Patent application number | Description | Published |
20080285164 | Light Reflecting Board - A technology for preventing cracks from occurring in a light reflector plate fabricated by forming a synthetic resin reflector plate into a three-dimensional shape and effectively preventing deformation of this light reflector plate is provided. | 11-20-2008 |
20090195880 | LIGHT REFLECTION PLATE - A three-dimensional light reflection plate that can successfully prevent deformation of the light reflection plate, reduce initial cost and product cost, and facilitate increase in size and reflectance. The light reflection plate includes a bottom plate in which a plurality of mutually parallel slit holes are formed on a flat, light-reflective plate material and a mountain plate that is rectangular from a planar view of which a width direction cross-sectional shape is a mountain shape and in which insertion sections are formed in both width-direction end sections. The mountain plate is fixed to the bottom plate by the insertion sections of the mountain plate being inserted into the slit holes of the bottom plate. | 08-06-2009 |
20090231842 | LIGHT REFLECTOR AND PLANAR LIGHT SOURCE - A light reflector and a planar light source achieving high average luminance and little luminance unevenness are provided. | 09-17-2009 |
20090231843 | PLANAR LIGHT SOURCE - A planar light source achieving high average luminance and little luminance unevenness is provided. | 09-17-2009 |
20090280415 | TRANSPARENT SUBSTRATE FOR MASK BLANK AND MASK BLANK - In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate. | 11-12-2009 |
20100173232 | MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLANK TRANSPARENT SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD - A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates. | 07-08-2010 |
20100300198 | OMNIDIRECTIONAL RAIN GAUGE - An Omnidirectional rain gauge measures an azimuth and zenith direction of flying rainwater. The Omnidirectional rain gauge includes catchment and measurement units. The catchment unit has a plural conical cylinders having individually different heights, and being overlaid so that bottom vertexes of the plural conical cylinders coincide with or come close to each other. The overlaid plural conical cylinders are partitioned by partitions, arranged radially in a plurality of horizontal azimuth directions, to form a plurality of catchment cells. Each of the plurality of partitions is shaped as semicircle following a virtual spherical outer circumference. Diameter of each of top opening parts opposite to the bottom vertexes, of the overlaid plural conical cylinders is sized to follow virtual spherical outer circumference. The measurement unit, by the rainwater caught by each of the plurality of catchment cells of the catchment unit dropping in a drop of water of a certain weight, detects the number of the dropping drops of water with respect to each of the plurality of catchment cells, and determines the amount of the rainwater caught by each of catchment cells on the basis of the total detected number of the drops of water. | 12-02-2010 |
20110262847 | MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLANK TRANSPARENT SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD - A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates. | 10-27-2011 |
20120125855 | METHOD FOR TREATING LIQUID CONTAINING PERCHLORATE ION - The present invention provides a novel and practical method for treating a perchlorate ion-containing liquid. The perchlorate ion-containing liquid is brought into contact with a weak base anion exchange resin, so that perchlorate ions are adsorbed to the weak base anion exchange resin, and then an acid is brought into contact with the resin, so as to remove the perchlorate ions from the weak base anion exchange resin to which the perchlorate ions are adsorbed. This makes it possible to repeatedly use the weak base anion exchange resin. | 05-24-2012 |