Okumura, Hyogo
Akihisa Okumura, Hyogo JP
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20100260652 | Catalyst for the removal of nitrogen oxides and method for the removal of nitrogen oxides with the same - The present invention provides a catalyst which can sufficiently remove nitrogen oxides in an exhaust gas. The catalyst for removing nitrogen oxides to achieve an object of the present invention includes a monolithic support which is coated with a lower layer containing a catalytic component A comprising cerium oxide and an upper layer containing a catalytic component B comprising at least one kind of metal selected from a group consisting of copper, manganese, iron, cobalt and nickel or a compound thereof, and zeolite. | 10-14-2010 |
20110200504 | EXHAUST GAS PURIFYING CATALYST AND METHOD FOR PURIFYING EXHAUST GAS USING THE CATALYST - A catalyst for exhaust gas purification of the present invention contains the thin-plate-like ceria (CeO | 08-18-2011 |
20110200506 | EXHAUST GAS PURIFYING CATALYST AND PURIFICATION METHOD USING SAME - A catalyst for the purification of exhaust gas that can be used to highly efficiently treat an exhaust gas which has moisture and fluctuates between an oxidizing atmosphere and a reducing atmosphere even after the catalyst is exposed to a high temperature is provided. The present invention relates to a catalyst for the purification of exhaust gas having a catalyst layer of catalyst components comprising a noble metal, magnesium oxide, and a refractory inorganic oxide formed on a three-dimensional structure, wherein the catalyst layer has two peaks originated from the magnesium oxide in a pore distribution obtained by mercury intrusion technique. | 08-18-2011 |
Arimichi Okumura, Hyogo JP
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20080199500 | Method for the Production of Resin Particles - Resin particles are produced by adding a liquid material having a boiling point of 100° C. or higher to an aqueous dispersion of resin particles to yield a mixture, recovering a wet cake from the mixture by filtration, and drying the wet cake. A water-soluble material is preferably used as the liquid material. The liquid material may also be at least one compound selected from compounds listed in The Japanese Standards of Cosmetic Ingredients, The Japanese Cosmetic Ingredients Codex, The Pharmacopoeia of Japan, and The Japan's Specifications and Standards for Food Additives. According to this method, there are provided resin particles which are resistant to coagulation upon drying and are satisfactorily dispersible in other materials. | 08-21-2008 |
20110027717 | PHOTORESIST COMPOSITION - A photoresist composition contains a polyol compound and a vinyl ether compound, which polyol compound having an aliphatic group and an aromatic group bound alternately, and which aromatic group has an aromatic ring and two or more hydroxyl groups on the aromatic ring. The polyol compound can be prepared, for example, through an acid-catalyzed reaction, such as a Friedel-Crafts reaction, between an aliphatic polyol and an aromatic polyol. The aliphatic polyol is preferably an alicyclic polyol, whereas the aromatic polyol is preferably hydroquinone. | 02-03-2011 |
20110027725 | POLYOL COMPOUND FOR PHOTORESIST - A polyol compound for photoresists has at least one aliphatic group and at least one aromatic group bound to each other alternately, in which the aromatic group has at least one aromatic ring and two or more hydroxyl groups bound to the aromatic ring. The polyol compound for photoresists can be prepared through an acid-catalyzed reaction, such as a Friedel-Crafts reaction, between an aliphatic polyol and an aromatic polyol. The aliphatic polyol is preferably an alicyclic polyol. The aromatic polyol is preferably hydroquinone. | 02-03-2011 |
20110027726 | POLYMER COMPOUND FOR PHOTORESIST - A polymer compound for photoresists contains alkali-soluble groups being protected by protecting groups capable of leaving with an acid, and is thereby insoluble or sparingly soluble in an alkaline developer, in which part or all of the protecting groups are multifunctional protecting groups each protecting two or more alkali-soluble groups. The alkali-soluble groups may be phenolic hydroxyl groups. The polymer compound may correspond to a polyol compound having an aliphatic group and an aromatic group bound to each other alternately, the aromatic group having an aromatic ring and two or more hydroxyl groups bound to the aromatic ring, except with phenolic hydroxyl groups of the polyol compound being protected by protecting groups capable of leaving with an acid. | 02-03-2011 |
20110040056 | PROCESS FOR PRODUCTION OF POLYMER - Disclosed is a process for the production of a polymer by polymerizing a monomer or monomers in a solvent to give a polymer solution; and bringing the polymer solution into contact with a poor solvent to precipitate the polymer and to remove impurities therefrom, in which the polymer solution is diluted with a solvent before being brought into contact with the poor solvent to precipitate the polymer. The polymerization solvent preferably has a coefficient of viscosity at 20° C. of 1 mPa·s or more. The dilution solvent preferably has a coefficient of viscosity at 20° C. of less than 1 mPa·s. The process enables efficient production of a polymer with good reproducibility in quality, which polymer contains less amounts of residual monomers and is useful as resist polymers, polymers for undercoat films of multilayer resists, polymers for anti-reflection coatings, and polymers for immersion topcoats. | 02-17-2011 |
20110065044 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME - A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R | 03-17-2011 |
Shunsuke Okumura, Hyogo JP
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20130223137 | LOW-VOLTAGE SEMICONDUCTOR MEMORY - Provided is memory which is capable of dynamically changing memory cell bit reliability and of switching the operating mode so as to accommodate process variations, thereby reducing the operating voltage. The memory is provided with a mode control line selection circuit for dividing mode control lines in to word units and using control line selection signals and global control signals to control the mode control lines divided into word units, and a word line selection circuit for dividing the word lines that control the conduction of switching unit into word units and using word line selection signals and global word signals to control the word lines divided into word units. The mode control line switching circuit is used to switch between a 1 bit/1 cell mode and a 1 bit/n cell mode in word units. | 08-29-2013 |
Yasuo Okumura, Hyogo JP
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20080317979 | Laser Weldable Label and Shaped Composite Article Therewith - The laser-transmissive welding label of the present invention is a resin label which comprises at least a resin layer and is affixable to a resin shaped article by a laser welding, wherein the resin layer has a light-scattering property, and the transmittance of the resin layer relative to a laser beam having an oscillation wavelength within the range of 740 to 1100 nm is not less than 20%, and the total light transmittance of the resin layer relative to a visible light (in accordance with ASTM D1003) is not more than 50%. The resin layer may comprise a thermoplastic resin which may have a compatibility with a resin for the resin shaped article. The label may be able to mask the resin shaped article, or may be colored with a coloring agent. A shaped composite article (e.g., a toner cartridge) may be formed by bonding the label to the resin shaped article with use of the laser welding. The present invention provides the resin label which is affixable to the resin shaped article in an easy and simple way, without an adhesive. | 12-25-2008 |
Yoichi Okumura, Hyogo JP
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20150013540 | SYSTEM AND PROCESS FOR TREATING AN ANAEROBICALLY-PROCESSED LIQUID - A system for treating an anaerobically-processed liquid, comprising: a solid-liquid separator provided with a filter submerged in the anaerobically-processed liquid; a gas-liquid separator retaining a filtrate passed through the filter, and having a gas-phase part which contains a gas and is positioned over the filtrate; a filtrate-flow passage connected to a filtrate discharge side of the filter and the gas-phase part of the gas-liquid separator; and a first gas-flow passage connected to the gas-phase part of the gas-liquid separator, and equipped with a depressurization means for depressurizing the gas-phase part. | 01-15-2015 |