Patent application number | Description | Published |
20100176087 | PHOTOMASK MAKING METHOD, PHOTOMASK BLANK AND DRY ETCHING METHOD - A photomask is manufactured by providing a photomask blank comprising a transparent substrate, a phase shift film, and a light-shielding film, the phase shift film and the light-shielding film including silicon base material layers, a N+O content in the silicon base material layer of the phase shift film differing from that of the light-shielding film, and chlorine dry etching the blank with oxygen-containing chlorine gas in a selected O/C1 ratio for selectively etching away the silicon base material layer of the light-shielding film. | 07-15-2010 |
20100248493 | PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD - A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank. | 09-30-2010 |
20100291478 | ETCHING METHOD AND PHOTOMASK BLANK PROCESSING METHOD - Disclosed herein is a dry etching method for a work layer formed over a substrate, including the steps of forming a hard mask layer over the work layer formed over the substrate, forming a resist pattern over the hard mask layer, transferring the resist pattern to the hard mask layer by first dry etching conducted using the resist pattern, and patterning the work layer by second dry etching conducted using a hard mask pattern obtained upon the transfer to the hard mask layer, wherein after the hard mask layer is patterned by the first dry etching, the patterning of the work layer by the second dry etching is conducted through changing the concentration of an auxiliary ingredient of a dry etching gas, without changing a main ingredient of the dry etching gas, in an etching apparatus in which the first dry etching has been conducted. | 11-18-2010 |
20100316942 | PHOTOMASK MAKING METHOD - A photomask is manufactured from a photomask blank comprising a transparent substrate and a light-shielding film consisting of upper and lower layers of transition metal-containing silicon base materials, the content of O+N in the upper layer being higher than that of the lower layer. The light-shielding film is processed in two steps by fluorine dry etching through a resist pattern such that a lower portion of the film is left behind, and oxygen-containing chlorine dry etching for removing the remainder of the film. | 12-16-2010 |
20130034806 | PHOTOMASK MAKING METHOD, PHOTOMASK BLANK AND DRY ETCHING METHOD - A photomask is manufactured by providing a photomask blank comprising a transparent substrate, a phase shift film, and a light-shielding film, the phase shift film and the light-shielding film including silicon base material layers, a N+O content in the silicon base material layer of the phase shift film differing from that of the light-shielding film, and chlorine dry etching the blank with oxygen-containing chlorine gas in a selected O/Cl ratio for selectively etching away the silicon base material layer of the light-shielding film. | 02-07-2013 |
20130059235 | PHOTOMASK BLANK, PHOTOMASK, AND MAKING METHOD - In a photomask blank comprising a transparent substrate, an optical film of material containing a transition metal and silicon, and a hard mask film, the hard mask film is a multilayer film including a first layer of a chromium-based material containing 20-60 atom % of oxygen and a second layer of a chromium-based material containing at least 50 atom % of chromium and less than 20 atom % of oxygen. The hard mask film having a thickness of 2.0 nm to less than 10 nm is resistant to fluorine dry etching. | 03-07-2013 |
20130126471 | EVALUATION OF ETCHING CONDITIONS FOR PATTERN-FORMING FILM - In conjunction with a photomask blank comprising a transparent substrate, a pattern-forming film, and an etch mask film, a set of etching conditions for the pattern-forming film is evaluated by measuring a first etching clear time (C | 05-23-2013 |
20130132014 | EVALUATION FOR ETCH MASK FILM - In conjunction with a photomask blank comprising a transparent substrate, a pattern-forming film, and an etch mask film, the etch mask film is evaluated by measuring a first etching clear time (C1) taken when the etch mask film is etched under the etching conditions to be applied to the pattern-forming film, measuring a second etching clear time (C2) taken when the etch mask film is etched under the etching conditions to be applied to the etch mask film, and computing a ratio (C1/C2) of the first to second etching clear time. | 05-23-2013 |
Patent application number | Description | Published |
20120309228 | CONNECTOR PROTECTION STRUCTURE AND PRODUCTION METHOD THEREFOR - A connector protection structure includes a connector electrically connected to an electric wire and a protector protecting the connector by surrounding the connector. The protector is formed of a protection material that includes a base material and a binder material having a melting point lower than that of the base material, and is joined in a joint portion thereof by cooling and solidifying the melted binder material. The connector is accommodated in an inner space formed in an inner surface of the protector. The binder material in the inner surface and outer surface is melted, cooled, and solidified such that the inner surface of the protector is harder than the outer surface of the protector. | 12-06-2012 |
20120325519 | WIRE PROTECTOR - A wire protector is provided that is lightweight, that has a simple structure, and that is capable of covering a circumference of wires along a length direction thereof and of preventing an occurrence of noise due to contact with the wires sheathed therein. The wire protector covers the circumference of the wires in the length direction thereof, is configured with a cylindrical member made of a hot press processed non-woven fabric, is formed such that an inner surface is more pliable than an outer surface hardened by the hot press process, and has a slit from the outer surface to the inner surface formed along the entire length direction. | 12-27-2012 |
20130000975 | WIRE HARNESS PROTECTION STRUCTURE - A wire harness protection structure includes a bundle of electric wires, and a protector formed into a tubular body that extends in a longitudinal direction of the bundle of electric wires and having a portion of the bundle of electric wires provided in an inner space of the tubular body. The protector is formed of a protection material including a base material and a binder material having a melting point lower than that of the base material. A joint portion of the protector is joined by heating and melting and then cooling and solidifying the binder material. The binder material in an inner peripheral surface is heated and melted and then cooled and solidified such that the inner peripheral surface, which faces the inner space, is harder than an outer peripheral surface of the protector. | 01-03-2013 |
20130005171 | CONNECTOR FIXING STRUCTURE - A connector fixing structure includes a connector provided at one end of an electric wire, a protector surrounding a portion of the electric wire, and a fixing portion integrally formed with the protector and fixating the connector. The protector and the fixing portion are formed of a protection material that includes a base material and a binder material having a melting point lower than that of the base material. The protector and the fixing portion are joined at each joint portion by cooling and solidifying the melted binder material. | 01-03-2013 |
20130008686 | WIRE HARNESS AND METHOD FOR MANUFACTURING THE SAME - It is an object of the present invention to provide a wire harness that has a simple structure, that can be easily manufactured, and that includes a protective member having an extra-length absorbing function. A wire harness ( | 01-10-2013 |
20130098660 | ELECTRIC WIRE PROTECTION STRUCTURE AND METHOD FOR MANUFACTURING ELECTRIC WIRE PROTECTION STRUCTURE - An electric wire protection structure has a structure in which a branch portion of an electric wire bundle is protected. In the electric wire protection structure, a protection portion covers the branch portion of the electric wire bundle, the protection portion being formed by heating and compressing a thermoplastic material in a state of covering at least the branch portion of the electric wire bundle. | 04-25-2013 |