Patent application number | Description | Published |
20080199687 | Functional composites, functional inks and applications thereof - Functional composite materials comprise elemental inorganic particles within an organic matrix. The elemental inorganic materials generally comprise elemental metal, elemental metalloid, alloys thereof, or mixtures thereof. In alternative or additional embodiments, the inorganic particles can comprise a metal oxide, a metalloid oxide, a combination thereof or a mixture thereof. The inorganic particles can have an average primary particle size of no more than abut 250 nm and a secondary particle size in a dispersion when blended with the organic matrix of no more than about 2 microns. The particles can be substantially unagglomerated within the composite. The organic binder can be a functional polymer such as a semiconducting polymer. The inorganic particles can be surface modified, such as with a moiety having an aromatic functional group for desirable interactions with a semiconducting polymer. Appropriate solution based methods can be used for forming the composite from dispersions of the particles. The composites can be processed into products, such as printed electronics devices. | 08-21-2008 |
20090017292 | Reactive flow deposition and synthesis of inorganic foils - Sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow. Thus, using this CVD configuration a relatively high deposition rate can be achieved while obtaining desired levels of coating uniformity. Deposition approaches are described to place one or more inorganic layers onto a release layer, such as a porous, particulate release layer. In some embodiments, the release layer is formed from a dispersion of submicron particles that are coated onto a substrate. The processes described can be effective for the formation of silicon films that can be separated with the use of a release layer into a silicon foil. The silicon foils can be used for the formation of a range of semiconductor based devices, such as display circuits or solar cells. | 01-15-2009 |
20090075083 | Nanoparticle production and corresponding structures - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 03-19-2009 |
20090081304 | Composite pigment nanoparticles and processes to form organic-inorganic nanoparticle composite particles - Milling approaches provide for the efficient formation of composite particles having an inorganic nanoparticle core with an organic coating composition. The nanoparticles can additionally function as a milling media or distinct milling particles can be used and later separated from the product composite particles. In general, the milling is performed in the presence of a dispersing agent that facilitates dispersing of the composite particles in a carrier liquid. The processes described herein can be effectively used in the formation of composite particles comprising organic pigments. Similarly, the composite particles can be formed with other organic compounds, such as organic pharmaceutical compositions. | 03-26-2009 |
20100102700 | Flame spray pyrolysis with versatile precursors for metal oxide nanoparticle synthesis and applications of submicron inorganic oxide compositions for transparent electrodes - Flame spray pyrolysis can be performed using aqueous solvents for the delivery of metal and/or metalloid oxide precursors while obtaining desirably high flame temperatures for the synthesis of uniform submicron inorganic oxide particles. A multiple liquid channel nozzle can be used to deliver liquid for the formation of the aerosol that is combusted in the flame. One or both channels can deliver liquid with metal/metalloid precursors and/or organic fuels. Flame spray pyrolysis can be used to form metal tungsten oxide submicron particles. Metal tungsten oxide compositions can be used in the formation of transparent electrodes. If the transparent electrodes are formed from polymer inorganic particle composites, the composites can further comprise electrically conductive nanoparticles to improve the electrical conductivity. | 04-29-2010 |
20100174024 | COMPOSITES OF POLYSILOXANE POLYMERS AND INORGANIC NANOPARTICLES - Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification. | 07-08-2010 |
20100190288 | THIN SILICON OR GERMANIUM SHEETS AND PHOTOVOLATICS FORMED FROM THIN SHEETS - Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits. | 07-29-2010 |
20100209328 | METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 08-19-2010 |
20100324191 | COMPOSITES OF POLYMERS AND METAL/METALLOID OXIDE NANOPARTICLES AND METHODS FOR FORMING THESE COMPOSITES - Successful dispersion approaches are described for the formation of dispersion of dry powders of inorganic particles. In some embodiments, it is desirable to form the dispersion in two processing steps in which the particles are surface modified in the second processing step. Composites can be formed using the well dispersed particles to form improved inorganic particle-polymer composites. These composites are suitable for optical applications and for forming transparent films, which can have a relatively high index or refraction. In some embodiments, water can be used to alter the surface chemistry of metal oxide particles. | 12-23-2010 |
20110109688 | SILICON/GERMANIUM OXIDE PARTICLE INKS, INKJET PRINTING AND PROCESSES FOR DOPING SEMICONDUCTOR SUBSTRATES - Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits. | 05-12-2011 |
20110120537 | SILICON INKS FOR THIN FILM SOLAR CELL FORMATION, CORRESPONDING METHODS AND SOLAR CELL STRUCTURES - High quality silicon inks are used to form polycrystalline layers within thin film solar cells having a p-n junction. The particles deposited with the inks can be sintered to form the silicon film, which can be intrinsic films or doped films. The silicon inks can have a z-average secondary particle size of no more than about 250 nm as determined by dynamic light scattering on an ink sample diluted to 0.4 weight percent if initially having a greater concentration. In some embodiments, an intrinsic layer can be a composite of an amorphous silicon portion and a crystalline silicon portion. | 05-26-2011 |
20110135928 | METAL SILICON NITRIDE OR METAL SILICON OXYNITRIDE SUBMICRON PHOSPHOR PARTICLES AND METHODS FOR SYNTHESIZING THESE PHOSPHORS - Submicron powders of metal silicon nitrides and metal silicon oxynitrides are synthesized using nanoscale particles of one or more precursor materials using a solid state reaction. For example, nanoscale powders of silicon nitride are useful precursor powders for the synthesis of metal silicon nitride and metal silicon oxynitride submicron powders. Due to the use of the nanoscale precursor materials for the synthesis of the submicron phosphor powders, the product phosphors can have very high internal quantum efficiencies. The phosphor powders can comprise a suitable dopant activator, such as a rare earth metal element dopant. | 06-09-2011 |
20110256377 | PHOTOVOLTAIC STRUCTURES PRODUCED WITH SILICON RIBBONS - Photovoltaic elements can be formed by in-motion processing of a silicon ribbon. In some embodiments, only a single surface of a silicon ribbon is processed in-motion. In other embodiments both surfaces of a silicon ribbon is processed in-motion. In-motion processing can include, but is not limited to, formation of patterned or uniform doped regions within or along the silicon ribbon as well as the formation of patterned or uniform dielectric layers and/or electrically conductive elements on the silicon ribbon. After performing in-motion processing, additional processing steps can be performed after the ribbon is cut into portions. Furthermore, post-cut processing can include, but is not limited to, the formation of solar cells, photovoltaic modules, and solar panels. | 10-20-2011 |
20110281390 | SILICON/GERMANIUM OXIDE PARTICLE INKS AND PROCESSES FOR FORMING SOLAR CELL COMPONENTS AND FOR FORMING OPTICAL COMPONENTS - Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits. | 11-17-2011 |
20110318905 | SILICON/GERMANIUM NANOPARTICLE INKS, LASER PYROLYSIS REACTORS FOR THE SYNTHESIS OF NANOPARTICLES AND ASSOCIATED METHODS - Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles. | 12-29-2011 |
20120012032 | DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 01-19-2012 |
20120193769 | SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON INKS AND CORRESPONDING PROCESSES - The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells. | 08-02-2012 |
20120244060 | METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 09-27-2012 |
20120289637 | COMPOSITES OF POLYSILOXANE POLYMERS AND INORGANIC NANOPARTICLES - Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification. | 11-15-2012 |
20120318168 | SILICON/GERMANIUM OXIDE PARTICLE INKS AND PROCESSES FOR FORMING SOLAR CELL COMPONENTS AND FOR FORMING OPTICAL COMPONENTS - Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silica particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits. | 12-20-2012 |
20130105806 | STRUCTURES INCORPORATING SILICON NANOPARTICLE INKS, DENSIFIED SILICON MATERIALS FROM NANOPARTICLE SILICON DEPOSITS AND CORRESPONDING METHODS | 05-02-2013 |
20130189831 | SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES - Improved silicon/germanium nanoparticle inks are described that have silicon/germanium nanoparticles well distributed within a stable dispersion. In particular the inks are formulated with a centrifugation step to remove contaminants as well as less well dispersed portions of the dispersion. A sonication step can be used after the centrifugation, which is observed to result in a synergistic improvement to the quality of some of the inks. The silicon/germanium ink properties can be engineered for particular deposition applications, such as spin coating or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon/germanium nanoparticles. The silicon/germanium nanoparticles are well suited for forming semiconductor components, such as components for thin film transistors or solar cell contacts. | 07-25-2013 |
20130217821 | COMPOSITES OF POLYSILOXANE POLYMERS AND INORGANIC NANOPARTICLES - Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification. | 08-22-2013 |
20130221286 | SILICON/GERMANIUM NANOPARTICLE INKS, LASER PYROLYSIS REACTORS FOR THE SYNTHESIS OF NANOPARTICLES AND ASSOCIATED METHODS - Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles. | 08-29-2013 |
20140138135 | SILICON/GERMANIUM PARTICLE INKS, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS - Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits. | 05-22-2014 |
20140151706 | STRUCTURES INCORPORATING SILICON NANOPARTICLE INKS, DENSIFIED SILICON MATERIALS FROM NANOPARTICLE SILICON DEPOSITS AND CORRESPONDING METHODS - Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer. The materials described herein can be effectively used for the formation of doped contacts for crystalline silicon solar cells, thin film silicon solar cells, electronic devices, such as printed electronics, and other useful products. | 06-05-2014 |
20140162445 | SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON BASED INKS AND CORRESPONDING PROCESSES - The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells. | 06-12-2014 |
20140346436 | PRINTABLE INKS WITH SILICON/GERMANIUM BASED NANOPARTICLES WITH HIGH VISCOSITY ALCOHOL SOLVENTS - Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant. | 11-27-2014 |