Shero
David J. Shero, South Park Township, PA US
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20080315685 | Energy Converter System With Reactive-Power-Management - A distributed generation system is connected to an AC power line that provides AC electrical power from a source to a load. The distributed generation system includes a DC electrical power source, a capacitor for storing DC electrical power, a converter for converting electrical power stored in the DC electrical power source at a first voltage to a second, greater voltage for storage in the capacitor. The system includes an inverter for inverting the electrical power stored in the capacitor at the second voltage into AC electrical power having a peak voltage less than the second voltage. A controller is provided and operative for controlling the operation of the converter and the inverter to deliver electrical power stored in the DC electrical power source to the capacitor for delivery as AC electrical power to the AC power line. | 12-25-2008 |
Eric J. Shero, Phoenix, AZ US
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20080286589 | INCORPORATION OF NITROGEN INTO HIGH K DIELECTRIC FILM - A high k dielectric film and methods for forming the same are disclosed. The high k material includes two peaks of impurity concentration, particularly nitrogen, such as at a lower interface and upper interface, making the layer particularly suitable for transistor gate dielectric applications. The methods of formation include low temperature processes, particularly CVD using a remote plasma generator and atomic layer deposition using selective incorporation of nitrogen in the cyclic process. Advantageously, nitrogen levels are tailored during the deposition process and temperatures are low enough to avoid interdiffusion and allow maintenance of the desired impurity profile. | 11-20-2008 |
20100202860 | METHOD AND APPARATUS FOR MINIMIZING CONTAMINATION IN SEMICONDUCTOR PROCESSING CHAMBER - A semiconductor processing apparatus includes a reaction chamber, a loading chamber, a movable support, a drive mechanism, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable support is configured to hold a workpiece. The drive mechanism is configured to move a workpiece held on the support towards the opening of the baseplate into a processing position. The control system is configured to create a positive pressure gradient between the reaction chamber and the loading chamber while the workpiece support is in motion. Purge gases flow from the reaction chamber into the loading chamber while the workpiece support is in motion. The control system is configured to create a negative pressure gradient between the reaction chamber and the loading chamber while the workpiece is being processed. Purge gases can flow from the loading chamber into the reaction chamber while the workpiece support is in the processing position, unless the reaction chamber is sealed from the loading chamber in the processing position. | 08-12-2010 |
20100266765 | METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE - An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process. | 10-21-2010 |
20110053383 | HIGH CONCENTRATION WATER PULSES FOR ATOMIC LAYER DEPOSITION - Methods are provided herein for forming thin films comprising oxygen by atomic layer deposition. The thin films comprising oxygen can be deposited by providing higher concentration water pulses, a higher partial pressure of water in the reaction space, and/or a higher flow rate of water to a substrate in a reaction space. Thin films comprising oxygen can be used, for example, as dielectric oxides in transistors, capacitors, integrated circuits, and other semiconductor applications. | 03-03-2011 |
20110275166 | SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES - The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD). | 11-10-2011 |
20130004288 | METHOD FOR MINIMIZING CONTAMINATION IN SEMICONDUCTOR PROCESSING CHAMBER - A semiconductor processing apparatus includes a reaction chamber, a loading chamber, a movable support, a drive mechanism, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable support is configured to hold a workpiece. The drive mechanism is configured to move a workpiece held on the support towards the opening of the baseplate into a processing position. The control system is configured to create a positive pressure gradient between the reaction chamber and the loading chamber while the workpiece support is in motion. Purge gases flow from the reaction chamber into the loading chamber while the workpiece support is in motion. The control system is configured to create a negative pressure gradient between the reaction chamber and the loading chamber while the workpiece is being processed. Purge gases can flow from the loading chamber into the reaction chamber while the workpiece support is in the processing position, unless the reaction chamber is sealed from the loading chamber in the processing position. | 01-03-2013 |
Eric James Shero, Phoenix, AZ US
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20140217065 | MULTI-STEP METHOD AND APPARATUS FOR ETCHING COMPOUNDS CONTAINING A METAL - A system and method for etching a material, including a compound having a formulation of XYZ, wherein X and Y are one or more metals and Z is selected from one or more Group 13-16 elements, such as carbon, nitrogen, boron, silicon, sulfur, selenium, and tellurium, are disclosed. The method includes a first etch process to form one or more first volatile compounds and a metal-depleted layer and a second etch process to remove at least a portion of the metal-depleted layer. | 08-07-2014 |
20140220247 | METHOD AND SYSTEM FOR TREATMENT OF DEPOSITION REACTOR - A system and method for treating a deposition reactor are disclosed. The system and method remove or mitigate formation of residue in a gas-phase reactor used to deposit doped metal films, such as aluminum-doped titanium carbide films or aluminum-doped tantalum carbide films. The method includes a step of exposing a reaction chamber to a treatment reactant that mitigates formation of species that lead to residue formation. | 08-07-2014 |
Ernest Lee Shero, Mckinney, TX US
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20080236099 | Packaging for Electrical Equipment - Packaging for electrical equipment is disclosed in which metal electrically conductive staples are stapled—in contrast to tacked—through the packaging to provide an electrical path between the inside and the outside of the packaging. On the inside of the packaging, each staple clutches and is electrically connected to a wire that is connected to a jack on the electrical equipment. This provides an electrical path between the outside of the packaging and the electrical equipment. When the electrical equipment is to be tested or configured, the testing tool is connected to the staples on the outside of the packaging with spring-load clips. This provides as many electrical paths between the testing tool and the electrical equipment as necessary or desirable and for very little cost. | 10-02-2008 |
John Brian Shero, Savage, MN US
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20140165484 | Glazing Unit Spacer Technology - The invention provides a spacer having an engineered wall with multiple corrugation fields including first and second corrugation fields having differently configured corrugations. Also provided are multi-pane glazing units that incorporate such a spacer. | 06-19-2014 |
Lee Shero, Mckinney, TX US
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20140189533 | DYNAMIC NOTIFICATION SYSTEM AND METHOD - A dynamic notification system for managing notifications on a user device is provided. The dynamic notification system includes a monitor module for monitoring user's interactions with previous notifications on the user device. The dynamic notification system further includes an order module for dynamically determining an order of display for notifications based on the user's interactions with the previous notifications. The dynamic notification system further includes a display module for displaying the notifications based on the determined order. The dynamic notification system also includes a customization module that allows a user to customize the order of display for notifications based upon a source or application associated with a notification. | 07-03-2014 |
20140380423 | SYSTEM AND METHOD FOR DYNAMICALLY AWARDING PERMISSIONS - An authorization system for dynamically awarding permissions to a requestor for performing an action, based on real-time monitored statistics of the requestor. The authorization system comprises a processor and a memory. The memory further comprises a status database for storing real-time information corresponding to the requestor, and a rules database for storing rules to enable the authorization system in determining permissions for various requestors' requests to perform the action. Additionally, the memory includes a status determining module for determining status-data related to the requestor, and a permission awarding module to evaluate the status-data with a dynamically selected set of rules for awarding permission to a requestor's request. The memory further includes a risk estimation module for calculating risk associated in awarding the permission, and an action triggering module for triggering an associated action based on the calculated risk. | 12-25-2014 |