Patent application number | Description | Published |
20130093338 | DRIVING CIRCUITS FOR LIGHT EMITTING ELEMENTS - A circuit for driving light emitting elements, such as LEDs, includes a first transistor having a source coupled to ground through a first resistive element, and a second transistor having a gate electrically coupled to a gate of the first transistor, a source electrically coupled to ground, and a drain for electrical connection to a first group of light emitting elements. The circuit also includes circuitry to provide a predetermined voltage at the source of the first transistor, circuitry to compensate for a difference in respective gate-source voltages of the first and second transistors, and circuitry to compensate for a difference in respective drain-source voltages of the first and second transistors. In some implementations, the circuit can achieve relatively low power consumption. | 04-18-2013 |
20130093339 | DRIVING CIRCUITS FOR LIGHT EMITTING ELEMENTS - A circuit for driving light emitting elements, such as LEDs, includes .a first transistor having a source coupled to ground through a first resistive element, and a second transistor having a gate electrically coupled to a gate of the first transistor, a source electrically coupled to ground, and a drain for electrical connection to a first group of light emitting elements. The circuit also includes circuitry to provide a predetermined voltage at the source of the first transistor, circuitry to compensate for a difference in respective gate-source voltages of the first and second transistors, and circuitry to compensate for a difference in respective drain-source voltages of the first and second. transistors. In some implementations, the circuit can achieve relatively low power consumption. | 04-18-2013 |
20130099697 | Multi-Channel Driver Equalizer - The disclosed multi-channel driver equalizer circuit matches currents in multiple strings of illumination devices at low current levels by using an analog equalizer to sequentially couple the output of a reference amplifier in series with each current source amplifier in a current limit loop of the driver equalizer circuit to correct the offsets of the current source amplifiers, resulting in the matching of string currents on average. | 04-25-2013 |
20130134889 | Circuit for Driving Light Emitting Elements - In one novel aspect, driving a string of light emitting elements, such as LEDs, includes applying a drive signal to circuitry that regulates a voltage appearing at a source of a transistor whose drain is coupled to one end of the string of light emitting elements and whose source is coupled to ground through a resistive element. Sequencing of the drive signal and a voltage supply signal for the light emitting elements is controlled such that the voltage supply signal is not increased above a predetermined allowable voltage for the transistor until the transistor is turned on, and such that the supply voltage is not decreased below the allowable voltage for the transistor until the transistor is turned off. | 05-30-2013 |
20130154593 | ADAPTIVE PHASE-LEAD COMPENSATION WITH MILLER EFFECT - An adaptive phase-lead compensation (zero) circuit is disclosed that can be added to a circuit (e.g., a CMOS-based LDO) to ease the compensation and increase the phase margin of the circuit. By using the disclosed adaptive phase-lead compensation circuit, an adjustable resistance can be connected to any nodes in the compensated circuit rather than just to the voltage source (VDD) or ground (GND), allowing the Miller Effect to be used via a Miller capacitor. | 06-20-2013 |
20140153291 | DUAL-MODE, AC/DC POWER CONVERTER WITH POWER FACTOR CORRECTION - A dual-mode circuit for the control of an AC/DC power converter is disclosed. An example dual-mode controller circuit generates a waveform that drives a switch on or off and controls the power converter. The controller circuit in addition to power factor correction (PFC) circuitry includes a critical conducting mode (CrM) module as well as a discontinuous conducting mode (DCM) module configured to generate waveforms adapted for CrM and DCM operation of a power converter. The circuit includes a node for receiving a feedback signal of a voltage or a current. Based on the received signal, one of the modules is selected at a time to supply the waveform at the output of the dual-mode controller. An example of the output waveform is a series of pulses that are configured to drive the switch that controls the transfer of power between input and output of the power converter. | 06-05-2014 |
20140160802 | FAULT PROTECTION AND CORRECTION OF LINE AND LOAD FAULTS - A fault protection and correction circuit for the control of a power converter is disclosed. An example circuit generates a waveform that drives a switch on or off and controls the power converter. The controller circuit in addition to power factor correction (PFC) circuitry includes a first and a second shut down mode modules, both of them cause the switching to stop. The circuit includes a module for receiving fault events. When a fault occurs, the controller enters the second shut down mode. The controller stays in the second shut down mode if the required current for this mode can be provided by the outside circuitry. Otherwise, the controller enters the first shut down mode that requires less current and subsequently restarts the controller. By modifying the outside circuitry the controller can respond differently to fault events. | 06-12-2014 |
20140211518 | LOW TOTAL HARMONIC DISTORTION AND HIGH POWER FACTOR CORRECTION POWER CONVERTERS - A controller circuit for the control of a power converter is disclosed. An example controller circuit generates a waveform that drives a switch that controls the power converter. The controller circuit includes a divider module that generates a modification factor based on a ratio of the two input signals of the module. The circuit includes a module that generates a first waveform configured for a critical conducting mode of operation of a power converter and an on-time adjuster module that modifies the first waveform based on the modification factor and generates a second waveform. The second waveform is delivered to the switch. An example modification factor is the ratio of the output voltage to the rectified input voltage of the power converter. | 07-31-2014 |
Patent application number | Description | Published |
20100118921 | Self-Adaptive Digital RF Bandpass and Bandstop Filter Architecture - A system and method provides adaptive digital front end control of an incoming radio frequency (RF) signal to identify RF characteristics in that signal, such as interference or desired data signals and adaptively control digital filter elements to selectively tune only portions of the RF signal to produce a filtered output signal, on a per cycle basis, prior to communicating the RF signal to an underlying wireless communication device, such as a base station in cellular network, cellular phone, wireless router base station, cognitive radio, or other wireless communication device. Each digital filter element may be tuned in frequency and bandwidth of operation and collectively the elements form an adaptive filter stage with elements configurable into both bandpass and bandstop filters for cascaded operation. | 05-13-2010 |
20130010627 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for selecting a spectral region in a radio frequency spectrum for initiating a communication session having an uplink and a downlink, correlating a signal strength of portions of the spectral region to generate a correlation factor, detecting radio frequency interference in the spectral region according to the correlation factor, and generating tuning coefficient data to substantially suppress the radio frequency interference in the spectral region during the communication session. Other embodiments are disclosed. | 01-10-2013 |
20130010629 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for identifying a spectral region in a radio frequency spectrum for initiating a communication session having a transmission link and a reception link, determining a correlation factor from signals measured in the spectral region, detecting according to the correlation factor a foreign communication signal in the spectral region, generating coefficient data to prevent interference with the foreign communication signal while transmitting in the transmission link, filtering a first signal for transmission in the transmission link according to the coefficient data to generate a filtered signal, and causing a transmission of the filtered signal which prevents interference with the foreign communication signal while transmitting in the transmission link. Other embodiments are disclosed. | 01-10-2013 |
20130010852 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for identifying a spectral region in a radio frequency spectrum, determining a signal strength of the spectral region, determining a correlation factor by correlating the signal strength of the spectral region, detecting according to the correlation factor interference in the spectral region, generating coefficient data to substantially suppress the interference in the spectral region, configuring a filter according to the coefficient data to substantially suppress the interference in the spectral region and produce a digital filtered signal, and transmitting the digital filtered signal to a base station. Other embodiments are disclosed. | 01-10-2013 |
20130017850 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for scanning a radio frequency spectrum for an available frequency band, selecting an available frequency band in the radio frequency spectrum even if the available frequency band is affected by radio frequency interference, measuring a signal strength in portions of the available frequency band, correlating the signal strength of each portion to generate a correlation factor, detecting radio frequency interference in the available frequency band according to the correlation factor, and generating tuning coefficient data to cause the filter apparatus to substantially suppress the radio frequency interference in the available frequency band. Other embodiments are disclosed. | 01-17-2013 |
20140079107 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for identifying a spectral region in a radio frequency spectrum, determining a signal strength of the spectral region, determining a correlation factor by correlating the signal strength of the spectral region, identifying from the correlation factor interference in the spectral region, repeating a determination of the correlation factor and an identification of the interference until a desired confidence level has been achieved, and generating coefficient data to substantially suppress the interference in the channel responsive to achieving the desired confidence level. Other embodiments are disclosed. | 03-20-2014 |
20140162672 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for identifying a spectral region in a radio frequency spectrum, determining a signal strength of the spectral region, determining a correlation factor by correlating the signal strength of the spectral region, detecting according to the correlation factor interference in the spectral region, generating coefficient data to substantially suppress the interference in the spectral region, configuring a filter according to the coefficient data to substantially suppress the interference in the spectral region and produce a digital filtered signal, and transmitting the digital filtered signal to a base station. Other embodiments are disclosed. | 06-12-2014 |
20140206351 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for identifying a spectral region in a radio frequency spectrum for initiating a communication session having a transmission link and a reception link, determining a correlation factor from signals measured in the spectral region, detecting according to the correlation factor a foreign communication signal in the spectral region, generating coefficient data to prevent interference with the foreign communication signal while transmitting in the transmission link, filtering a first signal for transmission in the transmission link according to the coefficient data to generate a filtered signal, and causing a transmission of the filtered signal which prevents interference with the foreign communication signal while transmitting in the transmission link. Other embodiments are disclosed. | 07-24-2014 |
20140256342 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for scanning a radio frequency spectrum for an available frequency band, selecting an available frequency band in the radio frequency spectrum even if the available frequency band is affected by radio frequency interference, measuring a signal strength in portions of the available frequency band, correlating the signal strength of each portion to generate a correlation factor, detecting radio frequency interference in the available frequency band according to the correlation factor, and generating tuning coefficient data to cause the filter apparatus to substantially suppress the radio frequency interference in the available frequency band. Other embodiments are disclosed. | 09-11-2014 |
20140269248 | METHOD AND APPARATUS FOR AN ADAPTIVE FILTER ARCHITECTURE - A system that incorporates teachings of the subject disclosure may include, for example, a method for selecting a spectral region in a radio frequency spectrum for initiating a communication session having an uplink and a downlink, correlating a signal strength of portions of the spectral region to generate a correlation factor, detecting radio frequency interference in the spectral region according to the correlation factor, and generating tuning coefficient data to substantially suppress the radio frequency interference in the spectral region during the communication session. Other embodiments are disclosed. | 09-18-2014 |
20140269374 | METHOD AND APPARTUS FOR SIGNAL INTERFERENCE PROCESSING - A system that incorporates the subject disclosure may include, for example, a method for measuring a power level in at least a portion of a plurality of resource blocks occurring in a radio frequency spectrum, wherein the measuring occurs for a plurality of time cycles to generate a plurality of power level measurements, calculating a baseline power level according to at least a portion of the plurality of power levels, determining a threshold from the baseline power level, and monitoring at least a portion of the plurality of resource blocks for signal interference according to the threshold. Other embodiments are disclosed. | 09-18-2014 |
20140269849 | METHOD AND APPARATUS FOR COLLECTING AND PROCESSING INTERFERENCE INFORMATION - A system that incorporates the subject disclosure may perform, for example, a method for receiving interference information from each of the plurality of communication devices detecting interference information in a plurality of segments of a radio frequency spectrum, correlating the interference information of the plurality of communication devices to generate correlated information, and identifying a plurality of interferers according to the correlated information. Other embodiments are disclosed. | 09-18-2014 |
20140269850 | METHOD AND APPARATUS FOR MITIGATING SIGNAL INTERFERENCE IN A FEEDBACK SYSTEM - A system that incorporates the subject disclosure may include, for example, a process that includes adjusting a filter in electrical communication between an input terminal and a demodulator. The filter is applied to an information bearing signal, e.g., to mitigate interference, received at the input terminal, resulting in a filtered signal. An error signal is received, indicative of errors detected within information obtained by demodulation of a modulated carrier of the filtered signal. A modified filter state is determined in response to the error signal and the filter is adjusted according to the modified filter state, e.g., to improve mitigation of the interference. Other embodiments are disclosed. | 09-18-2014 |
20140274132 | METHOD AND APPARATUS FOR SIGNAL INTERFERENCE PROCESSING - A system that incorporates the subject disclosure may include, for example, a device comprising a memory to store instructions and a processor coupled to the memory, wherein responsive to executing the instructions, the processor performs operations. The operations comprise receiving signals over a spectrum of frequencies, providing location data of the device to a base station, receiving a request from a base station to perform a spectral analysis of the signals, detecting an interference among the signals, and providing, in response to the request, data to the base station regarding a source of the interference, wherein the data comprises a location of the source relative to the device, spectral data for identifying the source, and a time a frequency of occurrence of the interference. Other embodiments are disclosed. | 09-18-2014 |
Patent application number | Description | Published |
20090197422 | REDUCING DAMAGE TO LOW-K MATERIALS DURING PHOTORESIST STRIPPING - A method of forming features in a porous low-k dielectric layer disposed below a patterned organic mask is provided. Features are etched into the porous low-k dielectric layer through the patterned organic mask, and then the patterned organic mask is stripped. The stripping of the patterned organic mask includes providing a stripping gas comprising COS, forming a plasma from the stripping gas, and stopping the stripping gas. A cap layer may be provided between the porous low-k dielectric layer and the patterned organic mask. The stripping of the patterned organic mask leaves the cap layer on the porous low-k dielectric layer. | 08-06-2009 |
20130288483 | METHODS AND APPARATUS FOR CONTROLLING SUBSTRATE UNIFORMITY - A dynamically tunable process kit, a processing chamber having a dynamically tunable process kit, and a method for processing a substrate using a dynamically tunable process kit are provided. The dynamically tunable process kit allows one or both of the electrical and thermal state of the process kit to be changed without changing the phyisical construction of the process kit, thereby allowing plasma properties, and hence processing results, to be easily changed without replacing the process kit. The processing chamber having a dynamically tunable process kit includes a chamber body that includes a portion of a conductive side wall configured to be electrically controlled, and a process kit. The processing chamber includes a first control system operable to control one or both of an electrical and thermal state of the process kit and a second control system operable to control an electrical state of the portion of the side wall. | 10-31-2013 |
20140024220 | METHOD OF FABRICATING AN ULTRA LOW-K DIELECTRIC SELF-ALIGNED VIA - Methods of fabricating ultra low-k dielectric self-aligned vias are described. In an example, a method of forming a self-aligned via (SAV) in a low-k dielectric film includes forming a trench pattern in a metal nitride hardmask layer formed above a low-k dielectric film formed above a substrate. A via pattern is formed in a masking layer formed above the metal nitride hardmask layer. The via pattern is etched at least partially into the low-k dielectric film, the etching comprising using a plasma etch using a chemistry based on CF | 01-23-2014 |
20140213060 | METHOD OF PATTERNING A LOW-K DIELECTRIC FILM - Methods of patterning low-k dielectric films are described. In an example, In an embodiment, a method of patterning a low-k dielectric film involves forming and patterning a metal nitride mask layer above a low-k dielectric layer. The low-k dielectric layer is disposed above a substrate. The method also involves passivating the metal nitride mask layer by treating with a plasma based on O | 07-31-2014 |
20140273496 | METHOD OF REMOVING A METAL HARDMASK - Methods of removing metal hardmasks in the presence of ultra low-k dielectric films are described. In an example, a method of patterning a low-k dielectric film includes forming a pattern in a metal nitride hardmask layer formed above a low-k dielectric film formed above a substrate. The method also includes etching, using the metal nitride hardmask layer as a mask, the pattern at least partially into the low-k dielectric film, the etching involving using a plasma etch based on SiF | 09-18-2014 |
20140342532 | DELICATE DRY CLEAN - A method of selectively removing fluorocarbon layers from overlying low-k dielectric material is described. These protective plasma treatments (PPT) are delicate alternatives to traditional post-etch treatments (PET). The method includes sequential exposure to (1) a local plasma formed from a silicon-fluorine precursor followed by (2) an exposure to plasma effluents formed in a remote plasma from a fluorine-containing precursor. The remote plasma etch (2) has been found to be highly selective of the residual material following the local plasma silicon-fluorine exposure. The sequential process (1)-(2) avoids exposing the low-k dielectric material to oxygen which would undesirably increase its dielectric constant. | 11-20-2014 |
20140342569 | NEAR SURFACE ETCH SELECTIVITY ENHANCEMENT - A method of selectively dry etching exposed substrate material on patterned heterogeneous structures is described. The method includes a plasma process prior to a remote plasma etch. The plasma process may use a biased plasma to treat an untreated substrate portion in a preferred direction to form a treated substrate portion. Subsequently, a remote plasma is formed using a fluorine-containing precursor to etch the treated substrate portion using the plasma effluents. By implementing biased plasma processes, the normally isotropic etch may be transformed into a directional (anisotropic) etch despite the remote nature of the plasma excitation during the etch process. | 11-20-2014 |
20140357083 | DIRECTED BLOCK COPOLYMER SELF-ASSEMBLY PATTERNS FOR ADVANCED PHOTOLITHOGRAPHY APPLICATIONS - Embodiments of methods and an apparatus for utilizing a directed self-assembly (DSA) process on block copolymers (BCPs) to form a defect-free photoresist layer for feature transfer onto a substrate are provided. In one embodiment, a method for performing a dry development process includes transferring a substrate having a layer of block copolymers disposed thereon into an etching processing chamber, wherein at least a first type and a second type of polymers comprising the block copolymers are aggregated into a first group of regions and a second group of regions on the substrate, supplying an etching gas mixture including at least a carbon containing gas into the etching processing chamber, and predominately etching the second type of the polymers disposed on the second groups of regions on the substrate in the presence of the etching gas mixture. | 12-04-2014 |
20150056814 | METHODS FOR FORMING FEATURES IN A MATERIAL LAYER UTILIZING A COMBINATION OF A MAIN ETCHING AND A CYCLICAL ETCHING PROCESS - Methods for etching a material layer disposed on the substrate using a combination of a main etching step and a cyclical etching process are provided. The method includes performing a main etching process in a processing chamber to an oxide layer, forming a feature with a first predetermined depth in the oxide layer, performing a treatment process on the substrate by supplying a treatment gas mixture into the processing chamber to treat the etched feature in the oxide layer, performing a chemical etching process on the substrate by supplying a chemical etching gas mixture into the processing chamber, wherein the chemical etching gas includes at least an ammonium gas and a nitrogen trifluoride, wherein the chemical etching process further etches the feature to a second predetermined depth, and performing a transition process on the etched substrate by supplying a transition gas mixture into the processing chamber. | 02-26-2015 |
20150064921 | LOW TEMPERATURE PLASMA ANNEAL PROCESS FOR SUBLIMATIVE ETCH PROCESSES - Methods for etching a material layer disposed on the substrate using a low temperature etching process along with a subsequent low temperature plasma annealing process are provided. In one embodiment, a method for etching a material layer disposed on a substrate includes transferring a substrate having a material layer disposed thereon into an etching processing chamber, supplying an etching gas mixture into the processing chamber, remotely generating a plasma in the etching gas mixture to etch the material layer disposed on the substrate, and plasma annealing the material layer at a substrate temperature less than 100 degrees Celsius. | 03-05-2015 |
20150079798 | METHODS FOR ETCHING AN ETCHING STOP LAYERUTILIZING A CYCLICAL ETCHING PROCESS - Methods for etching an etching stop layer disposed on the substrate using a cyclical etching process are provided. In one embodiment, a method for etching an etching stop layer includes performing a treatment process on the substrate having a silicon nitride layer disposed thereon by supplying a treatment gas mixture into the processing chamber to treat the silicon nitride layer, and performing a chemical etching process on the substrate by supplying a chemical etching gas mixture into the processing chamber, wherein the chemical etching gas mixture includes at least an ammonium gas and a nitrogen trifluoride, wherein the chemical etching process etches the treated silicon nitride layer. | 03-19-2015 |
Patent application number | Description | Published |
20100186028 | SYSTEM AND METHOD FOR METADATA-LINKED ADVERTISEMENTS - Systems and methods for providing metadata-selected advertisements are provided. These systems and methods may receive metadata and other media, select an object, read metadata attached to or associated with the selected object, select an advertisement based on the metadata, and display the selected advertisement. In addition, monitoring, collecting, and recording of predefined data concerning metadata selected advertisements may be provided. The invention also provides a receiver for receiving signals and/or data (e.g., programs, advertisements, program guides, metadata, etc.) and a processor for accepting a user's input signal, selecting an object, reading metadata attached to or associated with a selected object, selecting an advertisement, and displaying the selected advertisement. | 07-22-2010 |
20150128176 | SYSTEM AND METHOD FOR METADATA-LINKED ADVERTISEMENTS - Systems and methods for providing metadata-selected advertisements are provided. These systems and methods may receive metadata and other media, select an object, read metadata attached to or associated with the selected object, select an advertisement based on the metadata, and display the selected advertisement. In addition, monitoring, collecting, and recording of predefined data concerning metadata selected advertisements may be provided. The invention also provides a receiver for receiving signals and/or data (e.g., programs, advertisements, program guides, metadata, etc.) and a processor for accepting a user=s input signal, selecting an object, reading metadata attached to or associated with a selected object, selecting an advertisement, and displaying the selected advertisement. | 05-07-2015 |