Rasheed, US
Adam Rasheed, Niskayuna, NY US
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20150149234 | SYSTEMS AND METHODS FOR AIRLINE FLEET RETIREMENT PREDICTION - Systems and methods for airline fleet retirement prediction are provided. One methods includes obtaining market information for the airline that defines at least one market for the airline, determining a plurality of aircraft types (priority groupings) for the airline within the at least one market to define an airline fleet model, and determining deployment priorities for the plurality of aircraft types within the at least market. The method further includes developing one or more operational models using at least one of airline operational data or airline fleet data for the plurality of aircraft types and determining aircraft retirement prediction data for the airline using the airline fleet model and the one or more operational models developed for the airline. | 05-28-2015 |
Howard S. Rasheed, Wilmington, NC US
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20090292586 | Strategic Visioning System Using Bisociation Brainstorming - The instant invention is directed to a novel approach to identification and evaluation of the trends affecting a particular organization. By use of a specially designed software package, the participants in the evaluation are able to analyze and codify opportunities and/or threats that are present in the environment of the organization and to brainstorm solution as result of the codification of the stresses confronting the organization. This is accomplished by use of the software in a unique bisociational approach. | 11-26-2009 |
Irshad Rasheed, Fremont, CA US
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20140266893 | ADAPTIVE TRANSMIT ARRAY FOR BEAM-STEERING - A method includes receiving a remote transmitter signal at an antenna array including a number of antenna elements, mixing the received signal with in-phase and quadrature-phase Local Oscillator (LO) signals from Voltage Controlled Oscillators (VCOs) of a coupled VCO array, and configuring each Phase Locked Loop (PLL) of a number of PLLs to receive an in-phase output of the mixing corresponding to a VCO and a quadrature-phase output of the mixing corresponding to another VCO adjacent to the VCO as inputs thereto. The method also includes feeding back an output of the each PLL to the VCO, driving the in-phase and the quadrature-phase outputs of the mixing from a transmit modulator, and transmitting, in a direction of the remote transmitter, an antenna array signal based on the driving. Further, the method includes sensing a servoed state related to LO phase relationships and holding thereof during the transmission of the signal. | 09-18-2014 |
20140266894 | AUTOMATIC HIGH-RESOLUTION ADAPTIVE BEAM-STEERING - A method includes pointing a receive beam of a retro-directive antenna array attracted to a jammer circuit instead of a remote transmitter away from the jammer circuit toward the remote transmitter by a first angle based on coarse manual means therefor implemented in electronic circuitry associated with the retro-directive antenna array. The electronic circuitry includes a number of mixers, each of which is configured to mix a Local Oscillator (LO) signal generated from a Voltage Controlled Oscillator (VCO) with a signal received at an antenna element of the retro-directive antenna array. The method also includes automatically fine pointing the receive beam toward the remote transmitter by a second angle following the coarse pointing thereof by the first angle such that the receive beam exactly points to, and tracks, the remote transmitter. The automatic fine pointing is effected through a secondary automatic servo loop implemented in the electronic circuitry. | 09-18-2014 |
Muhammad Rasheed, Fremont, CA US
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20090025636 | HIGH PROFILE MINIMUM CONTACT PROCESS KIT FOR HDP-CVD APPLICATION - A process kit cover for chemical vapor deposition processes is disclosed according to one embodiment of the invention. The process kit cover may include a protrusion from the top surface of the process kit cover. The protrusion is adjacent to a wafer facing surface. The protrusion decreases oxide buildup on the process kit cover and the wafer facing surface during repeated deposition processes. The process kit cover may also be in minimal thermal contact at the interface with a lower support structure, such as a ceramic collar or pedestal, according to another embodiment of the invention. Minimal thermal contact may be achieved by placing an insulator between the process kit cover and the lower support structure or by creating a gap or gaps between the process kit cover and the lower support structure. Ambient atmosphere may provide thermal insulating within the gap or gaps. | 01-29-2009 |
20090034147 | Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing - A method and apparatus for providing a fluid distribution element for an electrostatic chuck that reduces plasma formation and arcing within heat transfer fluid passages. One embodiment comprises a plate and a dielectric component, where the dielectric component is inserted into the plate. The plate is adapted to be positioned within a channel to define a plenum, wherein the dielectric component provides at least a portion of a fluid passage coupled to the plenum. A porous dielectric layer, formed upon the dielectric component, provides at least another portion of a fluid passage coupled to the plenum. In other embodiments, the fluid distribution element comprises various arrangements of components to define a fluid passage that does not provide a line-of-sight path from the support surface for a substrate to a plenum. | 02-05-2009 |
20090034148 | Method of making an electrostatic chuck with reduced plasma penetration and arcing - A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum. | 02-05-2009 |
20090034149 | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing - A method for refurbishing at least a portion of an electrostatic chuck. The method comprises removing a first dielectric component from a fluid distribution element of the electrostatic chuck and replacing the first dielectric component with a second dielectric component. | 02-05-2009 |
Muhammad Rasheed, San Jose, CA US
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20110240464 | APPARATUS FOR PHYSICAL VAPOR DEPOSITION HAVING CENTRALLY FED RF ENERGY - In some embodiments, a feed structure to couple RF energy to a target may include a body having a first end to receive RF energy and a second end opposite the first end to couple the RF energy to a target, the body further having a central opening disposed through the body from the first end to the second end; a first member coupled to the body at the first end, wherein the first member comprises a first element circumscribing the body and extending radially outward from the body, and one or more terminals disposed in the first member to receive RF energy from an RF power source; and a source distribution plate coupled to the second end of the body to distribute the RF energy to the target, wherein the source distribution plate includes a hole disposed through the plate and aligned with the central opening of the body. | 10-06-2011 |
20110278165 | PROCESS KIT SHIELD FOR IMPROVED PARTICLE REDUCTION - Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber. | 11-17-2011 |
20110311735 | MAGNETRON DESIGN FOR RF/DC PHYSICAL VAPOR DEPOSITION - Methods and apparatus to improve target life and deposition uniformity in PVD chambers are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis, the shunt plate rotatable about the central axis, a first open loop magnetic pole arc coupled to the shunt plate at a first radius from the central axis, and a second open loop magnetic pole arc coupled the shunt plate at a first distance from the first open loop magnetic pole arc, wherein at least one of the first radius varies along the first open loop magnetic pole arc or the first distance varies along the second open loop magnetic pole arc. In some embodiments, a first polarity of the first open loop magnetic pole arc opposes a second polarity of the second open loop magnetic pole arc. | 12-22-2011 |
20120027954 | MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY - Methods and apparatus for depositing thin films having high thickness uniformity and low resistivity are provided herein. In some embodiments, a magnetron assembly includes a shunt plate, the shunt plate rotatable about an axis, an inner closed loop magnetic pole coupled to the shunt plate, and an outer closed loop magnetic pole coupled the shunt plate, wherein an unbalance ratio of a magnetic field strength of the outer closed loop magnetic pole to a magnetic field strength of the inner closed loop magnetic pole is less than about 1. In some embodiments, the ratio is about 0.57. In some embodiments, the shunt plate and the outer close loop magnetic pole have a cardioid shape. A method utilizing RF and DC power in combination with the inventive magnetron assembly is also disclosed. | 02-02-2012 |
20120103257 | DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER - Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing. | 05-03-2012 |
20130112554 | DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER - Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing. | 05-09-2013 |
20130153412 | APPARATUS FOR ENABLING CONCENTRICITY OF PLASMA DARK SPACE - In some embodiments, substrate processing apparatus may include a chamber body; a lid disposed atop the chamber body; a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate; an annular dark space shield having an inner wall disposed about an outer edge of the target; a seal ring disposed adjacent to an outer edge of the dark space shield; and a support member coupled to the lid proximate an outer end of the support member and extending radially inward such that the support member supports the seal ring and the annular dark space shield, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly. | 06-20-2013 |
20130255576 | PROCESS KIT SHIELD FOR PLASMA ENHANCED PROCESSING CHAMBER - Apparatus for processing substrates is disclosed herein. In some embodiments, an apparatus includes a first shield having a first end, a second end, and one or more first sidewalls disposed between the first and second ends, wherein the first end is configured to interface with a first support member of a process chamber to support the first shield in a position such that the one or more first sidewalls surround a first volume of the process chamber; and a second shield having a first end, a second end, and one or more second sidewalls disposed between the first and second ends of the second shield and about the first shield, wherein the first end of the second shield is configured to interface with a second support member of the process chamber to support the second shield such that the second shield contacts the first shield to form a seal therebetween. | 10-03-2013 |
20130256125 | SUBSTRATE PROCESSING SYSTEM WITH MECHANICALLY FLOATING TARGET ASSEMBLY - Substrate processing systems are provided herein. In some embodiments, a substrate processing system may include a target assembly having a target comprising a source material to be deposited on a substrate; a grounding assembly disposed about the target assembly and having a first surface that is generally parallel to and opposite a backside of the target assembly; a support member coupled to the grounding assembly to support the target assembly within the grounding assembly; one or more insulators disposed between the backside of the target assembly and the first surface of the grounding assembly; and one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member. | 10-03-2013 |
20130256127 | SUBSTRATE PROCESSING SYSTEM HAVING SYMMETRIC RF DISTRIBUTION AND RETURN PATHS - A processing system may include a target having a central axis normal thereto; a source distribution plate having a target facing side opposing a backside of the target, wherein the source distribution plate includes a plurality of first features such that a first distance of a first radial RF distribution path along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path along the given first diameter; and a ground plate opposing a target opposing side of the source distribution plate and having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path along the given second diameter. | 10-03-2013 |
20130277203 | PROCESS KIT SHIELD AND PHYSICAL VAPOR DEPOSITION CHAMBER HAVING SAME - Embodiments of process kit shields and physical vapor deposition (PVD) chambers incorporating same are provided herein. In some embodiments, a process kit shield for use in depositing a first material in a physical vapor deposition process may include an annular body defining an opening surrounded by the body, wherein the annular body is fabricated from the first material, and an etch stop coating formed on opening-facing surfaces of the annular body, the etch stop coating is fabricated from a second material that is different from the first material, the second material having a high etch selectivity with respect to the first material. | 10-24-2013 |
20130285065 | PVD BUFFER LAYERS FOR LED FABRICATION - Fabrication of gallium nitride-based light devices with physical vapor deposition (PVD)-formed aluminum nitride buffer layers is described. Process conditions for a PVD AlN buffer layer are also described. Substrate pretreatments for a PVD aluminum nitride buffer layer are also described. In an example, a method of fabricating a buffer layer above a substrate involves pre-treating a surface of a substrate. The method also involves, subsequently, reactive sputtering an aluminum nitride (AlN) layer on the surface of the substrate from an aluminum-containing target housed in a physical vapor deposition (PVD) chamber with a nitrogen-based gas or plasma. | 10-31-2013 |
20140158049 | PROCESS KIT SHIELD FOR PLASMA ENHANCED PROCESSING CHAMBER - Apparatus for processing substrates is disclosed herein. In some embodiments, an apparatus includes a first shield having a first end, a second end, and one or more first sidewalls disposed between the first and second ends, wherein the first end is configured to interface with a first support member of a process chamber to support the first shield in a position such that the one or more first sidewalls surround a first volume of the process chamber; and a second shield having a first end, a second end, and one or more second sidewalls disposed between the first and second ends of the second shield and about the first shield, wherein the first end of the second shield is configured to interface with a second support member of the process chamber to support the second shield such that the second shield contacts the first shield to form a seal therebetween. | 06-12-2014 |
20140251217 | TARGET FOR PVD SPUTTERING SYSTEM - Embodiments of apparatus for physical vapor deposition are provided. In some embodiments, a target assembly for use in a substrate processing system to process a substrate includes a plate having a first side and an opposing second side, wherein the second side comprises a target supporting surface extending from the second side in a direction normal to the second side, wherein the target supporting surface has a first diameter and is bounded by a first edge; and a target having a first side bonded to the target supporting surface, wherein a diameter of the target is greater than the first diameter of the target supporting surface. | 09-11-2014 |
20140260544 | METHOD AND APPARATUS FOR MEASURING PRESSURE IN A PHYSICAL VAPOR DEPOSITION CHAMBER - A method and apparatus for physical vapor deposition are provided herein. In some embodiments, an apparatus for measuring pressure of a substrate processing chamber may include a shield having an annular one-piece body having an inner volume, a top opening and a bottom opening, wherein a bottom of the annular one-piece body includes an inner upwardly extending u-shaped portion, a gas injection adapter disposed about an outer wall of the shield, a pressure measuring conduit formed within the gas injection adapter, wherein the pressure measuring conduit is fluidly coupled the inner volume via a gap formed between an outer wall of the shield and substrate processing chamber components disposed proximate the shield, and wherein the gap has substantially the same pressure as the inner volume, and a pressure detector coupled to the pressure measuring conduit. | 09-18-2014 |
20140261177 | APPARATUS FOR GAS INJECTION IN A PHYSICAL VAPOR DEPOSITION CHAMBER - Apparatus for physical vapor deposition are provided herein. In some embodiments, a shield for use in a physical vapor deposition chamber, comprises an annular one-piece body having an inner volume, a top opening and a bottom opening, wherein a bottom of the annular one-piece body includes an inner upwardly extending u-shaped portion, an annular groove formed in an inner wall of the one-piece body, and a plurality of gas distribution vents disposed along the annular feature and formed through the one-piece body, wherein the plurality of gas distribution vents are spaced apart from each other to distribute gases into the inner volume in a desired pattern. | 09-18-2014 |
20140261180 | PVD TARGET FOR SELF-CENTERING PROCESS SHIELD - In some embodiments, a target assembly, for use in a substrate processing chamber having a process shield, may include a backing plate having a first side and an opposing second side, wherein the second side comprises a first surface having a first diameter bounded by a first edge; a target material having a first side bonded to the first surface of the backing plate; wherein the first edge is an interface between the backing plate and the target material; a plurality of slots disposed along an outer periphery of the backing plate extending from the first side of the backing plate toward the second side of the backing plate, wherein the plurality of slots are configured to align the target assembly with respect to the process shield. | 09-18-2014 |
20140262764 | METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBER - Methods and apparatus for physical vapor deposition are provided herein. In some embodiments, a process kit shield for use in a physical vapor deposition chamber may include an electrically conductive body having one or more sidewalls defining a central opening, wherein the body has a ratio of a surface area of inner facing surfaces of the one or more sidewalls to a height of the one or more sidewalls of about 2 to about 3. | 09-18-2014 |
Muhammed M. Rasheed, San Jose, CA US
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20130087452 | PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION - Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a cover ring, a shield, and an isolator for use in a physical deposition chamber. The components of the process kit work alone and in combination to significantly reduce particle generation and stray plasmas. In comparison with existing multiple part shields, which provide an extended RF return path contributing to RF harmonics causing stray plasma outside the process cavity, the components of the process kit reduce the RF return path thus providing improved plasma containment in the interior processing region. | 04-11-2013 |
Rana Ghufran Rasheed, Overland Park, KS US
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20140237968 | BI-COMPONENT FIBER AND FILTER MEDIA INCLUDING BI-COMPONENT FIBERS - A bi-component fiber is provided. The bi-component fiber includes a sheath formed of polyphenylene sulfide (PPS) and a core formed of a high glass transition polyester. A PPS material of the sheath has a higher melting point than a high glass transition polyester material of the core. The core is at least partially crystallized whereby the high glass transition polyester material of the core effectively has a higher softening point than a softening point of the PPS material of the sheath. | 08-28-2014 |
Wail Rasheed, Summit, NJ US
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20110147252 | PACKAGES AND INSERTS USEFUL FOR DISPENSING MEDICINES - Various embodiments of the present invention provide packages, inserts and pharmaceutical products that are capable of holding a plurality of medicinal units and limiting the amount of medicinal units that are dispensed from the package at one time. | 06-23-2011 |
Yasser Rasheed, Beverton, OR US
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20110145558 | Virtual Bus Device Using Management Engine - A management engine may be used to trap configuration cycles during the boot process and thereafter in response to operating system enumeration. As a result, a virtual bus device can be created. The bus device may be used to provision software to the platform even when the operating system is corrupted or non-functional. | 06-16-2011 |
Zeeshan Rasheed, Herndon, VA US
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20090297023 | VIDEO SEGMENTATION USING STATISTICAL PIXEL MODELING - A method for segmenting video data into foreground and background ( | 12-03-2009 |
20130242095 | VIDEO SEGMENTATION USING STATISTICAL PIXEL MODELING - A method for segmenting video data into foreground and background portions utilizes statistical modeling of the pixels. A statistical model of the background is built for each pixel, and each pixel in an incoming video frame is compared with the background statistical model for that pixel. Pixels are determined to be foreground or background based on the comparisons. The method for segmenting video data may be further incorporated into a method for implementing an intelligent video surveillance system. The method for segmenting video data may be implemented in hardware. | 09-19-2013 |
Zeeshan Rasheed, Reston, VA US
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20080291278 | Wide-area site-based video surveillance system - A computer-readable medium contains software that, when read by a computer, causes the computer to perform a method for wide-area site-based surveillance. The method includes receiving surveillance data, including view targets, from a plurality of sensors at a site; synchronizing the surveillance data to a single time source; maintaining a site model of the site, wherein the site model comprises a site map, a human size map, and a sensor network model; analyzing the synchronized data using the site model to determine if the view targets represent a same physical object in the site; creating a map target corresponding to a physical object in the site, wherein the map target includes at least one view target; receiving a user-defined global event of interest, wherein the user-defined global event of interest is based on the site map and based on a set of rules; detecting the user-defined global event of interest in real time based on a behavior of the map target; and responding to the detected event of interest according to a user-defined response to the user-defined global event of interest. | 11-27-2008 |
Zeeshan Rasheed, Sterling, VA US
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20080240616 | Automatic camera calibration and geo-registration using objects that provide positional information - A video sequence of a field of view within an environment is received. Targets are detected in the video sequence. Target geo-positional information is received. Correspondences between the targets detected in the video sequence and the target geo-positional information are determined and used to calibrate the camera and to geo-register a field of view of the camera. | 10-02-2008 |
20080298636 | METHOD FOR DETECTING WATER REGIONS IN VIDEO - A computer-based method for automatic detection of water regions in a video include the steps of estimating a water map of the video and outputting the water map to an output medium, such as a video analysis system. The method may further include the steps of training a water model from the water map; re-classifying the water map using the water model by detecting water pixels in the video; and refining the water map. | 12-04-2008 |
20120268594 | METHOD FOR FINDING PATHS IN VIDEO - A system for detecting behavior of a target may include: a target detection engine, adapted to detect at least one target from one or more objects from a video surveillance system recording a scene; a path builder, adapted to create at least one mature path model from analysis of the behavior of a plurality of targets in the scene, wherein the at least one mature path model includes a model of expected target behavior with respect to the at least one path model; and a target behavior analyzer, adapted to analyze and identify target behavior with respect to the at least one mature path model. The system may further include an alert generator, adapted to generate an alert based on the identified behavior. | 10-25-2012 |
20140341433 | METHOD FOR FINDING PATHS IN VIDEO - A system for detecting behavior of a target may include: a target detection engine, adapted to detect at least one target from one or more objects from a video surveillance system recording a scene; a path builder, adapted to create at least one mature path model from analysis of the behavior of a plurality of targets in the scene, wherein the at least one mature path model includes a model of expected target behavior with respect to the at least one path model; and a target behavior analyzer, adapted to analyze and identify target behavior with respect to the at least one mature path model. The system way further include an alert generator, adapted to generate an alert based on the identified behavior. | 11-20-2014 |