| Patent application number | Description | Published |
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| 20080274422 | PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION - Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent. | 11-06-2008 |
| 20100143830 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS - A sulfonium salt has formula (1) wherein R | 06-10-2010 |
| 20100248493 | PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD - A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank. | 09-30-2010 |
| 20100261123 | PATTERNING PROCESS - In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment. | 10-14-2010 |
| 20100304302 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS - A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R | 12-02-2010 |
| 20100316955 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING PROCESS - A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents. | 12-16-2010 |
| 20110086986 | DEPROTECTION METHOD OF PROTECTED POLYMER - Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintaining the other structure, and being capable of taking out the deacylated polymer while highly suppressing contamination of the deacylated polymer with a substance other than the polymer taking part in the reaction. More specifically, provided is a method of deprotecting a protected polymer comprising at least a step of dissolving in an organic solvent the protected polymer comprising at least a unit structure having a phenolic hydroxyl group protected with an acyl group and a deprotecting reagent selected from primary or secondary amine compounds each having a ClogP value of 1.00 or less with the proviso that in the secondary amine compound, neither of the two carbon atoms coupled to the nitrogen atom of the amino group is tertiary. The primary or secondary amine compounds are each represented preferably by HNR | 04-14-2011 |
| 20110171579 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A negative resist composition comprises a base polymer comprising recurring units having an alkylthio group and having a Mw of 1000-2500, an acid generator, and a basic component, typically an amine compound containing a carboxyl group, but not active hydrogen. A 45-nm line-and-space pattern with a low value of LER can be formed. | 07-14-2011 |
| 20110200919 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A chemically amplified positive resist composition is provided comprising a polymer PB having an amine structure bound thereto and a polymer PA comprising recurring units having an acidic side chain protected with an acid labile protective group and recurring units having an acid generating moiety on a side chain. | 08-18-2011 |
| 20110200941 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS - A chemically amplified positive resist composition for EB or EUV lithography is provided comprising (A) a polymer or a blend of polymers wherein a film of the polymer or polymer blend is insoluble in alkaline developer, but turns soluble under the action of acid, (B) an acid generator, (C) a basic compound, and (D) a solvent. The basic compound (C) is a polymer comprising recurring units bearing a side chain having a secondary or tertiary amine structure as a basic active site and constitutes a part or the entirety of the polymer or polymers as component (A). | 08-18-2011 |
| 20110200942 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS - A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble polymer, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component, the polymer (A) turning alkali insoluble under the catalysis of acid. A basic polymer having a secondary or tertiary amine structure on a side chain serves as components (A) and (C). Processing the negative resist composition by EB or EUV lithography process may form a fine size resist pattern with advantages including uniform diffusion of base, improved LER, controlled deactivation of acid at the substrate interface, and a reduced degree of undercut. | 08-18-2011 |
| 20110212390 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning. | 09-01-2011 |
| 20110212391 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER. | 09-01-2011 |
| 20110294047 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS - A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity. | 12-01-2011 |
| 20120028190 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS - A polymer is provided comprising recurring units having a N,N′-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically amplified negative resist composition is formulated using the polymer and processed by lithography, a fine resist pattern can be formed with the advantages of improved LER and high resolution. | 02-02-2012 |
| 20120029193 | POLYMERIZABLE MONOMERS - A monomer of formula (1) is provided wherein R | 02-02-2012 |
| 20120196211 | RESIST PATTERN FORMING PROCESS - A resist pattern is formed by coating a chemically amplified positive resist composition onto a substrate and prebaking to form a resist film, exposing to high-energy radiation, baking and developing with a developer to form a resist pattern, and heating the pattern for profile correction to such an extent that the line width may not undergo a change of at least 10%. An amount of a softening accelerator having a molecular weight of up to 800 is added to the resist composition comprising (A) a base resin, (B) an acid generator, (C) a nitrogen-containing compound, and (D) an organic solvent. | 08-02-2012 |
| 20120219887 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut. | 08-30-2012 |
| 20120219888 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms a negative resist pattern of a profile with minimized LER and undercut. | 08-30-2012 |
| 20130209922 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained. | 08-15-2013 |
| 20140038104 | WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYANILINE COMPOSITIONS FOR LITHOGRAPHY - A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline copolymer comprises i) about 10 mol % to about 15 mol % of a fluorine-containing first aniline repeat unit based on total moles of repeat units in the polyaniline copolymer, and ii) a second aniline repeat unit comprising no fluorine. The sulfonic acid groups of the polymeric acid are present in a molar amount greater than or equal to total moles of repeat units of the polyaniline copolymer. The composition has a conductivity of at least 0.0001 S/cm. | 02-06-2014 |
| 20140329183 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms a negative resist pattern of a profile with minimized LER and undercut. | 11-06-2014 |
| 20140342274 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut. | 11-20-2014 |
| 20150355544 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS - A resist composition is provided comprising (A) a carboxylic acid sulfonium salt whose anion moiety has a bulky structure of arenecarboxylate in which secondary or tertiary carbon atoms bond at both ortho-positions relative to the carbon atom in bond with carboxylate, as an acid diffusion regulator and (B) a polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. When processed by EB or EUV lithography, the resist composition exhibits a very high resolution and forms a pattern with minimal LER. | 12-10-2015 |
| 20160070169 | NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN - A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers. | 03-10-2016 |
| 20160090355 | SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS - A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R | 03-31-2016 |
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| 20080233518 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION - With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound. | 09-25-2008 |
| 20090076309 | Alpha-Ketol Unsaturated Fatty Acid Derivative And Plant Growth Regulating Agent Using Same - An α-ketol unsaturated fatty acid derivative represented by the formula (1): | 03-19-2009 |
| 20100001452 | SHEET PROCESSING SYSTEM, SHEET PROCESSING APPARATUS, AND SHEET PROCESSING METHOD - A sheet processing system has a sheet processing apparatus and a server. The server stores, as sheet, the identification data of a sheet and the result of a process performed on the sheet in association. The server transmits the sheet data to the sheet processing apparatus. The sheet processing apparatus receives the sheet data from the serer and stores the sheet data. The sheet processing apparatus acquires mages of the sheet fed to it and acquires the identification data of the sheet on the basis of the images acquired. The sheet processing apparatus refers to the sheet data, discriminates the sheet on the basis of the identification data acquired, and classifies and collects the sheet in accordance with the result of discrimination. | 01-07-2010 |
| 20100093423 | SLOT MACHINE THAT INCREASES THE NUMBER OF DISPLAYED SYMBOLS AND CONTROL METHOD THEREOF - A slot machine according to the present invention comprises: a symbol display capable of scroll-displaying a symbol array that includes a plurality of symbols; and a controller programmed to execute the processing of: (A) executing a normal game in which the symbol array is scroll-displayed in a single direction and then stop-displayed to the symbol display, and in which game media are paid out in an amount corresponding to the stop-displayed symbol or a combination of the stop-displayed symbols; and (B) displaying an extra symbol being added to the symbol array, while scrolling the symbol array in a direction opposite to the single direction, when a predetermined condition has been satisfied in the normal game executed in the processing (A). | 04-15-2010 |
| 20100208262 | Temperature compensated spectroscope and optical apparatus - A spectroscope includes an emitting portion from where light is output, a dispersive element which is disposed on a side of the light emitting portion, to which the light is output, an incidence portion on which, light dispersed by the dispersive element is incident, and a temperature-compensating element which is disposed between the emitting portion and the incidence portion, and which is such that, an angle of incidence of the light dispersed on the incidence portion becomes almost constant with respect to a change in temperature in an operating temperature range. Moreover, the optical apparatus has such spectroscope in which temperature is compensated. | 08-19-2010 |
| 20110080642 | DISPERSION ELEMENT, SPECTRAL DEVICE, AND WAVELENGTH SELECTIVE SWITCH - A dispersion element includes a prism having a first transmission surface and an oppositely disposed second transmission surface, and an optical element having a third transmission surface and an oppositely disposed diffraction optical surface on which a diffraction grating is arranged. The prism and the optical element are integrated into one body by cementing the first transmission surface to the third transmission surface. The third transmission surface and the diffraction optical surface are non-parallel to each other in a plane perpendicular to grooves of the diffraction grating. | 04-07-2011 |
| 20110217037 | WAVELENGTH SELECTIVE SWITCH - A wavelength selective switch includes a substrate. On the substrate, the wavelength selective switch includes at least one input port, a dispersive element, a light converging element, a light deflecting member, an output port, and a driving mechanism which drives at least one of the dispersive element, the light condenser element, and the light deflecting member, and drive by the driving mechanism is a rotational drive around an axis perpendicular to the substrate, for the dispersive element, and is a translational drive in a direction of dispersion of wavelength with respect to the substrate, for the light condenser element or the light deflecting member. | 09-08-2011 |
| 20110222136 | WAVELENGTH SELECTIVE SWITCH - A wavelength selective switch according to the present invention includes at least one input port for inputting wavelength-multiplexed light, a dispersive element which receives the light from the input port, and disperses the received light, a light converging element which converges dispersed light which has been dispersed for each wavelength, a light deflecting member having a plurality of reflecting optical elements which are capable of independently deflecting each dispersed light from the light converging element, and at least one output port which receives light which has been deflected by the light deflecting member. An area having a reflectivity higher than a central area of the reflecting surface is formed in at least a part of an end portion of the reflecting surface in the dispersive direction by the dispersive element. | 09-15-2011 |
| 20130163921 | WAVELENGTH SELECTIVE SWITCH - Provided is a wavelength selective switch, which includes: an input/output unit; a dispersive portion; a condensing optical system; and the deflection portion. The input/output unit has input/output ports. The dispersive portion disperses signal light incident from the input/output ports. The condensing optical system condenses a plurality of signal light beams dispersed by the dispersive portion. The deflection portion has a plurality of deflection elements. The deflection elements deflect, along a second direction, the signal light beams condensed by the condensing optical system. In the condensing optical system, the aberration amount of the meridional component in a sagittal coma aberration remains substantially constant irrespective of an angle formed between the optical axis of the condensing optical system and a signal light beam incident on the condensing optical system from the input/output portion, at an incident position of the incident signal light beam at a certain height in the second direction. | 06-27-2013 |
| 20130187944 | INFORMATION PROCESSING APPARATUS THAT CONTROLS DISPLAY OF CONTENTS, METHOD OF CONTROLLING THE SAME, AND STORAGE MEDIUM - An information processing apparatus that is capable of displaying, when displaying a large number of contents in a manner divided into a plurality of pages, the contents in a manner such that continuity between each other is maintained, and enables a user to easily recognize the contents located in the vicinity of each page boundary. The information processing apparatus includes a CPU which selects and arranges the contents such that contents selected as objects to be displayed are redundant between adjacent display sections at a predetermined ratio, and subjects displays the contents to screen display in a display area, on a display section-by-display section basis. | 07-25-2013 |
| 20140037288 | OPTICAL UNIT FOR WAVELENGTH SELECTING SWITCH AND WAVELENGTH SELECTING SWITCH - An optical unit for a wavelength-selecting switch according to the present invention comprises: an input port; a dispersion section that produces wavelength dispersion of input light that is input from the input port; a light-collecting element that collects the light dispersed by the dispersion section; an output port; an optical path correction section that shifts the light that is dispersed by the dispersion section; an adjustment section that changes the amount of shift produced by the optical path correction section; and a casing that hermetically seals the input port, dispersion section, light-collecting element, output port, and optical path correction section. The casing has an optically transparent section in a location onto which the light that is collected by the light-collecting element is directed. The adjustment section is arranged outside the casing. The optical path correction section can be controlled from outside the casing by the adjustment section. | 02-06-2014 |
| 20140378207 | SLOT MACHINE THAT INCREASES THE NUMBER OF DISPLAYED SYMBOLS AND CONTROL METHOD THEREOF - A slot machine according to the present invention comprises: a symbol display capable of scroll-displaying a symbol array that includes a plurality of symbols; and a controller programmed to execute the processing of: (A) executing a normal game in which the symbol array is scroll-displayed in a single direction and then stop-displayed to the symbol display, and in which game media are paid out in an amount corresponding to the stop-displayed symbol or a combination of the stop-displayed symbols; and (B) displaying an extra symbol being added to the symbol array, while scrolling the symbol array in a direction opposite to the single direction, when a predetermined condition has been satisfied in the normal game executed in the processing (A). | 12-25-2014 |
| 20150015726 | IMAGING APPARATUS, METHOD OF CONTROLLING IMAGING APPARATUS, AND PROGRAM - In an imaging apparatus, when a user selects a smart phone mode while a communication function menu screen is displayed, a control unit controls a communication unit to perform a connection operation to an information processing apparatus such as a smart phone. If the user selects a printer mode while the communication function menu screen is displayed, the apparatus determines the current photographing mode. If the current photographing mode is a specific photographing mode, the apparatus displays a printer connection disenabled screen to inhibit connection with the printer. | 01-15-2015 |
| 20160077687 | ELECTRONIC APPARATUS AND CONTROL METHOD OF THE SAME - An electronic apparatus comprises a registration unit which registers a menu item in a menu having a hierarchical structure, and a display control unit which (i) displays a first-type item and a second-type item as options in a specific layer of the menu, (ii) performs control to display a first menu item in a menu in a lower layer below a layer of the first-type item, the first menu item being used to register a menu item in the same menu and to delete a registered menu item, and (iii) displays a second menu item in a menu in a lower layer below a layer of the second-type item, the second menu item being for deleting a registered menu item that is in the menu in the lower layer below the layer of the first-type item. | 03-17-2016 |
| Patent application number | Description | Published |
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| 20100009271 | Resist patterning process and manufacturing photo mask - There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the currently existing problems to be solved is the line edge roughness. To solve this problem by an acid-generator and a basic compound, there is a problem of the trade-off relationship with a resolution power. There can be provided a resist composition having a high resolution containing a base polymer such as hydroxystyrene that is protected by an acid labile group, a resist patterning process with a pattern rule of 65 nanometers or less having a reduced line edge roughness. | 01-14-2010 |
| 20100009286 | Chemically-amplified positive resist composition and patterning process thereof - There is disclosed a chemically-amplified positive resist composition comprising, as main components, (A) a base polymer, which contains one or more kinds of a monomer unit represented by the following general formula (1) and the like, and is an alkali-insoluble polymer whose hydroxyl group is partly protected by an acetal group while alkali-soluble when deprotected by an acid catalyst, (B) a sulfonium salt containing a sulfonate anion, (C) a basic component, and (D) an organic solvent. In a lithography technology by a photo resist, an extremely high temporal stability is necessary. In addition, it must give a good pattern profile not dependent on a substrate and have a high resolution power. There can be provided a chemically-amplified positive resist composition which can solve these problems simultaneously, a resist patterning process using the same, and a method for producing a photo mask blank. | 01-14-2010 |
| 20100009299 | Resist composition and patterning process - The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F | 01-14-2010 |
| 20100167207 | Chemically amplified positive resist composition and resist patterning process - There is disclosed a chemically amplified positive resist composition to form a chemically amplified resist film to be used in a lithography, wherein the chemically amplified positive resist composition comprises at least, (A) a base resin, insoluble or poorly soluble in an alkaline solution, having a repeating unit whose phenolic ydroxyl group is protected by a tertiary alkyl group, while soluble in an alkaline solution when the tertiary alkyl group is removed; (B) an acid generator; (C) a basic component; and (D) an organic solvent, and a solid component concentration is controlled so that the chemically amplified resist film having the film thickness of 10 to 100 nm is obtained by a spin coating method. There can be provided, in a lithography, a chemically amplified positive resist composition giving a high resolution with a suppressed LER deterioration caused by film-thinning at the time of forming a chemically amplified resist film with the film thickness of 10 to 100 nm, and a resist patterning process using the same. | 07-01-2010 |
| 20100291484 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition - There is disclosed a negative resist composition comprising at least (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid, with a crosslinker, (B) an acid generator, and (C) a compound containing a nitrogen as a basic component, and forming a resist film having the film thickness X (nm) of 50 to 100 nm, wherein, in the case that the resist film is formed from the negative resist composition under the film-forming conditions for the pattern formation, a dissolution rate of the resist film into the alkaline developer used in the development treatment for the pattern formation is 0.0333X−1.0 (nm/second) or more and 0.0667X−1.6 (nm/second) or less. There can be a negative resist composition having excellent etching resistance and resolution and giving a good pattern profile even at the substrate's interface, a patterning process using the same, and a testing process and a preparation process of this negative resist composition. | 11-18-2010 |
| 20100304301 | Negative resist composition and patterning process using the same - There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2). | 12-02-2010 |
| 20110003251 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - The present invention relates to a positive resist composition and to a pattern forming process using the same. The present invention provides: a positive resist composition having an enhanced etching resistance and an excellent resolution and being capable of providing an excellent pattern profile even at a substrate-side boundary face of resist, in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a pattern forming process utilizing the positive resist composition. | 01-06-2011 |
| 20110129765 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a negative resist composition wherein a base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000, and the compound containing a nitrogen atom as a basic component contains one or more kinds of amine compounds having a carboxyl group and not having a hydrogen atom covalently bonded to a base-center nitrogen atom. There can be a negative resist composition in which a bridge hardly occurs, substrate dependence is low and a pattern with a high sensitivity and a high resolution can be formed, and a patterning process using the same. | 06-02-2011 |
| 20110143266 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same. | 06-16-2011 |
| 20110189607 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R | 08-04-2011 |
| 20120021341 | SUBSTRATE TO BE PROCESSED HAVING LAMINATED THEREON RESIST FILM FOR ELECTRON BEAM AND ORGANIC CONDUCTIVE FILM, METHOD FOR MANUFACTURING THE SAME, AND RESIST PATTERNING PROCESS - There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed having a conductive inorganic thin film as its surface layer, wherein a surface to be processed of the substrate to be processed has an area of direct contact between the organic conductive film and the conductive inorganic thin film in part thereof. There can be a substrate to be processed capable of forming a resist pattern stably and accurately with efficient removal of electricity even when an electron beam with high current density is irradiated. | 01-26-2012 |
| 20120183892 | RESIST COMPOSITION AND PATTERNING PROCESS - The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F | 07-19-2012 |
| 20120183893 | RESIST COMPOSITION AND PATTERNING PROCESS - The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F | 07-19-2012 |
| 20120308920 | SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS - There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition. | 12-06-2012 |
| 20140051025 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same. | 02-20-2014 |
| 20150086908 | PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK - The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the silicon-containing inorganic film, comprising: forming the silicon-containing inorganic film such that a surface that will contact the resist film has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent; performing a silylation process after forming the silicon-containing inorganic film; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development. | 03-26-2015 |
| 20150086909 | METHOD FOR MANUFACTURING PHOTOMASK BLANK - The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the inorganic film, comprising: forming the silicon-containing inorganic film; heat treating the formed silicon-containing inorganic film at a temperature more than 200° C. under an atmosphere containing oxygen; performing a silylation process after the heat treatment; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development. | 03-26-2015 |
| 20150198876 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS - The present invention provides the onium salt comprises the material represented by the following general formula (0-1), | 07-16-2015 |
| 20150253664 | CHEMICALLY-AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS USING THE SAME - The present invention provides a chemically-amplified positive resist composition including a sulfonium salt capable of providing a pattern having an extremely high resolution with low line edge roughness, and also provides a resist patterning process using the same. | 09-10-2015 |
| 20150268556 | CHEMICALLY-AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS USING THE SAME - The present invention provides a chemically-amplified negative resist composition including a sulfonium salt capable of providing a pattern having an extremely high resolution with reduced line edge roughness, and also provides a resist patterning process using the same. | 09-24-2015 |
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| 20100226131 | LIGHTING EQUIPMENT - LEDs, a reflector, and a baffle are disposed on the underside of the equipment main body. An emission opening for emitting light of the LEDs and a reflection surface for emitting light of the LEDs from the emission opening by reflecting the same are provided in the reflector. The baffle is disposed outside the direct light emission area where direct light from the LEDs is emitted from the emission opening of the reflector. The direct light from the LEDs can be picked up without being blocked by the baffle, and the light pick-up efficiency can be improved. | 09-09-2010 |
| 20110261572 | LIGHTING FIXTURE - There is provided a lighting fixture | 10-27-2011 |
| 20120002429 | SOCKET DEVICE, LAMP DEVICE AND LIGHTING DEVICE - There is provided a lighting fixture capable of efficiently radiating heat of a lamp device attached to a socket device. | 01-05-2012 |
| 20120320565 | Lighting System - A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated. | 12-20-2012 |
| 20120320609 | Socket Device - A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated. | 12-20-2012 |
| 20120320610 | Socket Device - A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated. | 12-20-2012 |
| 20120320611 | Socket Device - A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated. | 12-20-2012 |
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| 20090066585 | PORTABLE WIRELESS UNIT - A portable wireless unit having high antenna performance, which comprises: a first case having a first antenna element, a second antenna element and a second feeding section; a second case having a third antenna element, a third feeding section and a circuit board provided with a ground pattern; and a coupling section consisting of first and second electrically connected conductive coupling elements and coupling the first case and the second case to be extended and housed freely. The second coupling element is provided in the first case while being connected electrically with the first antenna element, the first coupling element is provided in the second case while being connected electrically with the first feeding section, and the first antenna element, the coupling section, and the ground pattern are operated as a dipole antenna. | 03-12-2009 |
| 20110235095 | COMMUNICATION TERMINAL AND COMPUTER READABLE MEDIUM - A communication terminal that includes a first communication unit that is coupled to an IP (Internet Protocol) network and conducts a facsimile transmission through the IP network; a second communication unit that is coupled to a public telephone network and conducts a facsimile transmission through the public telephone network; a control unit that, in a case that a communication error is detected when the first communication unit calls to the IP network and that the address information used for calling to the IP network is the address information corresponding to the destination which is converted from the telephone number received by a reception unit, controls the second communication to call to public telephone network by using the telephone number received by a reception unit. | 09-29-2011 |
| 20130236269 | BOOKBINDING CONTROL DEVICE, NON-TRANSITORY COMPUTER READABLE MEDIUM, BOOKBINDING SYSTEM, AND BOOKBINDING CONTROL METHOD - A bookbinding control device includes an acquisition unit that acquires print data including post-processing unnecessary pages and post-processing necessary pages, a printing controller that, after post-processed sheets on which post-processing is performed on sheets with the printed post-processing necessary pages are supplied to a sheet feed unit, prints the post-processing unnecessary pages in print data, a first transport controller that performs control so as to transport sheets with the printed post-processing unnecessary pages to an accumulation unit of a bookbinding device, a second transport controller that performs control so as to transport the post-processed sheet supplied to the sheet feed unit to the accumulation unit of the bookbinding device, and a bookbinding controller that performs control so as to execute bookbinding on the sheets transported to the accumulation unit of the bookbinding device after printing based on print data ends. | 09-12-2013 |
| 20150043040 | FACSIMILE MACHINE, NON-TRANSITORY COMPUTER READABLE MEDIUM, AND FACSIMILE COMMUNICATION METHOD - A facsimile machine includes an image data receiving unit, a transmitting subscriber identification receiving unit, and a sorting unit. The image data receiving unit receives image data transmitted from a transmitting facsimile machine. The transmitting subscriber identification receiving unit receives transmitting subscriber identification specified as an arbitrary signal in a Group 3 standard and transmitted from the transmitting facsimile machine. The sorting unit sorts the image data received by the image data receiving unit into at least one of plural storage destinations on the basis of the transmitting subscriber identification received by the transmitting subscriber identification receiving unit and one or more predetermined sorting conditions. | 02-12-2015 |
| 20150262042 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND STORAGE MEDIUM - An information processing apparatus includes an acquiring unit that acquires a first instruction and a second instruction, the second instruction corresponding to the first instruction, being expressed in a character code different from a character code of the first instruction, and having added thereto a character string generated from the first instruction; a generating unit that generates a character string from the first instruction; and a canceling unit that cancels the second instruction if the character string added to the second instruction does not correspond to the character string generated by the generating unit. | 09-17-2015 |
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| 20120081743 | IMAGE PROCESSING SYSTEM, PROCESSING METHOD, IMAGE PROCESSING APPARATUS, AND RELAY APPARATUS - An image processing system includes: an image processing apparatus; a relay apparatus; and a service providing apparatus, which are connected to a network. The image processing apparatus includes: an electronic-file storage unit; an address-get-request transmitting unit; an upload-message generating unit which, upon receiving an upload destination address and a template for an upload message for performing an upload request to the service providing apparatus from the relay apparatus after a request for getting the upload destination address is transmitted to the relay apparatus by the account-information-request transmitting unit, generates the upload message including an electronic file and the upload destination address according to the received template; and an upload-message transmitting unit that transmits the upload message to the service providing apparatus to upload the electronic file to the service providing apparatus. The relay apparatus includes: a program storage unit; an upload-destination-address getting unit; and an upload-destination-address transmitting unit. | 04-05-2012 |
| 20120084402 | IMAGE PROCESSING SYSTEM, PROCESSING METHOD, IMAGE PROCESSING APPARATUS, AND RELAY APPARATUS - An image processing system includes: a relay apparatus; a service providing apparatus for an electronic-file storing service; and an image processing apparatus, which are connected to a network. The image processing apparatus includes: a first-address-get-request transmitting unit that transmits a request for getting a first address representing a location of an electronic file to be downloaded from the service providing apparatus to the relay apparatus; a first downloading unit which, upon receiving the first address from the relay apparatus after the request for getting the first address is transmitted, downloads the electronic file stored at the first address; and a storage control unit that controls a storage unit to store the electronic file downloaded by the first downloading unit. The relay apparatus includes: a first-address-get-program storage unit; a first-address getting unit; and a first-address transmitting unit. | 04-05-2012 |
| 20120113463 | RELAY APPARATUS, COMMUNICATION APPARATUS, AND CONTROL METHODS OF RELAY APPARATUS - A relay apparatus to be connected through a network to a server apparatus configured to store image data and a communication apparatus configured to acquire the image data from the server and output an image based on the acquired image data, the relay apparatus includes: a first receiving unit configured to receive a request for acquiring location information from the communication apparatus; an acquiring unit configured to acquire the location information for acquiring the image data from the server apparatus upon receipt of the request; and a transmitting unit configured to transmit the acquired location information to the communication apparatus. | 05-10-2012 |
| 20120113464 | RELAY APPARATUS, COMMUNICATION SYSTEM AND COMMUNICATING METHOD - A relay apparatus connected to service providing apparatuses respectively providing services and a communication apparatus that includes an additional-information storage unit configured to store additional information associated with the service and identification information, comprises: a receiving unit configured to receive notification including the service and the user identification information from the communication apparatus; a generating unit generating an output command for outputting, to the relay apparatus, the additional information stored in the additional-information storage unit corresponding to the service and the identification information included in the notification; an output commanding unit transmitting the output command to the communication apparatus; an acquiring unit acquiring the additional information output in response to the output command; a first communication unit configured to perform communication with the service providing apparatus using the acquired additional information; and a second communication unit that transmits, to the communication apparatus, information acquired from the service providing apparatus. | 05-10-2012 |
| 20120113471 | COMMUNICATION SYSTEM, COMMUNICATION APPARATUS, AND CONTROL METHOD OF RELAY APPARATUS - A communication system includes: a communication apparatus; and a relay apparatus. The communication apparatus includes: a contents-summary-information address request unit; a contents-summary-information display unit; a selection-information transmission unit; a selection-completion notification unit; and a contents get unit. The relay apparatus includes: an order-information addition unit that adds order information of contents to electronic data information; a contents-summary-information address transmission unit that transmits address information of a contents summary information item and the electronic data information, to which the order information is added, in response to a request of transmission of the address information of the contents summary information item; a contents-address get unit that gets the address information of the contents selected based on selection information from the selection-completion notification unit; and a contents-address transmission unit that transmits the address information of the contents got by the contents-address get unit to the communication apparatus. | 05-10-2012 |
| 20120113472 | COMMUNICATION APPARATUS, CONTROL PROGRAM OF COMMUNICATION APPARATUS, AND RELAY APPARATUS - A communication apparatus, a control program of the communication apparatus, and a relay apparatus are provided. The communication apparatus is configured to download electronic data from a server storing a first amount or more of electronic data and to output the downloaded electronic data. The communication apparatus includes an output unit configured to output a second amount of electronic data smaller than the first amount at one time, a download information acquiring unit configured to acquire download information necessary for downloading the first amount of electronic data stored in the server, from the server, a download unit configured to download the second amount of electronic data of the first amount of electronic data from the server, using the download information acquired by the download information acquiring unit. The output unit is configured to output the electronic data downloaded by the download unit. | 05-10-2012 |
| 20120117199 | COMMUNICATION APPARATUS SYSTEM, COMMUNICATION APPARATUS, RELAY APPARATUS, AND CONTROL METHOD OF RELAY - A communication apparatus system includes a relay apparatus and a communication apparatus which are connected to a network, to which a service providing apparatus for an electronic-file storing service is connected. The communication apparatus includes: an address-get-request transmitting unit that transmits a request for getting an upload destination address to the relay apparatus; a receiving unit that receives the upload destination address and a template for an upload message from the relay apparatus; an upload-message generating unit that generates the upload message including the electronic file and the upload destination address according to the received template; and an upload-message transmitting unit that transmits the generated upload message to the service providing apparatus to upload the electronic file in the electronic-file storing service. The relay apparatus includes: an upload-destination-address-get-program storage unit; an upload-destination-address getting unit; a time-information adding unit; and an upload-destination-address transmitting unit. | 05-10-2012 |
| 20120117629 | RELAY APPARATUS, COMMUNICATION APPARATUS AND RELAY METHOD - A relay apparatus connected to a communication apparatus, a service providing apparatus and a browser-equipped apparatus, includes: a registering unit registering provisional registration information, the provisional registration information being used in an authentication procedure performed between the service providing apparatus and the browser-equipped apparatus; an acquiring unit acquiring permission information representing that use of the service is permitted, the permission information being issued by the service providing apparatus in the authentication procedure; a communication unit transmitting the provisional registration information to the browser-equipped apparatus; a receiving unit receiving input information transmitted from the communication apparatus, the input information being generated in response to the provisional registration information; and a communication unit transmitting the permission information to the communication apparatus which has transmitted the input information if the receiving unit receives the input information. | 05-10-2012 |
| 20120254368 | RELAY APPARATUS, RECORDING MEDIUM STORING PROGRAM FOR RELAY APPARATUS, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING SYSTEM - A relay apparatus configured to communicate with a server which transmits contents corresponding to identification information received by the server, and a terminal which acquires the contents corresponding to the identification information, the relay apparatus comprises: a communication unit configured to communicate with the server and the terminal; and a processor configured to: receive first identification information from the server through the communication unit; determine whether first contents corresponding to the received first identification information complies with a first format or a second format; transmit the first identification information to the terminal through the communication unit if the processor determines that the first contents complies with the first format; and transmits, to the terminal through the communication unit, second identification information corresponding to second contents which is acquired by converting the first contents if the processor determines that the first contents complies with the second format. | 10-04-2012 |
| 20150349964 | RELAY DEVICE, NON-TRANSITORY STORAGE MEDIUM STORING INSTRUCTIONS EXECUTABLE BY THE RELAY DEVICE, AND SERVICE PERFORMING SYSTEM - A relay device communicates with a server and a client device and includes a storage and a controller. The controller is configured to: receive, from the server, service use information which is to be used for the client device to use a service; transmit the received service use information to the client device; receive, from the client device, transmission instructing information containing key information which identifies CA certificate data stored in the storage and used for the client device to verify server certificate data; and transmit, to the client device, the CA certificate data identified by the key information contained in the received transmission instructing information. The CA certificate data is stored in the storage. | 12-03-2015 |
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| 20130192879 | MULTILAYER PRINTED WIRING BOARD - A multilayer printed wiring board has a core substrate including first insulation layers, first conductive patterns formed on the first insulation layers, and first via conductors formed through the first insulation layers and connecting the first conductive patterns, and a buildup layer formed on the core substrate and including second insulation layers, second conductive patterns formed on the second insulation layers, and second via conductors formed through the second insulation layers and connecting the second conductive patterns. Each of the first insulation layers includes an inorganic reinforcing fiber material, each of the second insulation layers does not include an inorganic reinforcing fiber material, and the core substrate includes an inductor having the first conductive patterns and the first via conductors. | 08-01-2013 |
| 20140083746 | PRINTED WIRING BOARD AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD - A printed wiring board includes multiple insulating layers laminated on each other and each including resin and core, the insulating layers having first-surface sides and second-surface sides on the opposite side, respectively, and including multiple first insulating and second insulating layers, multiple first-surface-side conductive layers formed on the first-surface sides of the first insulating layers, respectively, multiple second-surface-side conductive layers formed on the second-surface sides of the second insulating layers, respectively. The insulating layers include one or more insulating layer having the core positioned such that the core is shifted toward the first-surface side from the center in the thickness direction, the insulating layers include a central insulating layer positioned in the center of the insulating layers, and the first-surface-side and second-surface-side conductive layers are formed such that the first-surface side conductive layers have the total area which is set smaller than the total area of the second-surface-side conductive layers. | 03-27-2014 |
| 20140116759 | PRINTED WIRING BOARD AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD - A method for manufacturing a printed wiring board includes fixing a lower metal foil on a support plate, forming a lower insulating layer on the lower metal foil, laminating a core metal layer on the lower insulating layer, patterning the core metal layer such that the core metal layer is formed into a core conductive layer, forming an upper insulating layer on the core conductive layer and lower insulating layer, laminating an upper metal foil on the upper insulating layer, removing the plate from the lower foil such that a core substrate including the lower metal foil, lower insulating layer, core conductive layer, upper insulating layer and upper metal foil is formed, and forming on the core substrate a buildup layer including an insulating layer and a conductive layer. The core metal layer has a thickness which is set to be greater than thicknesses of the lower and upper foils. | 05-01-2014 |
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| 20130088818 | HOUSING, DOUBLE-SIDED ADHESIVE TAPE, AND ELECTRONIC APPARATUS - A housing includes a first case and a second case configured to be joined together to make a housing space; and a double-sided adhesive member having a first surface and a second surface, the double-sided adhesive member including an impermeable, elastic base material, and a plurality of binder layers formed on either surface of the base material, the binder layers on the first and second surfaces being bonded to the first and second cases, respectively, wherein an adhesive force between the first case and the first surface of the double-sided adhesive member is greater on an outer side of the first case than on an inner side of the first case, and wherein an adhesive force between the second case and the second surface of the double-sided adhesive member is greater on an inner side of the second case than on an outer side of the second case. | 04-11-2013 |
| 20130146323 | GASKET AND ELECTRONIC DEVICE - A gasket includes a first body which is attached to a first member at outside of a gap between a first seal surface formed on the first member and a second seal surface formed on a second member and which includes a reinforcing member; a second body which is extended from the first body to the gap between the first seal surface and the second seal surface; and a protrusion portion which is protruded toward the second seal surface in a state in which the first body is attached to the first member and the second member has not yet been attached to the first member, and is pressed by the second seal surface to closely attach the second body to the first seal surface in a state in which the first body is attached to the first member and the second member is attached to the first member. | 06-13-2013 |
| 20140118906 | ELECTRONIC DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD - An electronic device including: a protrusion portion that projects towards a bottom face of a groove from the opposite side face of a second hook portion, that is inserted into the groove, and that makes close contact with a sealing material; and a cut-away portion that is formed to a side wall portion positioned further to the casing inside out of a pair of side wall portions forming the groove, the cut-away portion being formed at a position corresponding to a first hook portion. | 05-01-2014 |
| 20140238980 | WATERPROOFING CASE AND METHOD OF MANUFACTURING WATERPROOFING CASE - A waterproofing case with a first case and a second case includes a non-annular groove that has a start point side and an end point side and is arranged in parallel by a barrier rib of a certain length, in one of annular bonding portions. The waterproofing case also includes a cutout portion provided at a middle portion of the barrier rib so as to allow a groove portion at the start point side and the end point side to communicate with each other and a plastic elastomer that is disposed within the non-annular groove by curing after being coated. Furthermore, the waterproofing case includes a protrusion that bisects an exposed portion of the plastic elastomer disposed within the non-annular groove toward opposite walls of the non-annular groove at bonding two cases, in other annular bonding portion of the first case and the second case. | 08-28-2014 |
| 20150022955 | LID STRUCTURE AND ELECTRONIC DEVICE - A lid structure includes: a housing; a lid body configured to open and close an opening of the housing; an elastic member configured to be compressed by the housing and the lid body around the opening in a closing position where the lid body closes the opening; and a shaft member configured to allow movement of the lid body along an opening formation surface where the opening is formed and move the lid body come close to the opening formation surface from front to move the lid body from a facing position of facing around the opening to the closing position. | 01-22-2015 |
| 20150062805 | ELECTRONIC DEVICE - An electronic device includes: a fan; a housing configured to houses the fan, the housing including a vent hole configured to introduce outside air, a first air outlet configured to open to a blowing path from the fan, and a second air outlet configured to open at a different position with respect to the blowing path; and an opening and closing member configured to open and close the first air outlet. | 03-05-2015 |
