Patent application number | Description | Published |
20110090478 | Lens barrel support device and maskless exposure apparatus having the same - Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough. | 04-21-2011 |
20110134409 | Actuator, stage device, and exposure apparatus - An actuator according to example embodiments may be relatively compact and may be driven with 2 degrees of freedom with less spatial constraints. The actuator may include a base member, a ball screw member including a ball screw coupled to the base member and a ball nut screwed onto the ball screw, a driving member coupled to the ball nut so as to move in conjunction with the ball nut, a first directional displacement member configured to move in a first direction in response to a first movement of the driving member, a wedge member coupled to the driving member so as to be moved in a second direction in response to a second movement of the driving member, a second directional displacement member configured to move in a second direction in conjunction with the wedge member, and a binding member configured to bind the first directional displacement member to at least one of the driving member, the wedge member, and the base member. | 06-09-2011 |
20110149297 | Maskless exposure apparatus and multi-head alignment method thereof - Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams. | 06-23-2011 |
20110149301 | Beam position measuring apparatus and method - A beam position measuring apparatus and method using a beam expansion device may expand areas of beams irradiated onto a beam detection sensor. The beam expansion device is configured to expand areas of the beams onto the beam detection sensor is installed between a beam generator and the beam detection sensor. Central positions of the irradiated beams are detected using intensities of beams irradiated onto respective pixels of the beam detection sensor. | 06-23-2011 |
20110157569 | Maskless exposure apparatus and control method thereof - Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system. | 06-30-2011 |
20120099101 | Gantry Apparatus - A gantry apparatus includes a structure to couple and support an optical system has enhanced rigidity, which minimizes deformation of the structure even if a plurality of optical systems is coupled to the structure. The gantry apparatus includes an optical system, a drive device to drive the optical system, and a structure to couple and support the drive device. The structure includes a plurality of first plates arranged parallel to one another, and a plurality of second plates intersecting the plurality of first plates to define receptive corridors, each of which receives the drive device. | 04-26-2012 |
20130016361 | STAGE APPARATUSAANM Park; Sang WookAACI Suwon-siAACO KRAAGP Park; Sang Wook Suwon-si KRAANM Jang; In BaeAACI SeoulAACO KRAAGP Jang; In Bae Seoul KRAANM Jang; Sang DonAACI Suwon-siAACO KRAAGP Jang; Sang Don Suwon-si KRAANM Kim; Oui SergAACI Seongnam-siAACO KRAAGP Kim; Oui Serg Seongnam-si KR - The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable mirror disposed on the stage to reflect light, which is introduced from the interferometer, toward the fixed mirror, and to reflect the light, which is received after being reflected by the fixed mirror, to the interferometer. | 01-17-2013 |
20140076105 | GANTRY APPARATUS - A gantry apparatus includes a structure to couple and support an optical system has enhanced rigidity, which minimizes deformation of the structure even if a plurality of optical systems is coupled to the structure. The gantry apparatus includes an optical system, a drive device to drive the optical system, and a structure to couple and support the drive device. The structure includes a plurality of first plates arranged parallel to one another, and a plurality of second plates intersecting the plurality of first plates to define receptive corridors, each of which receives the drive device. | 03-20-2014 |
20140268171 | STAGE DEVICE AND DRIVING METHOD THEREOF - A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first X-axis interferometer disposed on the stage that is configured to measure an X-axis location of the stage using the X-axis interference reflector, and an optical movable element spaced apart from the stage in the Y-axis direction that is configured to shift in the X-axis direction a path of a light beam propagating in the Y-axis direction according to movement of the stage in the X-axis direction. | 09-18-2014 |
Patent application number | Description | Published |
20100195065 | Exposure apparatuses - An exposure apparatus may include a light source generating light; a hologram mask, on which a hologram pattern is formed; and an optical unit movably disposed on the hologram mask to guide the light generated from the light source to the hologram mask. An exposure apparatus may include a light source generating light; a hologram mask, on which a hologram pattern is formed; a prism, separated from the hologram mask, such that one surface of the prism is disposed opposite the hologram mask; and a water supply device to supply water to a space between the prism and the hologram mask. | 08-05-2010 |
20100208226 | Holographic exposure apparatuses - A holographic exposure apparatus may include an object to be exposed, a holographic mask on which a pattern to be transferred onto the object is formed, a stage to support the mask, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the stage. A holographic exposure apparatus also may include an object to be exposed, a mask spaced apart from the object, a holder that holds the mask, and a stage on which the holder is movably mounted such that a gap between the mask and object is adjusted. In addition, a holographic exposure apparatus may include a stage, a prism supported by the stage, a mask spaced apart from the prism and supported by the stage, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the prism. | 08-19-2010 |
20100208316 | Holographic exposure apparatuses - A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a driving unit disposed between the body and mask stage. A holographic exposure apparatus may include an object supported by a substrate stage, a holographic mask spaced apart from the object and supported by a mask stage, a main body supported by the mask stage, and a driving unit disposed between the mask stage and body to control a gap between the mask stage and body. A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a piezoelectric element disposed between the body and mask stage. The body may include a support arm that supports the element. The mask stage may include a seat arm that supports the element. | 08-19-2010 |