Patent application number | Description | Published |
20080237793 | Semiconductor device having projection on lower electrode and method for forming the same - A method of forming a semiconductor device, includes forming a lower electrode including a metal and a nitrogen on a semiconductor substrate, irradiating a reducing gas to a surface of the lower electrode, and irradiating a gas containing silicon to the surface of the lower electrode to form a projection containing silicide by reacting the metal with the silicon in an island shape on the surface of the lower electrode. Then, a capacitor film is formed on the lower electrode and the projection, and an upper electrode is formed on the capacitor film. | 10-02-2008 |
20110171775 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming a first insulating film over an underlying film by plasma polymerization of cyclic siloxane, and forming a second insulating film on the first insulating film by plasma polymerization of the cyclic siloxane continuously, after forming the first insulating film. The deposition rate of the first insulating film is slower than the deposition rate of the second insulating film. | 07-14-2011 |
20110318900 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device including: a substrate; an insulating film formed over the substrate; a copper interconnect, having a plurality of hillocks formed over the surface thereof, buried in the insulating film; a first insulating interlayer formed over the insulating film and the copper interconnect; a second insulating interlayer formed over the first insulating interlayer; and an electroconductive layer formed over the second insulating interlayer, wherein the top surface of at least one hillock highest of all hillocks is brought into contact with the lower surface of the second insulating interlayer is provided. | 12-29-2011 |
20120181694 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - The semiconductor device includes an interlayer insulating film, a wiring provided in the interlayer insulating film, and a SiN film provided over the interlayer insulating film and over the wiring. The peak positions of Si—N bonds of the SiN film, which are measured by FTIR, are within the range of 845 cm | 07-19-2012 |
Patent application number | Description | Published |
20100029085 | CLEANING COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE - A cleaning composition of a semiconductor device for laminating an organosiloxane-based thin film and a photoresist layer in this order on a substrate having a low dielectric interlayer insulation film and a copper wiring or a copper alloy wiring, then applying selective exposure and development treatments to the subject photoresist layer to form a photoresist pattern, subsequently applying a dry etching treatment to the organosiloxane-based thin film and the low dielectric interlayer insulation film while using this resist pattern as a mask and then removing the organosiloxane-based thin film, a residue generated by the dry etching treatment, a modified photoresist having been modified by the dry etching treatment and an unmodified photoresist layer located in a lower layer than the modified photoresist, the cleaning composition containing from 15 to 20% by mass of hydrogen peroxide, from 0.0001 to 0.003% by mass of an amino polymethylene phosphonic acid, from 0.02 to 0.5% by mass of potassium hydroxide and water and having a pH of from 7.5 to 8.5, is provided. Also, a method for manufacturing a semiconductor device using the subject cleaning composition is provided. | 02-04-2010 |
20100051066 | COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD - A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a residue of the present invention, in manufacturing a wiring board, residues remaining after dry etching which are derived from a resist or metals can be effectively removed without corroding titanium or titanium alloys with high corrosiveness. In particular, a semiconductor device using a wiring board containing titanium or titanium alloys can be efficiently manufactured. | 03-04-2010 |
20120135604 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF FINE METAL STRUCTURE, AND METHOD FOR PRODUCING FINE METAL STRUCTURE USING SAME - There are provided a processing liquid that is capable of suppressing pattern collapse of a fine metal structure, such as a semiconductor device and a micromachine, and a method for producing a fine metal structure using the same. The processing liquid for suppressing pattern collapse of a fine metal structure, contains a phosphate ester and/or a polyoxyalkylene ether phosphate ester, and the method for producing a fine metal structure, uses the same. | 05-31-2012 |
20120181249 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF FINE METAL STRUCTURE AND METHOD FOR PRODUCING FINE METAL STRUCTURE USING SAME - There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same. | 07-19-2012 |
20120205345 | TREATMENT SOLUTION FOR PREVENTING PATTERN COLLAPSE IN METAL FINE STRUCTURE BODY, AND PROCESS FOR PRODUCTION OF METAL FINE STRUCTURE BODY USING SAME - There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing a pattern collapse suppressing agent that has a hydrocarbyl group containing any one of an alkyl group and an alkenyl group, both of which may be substituted partly or entirely by a fluorine atom, and contains an oxyethylene structure, and a method for producing a fine metal structure using the same. | 08-16-2012 |
20120214722 | TREATMENT SOLUTION FOR PREVENTING PATTERN COLLAPSE IN METAL FINE STRUCTURE BODY, AND PROCESS FOR PRODUCTION OF METAL FINE STRUCTURE BODY USING SAME - There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from the group consisting of an ammonium halide having a fluoroalkyl group, a betaine compound having a fluoroalkyl group, and an amine oxide compound having a fluoroalkyl group, and a method for producing a fine metal structure using the same. | 08-23-2012 |
Patent application number | Description | Published |
20100216315 | ETCHING COMPOSITION FOR METAL MATERIAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME - The invention provides an etchant composition employed for selectively etching a metallic material in production of a semiconductor device from an insulating material having high dielectric constant, an insulating material of silicon oxide film or silicon nitride film, and a metallic material, characterized in that the etchant composition is an aqueous solution containing a fluorine compound, and a chelating agent having, in the molecular structure thereof, a phosphorus oxo-acid as a functional group; or is an aqueous solution containing a fluorine compound, a chelating agent having, in the molecular structure thereof, a phosphorus oxo-acid as a functional group, and an inorganic acid and/or an organic acid. The invention also provides a method for producing a semiconductor device employing the etchant composition. According to the invention, a metallic material can be etched selectively and efficiently. | 08-26-2010 |
20130161284 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID - There are provided a processing liquid for suppressing pattern collapse of a microstructure formed of silicon oxide which includes at least one compound selected from the group consisting of a fluoroalkyl group-containing ammonium halide, a fluoroalkyl group-containing betaine compound and a fluoroalkyl group-containing amine oxide compound, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid. | 06-27-2013 |
20130165365 | TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID - There are provided a processing liquid for suppressing pattern collapse of a microstructure which includes at least one compound selected from the group consisting of an imidazolium halide containing an alkyl group having 12, 14 or 16 carbon atoms, a pyridinium halide containing an alkyl group having 14 or 16 carbon atoms and an ammonium halide containing an alkyl group having 16 or 18 carbon atoms, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid. | 06-27-2013 |
20130171828 | PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME - There are provided a processing liquid for suppressing pattern collapse of a microstructure formed of polysilicon which includes at least one compound selected from the group consisting of pyridinium halides containing an alkyl group having 12, 14 or 16 carbon atoms, and water; and a method for producing a microstructure using the processing liquid. | 07-04-2013 |
20150152366 | CLEANING LIQUID COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT - [Problems to be Solved] The object is to provide a cleaning liquid composition, which suppresses damage to a low-dielectric constant interlayer dielectric film, a wiring material, such as copper or a copper alloy, a barrier metal, and a barrier dielectric film and removes an organosiloxane thin film, a dry etching residue and a photoresist on a treatment target surface in a process for producing a semiconductor device, as well as a cleaning method for a semiconductor device using the same, and a production process for a semiconductor device using the same. | 06-04-2015 |
20150210966 | CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USING SAME - By cleaning with use of a cleaning liquid that contains 10-30% by mass of hydrogen peroxide, 0.005-10% by mass of a quaternary ammonium hydroxide, 0.005-5% by mass of potassium hydroxide, 0.000005-0.005% by mass of an amino polymethylene phosphonic acid and water, a hard mask, an organosiloxane-based thin film, dry etching residue and a photoresist can be removed without corroding a low-dielectric-constant interlayer dielectric film, a wiring material such as copper or an copper alloy, a barrier metal and a barrier dielectric film. According to preferred embodiments of the present invention, damage to copper wiring lines is suppressed even in cases where an acid is added into the cleaning liquid and significant decomposition of hydrogen peroxide is not caused even in cases where titanium is added into the cleaning liquid. | 07-30-2015 |
Patent application number | Description | Published |
20150028697 | LINEAR MOTOR - A linear motor includes a stator and an armature that faces the stator with a gap therebetween. The stator has an elongated shape extending so as to cross a direction in which the stator faces the armature, and includes a plurality of salient poles that are arranged along a longitudinal direction of the stator and protrude toward the armature. The armature includes an armature core including a tooth that protrudes toward the stator, an armature winding wound around the tooth, a plurality of permanent magnets disposed on an end side of the tooth so as to be arranged along the longitudinal direction of the stator, and a magnetic-field sensor that detects a magnetic field which is generated by the plurality of permanent magnets and which passes through the plurality of salient poles. | 01-29-2015 |
20160087515 | LINEAR-ROTARY ACTUATOR - A linear-rotary actuator includes a rotor and a stator. The rotor includes an output shaft, and makes a linear motion in an axial direction of the output shaft and a rotary motion in a circumferential direction of the output shaft. The rotor includes permanent magnets and yokes alternating with each other in the axial direction. Each yoke includes protrusions that protrude toward an outer circumferential side of a radial direction of the output shaft and that are arranged in the circumferential direction. Each protrusion includes overhangs respectively extending toward first and second sides of the axial direction to overlap the permanent magnets in the radial direction. The stator includes a linear motion winding to generate a first magnetic field to cause the rotor to make the linear motion, and a rotary motion winding to generate a second magnetic field to cause the rotor to make the rotary motion. | 03-24-2016 |
20160087516 | LINEAR-ROTARY ACTUATOR - A linear-rotary actuator includes a rotor and a stator. The rotor includes an output shaft, and makes a linear motion in an axial direction and a rotary motion in a circumferential direction. The rotor includes N and S pole portions alternating with each other in the axial direction as seen in the circumferential direction and alternating with each other in the circumferential direction as seen in the axial direction. The stator includes a linear motion winding, a rotary motion winding, and protruding cores. The protruding cores protrude toward an inner circumferential side of a radial direction to be opposed to the rotor. The protruding cores are arranged in the axial direction and in the circumferential direction, and displaced in the axial direction to form a circumferential line skewed relative to a direction in which the rotor makes the rotary motion. | 03-24-2016 |
Patent application number | Description | Published |
20100320847 | LINEAR MOTOR ARMATURE AND LINEAR MOTOR - A linear motor armature includes a plurality of armature core blocks that are linearly connected to each other, each armature core block being formed of a stack of a plurality of armature cores that are substantially I-shaped, each armature core block including teeth portions around which armature coils are wound, the teeth portions being provided in two end portions of the armature core block in a longitudinal direction of the armature core block, and a step portion extending in a direction perpendicular to the longitudinal direction of the armature core block, the step portion being provided at a center of the armature core block and having a width larger than a width of the teeth portions, wherein an attachment hole for fixing each of the plurality of armature core blocks to an external armature attachment plate is formed in each of two side portions of the step portion. | 12-23-2010 |
20110057533 | ROTATING ELECTRICAL MACHINE - This invention provides a rotating electrical machine including a rotor that has an even number of first permanent magnets aligned in a circumferential direction of the rotor, second permanent magnets of a number equal to that of the first permanent magnets, provided respectively between the stator and circumferential ends of the first permanent magnets adjacent to each other in the circumferential direction, and core pieces of a number equal to that of the first permanent magnets, provided respectively between the second permanent magnets adjacent to each other in the circumferential direction. | 03-10-2011 |
20120161551 | RELUCTANCE MOTOR - A reluctance motor according to an aspect of an embodiment includes a stator and a mover. One of the stator and the mover includes a plurality of magnetic poles on which coils are wound. The other of the stator and the mover includes a magnetic segment that includes a directivity member of which the magnetization direction is regulated in a predetermined direction and that is embedded into a non-magnetic holder. | 06-28-2012 |
20120200189 | ROTATING ELECTRICAL MACHINE - A rotating electrical machine includes a rotor core, a stator core, and at least one permanent magnet. The rotor core has an inner circumference portion and an outer circumference portion. The stator core is opposed to the outer circumference portion of the rotor core. The at least one permanent magnet radially extends inside the rotor core. The at least one permanent magnet has an incremental circumferential width in a direction from the inner circumference portion to the outer circumference portion of the rotor core. | 08-09-2012 |
20130106202 | ACTUATOR AND ACTUATOR COOLING METHOD | 05-02-2013 |
20140246939 | MOTOR AND MOTOR SYSTEM - The motor includes: a rotor that includes a rotor core provided with a plurality of permanent magnets in a circumferential direction; and a stator that includes a stator core on which multi-phase stator coils are wound and is arranged facing the rotor with a predetermined air gap therebetween. The rotor has a structure in which the change pattern of magnetic properties of the rotor core or the permanent magnets changes stepwise in the circumferential direction. The stator has a structure in which the distribution pattern of a magnetic field generated by the stator coils with one phase or with a combination of the phases has uniqueness over a whole circumference. | 09-04-2014 |
20140246940 | MOTOR AND MOTOR SYSTEM - A motor includes a rotor including a rotor core provided with a plurality of permanent magnets in the circumferential direction and a stator including a stator core on which multi-phase stator coils are wound. The rotor has a structure in which the change pattern of magnetic properties of the rotor core or the permanent magnets changes in the circumferential direction, and the stator has a structure in which first and second stator coils of the stator coils are wound on the stator core for each phase in such a manner that passage of current is optionally switched, and when the passage of current is switched to the second stator coil, the distribution pattern of a magnetic field formed on the inner circumferential side by the stator has uniqueness over the whole circumference. | 09-04-2014 |
Patent application number | Description | Published |
20130259952 | TIE2 Activator, Vascular Endothelial Growth Factor (VEGF) Inhibitor, Angiogenesis Inhibitor, Vascular Maturing Agent, Vascular Normalizing Agent and Vascular Stabilizing Agent, and Pharmaceutical Composition - A Tie2 activator containing, as an active ingredient, a hawthorn extract, a starfruit extract, a shellflower extract, a lotus extract, a rooibos extract, an Indian date extract, a Chinese quince extract, a Psidium guava extract, a long pepper extract, a Quillaja extract, a Kouki extract, a ginkgo extract, an oyster extract, a turmeric extract, a chrysanthemum extract, a jujube extract, a Chinese wolfberry extract, a chamomile extract, or a Butcher's Broom extract, or any combination thereof. | 10-03-2013 |
Patent application number | Description | Published |
20090054522 | Hair Care Product - With an object of discovering a substance having a testosterone 5α-reductase inhibiting action, a hair papilla cell growth promoting action, a fibroblast growth factor-7 production promoting action, a vascular endothelial growth factor production promoting action or a bone morphogenetic protein-2 production promoting action, and of providing a hair care product having this substance blended therein, and a hair growth tonic, a testosterone 5α-reductase inhibitor, a hair papilla cell growth promoter, a fibroblast growth factor-7 production promoter, a vascular endothelial growth factor production promoter and a bone morphogenetic protein-2 production promoter each having this substance as an active ingredient thereof, a hair care product of the present invention is made to contain corosolic acid therein, and each of a hair growth tonic, a testosterone 5α-reductase inhibitor, a hair papilla cell growth promoter, a fibroblast growth factor-7 production promoter, a vascular endothelial growth factor production promoter and a bone morphogenetic protein-2 production promoter of the present invention is made to contain corosolic acid as an active ingredient thereof. | 02-26-2009 |
20090130238 | Composition for Preventing and Treating Hangover - There is provided a composition for preventing and treating katzenjammers comprising at least one extract selected from the group consisting of a | 05-21-2009 |
20110118201 | GLUTATHIONE PRODUCTION ENHANCER, PROPHYLACTIC/THERAPEUTIC AGENT FOR DISEASES CAUSED BY GLUTATHIONE DEFICIENCY, AND FOOD, BEVERAGE AND FEED - The invention aims at finding a highly-safe natural product having glutathione production-enhancing activity, and providing a glutathione production enhancer and a prophylactic/therapeutic agent for diseases caused by glutathione deficiency using that natural product as an active ingredient. The glutathione production enhancer or the prophylactic/therapeutic agent for diseases caused by glutathione deficiency contains, as an active ingredient, a licorice extract composition that contains liquiritin, liquiritigenin, isoliquiritin and isoliquiritigenin but contains substantially no glycyrrhizic acid. | 05-19-2011 |
20150125542 | TIE2 Activator, Vascular Endothelial Growth Factor (VEGF) Inhibitor, Angiogenesis Inhibitor, Vascular Maturing Agent, Vascular Normalizing Agent and Vascular Stabilizing Agent, and Pharmaceutical Composition - A Tie2 activator containing, as an active ingredient, a hawthorn extract, a starfruit extract, a shellflower extract, a lotus extract, a rooibos extract, an Indian date extract, a Chinese quince extract, a Psidium guava extract, a long pepper extract, a Quillaja extract, a Kouki extract, a ginkgo extract, an oyster extract, a turmeric extract, a chrysanthemum extract, a jujube extract, a Chinese wolfberry extract, a chamomile extract, or a Butcher's Broom extract, or any combination thereof. | 05-07-2015 |
Patent application number | Description | Published |
20090197773 | Bioreaction Execution System and Bioreaction Execution Method, DNA Chip, Information Processing System and Information Processing Method, Program, and Recording Medium - This invention relates to a bioreaction execution system and bioreaction execution method capable of producing electric fields in a flow channel, into which a solution with a target gene contained therein is dropped, on a DNA chip and causing the target gene to electrophoretically migrate, the DNA chip, an information processing system and information processing method, a program, and a recording medium. An AC supply unit | 08-06-2009 |
20090208931 | Gene Expression Level Normalization Method, Program and System - It is an object to improve the reliability and accuracy of normalization of gene expression levels, which have been measured separately, by providing a method for the acquisition of an index of high reliability and high accuracy as an index for performing the normalization such that the gene expression levels can be compared and verified. Provided is a method for normalizing a gene expression level, which has been measured for an analysis of a gene expression, by using plural gene expression levels measured for an acquisition of an index. The method includes acquiring a correlation among the plural gene expression levels measured for the acquisition of the index, and using the thus-acquired correlation as an index for normalizing the gene expression level measured for the analysis of the gene expression. The correlation function can be obtained by using, as function values, correlations among plural gene expression levels under at least two sets of experimental conditions (numerals | 08-20-2009 |
20090216458 | Biological-Information Processing Apparatus, Biological-Information Processing Method, Biological-Information Processing Program and Program Recording Medium - The present invention relates to a biological-information processing apparatus and a method, which are capable of measuring a hybridisation of a DMA chip without making use of a complex measurement configuration, at a low cost and with a high degree of accuracy, as well as relates to a program and a recording medium. An area enclosed by a spot boundary | 08-27-2009 |
20090246757 | Method, Program, and System for Normalizing Gene Expression Amounts - The present invention aims at presenting novel means for analyzing and correcting gene expression amounts. There is provided a gene expression amount normalizing method in which the number of cells in a sample is obtained by measuring a repeated sequence present in a substantially fixed proportion in a genome contained in the sample, and the number of cells obtained is used as an index for normalizing gene expression amounts obtained from the same sample. For example, a DNA sample | 10-01-2009 |
20100304395 | Method, Program, and System for Normalizing Gene Expression Amounts - The present invention aims at presenting novel means for analyzing and correcting gene expression amounts. There is provided a gene expression amount normalizing method in which the number of cells in a sample is obtained by measuring a repeated sequence present in a substantially fixed proportion in a genome contained in the sample, and the number of cells obtained is used as an index for normalizing gene expression amounts obtained from the same sample. For example, a DNA sample | 12-02-2010 |