Patent application number | Description | Published |
20120030168 | PERSISTENCE OF MASTER DATA IN A MULTI-TENANT SOFTWARE DELIVERY ARCHITECTURE - A first tenant-nonspecific database table on a repository accessible to an application server of a multi-tenant software delivery architecture can maintain a first record designating a first predefined generic field of a plurality of predefined generic fields. The first record can include an organization-specific master data field definition of the first predefined generic field maintained in a first tenant-specific definition field assigned to a first customer tenant of a plurality of customer tenants that are accessible via the application server. Each customer tenant of the plurality of customer tenants can provide a discrete organization-specific business configuration of a core software platform. A second tenant-nonspecific database table maintained on the repository can maintain a second record that can include a key value designating the first tenant, a record designator, and an organization-specific master data value corresponding to the first predefined generic field. A calculation or determination based on master data can be performed that is relevant to the discrete organization-specific business configuration provided by the first customer tenant using the organization-specific master data value. | 02-02-2012 |
20130030867 | MANAGING CONSISTENT INTERFACES FOR CAMPAIGN RESPONSE OPTION, SALES TARGET PLAN, SALES PRICE LIST AND SALES SPECIFICATION BUSINESS OBJECTS ACROSS HETEROGENEOUS SYSTEMS - A business object model, which reflects data that is used during a given business transaction, is utilized to generate interfaces. This business object model facilitates commercial transactions by providing consistent interfaces that are suitable for use across industries, across businesses, and across different departments within a business during a business transaction. In some operations, software creates, updates, or otherwise processes information related to a campaign response option, a sales target plan, a sales price list and a sales specification business object. | 01-31-2013 |
20130179399 | Persistence Of Master Data In A Multi-Tenant Software Delivery Architecture - A first tenant-nonspecific database table on a repository accessible to an application server of a multi-tenant software delivery architecture can maintain a first record designating a first predefined generic field of a plurality of predefined generic fields. The first record can include an organization-specific master data field definition of the first predefined generic field maintained in a first tenant-specific definition field assigned to a first customer tenant of a plurality of customer tenants that are accessible via the application server. Each customer tenant of the plurality of customer tenants can provide a discrete organization-specific business configuration of a core software platform. A second tenant-nonspecific database table maintained on the repository can maintain a second record that can include a key value designating the first tenant, a record designator, and an organization-specific master data value corresponding to the first predefined generic field. A calculation or determination based on master data can be performed that is relevant to the discrete organization-specific business configuration provided by the first customer tenant using the organization-specific master data value. | 07-11-2013 |
20140006236 | CONSISTENT INTERFACE FOR INVOICE SCHEDULE AND INVOICE SCHEDULE PROCESSING LOG | 01-02-2014 |
Patent application number | Description | Published |
20080211973 | Spectrum Sequential Display Having Reduced Cross Talk - A color display device, a drive circuit for a color display device, a method, a signal and a computer-readable medium for reducing electro-optical cross talk that occurs in a display that is operated in Spectrum Sequential mode is disclosed. The invention eliminates annoying visible artefacts, such as contouring, noise, or color deviation, which normally are introduced by this cross talk by compensating for the cross talk. According to embodiments of the invention, a drive signal (R′,G′,B′) to drive picture elements of the display is altered in video processing circuitry (MPC, XTC, SC) and/or software, in dependence on one or more properties of different spectra from a light source ( | 09-04-2008 |
20090096710 | DUAL DISPLAY DEVICE - The invention relates to a dual display device (DD | 04-16-2009 |
20100188531 | IMAGE DETAIL ENHANCEMENT - A method of enhancing details in an input image. The input image comprises input pixels, which have input pixel values (IPV) limited to a range (RA). The method comprises average filtering ( | 07-29-2010 |
Patent application number | Description | Published |
20100148109 | XEROGELS MADE FROM AROMATIC POLYUREAS - The invention relates to a xerogel comprising
| 06-17-2010 |
20100221519 | PROCESS FOR PRODUCING NANO- AND MESOFIBERS BY ELECTROSPINNING COLLOIDAL DISPERSIONS COMPRISING AT LEAST ONE ESSENTIALLY WATER-INSOLUBLE POLYMER - The present invention relates to a process for producing polymer fibers, especially nano- and mesofibers, by electrospinning a colloidal dispersion of at least one essentially water-insoluble polymer in an aqueous medium, and to fibers obtainable by this process, to textile fabrics comprising the inventive fibers, and to the use of the inventive fibers and of the inventive textile fabrics. | 09-02-2010 |
20110092635 | PROCESS FOR THE PREPARATION OF AN AQUEOUS POLYMER DISPERSION - Process for the preparation of an aqueous polymer dispersion using RAFT compounds. | 04-21-2011 |
20120058641 | AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES - An aqueous CMP agent, comprising (A) solid polymer particles interacting and forming strong complexes with the metal of the surfaces to be polished; (B) a dissolved organic non-polymeric compound interacting and forming strong, water-soluble complexes with the metal and causing an increase of the material removal rate MRR and the static etch rate SER with increasing concentration of the compound (B); and (C) a dissolved organic non-polymeric compound interacting and forming slightly soluble or insoluble complexes with the metal, which complexes are capable of being adsorbed by the metal surfaces, and causing a lower increase of the MRR than the compound (B) and a lower increase of the SER than the compound (B) or no increase of the SER with increasing concentration of the compound (C); a CMP process comprising selecting the components (A) to (C) and the use of the CMP agent and process for polishing wafers with ICs. | 03-08-2012 |
20120058643 | AQUEOUS METAL POLISHING AGENT COMPRISING A POLYMERIC ABRASIV CONTAINING PENDANT FUNCTIONAL GROUPS AND ITS USE IN A CMP PROCESS - (A) solid polymer particles being finely dispersed in the aqueous phase and containing pendant functional groups (a1) capable of strongly interacting and forming strong complexes with the metal of the surfaces to be polished, and pendant functional groups (a2) capable of interacting less strongly with the metal of the surfaces to be polished than the functional groups (a1); and (B) an organic non-polymeric compound dissolved in the aqueous phase and capable of interacting and forming strong, water-soluble complexes with the metal of the surfaces to be polished and causing an increase of the material removal rate MRR and the static etch rate SER of the metal surfaces to be polished with increasing concentration of the compound (B); a CMP process comprising selecting (A) and (B) and the use of the CMP agent and process for polishing wafers with ICs. | 03-08-2012 |
20120208344 | CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING INORGANIC PARTICLES AND POLYMER PARTICLES - A chemical mechanical polishing (CMP) composition, comprising (A) at least one type of inorganic particles which are dispersed in the liquid medium (C), (B) at least one type of polymer particles which are dispersed in the liquid medium (C), (C) a liquid medium, wherein the zeta-potential of the inorganic particles (A) in the liquid medium (C) and the zeta-potential of the polymer particles in the liquid medium (C) are of same signs. | 08-16-2012 |
20120231627 | PROCESS FOR REMOVING A BULK MATERIAL LAYER FROM A SUBSTRATE AND A CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS - An aqueous chemical mechanical polishing (CMP) agent (A) comprising solid particles (a1) containing (a11) a corrosion inhibitor for metals, and (a12) a solid material, the said solid particles (a1) being finely dispersed in the aqueous phase; and its use in a process for removing a bulk material layer from the surface of a substrate and planarizing the exposed surface by chemical mechanical polishing until all material residuals are removed from the exposed surface, wherein the CMP agent exhibits at the end of the chemical mechanical polishing, without the addition of supplementary materials, —the same or essentially the same static etch rate (SER) as at its start and a lower material removal rate (MRR) than at its start, —a lower SER than at its start and the same or essentially the same MRR as at its start or—a lower SER and a lower MRR than at its start; such that the CMP agent exhibits a soft landing behavior. | 09-13-2012 |
20120235081 | PROCESS FOR REMOVING A BULK MATERIAL LAYER FROM A SUBSTRATE AND A CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS - A process for removing a bulk material layer from a substrate and planarizing the exposed surface by CMP by (1) providing an CMP agent exhibiting at the end of the chemical mechanical polishing, without the addition of supplementary materials, the same SER as at its start and a lower MRR than at its start,—an SER which is lower than the initial SER and an MRR which is the same or essentially the same as the initial MRR or a lower SER and a lower MRR than at its start; (2) contacting the surface of the bulk material layer with the CMP agent; (3) the CMP of the bulk material layer with the CMP agent; and (4) continuing the CMP until all material residuals are removed from the exposed surface; and a CMP agent and their use for manufacturing electrical and optical devices. | 09-20-2012 |
20120322264 | AQUEOUS POLISHING AGENT AND GRAFT COPOLYMERS AND THEIR USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES - An aqueous polishing agent, comprising, as the abrasive, at least one kind of polymer particles (A) finely dispersed in the aqueous phase and having at their surface a plurality of at least one kind of functional groups (al) capable of interacting with the metals and/or the metal oxides on top of the surfaces to be polished and forming complexes with the said metals and metal cations, the said polymer particles (A) being preparable by the emulsion or suspension polymerization of at least one monomer containing at least one radically polymerizable double bond in the presence of at least one oligomer or polymer containing a plurality of functional groups (a1); graft copolymers preparable by the emulsion or suspension polymerization of at least one monomer containing at least one radically polymerizable double bond in the presence of at least one oligomeric or polymeric aminotriazine-polyamine condensate; and a process for the chemical and mechanical polishing of patterned and unstructured metal surfaces making use of the said aqueous polishing agent. | 12-20-2012 |
20130273739 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES HAVING PATTERNED OR UNPATTERNED LOW-K DIELECTRIC LAYERS - An aqueous polishing composition comprising (A) abrasive particles and (B) an amphiphilic nonionic surfactant selected from the group consisting of water-soluble or water-dispersible surfactants having (b1) hydrophobic groups selected from the group consisting of branched alkyl groups having 10 to 18 carbon atoms; and (b2) hydrophilic groups selected from the group consisting of polyoxyalkylene groups comprising (b21) oxyethylene monomer units and (b22) substituted oxyalkylene monomer units wherein the substituents are selected from the group consisting of alkyl, cycloalkyl, or aryl, alkyl-cycloalkyl, alkyl-aryl, cycloalkyl-aryl and alkyl-cycloalkyl-aryl groups, the said polyoxyalkylene group containing the monomer units (b21) and (b22) in random, alternating, gradient and/or blocklike distribution; a CMP process for substrates having patterned or unpatterned low-k or ultra-low-k dielectric layers making use of the said aqueous polishing composition; and the use of the said aqueous polishing composition for manufacturing electrical, mechanical and optical devices. | 10-17-2013 |
20150159050 | CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING POLYVINYL PHOSPHONIC ACID AND ITS DERIVATIVES - A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(═O)(OR1)(0R2) or phosphonic acid (P(═O)(OH)2) moiety or their deprotonated forms as pendant groups, wherein R | 06-11-2015 |
Patent application number | Description | Published |
20130260656 | ABRASIVE ARTICLE HAVING A NON-UNIFORM DISTRIBUTION OF OPENINGS - An abrasive article having a plurality of apertures arranged in a non-uniform distribution pattern, wherein the pattern is spiral or phyllotactic, and in particular those patterns described by the Vogel equation. Also, provided is a back-up pad having a spiral or phyllotactic patterns of air flow paths, such as in the form of open channels. The back-up pad can be specifically adapted to correspond with an abrasive article having a non-uniform distribution pattern. Alternatively, the back-up pad can be used in conjunction with conventional perforated coated abrasives. The abrasive articles having a non-uniform distribution pattern of apertures and the back-up pads can be used together as an abrasive system. | 10-03-2013 |
20140290147 | Abrasive Particles having Particular Shapes and Methods of Forming such Particles - A coated abrasive article comprising a backing, an adhesive layer disposed in a discontinuous distribution on at least a portion of the backing, wherein the discontinuous distribution comprises a plurality of adhesive contact regions having at least one of a lateral spacing or a longitudinal spacing between each of the adhesive contact regions; and at least one abrasive particle disposed on each adhesive contact region, the abrasive particle having a tip, and there being at least one of a lateral spacing or a longitudinal spacing between each of the abrasive particles, and wherein at least 65% of the at least one of a lateral spacing and a longitudinal spacing between the tips of the abrasive particles is within 2.5 standard deviations of the mean. | 10-02-2014 |
20150183090 | Nonwoven Abrasive Articles Made by Friction Welding - An abrasive article comprising a nonwoven substrate material having a top surface and a bottom surface; a woven cloth; a thermoplastic fastener; and a plurality of abrasive particles, wherein the cloth layer is adhered to the top surface of the nonwoven substrate material; wherein the thermoplastic fastener is disposed on the cloth, and wherein the plurality of abrasive particles are disposed on at least the bottom surface of the nonwoven abrasive substrate. | 07-02-2015 |