Patent application number | Description | Published |
20140308817 | ETCHING METHOD - An etching method can selectively etch a second region formed of silicon oxide in a target object with respect to a first region formed of silicon in the target object. The etching method includes (a) processing the target object with plasma of a first processing gas containing fluorocarbon and fluorohydrocarbon by generating the plasma of the first processing gas with a microwave, and (b) after the processing of the target object with the plasma of the first processing gas, processing the target object with plasma of a second processing gas containing fluorocarbon by generating the plasma of the second processing gas with the microwave. | 10-16-2014 |
20140332372 | PLASMA ETCHING METHOD - An isotropic etching process can be performed with high uniformity. A plasma etching method of etching an etching target layer containing silicon includes preparing a processing target object having the etching target layer in a processing chamber; removing an oxide film on a surface of the etching target layer by generating plasma of a first processing gas that contains a fluorocarbon gas or a fluorohydrocarbon gas but does not contain oxygen; removing a carbon-based reaction product generated when the removing of the oxide film by generating plasma of a second processing gas that does not contain oxygen; and etching the etching target layer without applying a high frequency bias power to a lower electrode serving as a mounting table configured to mount the processing target object thereon by generating plasma of a third processing gas containing a fluorocarbon gas or a fluorohydrocarbon gas with a microwave. | 11-13-2014 |
20150044877 | ETCHING METHOD - An etching method can improve etching accuracy as well as secure selectivity when forming a dummy gate of a fin-type field effect transistor. In the etching method, the dummy gate of a fin-type field effect transistor is formed with a target object. In the etching method, a gate material deposited between multiple fins is etched by using surface wave plasma. A pressure in the etching method is 50 mTorr (6.67 Pa) or more, a frequency of a power to be applied to a mounting table configured to mount thereon the target object is in a range of 10 Hz or more to 200 Hz or less, and the power is pulse-modulated such that a duty ratio as a ratio of an ON-time to a pulse cycle is 50% or less. | 02-12-2015 |
20150056773 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes exciting a processing gas containing a HBr gas and a Cl | 02-26-2015 |
20150064926 | PLASMA PROCESSING METHOD - A plasma processing method can etch regions having different densities at the same etching rates. When etching with surface wave plasma, both of layers contain Si and N, a processing gas includes a hydro fluorocarbon gas, a rare gas, and an oxygen gas, and a high frequency bias potential is applied to a preset location at a side of a substrate. Further, a power per unit area of the substrate, which generates the high frequency bias potential, is set to be about 0 W/m | 03-05-2015 |
Patent application number | Description | Published |
20150064922 | METHOD OF SELECTIVELY REMOVING A REGION FORMED OF SILICON OXIDE AND PLASMA PROCESSING APPARATUS - Provided is a method of selectively removing a first region from a workpiece which includes the first region formed of silicon oxide and a second region formed of silicon. The method performs a plurality of sequences. Each sequence includes: forming a denatured region by generating plasma of a processing gas that contains hydrogen, nitrogen, and fluorine within a processing container that accommodates the workpiece so as to denature a portion of the first region, and removing the denatured region within the processing container. In addition, a sequence subsequent to a predetermined number of sequences after a first sequence among the plurality of sequences further includes exposing the workpiece to plasma of a reducing gas which is generated within the processing container, prior to the forming of the denatured region. | 03-05-2015 |
20150099366 | PLASMA ETCHING METHOD - Provided is a plasma etching method capable of favorably forming masks used when etching a multilayer film. This plasma etching method for etching boron-doped amorphous carbon involves using a plasma of a gas mixture comprising a chlorine gas and an oxygen gas, and setting the temperature of a mounting stage ( | 04-09-2015 |
20150140822 | MULTILAYER FILM ETCHING METHOD AND PLASMA PROCESSING APPARATUS - In one embodiment of the present invention, there is provided a method for etching a multilayer film formed by laminating a plurality of alternating layers of a first layer having a first dielectric constant and a second layer having a second dielectric constant. This method includes (a) a multilayer film etching step, in which an etchant gas is supplied into a processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the etchant gas; and (b) a resist mask reducing step in which an oxygen-containing gas and a fluorocarbon-based gas are supplied to the processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the oxygen-containing gas and the fluorocarbon-based gas. In this method, the steps (a) and (b) are alternately repeated. | 05-21-2015 |
Patent application number | Description | Published |
20150153981 | PRINTING SYSTEM, INFORMATION PROCESSING APPARATUS, COMPUTER READABLE MEDIUM, AND IMAGE FORMING APPARATUS - A printing system includes an information processing apparatus and an image forming apparatus, and the information processing apparatus includes: an acquiring unit that acquires identification information of the image forming apparatus in a printing service system from the image forming apparatus by a short-range communication; and a transmitting unit that transmits, to the printing service system, a setting request which contains the identification information of the image forming apparatus acquired by the acquiring unit and identification information of a user in the printing service system and which is a request for making a setting for permitting the user to use the image forming apparatus; and the image forming apparatus includes a holding unit that holds the identification information of the image forming apparatus in the printing service system in such a form that the identification information can be acquired by the acquiring unit of the information processing apparatus. | 06-04-2015 |
20150264030 | PRINT SYSTEM, IMAGE FORMING APPARATUS, INFORMATION PROCESSING APPARATUS, PRINT SERVICE SYSTEM, AND STORAGE MEDIUM FOR AUTHORIZING ACCESS TO PRINT DATA HELD BY A PRINT SERVICE SYSTEM - A print system includes a print service system, an information processing apparatus, and an image forming apparatus. The print service system includes a holding unit associated with a user and holding print data instructed by the user, a providing unit that provides access authorization information for the holding unit, to the information processing apparatus upon a request thereof, and an access authorizing unit that authorizes an access to the holding unit if receives the access authorization information. The information processing apparatus includes a transmitting unit that transmits the access authorization information to the image forming apparatus by proximity communication. The image forming apparatus includes an authorization information acquiring unit that acquires the access authorization information by the proximity communication, and a print data acquiring unit that sends the acquired access authorization information to the print service system, is authorized to access the holding unit, and acquires the print data. | 09-17-2015 |
20160070512 | PRINT SYSTEM, IMAGE FORMING APPARATUS, INFORMATION PROCESSING APPARATUS, PRINT SERVICE SYSTEM, AND STORAGE MEDIUM FOR AUTHORIZING ACCESS TO PRINT DATA HELD BY A PRINT SERVICE SYSTEM - A print system includes a print service system, an information processing apparatus, and an image forming apparatus. The print service system includes a holding unit associated with a user and holding print data instructed by the user, a providing unit that provides access authorization information for the holding unit, to the information processing apparatus upon a request thereof, and an access authorizing unit that authorizes an access to the holding unit if receives the access authorization information. The information processing apparatus includes a transmitting unit that transmits the access authorization information to the image forming apparatus by proximity communication. The image forming apparatus includes an authorization information acquiring unit that acquires the access authorization information by the proximity communication, and a print data acquiring unit that sends the acquired access authorization information to the print service system, is authorized to access the holding unit, and acquires the print data. | 03-10-2016 |