Ozu
Ichiro Ozu, Tokyo JP
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20130241130 | ASSEMBLY JIG FOR USE IN ASSEMBLY OF LARGE STRUCTURE - An assembly jig includes an upper jig frame that is provided above a longitudinal outer edge of a large structure, a lower jig frame that is provided below a longitudinal outer edge of the large structure, a connecting jig frame that connects the upper jig frame and the lower jig frame to each other, three supporting parts for supporting the lower jig frame from below, and a jig leg portion that is provided perpendicular to the direction in which the lower jig frame extends and parallel to a ground surface. The supporting parts are provided at three portions that are respectively located under two end portions of the jig leg portion and under the lower jig frame, and arrangement positions of the supporting parts provided at the three portions form a substantially triangular shape when seen from above. | 09-19-2013 |
Nobuhiro Ozu, Tokyo JP
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20100235779 | ELECTRONIC MAP APPARATUS AND ELECTRONIC MAP DISPLAY METHOD - In an electronic map apparatus, an electronic map is displayed in accordance with map data read out from a DVD-ROM. Then, distance display circles which have a common center located at a point on the electronic map and each interconnect points on the electronic map at equal geographical distances from the point are drawn. | 09-16-2010 |
20130050518 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, AND INFORMATION PROCESSING METHOD - An information processing apparatus includes: an image receiving unit receiving an image series from a remote control apparatus, the remote control apparatus including a camera unit enabling continuous-shooting, the remote control apparatus being capable of sending the image series to an information processing apparatus via a wireless medium, the image series being obtained by continuous-shooting by the camera unit; a display unit having a display screen; a display controller displaying the received image series on the display screen in series; an image storing unit selecting, in response to a first control signal sent from the remote control apparatus via a wireless medium, a store-target image from the displayed image series, and storing the store-target image; and a content obtaining unit obtaining display-dedicated content. The display controller simultaneously displays the obtained display-dedicated content and the received image series on the display screen of the display unit. | 02-28-2013 |
20140218326 | TRANSMITTING DEVICE, DISPLAY CONTROL DEVICE, CONTENT TRANSMITTING METHOD, RECORDING MEDIUM, AND PROGRAM - An apparatus includes a transmitter configured to transmit content and a point of interest indicator to a second device. The content and the point of interest indicator are selected by a user of the first device using a single action. The point of interest indicator identifies a portion of the content to be highlighted by the second device. | 08-07-2014 |
Shotaro Ozu, Toyokawa-Shi JP
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20120318164 | BOGIE FRAME FOR RAILROAD VEHICLE - In a bogie frame, a lateral beam disposed in the left-right direction which is the direction in which the rail ties extend is joined to left and right side beams arranged so as to extend in the front-rear direction which is the direction in which the rails extend. The lateral beam has a flat shape having a width in the front-rear direction greater than the thickness thereof in the top-bottom direction, and the lateral beam is provided with left and right joining sections joined to the side beams, and also with an intermediate section sandwiched between the left and right joining sections. The width of the intermediate section in the front-rear direction is greater than the width of the joining sections in the front-rear direction. A through-hole is formed in the intermediate section. | 12-20-2012 |
Takuya Ozu, Mie JP
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20090158592 | Method for Assembling Roller Bearing - A method for assembling a roller bearing having rollers and spacers interposed between the adjacent rollers includes: alternately disposing, along the inner circumference of an outer ring ( | 06-25-2009 |
20090245708 | Roller Bearing - [PROBLEMS] A roller bearing is provided which has spacers interposed between rollers. During operation of the bearing, the spacer is prevented from being pressed by adjacent rollers against an inner ring or inner ring, so that heat generation and wear of the spacers at a guiding surface are reduced. | 10-01-2009 |
20090252448 | Roller bearing - A roller bearing having spacers interposed between its rollers is provided, which has a high permissible rotational speed which is achieved by allowing a lubricant to flow smoothly around rolling surfaces so that the stirring resistance of the lubricant due to the spacers is reduced. | 10-08-2009 |
Toshihisa Ozu, Amagasaki City JP
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20120190208 | PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD - Uniformity of a plasma process on a surface of a substrate is to be improved. In a plasma processing apparatus that processes a substrate by generating plasma from a processing gas introduced in a processing container, a ratio between an introducing amount of the processing gas introduced to a center portion of the substrate received in the processing container and an introducing amount of the processing gas introduced to a peripheral portion of the substrate received in the processing container is changed during a plasma process. Accordingly, a variation in an etching rate or the like between the center portion and the peripheral portion of the substrate may be reduced. Therefore, uniformity of the plasma process on the surface of the substrate is improved. | 07-26-2012 |
20140262025 | PLASMA PROCESSING APPARATUS AND PLASMA ETCHING APPARATUS - Uniformity of a plasma process on a surface of a substrate is to be improved. In a plasma processing apparatus that processes a substrate by generating plasma from a processing gas introduced in a processing container, a ratio between an introducing amount of the processing gas introduced to a center portion of the substrate received in the processing container and an introducing amount of the processing gas introduced to a peripheral portion of the substrate received in the processing container is changed during a plasma process. Accordingly, a variation in an etching rate or the like between the center portion and the peripheral portion of the substrate may be reduced. Therefore, uniformity of the plasma process on the surface of the substrate is improved. | 09-18-2014 |
Toshihisa Ozu, Hyogo JP
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20110266257 | PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS - A plasma etching method uses a plasma etching apparatus including a process chamber, a susceptor, a microwave supplying portion, a gas supplying portion, an evacuation apparatus, a bias electric power supplying portion that supplies alternating bias electric power to the susceptor, and a bias electric power control portion that controls the alternating bias electric power, wherein the bias electric power control portion controls the alternating bias electric power so that supplying and disconnecting the alternating bias electric power to the susceptor are alternately repeated to allow a ratio of a time period of supplying the alternating bias electric power with respect to a total time period of supplying the alternating bias electric power and disconnecting the alternating bias electric power to be 0.1 or more and 0.5 or less. | 11-03-2011 |
20140231017 | PLASMA ETCHING APPARATUS - A plasma etching apparatus includes a process chamber, a susceptor, microwave permeable plate that is made of a dielectric material that allows microwaves to pass therethrough, a microwave supplying portion including a microwave generation apparatus that generates microwaves of a predetermined frequency, a gas supplying portion for supplying a process gas, an evacuation portion, a bias electric power supplying portion; and an alternating bias electric power control portion that controls the alternating bias electric power, wherein the alternating bias electric power control portion controls the alternating bias electric power so that supplying and disconnecting the alternating bias electric power to the susceptor are repeated to allow a ratio of a time period of supplying the alternating bias electric power with respect to a total time period of supplying the alternating bias electric power and disconnecting the alternating bias electric power to be 0.1 or more and 0.5 or less. | 08-21-2014 |
Toshihisa Ozu, Miyagi JP
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20130102157 | ETCHING METHOD AND DEVICE - An etching method can prevent adverse effects of oxygen plasma from arising under an insulating film when etching the insulating film formed on a substrate. The etching method includes: a first etching step for exposing the insulating film to processing gas that has been turned into a plasma to etch the insulating film to a portion in the thickness direction; a deposition material removing step for exposing the insulating film remaining after completion of the first etching to oxygen plasma to remove deposition material deposited on the surface of the remaining insulating film; and a second etching of exposing the remaining insulating film to processing gas that has been turned into a plasma to etch the remaining insulating film. | 04-25-2013 |
Toshihisa Ozu, Hwaseong-City KR
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20150017811 | METHOD FOR PROCESSING BASE BODY TO BE PROCESSED - An exemplary embodiment provides a method which etches a second layer in a base body to be processed having a first layer containing Ni and Si and a second layer containing Si and N which are exposed to a surface thereof. The method according to the exemplary embodiment includes (a) preparing a base body to be processed in a processing chamber, and (b) supplying a first processing gas which contains carbon and fluorine but does not contain oxygen into the processing chamber and generating plasma in the processing chamber. | 01-15-2015 |
Toshihisa Ozu, Hwaseong-Si KR
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20150056773 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes exciting a processing gas containing a HBr gas and a Cl | 02-26-2015 |
Toshihisa Ozu, Sendai JP
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20120064726 | PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - There is provided a plasma etching apparatus provided for performing an etching in a desirable shape. The plasma etching apparatus includes a processing chamber | 03-15-2012 |
20130071955 | PLASMA ETCHING METHOD - A method for processing a substrate to form a desired pattern by an etching process after forming a mask pattern over the substrate includes the steps of: forming two layers over the substrate; measuring a width of the mask pattern or an etched pattern of one of the two layers; and adjusting a flow rate of any one of HBr and other gases, used in the etching process, based on the measured width. The two layers may include a silicon nitride layer and an organic dielectric layer. | 03-21-2013 |
Toshihisa Ozu, Hwaseong-Shi KR
Patent application number | Description | Published |
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20150096882 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus | 04-09-2015 |