| Patent application number | Description | Published |
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| 20080295635 | BICYCLE CONTROL DEVICE - A bicycle control device is basically provided with a base member, a shift control unit, a non-shift operating lever, a first shift operating lever and a second shift operating lever. The shift control unit is mounted to the base member. The non-shift operating lever is movably coupled relative to the base member. The first and second shift operating levers are operatively coupled to the shift control unit. The second shift operating lever is a separate member from the first shift operating lever. The first and second shift operating levers are configured and arranged relative to each other such that the second shift operating lever is moved by the first shift operating lever when the first shift operating lever is operated. | 12-04-2008 |
| 20110154939 | GEAR SHIFT OPERATING DEVICE - A bicycle gear shift operating device is a device configured to be mounted to a handlebar. The bicycle gear shift operating device includes at least one operating lever, a support member that supports the operating member and a mounting member that supports the support member on a handlebar. The mounting member has a mounting portion configured to be attached to the handlebar and a fastening portion that is configured to fasten the support member. The mounting member is configured to be selectively fasten the support member in either a first mounting orientation in which the fastening portion is offset in a first axial direction of the handlebar from the middle portion or a second mounting orientation in which the support member is offset in a second axial direction that is opposite the first axial direction. | 06-30-2011 |
| 20130081508 | BICYCLE CONTROL CABLE - A bicycle control cable is provided with a central wire and a radial protrusion. The central wire includes at least one metallic strand defining a radially outermost surface of the central wire. The radial protrusion extends along the radially outermost surface in a direction intersecting with a center longitudinal axis of the central wire. The radial protrusion reduces a sliding resistance of the central wire. The central wire and the radial protrusion are configured and arranged to slidably move in an axial direction with respect to the center longitudinal axis of the central wire within an outer case to operate a bicycle component. | 04-04-2013 |
| 20130081509 | BICYCLE CONTROL CABLE - A bicycle control cable is provided with a central wire, an outer case and a radial protrusion. The central wire includes at least one metallic strand defining a radially outermost surface of the central wire. The outer case surrounds at least a portion of an axial length of the central wire. The outer case has a radially innermost surface. The radial protrusion spirally extends along one of either the radially outermost surface of the central wire or the radially innermost surface of the outer case in a direction intersecting with a center longitudinal axis of the bicycle control cable. The radial protrusion reduces a sliding resistance of the central wire relative to the outer case. The central wire is configured and arranged to slidably move in an axial direction with respect to the center longitudinal axis of the bicycle control cable within the outer case to operate a bicycle component, | 04-04-2013 |
| 20130087008 | SLIDING CABLE AND CONTROL CABLE - A sliding cable is provided that basically includes a cable main body and a mesh structural body. The cable main body is made of a plurality of steel wires bundled together. The mesh structural body is arranged on an outer surface of the cable main body. | 04-11-2013 |
| Patent application number | Description | Published |
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| 20080201091 | Sample electrification measurement method and charged particle beam apparatus - The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. | 08-21-2008 |
| 20080237463 | Monochromator and scanning electron microscope using the same - An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope. | 10-02-2008 |
| 20090008551 | Electron beam apparatus with aberration corrector - An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other. | 01-08-2009 |
| 20090065694 | Scanning electron microscope - An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam. | 03-12-2009 |
| 20090152462 | Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method - It is an object of the present invention to improve the stability of a gas field ionization ion source. | 06-18-2009 |
| 20100044565 | SCANNING ELECTRON MICROSCOPE HAVING A MONOCHROMATOR - A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron beam entering the monochromator and a first astigmatism correcting lens for correcting astigmatism of the electron beam entering the monochromator. The microscope further includes a means of obtaining an image of an electron-beam adjustment sample disposed where the electron beam in the monochromator is focused, and based on the obtained image, driving the first focusing lens and the first astigmatism correcting lens so that the focusing and astigmatism of the electron beam entering the monochromator are adjusted. | 02-25-2010 |
| 20100294929 | Sample Electrification Measurement Method and Charged Particle Beam Apparatus - The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations. | 11-25-2010 |
| 20120097863 | ION MICROSCOPE - Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. | 04-26-2012 |
| 20120217391 | CHARGED PARTICLE MICROSCOPE - The charged particle beam microscope is configured of: a gas field ionization ion source ( | 08-30-2012 |
| 20130087704 | GAS FIELD IONIZATION ION SOURCE, SCANNING CHARGED PARTICLE MICROSCOPE, OPTICAL AXIS ADJUSTMENT METHOD AND SPECIMEN OBSERVATION METHOD - A gas field ionization ion source (GFIS) is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. It may be possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it may be possible to reduce the physical vibration of the cooling means. Consequently, it may be possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS. | 04-11-2013 |
| 20130119252 | GAS FIELD ION SOURCE AND METHOD FOR USING SAME, ION BEAM DEVICE, AND EMITTER TIP AND METHOD FOR MANUFACTURING SAME - To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more. | 05-16-2013 |
| 20130126731 | Charged Particle Microscope and Ion Microscope - In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ion source of a charged particle microscope is equipped with a vacuum chamber in which are provided a vacuum chamber evacuation mechanism, an acicular emitter tip, an extraction electrode disposed facing the emitter tip, and a mechanism for supplying a gas to the vicinity of the emitter tip, and is configured so that the gas in the region around the tip of acicular ion emitter is ionized and extracted as an ion beam. Therein, the evacuation mechanism and the gas supply mechanism are connected, and a material for adhering the gas to be ionized is disposed between the evacuation mechanism and the gas supply mechanism. | 05-23-2013 |
| Patent application number | Description | Published |
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| 20140124664 | DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM - A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed. | 05-08-2014 |
| 20140197336 | ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE - The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares. | 07-17-2014 |
| 20140264018 | OBSERVATION SPECIMEN FOR USE IN ELECTRON MICROSCOPY, ELECTRON MICROSCOPY, ELECTRON MICROSCOPE, AND DEVICE FOR PRODUCING OBSERVATION SPECIMEN - The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample. | 09-18-2014 |
| 20140299768 | ION SOURCE AND ION BEAM DEVICE USING SAME - Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament. | 10-09-2014 |
| 20150048247 | SCANNING ION MICROSCOPE AND SECONDARY PARTICLE CONTROL METHOD - The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image. | 02-19-2015 |
| 20150060654 | CHARGED PARTICLE BEAM DEVICE AND ARITHMETIC DEVICE - It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value. | 03-05-2015 |
| 20150083930 | CHARGED PARTICLE MICROSCOPE - The ionized gas supplied to the emitter tip of a gas field ionization ion source is cooled and purified to enable supplying a reliable and stable ion beam. Impurities contained in the ionized gas destabilize the field ionization ion source. The invention is configured to include a first heat exchanger thermally connected to a part of the field ionization ion source, a cryocooler capable of cooling a second gas line and a cold head, the second gas line being connected to the first heat exchanger and circulating a refrigerant, and a second heat exchanger that cools the first and second gas lines and is connected to the cold head. | 03-26-2015 |
