Patent application number | Description | Published |
20130019277 | Zone-Based Firewall Policy Model for a Virtualized Data CenterAANM Chang; DavidAACI MilpitasAAST CAAACO USAAGP Chang; David Milpitas CA USAANM Patra; AbhijitAACI SaratogaAAST CAAACO USAAGP Patra; Abhijit Saratoga CA USAANM Bagepalli; NagarajAACI San JoseAAST CAAACO USAAGP Bagepalli; Nagaraj San Jose CA USAANM Sethuraghavan; Rajesh KumarAACI San JoseAAST CAAACO USAAGP Sethuraghavan; Rajesh Kumar San Jose CA US - Techniques are provided for implementing a zone-based firewall policy. At a virtual network device, information is defined and stored that represents a security management zone for a virtual firewall policy comprising one or more common attributes of applications associated with the security zone. Information representing a firewall rule for the security zone is defined and comprises first conditions for matching common attributes of applications associated with the security zone and an action to be performed on application traffic. Parameters associated with the application traffic are received that are associated with properly provisioned virtual machines. A determination is made whether the application traffic parameters satisfy the conditions of the firewall rule and in response to determining that the conditions are satisfied, the action is performed. | 01-17-2013 |
20130163606 | Architecture for Scalable Virtual Network Services - Techniques are provided to start a virtual service node that is configured to provide network traffic services for one or more virtual machines. The virtual service node has at least one associated service profile comprising identifiers for corresponding service policies for network traffic services. The service policies identified in the at least one associated service profile are retrieved. A virtual machine is started with an associated virtual interface and a port profile is applied to the virtual interface, including information identifying the service profile. Information is provided to the virtual service node that informs the virtual service node of network parameters and assigned service profile of the virtual machine. Network traffic associated with the virtual machine is intercepted and redirected to the virtual service node. A virtual service data path is provided that enables dynamic service binding, virtual machine mobility support, and virtual service node chaining and/or clustering. | 06-27-2013 |
20130268588 | Location-Aware Virtual Service Provisioning in a Hybrid Cloud Environment - A sense of location is provided for distributed virtual switch components into the service provisioning scheme to reduce latency observed in conducting policy evaluations across a network in a hybrid cloud environment. A management application in a first virtual network subscribes to virtual network services provided by a second virtual network. A first message is sent to the second virtual network, the first message comprising information configured to start a virtual switch in the second virtual network that switches network traffic for one or more virtual machines in the second virtual network that are configured to extend services provided by the first virtual network into the second virtual network. A second message is sent to the second virtual network, the second message comprising information configured to start a virtual service node in the second virtual network that provides network traffic services for the one or more virtual machines. | 10-10-2013 |
20130268643 | SYSTEM AND METHOD FOR MIGRATING APPLICATION VIRTUAL MACHINES IN A NETWORK ENVIRONMENT - A method includes managing a virtual machine (VM) in a cloud extension, where the VM is part of a distributed virtual switch (DVS) of an enterprise network, abstracting an interface that is transparent to a cloud infrastructure of the cloud extension, and intercepting network traffic from the VM, where the VM can communicate securely with the enterprise network. The cloud extension comprises a nested VM container (NVC) that includes an emulator configured to enable abstracting the interface, and dual transmission control protocol/Internet Protocol stacks for supporting a first routing domain for communication with the cloud extension, and a second routing domain for communication with the enterprise network. The NVC may be agnostic with respect to operating systems running on the VM. The method further includes migrating the VM from the enterprise network to the cloud extension through suitable methods. | 10-10-2013 |
20130283364 | DISTRIBUTED VIRTUAL SWITCH ARCHITECTURE FOR A HYBRID CLOUD - In one embodiment, a secure transport layer tunnel may be established over a public network between a first cloud gateway in a private cloud and a second cloud gateway in a public cloud, where the secure transport layer tunnel is configured to provide a link layer network extension between the private cloud and the public cloud. In addition, a cloud virtual Ethernet module (cVEM) may be executed (instantiated) within the public cloud, where the cVEM is configured to switch inter-virtual-machine (VM) traffic between the private cloud and one or more private application VMs in the public cloud connected to the cVEM. | 10-24-2013 |
20130297769 | SYSTEM AND METHOD FOR SIMULATING VIRTUAL MACHINE MIGRATION IN A NETWORK ENVIRONMENT - A method includes simulating network resources of a portion of a cloud in a simulated cloud within a enterprise network, the cloud being communicable with the enterprise network over a first communication channel, which may be external to the enterprise network. The method can also include simulating network behavior of the first communication channel in a second communication channel within the enterprise network, and validating application performance in the simulated cloud. Simulating network resources includes providing a cloud resources abstraction layer in the enterprise network, and allocating enterprise network resources in the enterprise network to the simulated cloud by the cloud resources abstraction layer. The method further includes adding a virtual network service appliance to the simulated cloud, and determining a change to a network topology of the enterprise network to accommodate the virtual appliance without materially impacting application performance. | 11-07-2013 |
20130312056 | Zone-Based Firewall Policy Model for a Virtualized Data Center - Techniques are provided for implementing a zone-based firewall policy. At a virtual network device, information is defined and stored that represents a security management zone for a virtual firewall policy comprising one or more common attributes of applications associated with the security zone. Information representing a firewall rule for the security zone is defined and comprises first conditions for matching common attributes of applications associated with the security zone and an action to be performed on application traffic. Parameters associated with the application traffic are received that are associated with properly provisioned virtual machines. A determination is made whether the application traffic parameters satisfy the conditions of the firewall rule and in response to determining that the conditions are satisfied, the action is performed. | 11-21-2013 |
20140280836 | WORKLOAD BASED SERVICE CHAIN INSERTION IN A NETWORK ENVIRONMENT - An example method for workload based service chain insertion in a network environment is provided and includes partitioning a service-path into fragments at a service controller, where the service-path comprises an ordered sequence of services to be provided to a packet associated with a workload in a network. The method also includes determining a location of service nodes providing the services; and provisioning the fragments at interfaces at a distributed virtual switch. The method could further include generating a plurality of service insertion points corresponding to the fragments at a service dispatcher. The service dispatcher can include a plurality of data plane components, and the service insertion points are generated at the data plane components. | 09-18-2014 |
20140321459 | ARCHITECTURE FOR AGENTLESS SERVICE INSERTION - An example method for service insertion in a network environment is provided in one example and includes configuring a service node by tagging one or more interface ports of a virtual switch function to which the service node is connected with one or more policy identifiers. When data traffic associated with a policy identifier is received on a virtual overlay path the virtual switch function may then terminate the virtual overlay path and direct raw data traffic to the interface port of the service node that is tagged to the policy identifier associated with the data traffic. | 10-30-2014 |
20140366155 | METHOD AND SYSTEM OF PROVIDING STORAGE SERVICES IN MULTIPLE PUBLIC CLOUDS - A system and a method implement a cloud storage gateway configured to provide secure storage services in a cloud environment. A method can include implementing storage provisioning for a virtual machine (VM) in a hybrid cloud environment that includes an enterprise network in communication with a cloud. Enterprise network includes enterprise storage, and cloud includes cloud storage. The storage provisioning is implemented by deploying a cloud storage gateway in the cloud that facilitates secure migration of data associated with the VM between enterprise storage and cloud storage. A nested virtual machine container (NVC) is also deployed in the cloud, where NVC abstracts an interface that is transparent to a cloud infrastructure of the cloud. Cloud storage gateway can then be executed as a virtual machine within NVC. Such storage provisioning is further implemented by deploying the VM in a NVC in the cloud and directly attaching storage to the VM. | 12-11-2014 |
20150026362 | Dynamic Service Path Creation - Presented herein are techniques for dynamic creation of a unique service path for a service chain. In one example, a service controller and a plurality of service nodes are provided, each service node configured to apply a service function to traffic that passes through the respective service node. The service controller defines a service chain identifying a set of service functions and an order in which they are applied. The service controller receives an indication that the service chain has been instantiated at a classifier, and creates a unique service path for the service chain, wherein the unique service path includes the service chain and the classifier at which the service chain is instantiated. | 01-22-2015 |
20150071285 | DISTRIBUTED SERVICE CHAINING IN A NETWORK ENVIRONMENT - An example method for distributed service chaining in a network environment is provided and includes receiving a packet belonging to a service chain in a distributed virtual switch (DVS) network environment, wherein the packet includes a network service header (NSH) indicating a service path identifier identifying the service chain and a location of the packet on the service chain, evaluating a service forwarding table to determine a next service node based on the service path identifier and the location, with a plurality of different forwarding tables distributed across the DVS at a corresponding plurality of virtual Ethernet Modules (VEMs) associated with respective service nodes in the service chain, and forwarding the packet to the next service node, with substantially all services in the service chain provided sequentially to the packet in a single service loop on a service overlay. | 03-12-2015 |
20150138973 | SHORTENING OF SERVICE PATHS IN SERVICE CHAINS IN A COMMUNICATIONS NETWORK - A method is provided in one example embodiment and includes receiving at a network element a flow offload decision for a first service node comprising a portion of a service chain for processing a flow; recording the flow offload decision against the first service node at the network element; and propagating the flow offload decision backward on a service path to which the flow belongs if the first service node is hosted at the network element. Embodiments may also include propagating the flow offload decision backward on a service path to which the flow belongs if the flow offload decision is a propagated flow offload decision and the network element hosts a second service node that immediately precedes the service node on behalf of which the propagated flow offload decision was received and a flow offload decision has already been received by the network element from the second service node. | 05-21-2015 |
20150163200 | Zone-Based Firewall Policy Model for a Virtualized Data Center - Techniques are provided for implementing a zone-based firewall policy. At a virtual network device, information is defined and stored that represents a security management zone for a virtual firewall policy comprising one or more common attributes of applications associated with the security zone. Information representing a firewall rule for the security zone is defined and comprises first conditions for matching common attributes of applications associated with the security zone and an action to be performed on application traffic. Parameters associated with the application traffic are received that are associated with properly provisioned virtual machines. A determination is made whether the application traffic parameters satisfy the conditions of the firewall rule and in response to determining that the conditions are satisfied, the action is performed. | 06-11-2015 |
20150215172 | Service-Function Chaining - Presented herein are service-function chaining techniques. In one example, a service controller in a network comprising a plurality of service nodes receives one is configured to identify one or more service-functions hosted by each of the service nodes. The service controller defines a service-function chain in terms of service-functions to be applied to traffic in the network and provides information descriptive of the service-function chain to a classifier node. | 07-30-2015 |
20150222640 | Elastic Service Chains - Presented herein are elastic service chain techniques. In one example, a network element receives data traffic to be processed by a service chain that specifies an ordered sequence of service pools including a first service pool and second service pool, wherein each service pool comprises a plurality of network services. A network service is determined from the first service pool to be applied to the data traffic, and data traffic is forwarded to the network service in the first service pool. | 08-06-2015 |
20150263901 | SERVICE NODE ORIGINATED SERVICE CHAINS IN A NETWORK ENVIRONMENT - An example method for service node originated service chains in a network environment is provided and includes receiving a packet at a service node in a network environment that includes a plurality of service nodes and a central classifier, analyzing the packet for a service chain modification or a service chain initiation, classifying the packet at the service node to a new service chain based on the analysis, initiating the new service chain at the service node if the analysis indicates service chain initiation, and modifying an existing service chain for the packet to the new service chain if the analysis indicates service chain modification. In specific embodiments, the analysis includes applying classification logic specific to the service node. Some embodiments, service node attributes and order of service nodes in substantially all service chains configured in the network may be received from a central controller. | 09-17-2015 |
20150295731 | PROGRAMMABLE INFRASTRUCTURE GATEWAY FOR ENABLING HYBRID CLOUD SERVICES IN A NETWORK ENVIRONMENT - An example method for a programmable infrastructure gateway for enabling hybrid cloud services in a network environment is provided and includes receiving an instruction from a hybrid cloud application executing in a private cloud, interpreting the instruction according to a hybrid cloud application programming interface, and executing the interpreted instruction in a public cloud using a cloud adapter. The method is generally executed in the infrastructure gateway including a programmable integration framework allowing generation of various cloud adapters using a cloud adapter software development kit, the cloud adapter being generated and programmed to be compatible with a specific public cloud platform of the public cloud. In specific embodiments, identical copies of the infrastructure gateway can be provided to different cloud service providers who manage disparate public cloud platforms; each copy of the infrastructure gateway can be programmed differently to generate corresponding cloud adapters compatible with the respective public cloud platforms. | 10-15-2015 |
20150365324 | HIGH-EFFICIENCY SERVICE CHAINING WITH AGENTLESS SERVICE NODES - An example method for distributed service chaining is provided and includes receiving a packet belonging to a service chain in a distributed virtual switch (DVS) network environment, the packet includes a network service header (NSH) indicating a service path identifier identifying the service chain. The packet is provided to a virtual Ethernet module (VEM) connected to an agentless service node (SN) providing an edge service such as a server load balancer (SLB). The VEM associates a service path identifier corresponding to the service chain with a local identifier such as a virtual local area network (VLAN). The agentless SN returns the packet to the VEM for forwarding on the VLAN. Because the VLAN corresponds exactly to the service path and service chain, the packet is forwarded directly to the next node in the service chain. This can enable agentless SNs to efficiently provide a service chain for network traffic. | 12-17-2015 |
Patent application number | Description | Published |
20090262324 | ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS - A microlithographic projection exposure apparatus ( | 10-22-2009 |
20100039629 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument. | 02-18-2010 |
20100265482 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane. | 10-21-2010 |
20100283984 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%. | 11-11-2010 |
20100283985 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%. | 11-11-2010 |
20110194090 | OPTICAL RASTER ELEMENT, OPTICAL INTEGRATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate. | 08-11-2011 |
20110304837 | PROJECTION EXPOSURE METHOD, PROJECTION EXPOSURE APPARATUS, LASER RADIATION SOURCE AND BANDWIDTH NARROWING MODULE FOR A LASER RADIATION SOURCE - In a projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, laser radiation having a spectral intensity distribution I(ω) dependent on the angular frequency ω is used. The laser radiation is characterized by an aberration parameter α in accordance with: | 12-15-2011 |
20120002185 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit. | 01-05-2012 |
20120099093 | POLARIZATION ACTUATOR - The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams ( | 04-26-2012 |
20120105865 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND RELATED METHOD - A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface. | 05-03-2012 |
20120293784 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 11-22-2012 |
20130057844 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings. | 03-07-2013 |
20130077076 | MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS INCLUDING SAME - A microlithography illumination optical system is used to guide illumination light from a primary light source to an object field. A mirror array of the illumination optical system has a plurality of individual mirrors, which can be tilted independently of one another by actuators and are connected to associated tilting actuators. A controller is used to activate the actuators. A raster module of the illumination optical system has a plurality of raster elements to produce a spatially distributed arrangement of secondary light sources. | 03-28-2013 |
20130114060 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes an optical integrator that includes an array of optical raster elements. A condenser superimposes the light beams associated with the optical raster elements in a common field plane. A modulator modifies a field dependency of an angular irradiance distribution in an illuminated field. Units of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser such that only the associated light beam impinges on a single modulator unit. The units are configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device controls the modulator units if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane shall be modified. | 05-09-2013 |
20130194559 | METHOD FOR SETTING AN ILLUMINATION GEOMETRY FOR AN ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - A method for setting an illumination geometry for an illumination optical unit for EUV projection lithography is disclosed. The method includes defining a desired illumination geometry, followed by varying tilting angles of individual mirrors of the a facet mirror within one and the same individual-mirror group. In a first tilting position, the individual mirrors are assigned via a first group-mirror illumination channel to a first facet of a second facet mirror. In at least one further tilting position, the individual mirrors are assigned either via a further illumination channel to a further facet of the second facet mirror or to a switch-off illumination channel. The tilting angle variation is carried out until an actual illumination geometry corresponds to the desired illumination geometry within predefined tolerances. | 08-01-2013 |
20130250264 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane. | 09-26-2013 |
20130308115 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises a light source which is configured to produce projection light (PL), a pupil plane and a diffractive optical element that is arranged between the light source and the pupil plane such that an irradiance distribution of projection light (PL) in the pupil plane depends on the position of a field that is illuminated by the projection light (PL) on the diffractive optical element. The illumination system further comprises an optical imaging system-that is arranged between the light source and the diffractive optical element. The optical imaging system ensures that changes of the direction and divergence of the projection light (PL) emitted by the light source have no substantial effect on the position and size of the field which is illuminated on the diffractive optical element by the projection light (PL). | 11-21-2013 |
20140211188 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ. | 07-31-2014 |
20140233006 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 08-21-2014 |
20140362361 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - An illumination optical unit for EUV projection lithography serves for guiding illumination light towards an illumination field, in which a lithography mask can be arranged. The illumination optical unit has a first facet mirror having a plurality of individual mirrors. The latter predefine illumination channels for guiding illumination light partial beams towards the illumination field. A second facet mirror of the illumination optical unit is disposed downstream of the first facet mirror and has a plurality of facets. The latter respectively contribute to the imaging of a group of the individual mirrors of the first facet mirror into the object field via a group-mirror illumination channel. The latter comprises the individual-mirror illumination channels of the individual-mirror group. Images of the different individual-mirror groups are superimposed on one another in the object field via the assigned group-mirror illumination channels. | 12-11-2014 |
20140368803 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTICAL SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT - An illumination optical unit for EUV projection lithography guides illumination light to an illumination field, in which a lithography mask can be arranged. A facet mirror with a plurality of facets guides the illumination light to the illumination field. Respectively one illumination channel which guides an illumination light partial beam is predetermined by one of the facets. Exactly one illumination channel is guided over respectively one of the facets. The illumination optical unit is configured so that, at any time and at any point in the illumination field when the illumination optical unit is in operation, any pairs of illumination light partial beams guided over different illumination channels are incident on this illumination field point at times of incidence, the time difference of which is greater than a coherence duration of the illumination light. | 12-18-2014 |
20140377692 | MASK FOR MICROLITHOGRAPHY AND SCANNING PROJECTION EXPOSURE METHOD UTILIZING THE MASK - A mask for microlithography comprises a substrate; a first pattern area on the substrate, the first pattern area comprising a first pattern extending over a first length in a mask scanning direction and a first width in a direction perpendicular to the mask scan direction; and a second pattern area on the substrate adjacent to the first pattern area in the mask scanning direction, the second pattern area comprising a second pattern extending over a second length in the mask scanning direction and a second width identical to the first width in the direction perpendicular to the mask scan direction. | 12-25-2014 |
20150015862 | ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY - An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light. | 01-15-2015 |
20150029477 | OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes, relative to the optical beam path downstream of the mirror arrangement, at least one deflection surface at which a deflection of the optical axis occurs. The at least one deflection surface has refractive power. | 01-29-2015 |
20150036115 | ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY - Illumination optical unit for EUV projection lithography guides illumination light to an object field. The illumination optical unit has a first facet mirror, which comprises a multiplicity of individual mirrors which can be switched between at least two tilt positions. A second facet mirror of the illumination optical unit is arranged downstream of the first facet mirror in the beam path of the illumination light. The second facet mirror has a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the first facet mirror into the object field via a group mirror illumination channel. The images of the groups are superposed on one another in the object field. At least some of the individual mirrors belong to at least two different groups of the individual mirror groups, which are respectively associated with a dedicated second facet via a dedicated group mirror illumination channel. | 02-05-2015 |
20150062549 | ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS FOR EUV PROJECTION LITHOGRAPHY - An assembly for a projection exposure apparatus for EUV projection lithography has an illumination optical unit for guiding illumination light to an illumination field, in which a lithography mask can be arranged. The illumination optical unit comprises a first facet mirror, which comprises a plurality of mirror arrays with respectively a plurality of individual mirrors. The individual mirrors provide individual mirror illumination channels for guiding illumination light partial beams to the illumination field. The mirror arrays of the first facet mirror are arranged in an array superstructure. Gaps extend along at least one main direction (HRα) between neighboring ones of the mirror arrays. Furthermore, the illumination optical unit comprises a second facet mirror, which comprises a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the field facet mirror into the illumination field via a group mirror illumination channel. | 03-05-2015 |
20150070671 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises a spatial light modulator which is arranged between a light source and a pupil plane. The spatial light modulator includes an array of micromirrors or other light deflecting elements each being capable of individually deflecting impinging projection into various directions. An irradiance distribution on the mirror array or its envelope has, along a direction X an increasing slope and a decreasing slope. The control unit controls the mirrors in such a way that a first mirror, which is located at the increasing slope, and a second mirror, which is located at the decreasing slope, deflect impinging projection light so that it at least partly overlaps in the pupil plane. This ensures that the angular irradiance distribution at mask level is substantially independent from beam pointing fluctuations. | 03-12-2015 |
20150085271 | PROJECTION EXPOSURE APPARATUS AND METHOD FOR CONTROLLING A PROJECTION EXPOSURE APPARATUS - A method is provided for controlling a projection exposure apparatus for microlithography, embodied as a scanner, in the exposure operation, in which a reticle is moved along a scanning axis with respect to a frame of the projection exposure apparatus such that the reticle is scanned by an illumination field radiated thereon, and the radiation of the illumination field is guided onto a wafer after interaction with the reticle in order to generate a desired dose distribution on the wafer. The method comprises the following steps: measuring positional changes of the illumination field in the direction of the scanning axis with respect to the frame of the projection exposure apparatus, and correcting the influence of a measured positional change of the illumination field on the dose distribution on the wafer by modifying at least one operational parameter of the projection exposure apparatus. | 03-26-2015 |
20150092174 | ILLUMINATION OPTICAL UNIT - An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets. | 04-02-2015 |
20150124233 | ILLUMINATION SYSTEM FOR AN EUV PROJECTION LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field in a reticle plane is illuminated by the output beam. The light source comprises an electron beam supply device, an EUV generating device and a polarization setting device. The EUV generating device is supplied with an electron beam by the electron beam supply device. The polarization setting device exerts an adjustable deflecting effect on the electron beam for setting the polarization of the output beam. This results in an illumination system, which operates on the basis of an electron beam-based EUV light source and provides an output beam, which is improved for a resolution-optimized illumination. | 05-07-2015 |
20150137012 | EUV LIGHT SOURCE - An EUV light source for a projection exposure apparatus for EUV projection lithography includes a first electron beam device in the form of an electron beam supply device. The light source furthermore includes an EUV generation device supplied with an electron beam by the electron beam supply device. The light source furthermore includes a second electron beam device in the form of an electron beam disposal device which disposes of an electron beam in the beam path downstream of the EUV generation device. At least one of the electron beam devices on the one hand and the EUV generation device on the other hand are arranged in rooms which are situated one above the other and separated by a building ceiling. At least one electron beam passage is arranged in the building ceiling. This results in an electron beam-based EUV radiation source with the possibility of a manageable operational outlay. | 05-21-2015 |
20150177623 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRROR ARRAY WITH TEMPORAL STABILISATION - A microlithography projection exposure apparatus includes illumination optics configured to illuminate object field points of an object field in an object plane, and projection optics configured to image the object field onto an image field in an image plane. The illumination optics includes a multi-mirror array which includes a plurality of mirrors configured to adjust an intensity distribution in exit pupils associated with the object field points. The illumination optics also includes an optical system configured to produce, via an incoherent superposition of illumination rays, a temporal modification of a temporal stabilization of an illumination of the multi-mirror array. The optical system includes a mirror which includes a mirror surface. In addition, the optical system includes an actuator configured to produce a tilt of at least a portion of the mirror surface. | 06-25-2015 |
20150185622 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises an optical integrator, which includes a first optical raster plate and a second optical raster plate. The first second optical raster plate comprising an array of first lenses having, along a reference direction, a first focal length f | 07-02-2015 |
20150198891 | METHOD FOR ASSIGNING A PUPIL FACET OF A PUPIL FACET MIRROR OF AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS TO A FIELD FACET OF A FIELD FACET MIRROR OF THE ILLUMINATION OPTICAL UNIT - Methods are disclosed for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit for the definition of an illumination channel for a partial beam of illumination light. | 07-16-2015 |
20150198894 | MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND EUV LITHOGRAPHY SYSTEM - An EUV lithography system | 07-16-2015 |
20150234291 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings. | 08-20-2015 |
20150300807 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 10-22-2015 |
20150301455 | METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps:
| 10-22-2015 |
20160062244 | SYSTEM FOR PRODUCING STRUCTURES IN A SUBSTRATE - The disclosure provides a system for producing structures in a substrate. The system includes a projection exposure system. The projection exposure system includes a projection optical unit and an illumination system. | 03-03-2016 |
20160070176 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes an optical integrator that includes an array of optical raster elements. A condenser superimposes the light beams associated with the optical raster elements in a common field plane. A modulator modifies a field dependency of an angular irradiance distribution in an illuminated field. Units of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser such that only the associated light beam impinges on a single modulator unit. The units are configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device controls the modulator units if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane shall be modified. | 03-10-2016 |