Patent application number | Description | Published |
20130053762 | METHOD AND APPARATUS FOR COLD PLASMA TREATMENT OF INTERNAL ORGANS - Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells. | 02-28-2013 |
20140005481 | METHOD AND APPARATUS FOR COLD PLASMA TREATMENT OF INTERNAL ORGANS | 01-02-2014 |
20140162465 | PLASMA SHIELD SURFACE PROTECTION - Apparatuses and methods are provided for electrostatically inhibiting particle contamination of a surface of a process structure, such as a mask or reticle. The apparatuses include a plasma-generating system configured to establish a plasma shield over the surface of the process structure. The plasma shield includes a plasma region and a plasma sheath over the surface of the process structure, with the plasma sheath being disposed, at least partially, adjacent to the surface of the process structure, between the plasma region and the surface of the process structure. The plasma shield facilitates negatively charging particles within the plasma shield, and electrostatically inhibits negatively-charged particle contamination of the surface of the process structure to be protected. | 06-12-2014 |
20150038790 | METHOD AND APPARATUS FOR COLD PLASMA TREATMENT OF INTERNAL ORGANS - Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells. | 02-05-2015 |
Patent application number | Description | Published |
20110146576 | SYSTEMS FOR APPLYING A THERMAL BARRIER COATING TO A SUPERALLOY SUBSTRATE - Systems for applying a thermal barrier coating to a superalloy substrate including at least one target for supplying a material for making the thermal barrier coating; at least one laser operably directed toward the target for liberating atomic particles from the target; and a plasma torch for generating a plasma for accelerating and depositing the atomic particles onto the superalloy substrate as the thermal barrier coating where the superalloy substrate is a nickel based superalloy or a cobalt based superalloy. | 06-23-2011 |
20110151270 | METHODS OF LASER ASSISTED PLASMA COATING AT ATMOSPHERIC PRESSURE AND SUPERALLOY SUBSTRATES COMPRISING COATINGS MADE USING THE SAME - Methods of laser assisted plasma coating at atmospheric pressure including providing a plasma, at least one target, at least one laser, and a superalloy substrate, operably directing the laser toward the target to liberate atomic particles from the target and feed the atomic particles into the plasma, and depositing the atomic particles onto the superalloy substrate using the plasma to produce a thermal barrier coating having a column width of from about 0.5 microns to about 60 microns, and an intra column porosity of from about 0% to about 9%. | 06-23-2011 |
20110263119 | METHOD OF FORMING NANOSCALE THREE-DIMENSIONAL PATTERNS IN A POROUS MATERIAL - A method of forming a nanoscale three-dimensional pattern in a porous semiconductor includes providing a film comprising a semiconductor material and defining a nanoscale metal pattern on the film, where the metal pattern has at least one lateral dimension of about 100 nm or less in size. Semiconductor material is removed from below the nanoscale metal pattern to create trenches in the film having a depth-to-width aspect ratio of at least about 10:1, while pores are formed in remaining portions of the film adjacent to the trenches. A three-dimensional pattern having at least one nanoscale dimension is thus formed in a porous semiconductor, which may be porous silicon. The method can be extended to form self-integrated porous low-k dielectric insulators with copper interconnects, and may also facilitate wafer level chip scale packaging integration. | 10-27-2011 |
20130309873 | METHOD OF SELECTIVELY ETCHING A THREE-DIMENSIONAL STRUCTURE - A method of selectively etching a three-dimensional (3-D) structure includes generating a plasma in contact with the 3-D structure, and illuminating a designated portion of the 3-D structure with a laser beam while the plasma is being generated. Nonilluminated portions of the 3-D structure are etched at a first etch rate, and the designated portion of the 3-D structure is etched at a second etch rate, where the second etch rate is different from the first etch rate. | 11-21-2013 |
20140315347 | Scalable Multi-Role Surface-Wave Plasma Generator - Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes. | 10-23-2014 |
Patent application number | Description | Published |
20090173049 | Packing Machine, in Particular Encompassing a Deep Drawing Machine - The present invention relates to a packing machine | 07-09-2009 |
20100137087 | Chain for a Machine Drive, Transport of Material in a Machine or the Like, and Packaging machine comprising one such chain - The invention proposes a chain for a machine drive, transport of material in a machine or the like, and also a packaging machine comprising one such chain, this chain being better than known link chains at meeting requirements in respect of hygiene conditions during operation and cleaning. This is achieved according to the invention in that flexible chain links ( | 06-03-2010 |
20100218792 | Packing Machine - Proposed is a packing machine ( | 09-02-2010 |
20110220699 | PACKAGING MACHINE WITH DYNAMIC CHAIN TENSION - The invention relates to a packaging machine, in particular a thermoformer, traysealer, comprising at least two transport chains for transporting a web of material, such as a film or the like. The packaging machine is characterized in that sensor means are provided for detecting the chain length and/or the chain pitch and/or the chain tension of the transport chains, means being provided for stretching and/or relaxing at least one individual transport chain, and control means being provided for adapting different lengths or chain pitches of two transport chains by stretching and/or relaxing at least one transport chain in a controlled manner. | 09-15-2011 |