Patent application number | Description | Published |
20090161422 | Magnetic Tunnel Junction Device with Separate Read and Write Paths - In an embodiment, a device is disclosed that includes a magnetic tunnel junction (MTJ) structure. The device also includes a read path coupled to the MTJ structure and a write path coupled to the MTJ structure. The write path is separate from the read path. | 06-25-2009 |
20090174015 | Memory Cell and Method of Forming a Magnetic Tunnel Junction (MTJ) of a Memory Cell - A memory including a memory cell and method for producing the memory cell are disclosed. The memory includes a substrate in a first plane. A first metal connection extending in a second plane is provided. The second plane is substantially perpendicular to the first plane. A magnetic tunnel junction (MTJ) is provided having a first layer coupled to the metal connection such that the first layer of the MTJ is oriented along the second plane. | 07-09-2009 |
20090261434 | STT MRAM Magnetic Tunnel Junction Architecture and Integration - A magnetic tunnel junction (MTJ) device for a magnetic random access memory (MRAM) in a semiconductor back-end-of-line (BEOL) process flow includes a first metal interconnect for communicating with at least one control device and a first electrode for coupling to the first metal interconnect through a via formed in a dielectric passivation barrier using a first mask. The device also includes an MTJ stack for storing data coupled to the first electrode, a portion of the MTJ stack having lateral dimensions based upon a second mask. The portion defined by the second mask is over the contact via. A second electrode is coupled to the MTJ stack and also has a same lateral dimension as defined by the second mask. The first electrode and a portion of the MTJ stack are defined by a third mask. A second metal interconnect is coupled to the second electrode and at least one other control device. | 10-22-2009 |
20090261437 | Two Mask MTJ Integration For STT MRAM - A method for forming a magnetic tunnel junction (MTJ) for magnetic random access memory (MRAM) using two masks includes depositing over an interlevel dielectric layer containing an exposed first interconnect metallization, a first electrode, a fixed magnetization layer, a tunneling barrier layer, a free magnetization layer and a second electrode. An MTJ structure including the tunnel barrier layer, free layer and second electrode is defined above the first interconnect metallization by a first mask. A first passivation layer encapsulates the MTJ structure, leaving the second electrode exposed. A third electrode is deposited in contact with the second electrode. A second mask is used to pattern a larger structure including the third electrode, the first passivation layer, the fixed magnetization layer and the first electrode. A second dielectric passivation layer covers the etched plurality of layers, the first interlevel dielectric layer and the first interconnect metallization. | 10-22-2009 |
20090273068 | 3-D Integrated Circuit Lateral Heat Dissipation - By filling an air gap between tiers of a stacked IC device with a thermally conductive material, heat generated at one or more locations within one of the tiers can be laterally displaced. The lateral displacement of the heat can be along the full length of the tier and the thermal material can be electrically insulating. Through silicon-vias (TSVs) can be constructed at certain locations to assist in heat dissipation away from thermally troubled locations. | 11-05-2009 |
20090294754 | NOVEL TECHNIQUES FOR PRECISION PATTERN TRANSFER OF CARBON NANOTUBES FROM PHOTO MASK TO WAFERS - A method for patterning CNTs on a wafer wherein a CNT layer is provided on a substrate, a hard mask film is deposited on the CNT layer, a BARC layer (optional) is coated on the hard mask film, and a resist is patterned on the BARC layer (or directly on the hard mask film if the BARC layer is not included). Then, the resist pattern is effectively transferred to the hard mask film by etching the BARC layer (if provided) and etching partly into, but not entirely through, the hard mask film (i.e., etching is stopped before reaching the CNT layer). Then, the resist and the BARC layer (if provided) is stripped, and the hard mask pattern is effectively transferred to the CNTs by etching away (preferably by using C1, F plasma) the portions of the hard mask which have been already partially etched away. | 12-03-2009 |
20090321909 | Active Thermal Control for Stacked IC Devices - Thermal conductivity in a stacked IC device can be improved by constructing one or more active temperature control devices within the stacked IC device. In one embodiment, the control devices are thermal electric (TE) devices, such as Peltier devices. The TE devices can then be selectively controlled to remove or add heat, as necessary, to maintain the stacked IC device within a defined temperature range. The active temperature control elements can be P-N junctions created in the stacked IC device and can serve to move the heat laterally and/or vertically, as desired. | 12-31-2009 |
20090327983 | Predictive Modeling of Interconnect Modules for Advanced On-Chip Interconnect Technology - A computer program product estimates performance of an interconnect structure of a semiconductor integrated circuit (IC). The program product includes code executing on a computer to calculate at least one electrical characteristic of the interconnect structure based on input data accounting for multiple layers of the interconnect structure. The electrical characteristics can be capacitance, resistance, and/or inductance. The capacitance may be based upon multiple components, including a fringe capacitance component, a terminal capacitance component, and a coupling capacitance component. | 12-31-2009 |
20100038801 | Corrosion Control of Stacked Integrated Circuits - A system and method prevent corrosive elements (or at least the oxidizing agent) from making contact with metal connections at the interface between two layers of a stacked IC device. When layers are positioned in proximity to each other, a cavity is formed at the boundary of the planar surfaces of the layers. This cavity is bounded by a peripheral seal between the layers. In one embodiment, a vacuum is created within the cavity thereby reducing the corrosive atmosphere within the cavity. In another embodiment, the cavity is filled with an inert gas, such as argon. Once the cavity has oxidizing elements reduced, the peripheral seal can be encapsulated to prevent seepage of contaminants into the cavity. | 02-18-2010 |
20100045630 | Capacitive MEMS-Based Display with Touch Position Sensing - A micro-electro-mechanical systems (MEMS) pixel for display and touch position sensing includes a substrate and a capacitive element. The capacitive element includes one or more pixels having a first conductive platelet above the substrate, and a second conductive platelet above and spaced apart from the first conductive platelet, the two platelets forming the capacitive element. A connection to each platelet provides for applying a voltage, wherein the platelet separation changes according to the applied voltage. A transparent dielectric plate, spaced apart from and positioned opposite the substrate, covers the at least one pixel. A capacitance sensing circuit attached to the connection to each platelet of the pixel senses changes in capacitance not resulting from the applied voltage. | 02-25-2010 |
20100059869 | Systems and Methods for Enabling ESD Protection on 3-D Stacked Devices - An electrostatic discharge (ESD) protection device is fabricated in a vertical space between active layers of stacked semiconductor dies thereby utilizing space that would otherwise be used only for communication purposes. The vertical surface area of the through silicon vias (TSVs) is used for absorbing large voltages resulting from ESD events. In one embodiment, an ESD diode is created in a vertical TSV between active layers of the semiconductor dies of a stacked device. This ESD diode can be shared by circuitry on both semiconductor dies of the stack thereby saving space and reducing die area required by ESD protection circuitry. | 03-11-2010 |
20100075460 | Low Cost Die-To-Wafer Alignment/Bond For 3d IC Stacking - The cost associated with alignment in a stacked IC device can be reduced by aligning multiple die instead of a single die during the alignment step. In one embodiment, the alignment structures are placed in the scribe line instead of within the die itself. Aligning four die instead of one eliminates the need for as many alignment indicators and thus more silicon on the wafer can be used for active areas. In addition, this method allows for yield improvement through binning of dies having the same yield configuration. | 03-25-2010 |
20100091475 | Electrostatic Discharge (ESD) Shielding For Stacked ICs - An unassembled stacked IC device includes an unassembled tier. The unassembled stacked IC device also includes a first unpatterned layer on the unassembled tier. The first unpatterned layer protects the unassembled tier from ESD events. | 04-15-2010 |
20100127937 | Antenna Integrated in a Semiconductor Chip - An antenna structure is integrated in a semiconductor chip. The antenna structure is formed by at least one of: a) one or more through-silicon vias (TSVs), and b) one or more crack stop structures. In certain embodiments, the antenna structure includes an antenna element formed by the TSVs. The antenna structure may further include a directional element formed by the crack stop structure. In certain other embodiments, the antenna structure includes an antenna element formed by the crack stop structure, and the antenna structure may further include a directional element formed by the TSVs. | 05-27-2010 |
20100148371 | Via First Plus Via Last Technique for IC Interconnects - A multi-tiered IC device contains a first die including a substrate with a first and second set of vias. The first set of vias extends from one side of the substrate, and the second set of vias extend from an opposite side of the substrate. Both sets of vias are coupled together. The first set of vias are physically smaller than the second set of vias. The first set of vias are produced prior to circuitry on the die, and the second set of vias are produced after circuitry on the die. A second die having a set of interconnects is stacked relative to the first die in which the interconnects couple to the first set of vias. | 06-17-2010 |
20100193888 | Magnetic Tunnel Junction (MTJ) Storage Element and Spin Transfer Torque Magnetoresistive Random Access Memory (STT-MRAM) Cells Having an MJT - A magnetic tunnel junction storage element for a spin transfer torque magnetoresistive random access memory (STT-MRAM) bit cell includes a bottom electrode layer, a pinned layer adjacent to the bottom electrode layer, a dielectric layer encapsulating a portion of the bottom electrode layer and the pinned layer, the dielectric layer including sidewalls that define a hole adjacent to a portion of the pinned layer, a tunneling barrier adjacent to the pinned layer, a free layer adjacent to the tunneling barrier, and a top electrode adjacent to the free layer, wherein a width of the bottom electrode layer and/or the pinned barrier in a first direction is greater than a width of a contact area between the pinned layer and the tunneling barrier in the first direction. Also a method of forming an STT-MRAM bit cell. | 08-05-2010 |
20100193905 | Techniques for Placement of Active and Passive Devices Within a Chip - A semiconductor die includes a semiconductive substrate layer with first and second sides, a metal layer adjacent the second side of the semiconductive substrate layer, one or more active devices in an active layer on the first side of the semiconductive substrate layer; and a passive device in the metal layer in electrical communication with the active layer. The passive device can electrically couple to the active layer with through silicon vias (TSVs). | 08-05-2010 |
20100206370 | Photovoltaic Cell Efficiency Using Through Silicon Vias - A photovoltaic cell includes a photovoltaic layer having a first node and a second node. A first conductive layer is electrically coupled to the second node of the photovoltaic layer so the first conductive layer does not block light from the photovoltaic layer. A second conductive layer is adjacent to but electrically insulated from the first conductive layer, so the second conductive layer is positioned where it does not block light from the photovoltaic layer. At least one through silicon via is electrically coupled to the first node of the photovoltaic layer and the second conductive layer, but is electrically insulated from at least a portion of the photovoltaic layer and the first conductive layer. | 08-19-2010 |
20100206842 | Novel Method Of Air Gap Pattern For Advanced Back End Of Line (BOEL) Interconnect - An air gap pattern is created for backend of line (BEOL) interconnects. The method includes designing a nano-island pattern, and etching through the designed nano-island pattern to create at least one air gap between wire connects. | 08-19-2010 |
20100258949 | Reduced Susceptibility To Electrostatic Discharge During 3D Semiconductor Device Bonding and Assembly - A method to reduce electrostatic discharge susceptibility when assembling a stacked IC device. The method includes coupling a ground plane of a first semiconductor device and a ground plane of a second semiconductor device to substantially a same electrical potential. Active circuitry on the first semiconductor device and active circuitry on the second semiconductor device are electrically coupled after the ground planes are coupled. Electrically coupling the ground planes of the first and the second semiconductor device creates a preferred electrostatic discharge path to ground, thus minimizing potential damage to sensitive circuit elements. | 10-14-2010 |
20100261310 | Via First Plus Via Last Technique for IC Interconnect - A multi-tiered IC device contains a first die including a substrate with a first and second set of vias. The first set of vias extends from one side of the substrate, and the second set of vias extend from an opposite side of the substrate. Both sets of vias are coupled together. The first set of vias are physically smaller than the second set of vias. The first set of vias are produced prior to circuitry on the die, and the second set of vias are produced after circuitry on the die. A second die having a set of interconnects is stacked relative to the first die in which the interconnects couple to the first set of vias. | 10-14-2010 |
20100308435 | Through Silicon Via With Embedded Decoupling Capacitor - A semiconductor die, having a substrate, includes a through silicon via. The through silicon via includes a decoupling capacitor having a first co-axial conductor, a second co-axial conductor, and a co-axial dielectric separating the first co-axial conductor from the second co-axial conductor. The decoupling capacitor is configured to provide local charge storage for components on the semiconductor die. | 12-09-2010 |
20100314725 | Stress Balance Layer on Semiconductor Wafer Backside - A semiconductor component (such as a semiconductor wafer or semiconductor die) includes a substrate having a front side and a back side. The semiconductor die/wafer also includes a stress balance layer on the back side of the substrate. An active layer deposited on the front side of the substrate creates an unbalanced stress in the semiconductor wafer/die. The stress balance layer balances stress in the semiconductor wafer/die. The stress in the stress balance layer approximately equals the stress in the active layer. Balancing stress in the semiconductor component prevents warpage of the semiconductor wafer/die. | 12-16-2010 |
20100327433 | High Density MIM Capacitor Embedded in a Substrate - An integrated circuit package includes a decoupling capacitor. The integrated circuit package also includes a packaging substrate. The decoupling capacitor is at least partially embedded in the packaging substrate. The integrated circuit package further includes a die mounted to the packaging substrate. The die is coupled to the decoupling capacitor. The die receiving substantially instantaneous current from the decoupling capacitor. | 12-30-2010 |
20110012239 | Barrier Layer On Polymer Passivation For Integrated Circuit Packaging - A barrier layer deposited on the passivation layer of a semiconductor die decreases adhesion of glue used during stacking of semiconductor dies by altering chemical or structural properties of the passivation layer. During detachment of a carrier wafer from a wafer, the barrier layer reduces glue residue on the wafer by modifying the surface of the passivation layer. The barrier layer may be insulating films such as silicon dioxide, silicon nitride, silicon carbide, polytetrafluoroethylene, organic layers, or epoxy and may be less than two micrometers in thickness. Additionally, the barrier layer may be used to reduce topography of the semiconductor die to decrease adhesion of glues. | 01-20-2011 |
20110042829 | IC Interconnect - A multi-tiered IC device contains a first die including a substrate with a first and second set of vias. The first set of vias extends from one side of the substrate, and the second set of vias extend from an opposite side of the substrate. Both sets of vias are coupled together. The first set of vias are physically smaller than the second set of vias. A second die having a set of interconnects is stacked relative to the first die in which the interconnects couple to the first set of vias. | 02-24-2011 |
20110084765 | Three Dimensional Inductor and Transformer - A three dimensional on-chip inductor, transformer and radio frequency amplifier are disclosed. The radio frequency amplifier includes a pair of transformers and a transistor. The transformers include at least two inductively coupled inductors. The inductors include a plurality of segments of a first metal layer, a plurality of segments of a second metal layer, a first inductor input, a second inductor input, and a plurality of through silicon vias coupling the plurality of segments of the first metal layer and the plurality of segments of the second metal layer to form a continuous, non-intersecting path between the first inductor input and the second inductor input. The inductors can have a symmetric or asymmetric geometry. The first metal layer can be a metal layer in the back-end-of-line section of the chip. The second metal layer can be located in the redistributed design layer of the chip. | 04-14-2011 |
20110101347 | Interconnect Sensor for Detecting Delamination - An interconnect sensor for detecting delamination due to coefficient of thermal expansion mismatch and/or mechanical stress. The sensor comprises a conductive path that includes a via disposed between two back end of line metal layers separated by a dielectric. The via is coupled between a first probe structure and a second probe structure and mechanically coupled to a stress inducing structure. The via is configured to alter the conductive path in response to mechanical stress caused by the stress inducing structure. The stress inducing structure can be a through silicon via or a solder ball. The dielectric material can be a low-k dielectric material. In another embodiment, a method of forming an interconnect sensor is provided for detecting delamination. | 05-05-2011 |
20110139497 | Via Structure Integrated in Electronic Substrate - A system of via structures disposed in a substrate. The system includes a first via structure that comprises an outer conductive layer, an inner insulating layer, and an inner conductive layer disposed in the substrate. The outer conductive layer separates the inner insulating layer and the substrate and the inner insulating layer separates the inner conductive layer and the outer conductive layer. A first signal of a first complementary pair passes through the inner conductive layer and a second signal of the first complementary pair passes through the outer conductive layer. In different embodiments, a method of forming a via structure in an electronic substrate is provided. | 06-16-2011 |
20110193211 | Surface Preparation of Die for Improved Bonding Strength - A surface preparation method for improved adhesion in an electronic package system. The method of improving adhesion in the electronic package system includes depositing a passivation layer on a bonding surface and roughening at least a portion of the passivation layer. A coating material is deposited on the passivation layer. The bonding surface can be part of a semiconductor or package substrate. The roughening process can be performed by a chemical or mechanical process. In another embodiment, an electronic package system includes a bonding surface of a semiconductor or package substrate. A passivation layer is deposited on the bonding surface and a portion of the passivation layer is roughened for improved adhesion. A coating material is deposited on the roughened portion of the passivation layer. | 08-11-2011 |
20110193212 | Systems and Methods Providing Arrangements of Vias - A semiconductor chip includes an array of electrical contacts and multiple vias coupling at least one circuit in the semiconductor chip to the array of electrical contacts. A first one of the electrical contacts of the array of electrical contacts is coupled to N vias, and a second one of the electrical contacts of the array of electrical contacts is coupled to M vias. M and N are positive integers of different values. | 08-11-2011 |
20110204517 | Semiconductor Device with Vias Having More Than One Material - A semiconductor die includes a via within a substrate material of the semiconductor die. The via includes a first conductive material having a first Coefficient of Thermal Expansion (CTE) and a second conductive material between the first conductive material and the substrate material of the semiconductor die. The second conductive material has a second CTE between the first CTE and a CTE of the substrate material of the semiconductor die. The first conductive material can be copper. The second conductive material can be tungsten and/or nickel. The substrate material can be silicon. | 08-25-2011 |
20110227230 | THROUGH-SILICON VIA FABRICATION WITH ETCH STOP FILM - For a semiconductor wafer substrate having an inter layer dielectric, a through-silicon via may be formed in the substrate by first depositing an etch stop film on top of the inter layer dielectric, followed by etching an opening through the etch stop film, the interlayer dielectric, and into the substrate. A dielectric liner is then deposited over the etch stop film and into the opening. For some embodiments, the dielectric liner may be etched away except for those portions adhering to the sidewall of the opening. Then a conductive material may be deposited into the opening and on the etch stop film. The excess conductive material may then be removed, and for some embodiments the etch stop film may also be removed. | 09-22-2011 |
20110229687 | Through Glass Via Manufacturing Process - Fabrication of a through glass via in a relatively thick glass substrate includes patterning a through glass via hard mask on a surface of the glass substrate. The fabrication also includes wet etching a portion of the glass substrate, through the hard mask, to create a partial through glass via. The wet etching may involve applying a vapor of an oxide etch chemical, such as HF and XeF6, or applying a wet oxide etch chemical, such as HF and XeF6. The fabrication further includes passivating the etched partial through glass via, removing bottom passivation from the partial through glass via, and repeating the etching, passivating and removing to create the through glass via. The resulting through glass via has a scalloped side wall, a vertical profile and a high aspect ratio. | 09-22-2011 |
20110248405 | Selective Patterning for Low Cost through Vias - A block layer deposited on a substrate before deposition of metal lines and etching of a through via enables low cost fabrication of through vias in a substrate using isotropic etching processes. For example, wet etching of a glass substrate may be used to fabricate through glass vias without undercut from the wet etching shorting metal lines on the glass substrate. The block layer prevents contact between a conductive layer lining the through via with more than one metal line on the substrate. The manufacturing process allows stacking of devices on substrates such as glass substrates and connecting the devices with through vias. | 10-13-2011 |
20110320698 | Multi-Channel Multi-Port Memory - A multi-channel multi-port memory is disclosed. In a particular embodiment, the multi-channel memory includes a plurality of channels responsive to a plurality of memory controllers. The multi-channel memory may also include a first multi-port multi-bank structure accessible to a first set of the plurality of channels and a second multi-port multi-bank structure accessible to a second set of the plurality of channels. | 12-29-2011 |
20110320751 | Dynamic Interleaving Of Multi-Channel Memory - In a particular embodiment, a dynamic interleaving system changes the number of interleaving channels of a multi-channel memory based on a detected level of bandwidth requests from a plurality of master ports to a plurality of slave ports. At a low level of bandwidth requests, the number of interleaving channels is reduced. | 12-29-2011 |
20120001297 | Techniques for Placement of Active and Passive Devices within a Chip - A semiconductor die includes a semiconductive substrate layer with first and second sides, a metal layer adjacent the second side of the semiconductive substrate layer, one or more active devices in an active layer on the first side of the semiconductive substrate layer; and a passive device in the metal layer in electrical communication with the active layer. The passive device can electrically couple to the active layer with through silicon vias (TSVs). | 01-05-2012 |
20120012998 | Conductive Sidewall for Microbumps - Electromigration in microbump connections causes voids in the microbumps, which reduces the lifetime of an integrated circuit containing the microbump. Electromigration lifetime may be increased in microbumps by forming a copper shell around the solder. The copper shell of one microbump contacts the copper shell of a second microbump to enclose the solder of the microbump connection. The copper shell allows higher current densities through the microbump. Thus, smaller microbumps may be manufactured on a smaller pitch without suffering failure from electromigration. Additionally, the copper shell reduces shorting or bridging between microbump connections on a substrate. | 01-19-2012 |
20120025362 | Reinforced Wafer-Level Molding to Reduce Warpage - A method for forming an electrical package to reduce warpage. The method includes providing a wafer and coupling a die thereto. A mold compound material is applied to the wafer such that the mold compound material surrounds the die. The method further includes applying a reinforcing material to the mold compound material. The mold compound material is thereby disposed between the wafer and the reinforcing material. | 02-02-2012 |
20120040509 | Techniques for Placement of Active and Passive Devices within a Chip - A method for manufacturing a semiconductor device includes fabricating an active layer on a first side of a semiconductor substrate. The method also includes fabricating a metal layer on a second side of the semiconductor substrate. The metal layer includes a passive device embedded within the metal layer. The passive device can electrically couple to the active layer with through vias. | 02-16-2012 |
20120056680 | Three Dimensional Inductor, Transformer and Radio Frequency Amplifier - A three dimensional on-chip radio frequency amplifier is disclosed that includes first and second transformers and a first transistor. The first transformer includes first and second inductively coupled inductors. The second transformer includes third and fourth inductively coupled inductors. Each inductor includes multiple first segments in a first metal layer; multiple second segments in a second metal layer; first and second inputs, and multiple through vias coupling the first and second segments to form a continuous path between the first and second inputs. The first input of the first inductor is coupled to an amplifier input; the first input of the second inductor is coupled to the first transistor gate; the first input of the third inductor is coupled to the first transistor drain, the first input of the fourth inductor is coupled to an amplifier output. The second inductor inputs and the first transistor source are coupled to ground. | 03-08-2012 |
20120061804 | Systems and Methods for Enabling Esd Protection on 3-D Stacked Devices - An electrostatic discharge (ESD) protection device is fabricated in a vertical space between active layers of stacked semiconductor dies thereby utilizing space that would otherwise be used only for communication purposes. The vertical surface area of the through silicon vias (TSVs) is used for absorbing large voltages resulting from ESD events. In one embodiment, an ESD diode is created in a vertical TSV between active layers of the semiconductor dies of a stacked device. This ESD diode can be shared by circuitry on both semiconductor dies of the stack thereby saving space and reducing die area required by ESD protection circuitry. | 03-15-2012 |
20120112312 | Integrated Circuit Chip Customization Using Backside Access - An integrated circuit, a method for making an integrated circuit product, and methods for customizing an integrated circuit are disclosed. Integrated circuit elements including programmable elements, such as fuses, PROMs, RRAMs, MRAMs, or the like, are formed on the frontside of a substrate. Vias are formed through the substrate from its frontside to its backside to establish conduction paths to at least some of the programmable elements from the backside. A programming stimulus is applied to at least some of the vias from the backside to program at least some of the frontside programmable elements. | 05-10-2012 |
20120154333 | CAPACITIVE MEMS-BASED DISPLAY WITH TOUCH POSITION SENSING - A micro-electro-mechanical systems (MEMS) pixel for display and touch position sensing includes a substrate and a capacitive element. The capacitive element includes one or more pixels having a first conductive platelet above the substrate, and a second conductive platelet above and spaced apart from the first conductive platelet, the two platelets forming the capacitive element. A connection to each platelet provides for applying a voltage, wherein the platelet separation changes according to the applied voltage. A transparent dielectric plate, spaced apart from and positioned opposite the substrate, covers the at least one pixel. A capacitance sensing circuit attached to the connection to each platelet of the pixel senses changes in capacitance not resulting from the applied voltage. | 06-21-2012 |
20120248582 | Voltage Switchable Dielectric for Die-Level Electrostatic Discharge (ESD) Protection - A voltage-switchable dielectric layer may be employed on a die for electrostatic discharge (ESD) protection. The voltage-switchable dielectric layer functions as a dielectric layer between terminals of the die during normal operation of the die. When ESD events occur at the terminals of the die, a high voltage between the terminals switches the voltage-switchable dielectric layer into a conducting layer to allow current to discharge to a ground terminal of the die without the current passing through circuitry of the die. Thus, damage to the circuitry of the die is reduced or prevented during ESD events on dies with the voltage-switchable dielectric layer. The voltage-switchable dielectric layer may be deposited on the back side of a die for protection during stacking with a second die to form a stacked IC. | 10-04-2012 |
20130020711 | Interconnect Pillars with Directed Compliance Geometry - Pillars having a directed compliance geometry are arranged to couple a semiconductor die to a substrate. The direction of maximum compliance of each pillar may be aligned with the direction of maximum stress caused by unequal thermal expansion and contraction of the semiconductor die and substrate. Pillars may be designed and constructed with various shapes having particular compliance characteristics and particular directions of maximum compliance. The shape and orientation of the pillars may be selected as a function of their location on a die to accommodate the direction and magnitude of stress at their location. A method includes fabricating pillars with particular shapes by patterning to increase surface of materials upon which the pillar is plated or deposited. | 01-24-2013 |
20130040436 | THROUGH SUBSTRATE VIA WITH EMBEDDED DECOUPLING CAPACITOR - A method of manufacturing a semiconductor die having a substrate with a front side and a back side includes fabricating openings for through substrate vias on the front side of the semiconductor die. The method also includes depositing a first conductor in the through substrate vias, depositing a dielectric on the first conductor and depositing a second conductor on the dielectric. The method further includes depositing a protective insulator layer on the back side of the substrate covering the through substrate vias. | 02-14-2013 |
20130082235 | MONOLITHIC 3-D INTEGRATION USING GRAPHENE - A monolithic three dimensional integrated circuit device includes a first layer having first active devices. The monolithic three dimensional integrated circuit device also includes a second layer having second active devices that each include a graphene portion. The second layer can be fabricated on the first layer to form a stack of active devices. A base substrate may support the stack of active devices. | 04-04-2013 |
20130105559 | CONDUCTIVE SIDEWALL FOR MICROBUMPS | 05-02-2013 |
20130113068 | LOW-K DIELECTRIC PROTECTION SPACER FOR PATTERNING THROUGH SUBSTRATE VIAS THROUGH A LOW-K WIRING LAYER - A low-K value dielectric protection spacer for patterning through substrate vias (TSVs) through a low-K value wiring layer. A method for forming a low-K value dielectric protection spacer includes etching a via opening through a low-K value dielectric interconnect layer. A protective layer is deposited in the via opening and on the low-K value dielectric interconnect layer. At least a portion of the protective layer is etched from the bottom of the via opening and from a horizontal surface of the low-K value dielectric interconnect layer. The etching leaving a protective sidewall spacer on a sidewall of the via opening. A through substrate via is etched through the bottom of the via opening and through the semiconductor substrate. The through substrate via is filled with a conductive material. | 05-09-2013 |
20130127046 | REDUCED SUSCEPTIBILITY TO ELECTROSTATIC DISCHARGE DURING 3D SEMICONDUCTOR DEVICE BONDING AND ASSEMBLY - Electrostatic discharge susceptibility is reduced when assembling a stacked IC device by coupling a ground plane of a first semiconductor device and a ground plane of a second semiconductor device to place the ground plane at substantially a same electrical potential. Active circuitry on the first semiconductor device and active circuitry on the second semiconductor device are electrically coupled after the ground planes are coupled. Electrically coupling the ground planes of the first and the second semiconductor device creates a preferred electrostatic discharge path to ground, thus reducing potential damage to sensitive circuit elements. | 05-23-2013 |
20130181330 | INTEGRATING THROUGH SUBSTRATE VIAS INTO MIDDLE-OF-LINE LAYERS OF INTEGRATED CIRCUITS - A semiconductor wafer has an integrated, through substrate, via (TSV). The semiconductor wafer includes a substrate. A dielectric layer may be formed on a first side of the substrate. A through substrate via may extend through the dielectric layer and the substrate. The through substrate via may include a conductive material and an isolation layer. The isolation layer may at least partially surround the conductive material. The isolation layer may have a tapered portion. | 07-18-2013 |
20130221494 | STRUCTURE AND METHOD FOR STRAIN-RELIEVED TSV - A semiconductor die including strain relief for through substrate vias (TSVs). The semiconductor die includes a semiconductor substrate having an active face. The semiconductor substrate includes conductive layers connected to the active face, The semiconductor die also includes a through substrate via extending only through the substrate. The through substrate via may include a substantially constant diameter through a length of the through substrate via. The through substrate via may be filled with a conductive filler material. The semiconductor die also includes an isolation layer surrounding the through substrate via. The isolation layer may include two portions: a recessed portion near the active face of the substrate capable of relieving stress from the conductive filler material, and a dielectric portion. A composition of the recessed portion may differ from the dielectric portion. | 08-29-2013 |
20130297981 | LOW COST HIGH THROUGHPUT TSV/MICROBUMP PROBE - A first apparatus, such as a die or a semiconductor package, has signal paths extending through the apparatus. The signal paths can include through vias and other components. The signal paths are operable to communicate with a second apparatus when the second apparatus is stacked with the first apparatus. The first apparatus also has pass gates. Each pass gate is configurable in response to a signal, to short a pair of the signal paths to enable substantially simultaneous testing of the signal paths. The pass gates may be configurable to isolate the signal paths during operation of the first apparatus. | 11-07-2013 |
20130316526 | VOLTAGE SWITCHABLE DIELECTRIC FOR DIE-LEVEL ELECTROSTATIC DISCHARGE (ESD) PROTECTION - A voltage-switchable dielectric layer may be employed on a die for electrostatic discharge (ESD) protection. The voltage-switchable dielectric layer functions as a dielectric layer between terminals of the die during normal operation of the die. When ESD events occur at the terminals of the die, a high voltage between the terminals switches the voltage-switchable dielectric layer into a conducting layer to allow current to discharge to a ground terminal of the die without the current passing through circuitry of the die. Thus, damage to the circuitry of the die is reduced or prevented during ESD events on dies with the voltage-switchable dielectric layer. The voltage-switchable dielectric layer may be deposited on the back side of a die for protection during stacking with a second die to form a stacked IC. A method includes depositing a voltage-switchable dielectric layer on a first die between a first terminal and a second terminal. | 11-28-2013 |
20140015080 | STT MRAM MAGNETIC TUNNEL JUNCTION ARCHITECTURE AND INTEGRATION - A magnetic tunnel junction (MTJ) device for a magnetic random access memory (MRAM) includes a first conductive interconnect communicating with at least one control device and a first electrode coupling to the first conductive interconnect through a via opening formed in a dielectric passivation barrier using a first mask. The device has an MTJ stack for storing data, coupled to the first electrode. A portion of the MTJ stack has lateral dimensions based upon a second mask. The portion defined by the second mask is over the contact via. A second electrode is coupled to the MTJ stack and also has a lateral dimension defined by the second mask. The first electrode and a portion of the MTJ stack are defined by a third mask. A second conductive interconnect is coupled to the second electrode and at least one other control device. | 01-16-2014 |
20140043756 | ACTIVE THERMAL CONTROL FOR STACKED IC DEVICES - Thermal conductivity in a stacked IC device can be improved by constructing one or more active temperature control devices within the stacked IC device. In one embodiment, the control devices are thermal electric (TE) devices, such as Peltier devices. The TE devices can then be selectively controlled to remove or add heat, as necessary, to maintain the stacked IC device within a defined temperature range. The active temperature control elements can be P-N junctions created in the stacked IC device and can serve to move the heat laterally and/or vertically, as desired. | 02-13-2014 |
20140061744 | FinFET CIRCUIT - A capacitor includes a semiconductor substrate. The capacitor also includes a first terminal having a fin disposed on a surface of the semiconductor substrate. The capacitor further includes a dielectric layer disposed onto the fin. The capacitor still further includes a second terminal having a FinFET compatible high-K metal gate disposed proximate and adjacent to the fin. | 03-06-2014 |
20140131549 | THROUGH SILICON OPTICAL INTERCONNECTS - Some implementations provide a semiconductor device that includes a first die and an optical receiver. The first die includes a back side layer having a thickness that is sufficiently thin to allow an optical signal to traverse through the back side layer. The optical receiver is configured to receive several optical signals through the back side layer of the first die. In some implementations, each optical signal originates from a corresponding optical emitter coupled to a second die. In some implementations, the back side layer is a die substrate. In some implementations, the optical signal traverses a substrate portion of the back side layer. The first die further includes an active layer. The optical receiver is part of the active layer. In some implementations, the semiconductor device includes a second die that includes an optical emitter. The second die coupled to the back side of the first die. | 05-15-2014 |
20140264331 | DAISY CHAIN CONNECTION FOR TESTING CONTINUITY IN A SEMICONDUCTOR DIE - An integrated circuit product package configured to continuity testing is described. The integrated circuit product package includes a package substrate. The package substrate includes internal routing connections. The integrated circuit product package also includes a semiconductor die coupled to the package substrate. The semiconductor die includes input/output (I/O) pins and switches. The switches selectively coupled the I/O pins to facilitate a daisy chain connection. The daisy chain connection includes circuitry fabricated on the semiconductor die, more than two of the internal routing connections, more than two of the I/O pins and at least one switch. | 09-18-2014 |
20140264836 | SYSTEM-IN-PACKAGE WITH INTERPOSER PITCH ADAPTER - An integrated circuit package is disclosed that includes a first-pitch die and a second-pitch die. The second-pitch die interconnects to the second-pitch substrate through second-pitch substrates. The first-pitch die interconnects through first-pitch interconnects to an interposer adapter. The pitch of the first-pitch interconnects is too fine for the second-pitch substrate. But the interposer adapter interconnects through second-pitch interconnects to the second-pitch substrate and includes through substrate vias so that I/O signaling between the first-pitch die and the second-pitch die can be conducted through the second-pitch substrate and through the through substrate vias in the interposer adapter. | 09-18-2014 |
20140266286 | THROUGH-SUBSTRATE VIA WITH A FUSE STRUCTURE - A device includes a conductive via to provide an electrical path through a substrate. The device further includes a conductive element. The device further includes a fuse coupled to the conductive via and coupled to the conductive element to provide a conductive path between the conductive via and the conductive element. The conductive path enables testing of continuity of at least a portion of the conductive via. The fuse is configured to be disabled after the testing of the continuity of the conductive via. | 09-18-2014 |
20140302674 | METHOD FOR STRAIN-RELIEVED THROUGH SUBSTRATE VIAS - A semiconductor die including strain relief for through substrate vias (TSVs). A method for strain relief of TSVs includes defining a through substrate via cavity in a substrate. The method also includes depositing an isolation layer in the cavity. The method further includes filling the cavity with a conductive material. The method also includes removing a portion of the isolation layer to create a recessed portion. | 10-09-2014 |
20140306349 | LOW COST INTERPOSER COMPRISING AN OXIDATION LAYER - Some implementations provide an interposer that includes a substrate, a via in the substrate, and an oxidation layer. The via includes a metal material. The oxidation layer is between the via and the substrate. In some implementations, the substrate is a silicon substrate. In some implementations, the oxidation layer is a thermal oxide formed by exposing the substrate to heat. In some implementations, the oxidation layer is configured to provide electrical insulation between the via and the substrate. In some implementations, the interposer also includes an insulation layer. In some implementations, the insulation layer is a polymer layer. In some implementations, the interposer also includes at least one interconnect on the surface of the interposer. The at least one interconnect is positioned on the surface of the interposer such that the oxidation layer is between the interconnect and the substrate. | 10-16-2014 |
20140327105 | ELECTROSTATIC DISCHARGE DIODE - A method includes thinning a back-side of a substrate to expose a portion of a first via that is formed in the substrate. The method also includes forming a first diode at the back-side of the substrate. The first diode is coupled to the first via. | 11-06-2014 |
20150048465 | SMALL FORM FACTOR MAGNETIC SHIELD FOR MAGNETORESTRICTIVE RANDOM ACCESS MEMORY (MRAM) - Some implementations provide a die that includes a magnetoresistive random access memory (MRAM) cell array that includes several MRAM cells. The die also includes a first ferromagnetic layer positioned above the MRAM cell array, a second ferromagnetic layer positioned below the MRAM cell array, and several vias positioned around at least one MRAM cell. The via comprising a ferromagnetic material. In some implementations, the first ferromagnetic layer, the second ferromagnetic layer and the several vias define a magnetic shield for the MRAM cell array. The MRAM cell may include a magnetic tunnel junction (MTJ). In some implementations, the several vias traverse at least a metal layer and a dielectric layer of the die. In some implementations, the vias are through substrate vias. In some implementations, the ferromagnetic material has high permeability and high B saturation. | 02-19-2015 |
20150048497 | INTERPOSER WITH ELECTROSTATIC DISCHARGE PROTECTION - A photovoltaic (PV) substrate includes a grooved die-facing surface to form a channel for a bypass diode. The die-facing surface supports a screen-printed metal interconnect layer to form a first terminal for the bypass diode. | 02-19-2015 |