Patent application number | Description | Published |
20090104103 | ARTIFICIAL QUARTZ MEMBER, PROCESS FOR PRODUCING THE SAME, AND OPTICAL ELEMENT COMPRISING THE SAME - An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower. | 04-23-2009 |
20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
20100317505 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention is to provide a TiO | 12-16-2010 |
20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
20110053059 | MASK BLANKS - The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided. | 03-03-2011 |
20120149543 | TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a TiO | 06-14-2012 |
20120292793 | PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVE AND CONVEX STRUCTURE ON SURFACE - The present invention relates to a method for producing an article having a fine concave and convex structure on a surface thereof, comprising the following steps (i) to (iii): (i) step of sandwiching a photocurable composition between a mold having an inverted structure of the fine concave and convex structure on a surface thereof and a substrate; (ii) step of irradiating the photocurable composition with light; and (iii) step of separating the mold from the cured product to obtain an article comprising the substrate having on a surface thereof the cured product having the fine concave and convex structure on a surface thereof, in which the mold contains TiO | 11-22-2012 |
20130034687 | GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR DEVICE - A glass substrate for forming a through-substrate via of a semiconductor device includes a plurality of penetration holes. In the glass substrate, an α-count is 0.05 c/cm | 02-07-2013 |