Patent application number | Description | Published |
20090068571 | GRAY SCALE MASK - A gray scale mask for fabricating a thin film transistor, comprising: a source mask region; a drain mask region; and a channel mask region between the source mask region and the drain mask region, wherein a plurality of light-blocking bars are arranged regularly in the channel mask region, and the light-blocking bars are perpendicular to a center line of the channel mask region. | 03-12-2009 |
20090079351 | ELECTROLUMINESCENCE DISPLAY PANEL AND DRIVING METHOD THEREOF - The present invention relates to an electroluminescence display panel and a method of driving the same. The electroluminescence display panel comprises a plurality of pixels arranged in a matrix, each of the pixels including a red sub-pixel, a green sub-pixel and a blue sub-pixel. The blue sub-pixel includes at least a first blue sub-sub-pixel and a second blue sub-sub-pixel. In operation, the first blue sub-sub-pixel and the second blue sub-sub-pixel are alternately driven among frames. | 03-26-2009 |
20090251646 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY - An embodiment of the invention provides an array substrate for a liquid crystal display comprising a substrate and a gate scanning line, a thin film transistor, a data line, and a passivation layer on the substrate, the passivation layer covering the gate scanning line, the thin film transistor, the data line, and a through hole being formed in the passivation layer. A pixel electrode is formed on the passivation layer and comprises a transmissive part and a reflective part, the transmissive part comprises an amorphous-type indium tin oxide film and a poly-type indium tin oxide film below the amorphous-type indium tin oxide film, and the reflective part comprises the poly-type indium tin oxide film and a metal film covering the poly-type indium tin oxide film. | 10-08-2009 |
20100075450 | METHOD FOR MANUFACTURING ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY - A method for manufacturing an array substrate of liquid crystal display comprising the following steps: providing a substrate having gate lines, a gate insulating layer and an active layer pattern formed thereon in this order; depositing a first transparent conductive layer and a source/drain metal layer in this order on the substrate; forming a photoresist pattern layer on the source/drain metal layer through a triple-tone mask; performing a wet-etching process on the source/drain metal layer and the first transparent conductive layer exposed from the photoresist pattern layer; performing a first ashing process on the photoresist pattern layer and performing a dry-etching process on the source/drain metal layer, the first transparent conductive layer and the active layer pattern exposed by the first ashing process; performing a second ashing process on the photoresist pattern layer and performing a wet-etching process on the source/drain metal layer exposed by the second ashing process; and removing the remaining photoresist pattern layer. According to the invention, the over-etching on the TFT channel region can be reduced and the display quality of the liquid crystal display can be ensured. | 03-25-2010 |
20100075451 | METHOD FOR MANUFACTURING A THIN FILM STRUCTURE - The present invention discloses a method for manufacturing thin film structure, which comprises the following steps: providing a substrate having a first recess and a second recess formed therein with the first recess being deeper than the second recess; depositing a first material layer and a second material layer of different thicknesses successively on the substrate; and grinding the substrate so that a flat upper surface is formed and the first material layer and the second material layer are remained in the first recess while only the first material layer is remained in the second recess. The present invention also discloses a method for manufacturing fringe field switching type liquid crystal display array substrate. With the present invention, it is possible to make the upper surface flat while forming patterns on two layers of thin films respectively by using a single mask. | 03-25-2010 |
20100225858 | LIQUID CRYSTAL DISPLAY, COLOR FILTER SUBSTRATE AND MANUFACTURING METHOD THEREOF - An embodiment of the invention provides a color filter substrate comprising first black matrixes; color resin units; and a protection layer. Each of the color resin units is formed between two adjacent first black matrixes, the protection layer is formed on the first black matrixes and the color resin units, second black matrixes are formed, each corresponding to one first black matrix, on the protection layer for blocking reflected light from the first black matrixes from entering TFT channel regions on an array substrate to be provided to oppose the color filter substrate. | 09-09-2010 |
20100230682 | ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - The present invention provides an array substrate comprising: a substrate, having a thin film transistor (TFT) formed thereupon, the TFT having a gate electrode, a source electrode and a drain electrode; a first metal layer, formed on the substrate, and comprising a gate line and the gate electrode of the TFT; a first insulating layer, covering the first metal layer and the substrate; a semiconductor layer, an ohmic contact layer, and a second metal layer, which are sequentially formed on the first insulating layer; a second insulating layer, covering the semiconductor layer, the ohmic contact layer, and the second metal layer; a pixel electrode, provided on the second insulating layer and is connected to the drain electrode. The second metal layer further comprises an etch-blocking pattern in the peripheral area of the pixel electrode within the overlapping region between the pixel electrode and the first metal layer. | 09-16-2010 |
20100295049 | TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - The embodiment of the invention provides a manufacturing method for a thin film transistor liquid crystal display (TFT-LCD) array substrate, the manufacturing method comprises: step | 11-25-2010 |
20110013130 | FFS TYPE TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A manufacturing method for an FFS type TFT-LCD array substrate comprises: depositing a first metal film on a transparent substrate, and form a gate line, a gate electrode and a common electrode line by a first patterning process; depositing a gate insulating layer, an active layer film and a second metal film sequentially and patterning the second metal film and the active layer film by a second patterning process; Step | 01-20-2011 |
20110297929 | ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - The present invention provides an array substrate, comprising: a base substrate; a pixel electrode pattern and a gate pattern formed on the base substrate, the gate pattern comprises a gate scanning line and a gate electrode of a transistor, both of the gate scanning line and the gate electrode comprise transparent conductive metal layer and the gate metal layer stacking on the substrate, each pixel electrode in the pixel electrode pattern comprises transparent conductive metal layer; a gate insulating layer on the pixel electrode pattern and the gate pattern, an active layer pattern on the gate insulating layer and corresponding to the gate electrode, a via hole in the gate insulating layer for exposing the pixel electrode; and a source/drain pattern on the gate insulating layer, the source/drain pattern comprises a data scanning line crossing with the gate scanning line, source and drain electrodes of the transistor, and the drain electrode is in contact with the pixel electrode through the via hole. | 12-08-2011 |
20110299004 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An array substrate comprises: a base substrate; a gate scanning line, a data scanning line, a pixel electrode and a thin film transistor, formed on the base substrate; and a light blocking layer, formed on the base substrate and corresponding to the thin film transistor and the data scanning line. | 12-08-2011 |
20120094472 | METHODS FOR FABRICATING THIN FILM PATTERN AND ARRAY SUBSTRATE - A method for fabricating a thin film pattern and a method for fabricating an array substrate are provided. The method for fabricating a thin film pattern comprises: forming a first film and a second film sequentially; applying a layer of photoresist on the second film; forming a photoresist pattern comprising a totally left region, a partially left region and a totally removed region; performing a first wet etching on the second film in the totally removed region; performing a first dry etching on the first film in the totally removed region to form a first pattern, and etching the photoresist layer to remove the photoresist in the partially left region to expose the second film in the partially left region; performing a second wet etching on the second film in the partially left region; performing a second dry etching to form a second pattern; and removing the residual photoresist. | 04-19-2012 |
20120107982 | MANUFACTURING METHOD FOR ARRAY SUBSTRATE WITH FRINGE FIELD SWITCHING TYPE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY - Disclosed is a method for manufacturing an array substrate of an FFS type TFT-LCD, comprising the steps of: forming a first transparent conductive film, a first metal film and an impurity-doped semiconductor film on a transparent substrate sequentially, and then patterning the stack of the films to form patterns including source electrodes, drain electrodes, data lines and pixel electrodes; forming a semiconductor film and patterning it to form a pattern of the impurity-doped semiconductor layer and a pattern of the semiconductor layer including TFT channels; forming an insulating film and a second metal film, and patterning the stack of the films to form patterns including connection holes of the data lines in a PAD region, gate lines, gate electrodes and common electrode lines; forming a second transparent conductive film, and patterning it to form patterns including the common electrode. | 05-03-2012 |
20120119232 | ARRAY SUBSTRATE AND A MANUFACTURING METHOD THEREOF - An embodiment of the invention provides a method for manufacturing an array substrate, wherein the procedure for forming a data line, an active layer with a channel, a source electrode, a drain electrode and a pixel electrode comprises applying a photoresist on a data line metal thin film and performing exposure and development processes by using a multi-tone mask so as to form a photoresist pattern including a third thickness region, a second thickness region and a first thickness region whose thicknesses are successively increased, the third thickness region at least corresponding to the pixel electrode, the second thickness region corresponding to the data line, the active layer, the source electrode and the drain electrode, and the first thickness region corresponding to the other regions. | 05-17-2012 |
20120184060 | MANUFACTURING METHOD FOR ARRAY SUBSTRATE WITH FRINGE FIELD SWITCHING TYPE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY - A manufacturing method for an array substrate with a fringe field switching (FFS) type thin film transistor (TFT) liquid crystal display (LCD) includes the following steps. A pattern of a gate line ( | 07-19-2012 |
20120276697 | MANUFACTURING METHOD OF ARRAY SUBSTRATE - A manufacturing method of an array substrate, comprising the following steps: S1 forming a gate signal line and a gate electrode on a base substrate, successively depositing a gate insulating layer, an active layer, and a metal layer, faulting a mask formed of photoresist on the metal layer, and removing the metal layer outside a region for forming a data line and source/drain electrodes through the mask; S2. simultaneously etching the active layer and ashing the photoresist so as to expose the metal layer within a channel region; S3. etching the active layer exposed by the photoresist after being ashed after the step S2; S4. removing the metal layer within the channel region. | 11-01-2012 |
20120292625 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An embodiment of the disclosed technology provides a method of manufacturing an array substrate, comprising: a first mask process of forming an inorganic material protrusion on a base substrate; a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode; a third mask process of forming an active island and a data line formed and forming a source electrode connected to the data line and a drain electrode on the active island and a channel; a fourth mask process of forming an insulation material layer, treating the insulation material layer to form a planarization layer, and forming a through hole above the drain electrode; and a fifth mask process of forming a pixel electrode and connected to the drain electrode via the through hole in a reflective region. | 11-22-2012 |
20140017838 | METHOD OF MANUFACTURING AN ARRAY SUBSTRATE - The present invention provides an array substrate comprising: a substrate, having a thin film transistor (TFT) formed thereupon, the TFT having a gate electrode, a source electrode and a drain electrode; a first metal layer, formed on the substrate, and comprising a gate line and the gate electrode of the TFT; a first insulating layer, covering the first metal layer and the substrate; a semiconductor layer, an ohmic contact layer, and a second metal layer, which are sequentially formed on the first insulating layer; a second insulating layer, covering the semiconductor layer, the ohmic contact layer, and the second metal layer; a pixel electrode, provided on the second insulating layer and is connected to the drain electrode. The second metal layer further comprises an etch-blocking pattern in the peripheral area of the pixel electrode within the overlapping region between the pixel electrode and the first metal layer. | 01-16-2014 |
20140042540 | ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME AND DISPLAY DEVICE - Disclosed are an array substrate, a method for fabricating the same and a display device. The array substrate comprises: a substrate, a gate electrode, a gate insulating layer as well as an active layer, and a source/drain metal layer formed on the substrate, the source/drain metal layer is configured for forming a source electrode, a drain electrode and a channel region, wherein a region of the S/D metal layer for forming the channel region is at a lower height than other region of the S/D metal layer for forming the source electrode and the drain electrode. | 02-13-2014 |
20140054581 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE - Embodiments of the invention relate to an array substrate, a manufacturing method thereof and a display device comprising the array substrate. The array substrate comprises a gate line and a data line which define a pixel region, the pixel region comprises a thin film transistor region and an electrode pattern region, a gate electrode, a gate insulation layer, an active layer, a source electrode, a drain electrode and a passivation layer are formed in the thin film transistor region, the gate insulation layer, a pixel electrode, the passivation layer and a common electrode are formed in the electrode pattern region, and the common electrode and the pixel electrode form a multi-dimensional electric field. A color resin layer is formed between the gate insulation layer and the pixel electrode. | 02-27-2014 |
20140054702 | TFT, MASK FOR MANUFACTURING THE TFT, ARRAY SUBSTRATE AND DISPLAY DEVICE - Embodiments of the invention relate to a TFT, a mask for manufacturing the TFT, an array substrate and a display device. A channel of the TFT is formed by using a single slit mask. The channel of the TFT has a bent portion and extension portions provided on both sides of the bent portion, and a channel width of the bent portion is larger than a channel width of the extension portion. | 02-27-2014 |
20140055690 | Touch Liquid Crystal Display Device, Liquid Crystal Display Panel And Upper Substrate - Disclosed are a touch liquid crystal display device, a liquid crystal display panel, and an upper substrate. The liquid crystal display panel comprises an upper substrate ( | 02-27-2014 |
20140080254 | Fabricating Method Of Thin Film Transistor, Fabricating Method Of Array Substrate And Display Device - An embodiment of the present invention provides a fabricating method of a thin film transistor, a fabricating method of an array substrate, and a display device. The fabricating method of a thin film transistor comprises: forming a gate electrode on a substrate; and forming a gate insulating layer, a semiconductor layer, source and drain electrodes and a channel region on the substrate, wherein, the semiconductor layer is formed of a metal oxide, and two etching steps are used to form the channel region, and in a first etching step, a part of a source-drain metal layer above the semiconductor layer corresponding to the channel region is removed by using a dry etching, and in a second etching step, a remaining part of the source-drain metal layer above the semiconductor layer corresponding to the channel region is removed by using a wet etching, thereby forming the channel region. | 03-20-2014 |
20140084282 | THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND DISPLAY DEVICE - Embodiments of the present invention provide a thin film transistor, an array substrate and a display device. The thin film transistor comprises a gate layer, a first insulating layer, an active layer, an etch stop layer and a source/drain electrode layer, wherein the active layer is made of a metal oxide material, the first insulating layer, the active layer, the etch stop layer and the source/drain electrode layer are sequentially stacked from bottom to top, the source/drain electrode layer contains an interval separating a source electrode and a drain electrode therein, the etch stop layer is located below the interval, and the etch stop layer has a width greater than that of the interval, and the first insulating layer comprises a laminate of a first sub-insulation layer and a second sub-insulation layer, the second sub-insulation layer is in contact with the active layer and made of an oxygen-rich insulating material. | 03-27-2014 |
20140132485 | Open-Type Head Mount Display Device and Display Method Thereof - The present invention provides an open-type head mount display device and a display method thereof. The open-type head mount display device according to the present invention comprises a display unit for generating display images; a focusing lens unit for adjusting the object distance of a display image from a user's eye; an image acquisition unit for acquiring the image of the two eyes of the user; a focal distance analyzing unit for obtaining the focal distance of the user's eye according to the image of the two eyes of the user; and a lens adjusting unit for adjusting the position of the focusing lens unit in the light ray propagation direction of the display image according to a control command from the analyzing unit, so that the object distance of the display image is matched with the current focal distance of the user's eye. | 05-15-2014 |
20140159021 | ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND OLED DISPLAY DEVICE - This invention provides an array substrate, a method for fabricating the same, and an OLED display device. Each pixel unit of the array substrate comprises: a TFT drive layer; an OLED further away from the substrate than the TFT drive layer and driven by it, the OLED sequentially comprises a first electrode, a light emitting layer, a second electrode, wherein the first electrode is transparent, and the second electrode is a transflective layer, or the second electrode is transparent and has a transflective layer disposed thereon; a reflection layer disposed between the TFT drive layer and the OLED and forming a microcavity structure with the transflective layer, and a reflective surface of the reflection layer has a concave-convex or corrugated structure disposed thereon for causing diffuse reflection of light; and a color filter film disposed between the reflection layer and the OLED and located in the microcavity structure. | 06-12-2014 |
20140159022 | ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND OLED DISPLAY DEVICE - This invention provides an array substrate, a method for fabricating the same, and an OLED display device, which can solve the technical problem that the existing OLED display device has low luminous efficiency. Each pixel unit of the array substrate comprises: a TFT drive layer; an OLED further away from the substrate than the TFT drive layer and driven by it, the OLED sequentially comprises a first electrode, a light emitting layer, and a transparent second electrode, wherein the first electrode is a reflection layer, or the first electrode is transparent and has a reflection layer disposed thereunder; a transflective layer further away from the substrate than the OLED and forming a microcavity structure with the reflection layer; and a color filter film disposed between the OLED and the transflective layer and located in the microcavity structure. The present invention is particularly suitable for a WOLED display device. | 06-12-2014 |
20140167031 | METHOD FOR FABRICATING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE - A method for fabricating array substrate, an array substrate and a display device. The method for fabricating the array substrate comprises forming a thin film transistor, a first transparent electrode ( | 06-19-2014 |
20140209913 | Array Substrate And Display Device Comprising The Same - An array substrate, which is formed with a gate electrode ( | 07-31-2014 |
20140353672 | ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME AND DISPLAY DEVICE - An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate comprises a plurality of gate lines and a plurality of data lines which intersect each other to define a plurality of pixel regions, each of the pixel regions comprises a thin film transistor and further comprises: a base substrate; more than one protrusion disposed apart from each other on the base substrate; a first electrode layer comprising at least one first electrode strip disposed in a gap between adjacent protrusions; a second electrode layer comprising at least one second electrode strip disposed on the protrusions. | 12-04-2014 |
20140353690 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE - An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate comprise a base substrate ( | 12-04-2014 |
20150028342 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE - An array substrate, a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate ( | 01-29-2015 |