Patent application number | Description | Published |
20140031591 | CONTINUOUS PROCESS TO MAKE AMINE OXIDE - A continuous process for making amine oxide surfactant comprising the steps of (a) providing the following components; a tertiary amine composition and an aqueous hydrogen peroxide composition, (b) mixing the components from step a) in a mixing device, (c) passing the mixture exiting the mixing device from step b) into an aqueous amine oxide composition comprising from 65 to 80 wt % amine oxide, (d) adjusting the temperature of the amine oxide composition made in step c) to between 40 and 80° C., (e) collecting the amine oxide surfactant; and wherein, for every 1 part of the component mixture from step b) being passed into the aqueous stream in step c), between 8 and 30 parts of the temperature adjusted amine oxide composition from step d) are recycled back to step b) and passed through the mixing device together with the components from step a). | 01-30-2014 |
20140051622 | PROCESS FOR MAKING A CRYSTALLINE STRUCTURANT - An oil-in-water emulsion comprising droplets of a molten hydrogenated castor oil, the droplets having a mean diameter of between 0.1 μm and 4 μm; and an anionic surfactant; and wherein the mean diameter is measured when the emulsion is at a temperature of between 85° C. and 95° C. | 02-20-2014 |
20140162930 | STRUCTURING WITH THREADS OF NON-POLYMERIC, CRYSTALLINE, HYDROXYL-CONTAINING STRUCTURING AGENTS - The need for a structurant premix that provides improved structuring of liquid compositions, while exhibiting less performance variation due to process variation or variation in ingredient levels, that is also particularly suitable for low water liquid compositions, is met through the use of an aqueous structuring premix comprising long threads of non-polymeric, crystalline, hydroxyl-containing structuring agent. | 06-12-2014 |
20140162931 | STRUCTURING WITH SHORT NON-POLYMERIC, CRYSTALLINE, HYDROXYL- CONTAINING STRUCTURING AGENTS - The need for a structurant premix that provides improved structuring of liquid compositions comprising high surfactant levels or hydrophobic ingredients is met through the use of an aqueous structuring premix comprising small particles of a non-polymeric, crystalline, hydroxyl-containing structuring agent. | 06-12-2014 |
Patent application number | Description | Published |
20090128792 | Lithographic apparatus and method - A method is disclosed that includes introducing a substrate into a pre-aligner of a lithographic apparatus, using a detector to measure the location of an alignment mark provided on a side of the substrate which is opposite to the location of the detector, and after measurement, putting the substrate onto a substrate table of the lithographic apparatus, the substrate being positioned on the substrate table such that the alignment mark provided on the opposite side of the substrate is visible through a window of the substrate table. | 05-21-2009 |
20090153825 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic alignment apparatus includes a radiation source arranged to generate radiation at a wavelength of 1000 nanometers or longer, and a plurality of non-imaging detectors arranged to detect the radiation after the radiation has been reflected by an alignment mark. | 06-18-2009 |
20090237635 | LITHOGRAPHIC APPARATUS AND METHOD - According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided. | 09-24-2009 |
20100104959 | LITHOGRAPHIC METHOD, APPARATUS AND CONTROLLER - A method for lithographically applying a pattern to a substrate involves obtaining temperature as a function of time during a post exposure bake for one or more locations on a substrate coated with a layer of chemically amplified resist. A relationship between radiation dosage directed onto the chemically amplified resist and post-exposure concentration of accelerant generated in the chemically amplified resist layer by the radiation dosage is also obtained. Using a model relating the critical dimension to post-exposure concentration of accelerant, and temperature as a function of time across the one or more locations, a radiation dosage to obtain a specified critical dimension for the patterned substrate can be calculated. A substrate can be patterned using the calculated radiation dosage for each one or more location on the substrate such that a specified critical dimension is obtained. An apparatus and controller for putting the method into effect are also disclosed. | 04-29-2010 |
20100157260 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 06-24-2010 |
20110273679 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. | 11-10-2011 |
20140211189 | RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD - A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams. | 07-31-2014 |