: a porous substrate; and a layer of a crosslinked polymer supported on at least one surface of the porous substrate, in which the crosslinked polymer is obtained by reacting (a) a reactive polymer having, in the molecule thereof, a reactive group containing active hydrogen with (b) a polycarbonate urethane prepolymer terminated by an isocyanate group. | 06-09-2011 |
Kotaro Sho, Yokohama-Shi JP
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20090220896 | PATTERN FORMING METHOD - A pattern forming method has forming a lower layer film on a film to be processed, forming a silicon-containing intermediate film containing a protecting group which is removed by an acid, on said lower layer film, forming a resist film on said silicon-containing intermediate film, exposing a predetermined region of said resist film to light, and developing said resist film with a developer. | 09-03-2009 |
Kotaro Sho, Kanagawa-Ken JP
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20090253082 | METHOD FOR FORMING RESIST PATTERN - A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developing the photoresist film. The lower layer film contains at least any one of a free acid, a thermoacid-generating agent, and a photoacid-generating agent, on a substrate to be treated. | 10-08-2009 |
Koutaro Sho, Mie-Ken JP
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20110059405 | SUBSTRATE PROCESSING METHOD - A substrate processing method, includes: forming a resist film above a substrate; exposing the resist film; developing the resist film using a developing fluid after the exposing of the resist film; cleaning the resist film using a rinsing fluid after the developing of the resist film; and drying the resist film in a processing chamber after the cleaning of the resist film, inside the processing chamber being an atmosphere including an ion, the atmosphere including the ion being caused by introducing a gas including the ion produced externally to the processing chamber into the processing chamber. | 03-10-2011 |
Koutaro Sho, Yokohama-Shi JP
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20100112823 | METHOD OF FORMING A RESIST PATTERN - A lower-layer film to which a fluorine-doped polymer is added is formed on a film to be processed. The lower-layer film is baked. An intermediate film is formed on the lower-layer film. A resist film is formed on the intermediate film. The resist film is baked. A resist protection film is formed. The resist film is immersion-exposed. The resist film is developed to form a resist pattern. | 05-06-2010 |
Koutarou Sho, Kanagawa JP
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20100119982 | ETCHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - An etching method according to an embodiment includes forming a resist film on a workpiece film, exposing the resist film, developing the resist film so as to form a resist pattern, selectively irradiating a particular place of the resist pattern with an energy beam so as to generate an acid component in the particular place of the resist pattern, forming a film including a cross-linking agent that causes a cross-linking reaction due to the acid component on the workpiece film so as to cover the particular place of the resist pattern where the acid component is generated, reacting the cross-linking agent with the resist pattern so as to form a cross-linked layer in a part of the resist pattern and processing the workpiece film by using the resist pattern and the cross-linked layer as a mask. | 05-13-2010 |
Koutarou Sho, Kanagawa-Ken JP
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20100227262 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device, includes: supplying a liquid resist containing a water-repellent additive to a surface of a rotating semiconductor wafer fixed to a rotary support to form a resist film to a design thickness on the surface of the semiconductor wafer; spin drying the resist film; bringing a liquid into contact with the resist film and exposing the resist film through the liquid after the spin drying; developing the resist film to form a resist pattern; and performing processing on the semiconductor wafer. | 09-09-2010 |
Koutarou Sho, Yokkaichi Mie JP
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20160071763 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, at first, while a resist pattern is used as a mask, a first set of one of the first layers and one of the second layers, which is an uppermost set in a stacked body and is exposed, is etched. Then, a hardening layer having a predetermined thickness is formed on an upper side of the resist pattern. Thereafter, slimming is performed to the resist pattern in its in-plane direction perpendicular to its thickness direction. The slimming is completed after the hardening layer is entirely removed or at the same time when the hardening layer is entirely removed. Then, while the resist pattern is used as a mask, a set of one of the first layers and one of the second layers is etched at an exposed area of the stacked body. | 03-10-2016 |
Koutarou Sho, Yokkaichi-Shi JP
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20140232998 | SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A semiconductor manufacturing apparatus according to the present embodiment comprises a vacuum chamber. A first stage is configured to temporarily attach a reticle thereonto in order to attract a foreign material present on a back surface of the reticle. A second stage is configured to attach the reticle thereonto after attaching the reticle onto the first stage in order to expose a semiconductor substrate to light using the reticle within the vacuum chamber. An exposure unit is configured to expose a surface of the semiconductor substrate to the light using the reticle attached onto the second stage. | 08-21-2014 |
20150220846 | PROCESS CONVERSION DIFFERENCE PREDICTION DEVICE, PROCESS CONVERSION DIFFERENCE PREDICTION METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM CONTAINING A PROCESS CONVERSION DIFFERENCE PREDICTION PROGRAM - According to one embodiment, a process conversion difference in a processed pattern having undergone a process via the resist pattern can be predicted, based on results of simulation of a cross-sectional shape of the resist pattern by which predicted values of resist dimensions adapted to a relationship between a parameter for lithography and actual measurement values of the resist dimensions. | 08-06-2015 |
Ogata Sho, Kanagawa JP
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20120175220 | ESCALATOR DISPLAY DEVICE - An escalator display device includes a light-emitting body arranged on an edge of a side wall, which includes a transparent medium. The light-emitting body is arranged to display a displayed item on the surface of the transparent medium and is a photosensitive material that reacts photosensitively with the light emission color of the light-emitting body. | 07-12-2012 |
Sekikin Sho, Kawasaki JP
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20100022080 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - The method of manufacturing the semiconductor device includes nitridizing a silicon substrate with ammonia while heating the silicon substrate, then heating the silicon substrate in an atmosphere containing nitrogen and oxygen to form a gate insulating film including a silicon-based insulating film containing nitrogen and oxygen, then annealing the silicon substrate in an oxygen atmosphere, and forming a gate electrode on the gate insulating film. | 01-28-2010 |
To Sho, Kizugawa-Shi JP
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20120086950 | SHAPE MEASURING APPARATUS AND SHAPE MEASURING METHOD - A shape measuring apparatus that measures a three-dimensional shape of a measuring target has a lighting device that irradiates the measuring target placed on a stage with light, an imaging device that takes an image of the measuring target, a shape calculating device that calculates orientations of normals at a plurality of points on a surface of the measuring target from an image, the image being obtained by performing imaging with the imaging device while the lighting device irradiates the measuring target with the light, the shape calculating device calculating the three-dimensional shape of the surface of the measuring target from the calculation result of the orientations of the normals, a ranging device that measures a distance from a predetermined reference position with respect to at least one point on the surface of the measuring target, and a determination device that determines a spatial position of the three-dimensional shape of the surface of the measuring target, the three-dimensional shape being obtained by the shape calculating device using information on the distance obtained by the ranging device. | 04-12-2012 |
Tomoyoshi Sho, Kyotanabe-Shi JP
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20140262570 | HYDRAULIC EXCAVATOR - A hydraulic excavator is provided, facilitating access to the lower side inside an engine compartment, allowing a maintenance job to be performed in a reasonable posture. The hydraulic excavator includes a revolving frame, an engine arranged on the revolving frame, and a counterweight arranged on the revolving frame, at the back side of the engine. A recess indented from the bottom face in the upward direction is formed at the counterweight. An opening is formed at the revolving frame for allowing a person to access from the lower side of the revolving frame to the space between the engine and the counterweight. The recess has a section overlapping with the opening, when viewed from the top. | 09-18-2014 |
Yoshiyuki Sho, Namerikawa JP
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20120114782 | Systems And Methods Of Feeding Hook Fastening Elements Into A Mold Assembly Line - Systems and methods for introducing hook fastening elements into a mold traveling along a mold assembly line is disclosed. The system can be configured to cut hook fastening tape into strips having a predetermined length based on information received from the mold assembly line, and to drop the cut strips directly into the mold at the appropriate intervals as the mold travels along the mold assembly line. | 05-10-2012 |
Yoshiyuki Sho, Toyama JP
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20130160627 | Systems and Methods of Feeding Hook Fastening Elements - Systems and methods for introducing hook fastening elements into a mold traveling along a mold assembly line are disclosed. The system can be configured to cut hook fastening tape into strips having a predetermined length based on information received from the mold assembly line, and to drop the cut strips directly into the mold at the appropriate intervals as the mold travels along the mold assembly line. Also disclosed is a system for facilitating the continuous feeding of hook fastening tape through the system. | 06-27-2013 |
20150366300 | Stringers Without Fastener Tape and Article with Slide Fastener - Stringers without fastener tape have continuous fastener elements and have element fixing members wherein the fastener elements are sewn together by a sewing thread. The element fixing members are inserted between upper and lower leg sections of the fastener elements. The sewing thread comes in contact with and straddles the upper and lower leg sections of each fastener element and pierces the element fixing members between the fastener elements. As a result of such stringers without fastener tape, the fastener elements can be held and the weight and cost of an article with a slide fastener can be reduced. | 12-24-2015 |
20160039119 | Systems and Methods of Feeding Hook Fastening Elements - Systems and methods for introducing hook fastening elements into a mold traveling along a mold assembly line are disclosed. The system can be configured to cut hook fastening tape into strips having a predetermined length based on information received from the mold assembly line, and to drop the cut strips directly into the mold at the appropriate intervals as the mold travels along the mold assembly line. Also disclosed is a system for facilitating the continuous feeding of hook fastening tape through the system. | 02-11-2016 |
Yuji Sho, Isehara-Shi JP
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20080218888 | Vehicle mirror device - A vehicle mirror device includes a base unit configured to be fixed to a vehicle, a body unit that includes a mirror and is rotatably attached to the base unit, and a driving unit that drives the body unit to rotate with respect to the base unit. The driving unit includes a motor that drives the body unit to rotate, a current detecting circuit that detects current fluctuation due to rotation of the motor, and a switching circuit that switches ON or OFF current supply to the motor. While current fluctuation is detected, the switching circuit keeps current supply to the motor ON. While no current fluctuation is detected, the switching circuit switches OFF current supply to the motor. | 09-11-2008 |